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Author : Society of Photo-optical Instrumentation Engineers
Publisher :
ISBN 13 :
Total Pages : 304 pages
Book Rating : 4.:/5 (318 download)
Download or read book Optical Microlithography VI written by Society of Photo-optical Instrumentation Engineers and published by . This book was released on 1987 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : P. Rai-Choudhury
Publisher : SPIE Press
ISBN 13 : 9780819423788
Total Pages : 780 pages
Book Rating : 4.4/5 (237 download)
Download or read book Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography written by P. Rai-Choudhury and published by SPIE Press. This book was released on 1997 with total page 780 pages. Available in PDF, EPUB and Kindle. Book excerpt: The dynamic field of lithography demands an authoritative handbook for process development and production, and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook. Copublished with IEE.
Author : Chris Mack
Publisher : John Wiley & Sons
ISBN 13 : 1119965071
Total Pages : 503 pages
Book Rating : 4.1/5 (199 download)
Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Author : Laszlo Monostori
Publisher : Springer
ISBN 13 : 3030181804
Total Pages : 259 pages
Book Rating : 4.0/5 (31 download)
Download or read book Proceedings of the 4th International Conference on the Industry 4.0 Model for Advanced Manufacturing written by Laszlo Monostori and published by Springer. This book was released on 2019-04-30 with total page 259 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book gathers the proceedings of the 4th International Conference on the Industry 4.0 Model for Advanced Manufacturing (AMP 2019), held in Belgrade, Serbia, on 3–6 June 2019. The event marks the latest in a series of high-level conferences that bring together experts from academia and industry to exchange knowledge, ideas, experiences, research findings, and information in the field of manufacturing. The book addresses a wide range of topics, including: design of smart and intelligent products, developments in CAD/CAM technologies, rapid prototyping and reverse engineering, multistage manufacturing processes, manufacturing automation in the Industry 4.0 model, cloud-based products, and cyber-physical and reconfigurable manufacturing systems. By providing updates on key issues and highlighting recent advances in manufacturing engineering and technologies, the book supports the transfer of vital knowledge to the next generation of academics and practitioners. Further, it will appeal to anyone working or conducting research in this rapidly evolving field.
Author :
Publisher :
ISBN 13 :
Total Pages : 878 pages
Book Rating : 4.3/5 (91 download)
Download or read book Optical Microlithography written by and published by . This book was released on 2001 with total page 878 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Jim Dey
Publisher :
ISBN 13 :
Total Pages : 236 pages
Book Rating : 4.:/5 (318 download)
Download or read book Semiconductor Microlithography VI written by Jim Dey and published by . This book was released on 1981 with total page 236 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Emil Wolf
Publisher : Elsevier
ISBN 13 : 0444594221
Total Pages : 378 pages
Book Rating : 4.4/5 (445 download)
Download or read book Progress in Optics written by Emil Wolf and published by Elsevier. This book was released on 2012-09-05 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the 50 years since the first volume of Progress in Optics was published, optics has become one of the most dynamic fields of science. The volumes in this series that have appeared up to now contain more than 300 review articles by distinguished research workers, which have become permanent records for many important developments, helping optical scientists and optical engineers stay abreast of their fields. Comprehensive, in-depth reviews Edited by the leading authority in the field
Author : Luciano Lavagno
Publisher : CRC Press
ISBN 13 : 1351831003
Total Pages : 893 pages
Book Rating : 4.3/5 (518 download)
Download or read book Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology written by Luciano Lavagno and published by CRC Press. This book was released on 2017-02-03 with total page 893 pages. Available in PDF, EPUB and Kindle. Book excerpt: The second of two volumes in the Electronic Design Automation for Integrated Circuits Handbook, Second Edition, Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology thoroughly examines real-time logic (RTL) to GDSII (a file format used to transfer data of semiconductor physical layout) design flow, analog/mixed signal design, physical verification, and technology computer-aided design (TCAD). Chapters contributed by leading experts authoritatively discuss design for manufacturability (DFM) at the nanoscale, power supply network design and analysis, design modeling, and much more. New to This Edition: Major updates appearing in the initial phases of the design flow, where the level of abstraction keeps rising to support more functionality with lower non-recurring engineering (NRE) costs Significant revisions reflected in the final phases of the design flow, where the complexity due to smaller and smaller geometries is compounded by the slow progress of shorter wavelength lithography New coverage of cutting-edge applications and approaches realized in the decade since publication of the previous edition—these are illustrated by new chapters on 3D circuit integration and clock design Offering improved depth and modernity, Electronic Design Automation for IC Implementation, Circuit Design, and Process Technology provides a valuable, state-of-the-art reference for electronic design automation (EDA) students, researchers, and professionals.
Download or read book Optical Microlithography XXV written by and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Charles J. Alpert
Publisher : CRC Press
ISBN 13 : 1000654192
Total Pages : 1044 pages
Book Rating : 4.0/5 (6 download)
Download or read book Handbook of Algorithms for Physical Design Automation written by Charles J. Alpert and published by CRC Press. This book was released on 2008-11-12 with total page 1044 pages. Available in PDF, EPUB and Kindle. Book excerpt: The physical design flow of any project depends upon the size of the design, the technology, the number of designers, the clock frequency, and the time to do the design. As technology advances and design-styles change, physical design flows are constantly reinvented as traditional phases are removed and new ones are added to accommodate changes in
Author : Luciano Lavagno
Publisher : CRC Press
ISBN 13 : 1351837583
Total Pages : 762 pages
Book Rating : 4.3/5 (518 download)
Download or read book EDA for IC Implementation, Circuit Design, and Process Technology written by Luciano Lavagno and published by CRC Press. This book was released on 2018-10-03 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presenting a comprehensive overview of the design automation algorithms, tools, and methodologies used to design integrated circuits, the Electronic Design Automation for Integrated Circuits Handbook is available in two volumes. The second volume, EDA for IC Implementation, Circuit Design, and Process Technology, thoroughly examines real-time logic to GDSII (a file format used to transfer data of semiconductor physical layout), analog/mixed signal design, physical verification, and technology CAD (TCAD). Chapters contributed by leading experts authoritatively discuss design for manufacturability at the nanoscale, power supply network design and analysis, design modeling, and much more. Save on the complete set.
Author : J. Greer
Publisher : Elsevier
ISBN 13 : 0080537219
Total Pages : 264 pages
Book Rating : 4.0/5 (85 download)
Download or read book Nano and Giga Challenges in Microelectronics written by J. Greer and published by Elsevier. This book was released on 2003-10-24 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: The book is designed as an introduction for engineers and researchers wishing to obtain a fundamental knowledge and a snapshot in time of the cutting edge in technology research. As a natural consequence, Nano and Giga Challenges is also an essential reference for the "gurus" wishing to keep abreast of the latest directions and challenges in microelectronic technology development and future trends. The combination of viewpoints presented within the book can help to foster further research and cross-disciplinary interaction needed to surmount the barriers facing future generations of technology design. Key Features: • Quickly becoming the hottest topic of the new millennium (2.4 billion dollars funding in US alone • Current status and future trends of micro and nanoelectronics research • Written by leading experts in the corresponding research areas • Excellent tutorial for graduate students and reference for "gurus"
Author : Luc Van den Hove
Publisher : SPIE-International Society for Optical Engineering
ISBN 13 :
Total Pages : 1114 pages
Book Rating : 4.E/5 ( download)
Download or read book Optical Microlithography XI written by Luc Van den Hove and published by SPIE-International Society for Optical Engineering. This book was released on 1998 with total page 1114 pages. Available in PDF, EPUB and Kindle. Book excerpt: A study of optical microlithography. It contains papers on subjects such as phase-shifting masks, CD control scanners, process optimization, and advanced masks.
Author :
Publisher :
ISBN 13 :
Total Pages : 848 pages
Book Rating : 4.3/5 (91 download)
Download or read book Optical Microlithography written by and published by . This book was released on 2000 with total page 848 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Alfred Kwok-Kit Wong
Publisher : SPIE Press
ISBN 13 : 9780819439956
Total Pages : 238 pages
Book Rating : 4.4/5 (399 download)
Download or read book Resolution Enhancement Techniques in Optical Lithography written by Alfred Kwok-Kit Wong and published by SPIE Press. This book was released on 2001 with total page 238 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers
Author : Alfred Kwok-Kit Wong
Publisher : SPIE Press
ISBN 13 : 9780819458292
Total Pages : 280 pages
Book Rating : 4.4/5 (582 download)
Download or read book Optical Imaging in Projection Microlithography written by Alfred Kwok-Kit Wong and published by SPIE Press. This book was released on 2005 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt: Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
Author : Chue San Yoo
Publisher : World Scientific Publishing Company
ISBN 13 : 9813106719
Total Pages : 484 pages
Book Rating : 4.8/5 (131 download)
Download or read book Semiconductor Manufacturing Technology written by Chue San Yoo and published by World Scientific Publishing Company. This book was released on 2008-03-03 with total page 484 pages. Available in PDF, EPUB and Kindle. Book excerpt: This textbook contains all the materials that an engineer needs to know to start a career in the semiconductor industry. It also provides readers with essential background information for semiconductor research. It is written by a professional who has been working in the field for over two decades and teaching the material to university students for the past 15 years. It includes process knowledge from raw material preparation to the passivation of chips in a modular format.
