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A Low Pressure Chemical Vapor Deposition Process For Titanium Disilicide Films With And Without Plasma Enhancement
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Book Synopsis A Low Pressure Chemical Vapor Deposition Process for Titanium Disilicide Films with and Without Plasma Enhancement by : Jaegab Lee
Download or read book A Low Pressure Chemical Vapor Deposition Process for Titanium Disilicide Films with and Without Plasma Enhancement written by Jaegab Lee and published by . This book was released on 1991 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis A Very Low Pressure Chemical Vapor Deposition Process for Blanket and Selective Titanium Silicide Films by : Vida Ilderem
Download or read book A Very Low Pressure Chemical Vapor Deposition Process for Blanket and Selective Titanium Silicide Films written by Vida Ilderem and published by . This book was released on 1988 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Plasma-enhanced Chemical Vapor Deposition of Titanium Silicide by : Edwin Earl Cervantes
Download or read book Plasma-enhanced Chemical Vapor Deposition of Titanium Silicide written by Edwin Earl Cervantes and published by . This book was released on 1985 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Pressure and Plasma Enhanced Chemical Vapor Deposition of Molybdenum Oxide Films by : Jeffrey Scott Cross
Download or read book Low Pressure and Plasma Enhanced Chemical Vapor Deposition of Molybdenum Oxide Films written by Jeffrey Scott Cross and published by . This book was released on 1992 with total page 202 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Proceedings of the Eighth International Conference on Chemical Vapor Deposition by : J. M. Blocher
Download or read book Proceedings of the Eighth International Conference on Chemical Vapor Deposition written by J. M. Blocher and published by . This book was released on 1981 with total page 844 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Handbook of Chemical Vapor Deposition by : Hugh O. Pierson
Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 2012-12-02 with total page 458 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Download or read book Research in Materials written by and published by . This book was released on 1990 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Pressure Chemical Vapor Deposition (LPCVD) of Titanium Nitride by : Sameer Narsinha Dharmadhikari
Download or read book Low Pressure Chemical Vapor Deposition (LPCVD) of Titanium Nitride written by Sameer Narsinha Dharmadhikari and published by . This book was released on 1999 with total page 110 pages. Available in PDF, EPUB and Kindle. Book excerpt: Titanium tetrachioride and ammonia were used as precursors in a Jow pressure chemical vapor deposition process to deposit titanium nitride films on silicon wafers. The process was carried out at temperatures from 450 to 850°C and the activation energy for the reaction was determined. The order of the reaction, with respect to the partial pressures of the reactant gases, was determined by carrying out the reaction at varying partial pressures of the reactant gases. The following rate equation was established for the reaction: rate = 4.35*10-5exp( -5150/T)*(PNH3)1.37(PTicl4)-0.42 The titanium nitride thin films deposited were characterized for properties like resistivity, stress, hardness, and density. The effects of varying the process parameters (temperature, flow ratio, etc.) on these film properties were studied.
Book Synopsis Scientific and Technical Aerospace Reports by :
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Official Gazette of the United States Patent and Trademark Office by : United States. Patent and Trademark Office
Download or read book Official Gazette of the United States Patent and Trademark Office written by United States. Patent and Trademark Office and published by . This book was released on 1999 with total page 1440 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Research in Materials by : Massachusetts Institute of Technology
Download or read book Research in Materials written by Massachusetts Institute of Technology and published by . This book was released on 1990 with total page 448 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition by : Theodore M. Besmann
Download or read book Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition written by Theodore M. Besmann and published by The Electrochemical Society. This book was released on 1996 with total page 922 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition Polymerization by : Jeffrey B. Fortin
Download or read book Chemical Vapor Deposition Polymerization written by Jeffrey B. Fortin and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 112 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed. This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.
Book Synopsis Chemical Vapor Deposition by : Jong-Hee Park
Download or read book Chemical Vapor Deposition written by Jong-Hee Park and published by ASM International. This book was released on 2001 with total page 477 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Pressure Chemical Vapor Deposition of Titanium Silicide by : Vida Ilderem
Download or read book Low Pressure Chemical Vapor Deposition of Titanium Silicide written by Vida Ilderem and published by . This book was released on 1985 with total page 202 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition for Microelectronics by : Arthur Sherman
Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Book Synopsis Chemistry in Microelectronics by : Yannick Le Tiec
Download or read book Chemistry in Microelectronics written by Yannick Le Tiec and published by John Wiley & Sons. This book was released on 2013-02-28 with total page 261 pages. Available in PDF, EPUB and Kindle. Book excerpt: Microelectronics is a complex world where many sciences need to collaborate to create nano-objects: we need expertise in electronics, microelectronics, physics, optics and mechanics also crossing into chemistry, electrochemistry, as well as biology, biochemistry and medicine. Chemistry is involved in many fields from materials, chemicals, gases, liquids or salts, the basics of reactions and equilibrium, to the optimized cleaning of surfaces and selective etching of specific layers. In addition, over recent decades, the size of the transistors has been drastically reduced while the functionality of circuits has increased. This book consists of five chapters covering the chemicals and sequences used in processing, from cleaning to etching, the role and impact of their purity, along with the materials used in “Front End Of the Line” which corresponds to the heart and performance of individual transistors, then moving on to the “Back End Of the Line” which is related to the interconnection of all the transistors. Finally, the need for specific functionalization also requires key knowledge on surface treatments and chemical management to allow new applications. Contents 1. Chemistry in the “Front End of the Line” (FEOL): Deposits, Gate Stacks, Epitaxy and Contacts, François Martin, Jean-Michel Hartmann, Véronique Carron and Yannick Le Tiec. 2. Chemistry in Interconnects, Vincent Jousseaume, Paul-Henri Haumesser, Carole Pernel, Jeffery Butterbaugh, Sylvain Maîtrejean and Didier Louis. 3. The Chemistry of Wet Surface Preparation: Cleaning, Etching and Drying, Yannick Le Tiec and Martin Knotter. 4. The Use and Management of Chemical Fluids in Microelectronics, Christiane Gottschalk, Kevin Mclaughlin, Julie Cren, Catherine Peyne and Patrick Valenti. 5. Surface Functionalization for Micro- and Nanosystems: Application to Biosensors, Antoine Hoang, Gilles Marchand, Guillaume Nonglaton, Isabelle Texier-Nogues and Francoise Vinet. About the Authors Yannick Le Tiec is a technical expert at CEA-Leti, Minatec since 2002. He is a CEA-Leti assignee at IBM, Albany (NY) to develop the advanced 14 nm CMOS node and the FDSOI technology. He held different technical positions from the advanced 300 mm SOI CMOS pilot line to different assignments within SOITEC for advanced wafer development and later within INES to optimize solar cell ramp-up and yield. He has been part of the ITRS Front End technical working group at ITRS since 2008.
