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Resolution Enhancement Techniques In Optical Lithography
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Book Synopsis Resolution Enhancement Techniques in Optical Lithography by : Alfred Kwok-Kit Wong
Download or read book Resolution Enhancement Techniques in Optical Lithography written by Alfred Kwok-Kit Wong and published by SPIE Press. This book was released on 2001 with total page 238 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers
Author :F. M. Schellenberg Publisher :SPIE-International Society for Optical Engineering ISBN 13 : Total Pages :910 pages Book Rating :4.:/5 (318 download)
Book Synopsis Selected Papers on Resolution Enhancement Techniques in Optical Lithography by : F. M. Schellenberg
Download or read book Selected Papers on Resolution Enhancement Techniques in Optical Lithography written by F. M. Schellenberg and published by SPIE-International Society for Optical Engineering. This book was released on 2004 with total page 910 pages. Available in PDF, EPUB and Kindle. Book excerpt: Optical lithography for integrated circuits is undergoing a renaissance with the adoption of Resolution Enhancement Technology (RET). Some RET concepts have become routine in manufacturing. This volume gathers together seminal RET papers.
Book Synopsis Selected Papers on Resolution Enhancement Techniques in Optical Lithography by : F. M. Schellenberg
Download or read book Selected Papers on Resolution Enhancement Techniques in Optical Lithography written by F. M. Schellenberg and published by . This book was released on 2004-03-30 with total page 896 pages. Available in PDF, EPUB and Kindle. Book excerpt: Optical lithography for integrated circuits is undergoing a renaissance with the adoption of resolution enhancement techniques (RET). Some RET concepts have become routine in manufacturing, almost two decades after the original applications were conceived. This volume gathers together seminal RET papers. Since many of the first applications were announced by Japanese authors well before the material was presented in English, some of the original Japanese papers are included plus their English translations.
Book Synopsis Resolution Enhancement Techniques in Optical Lithography by : Alfred K. Wong
Download or read book Resolution Enhancement Techniques in Optical Lithography written by Alfred K. Wong and published by . This book was released on 2001 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers.
Book Synopsis Computational Lithography by : Xu Ma
Download or read book Computational Lithography written by Xu Ma and published by John Wiley & Sons. This book was released on 2011-01-06 with total page 225 pages. Available in PDF, EPUB and Kindle. Book excerpt: A Unified Summary of the Models and Optimization Methods Used in Computational Lithography Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting mask (PSM), and off-axis illumination (OAI) RET tools that use model-based mathematical optimization approaches. The book starts with an introduction to optical lithography systems, electric magnetic field principles, and the fundamentals of optimization from a mathematical point of view. It goes on to describe in detail different types of optimization algorithms to implement RETs. Most of the algorithms developed are based on the application of the OPC, PSM, and OAI approaches and their combinations. Algorithms for coherent illumination as well as partially coherent illumination systems are described, and numerous simulations are offered to illustrate the effectiveness of the algorithms. In addition, mathematical derivations of all optimization frameworks are presented. The accompanying MATLAB® software files for all the RET methods described in the book make it easy for readers to run and investigate the codes in order to understand and apply the optimization algorithms, as well as to design a set of optimal lithography masks. The codes may also be used by readers for their research and development activities in their academic or industrial organizations. An accompanying MATLAB® software guide is also included. An accompanying MATLAB® software guide is included, and readers can download the software to use with the guide at ftp://ftp.wiley.com/public/sci_tech_med/computational_lithography. Tailored for both entry-level and experienced readers, Computational Lithography is meant for faculty, graduate students, and researchers, as well as scientists and engineers in industrial organizations whose research or career field is semiconductor IC fabrication, optical lithography, and RETs. Computational lithography draws from the rich theory of inverse problems, optics, optimization, and computational imaging; as such, the book is also directed to researchers and practitioners in these fields.
Book Synopsis Field Guide to Optical Lithography by : Chris A. Mack
Download or read book Field Guide to Optical Lithography written by Chris A. Mack and published by Society of Photo Optical. This book was released on 2006 with total page 122 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Field Guide distills the material written by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. It details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.
Book Synopsis Physics of Semiconductor Devices by : Vikram Kumar
Download or read book Physics of Semiconductor Devices written by Vikram Kumar and published by Allied Publishers. This book was released on 2002 with total page 748 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Fundamental Principles of Optical Lithography by : Chris Mack
Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Book Synopsis Optical and EUV Lithography by : Andreas Erdmann
Download or read book Optical and EUV Lithography written by Andreas Erdmann and published by . This book was released on 2021-02 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Extending Moore's Law through Advanced Semiconductor Design and Processing Techniques by : Wynand Lambrechts
Download or read book Extending Moore's Law through Advanced Semiconductor Design and Processing Techniques written by Wynand Lambrechts and published by CRC Press. This book was released on 2018-09-13 with total page 354 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a methodological understanding of the theoretical and technical limitations to the longevity of Moore’s law. The book presents research on factors that have significant impact on the future of Moore’s law and those factors believed to sustain the trend of the last five decades. Research findings show that boundaries of Moore’s law primarily include physical restrictions of scaling electronic components to levels beyond that of ordinary manufacturing principles and approaching the bounds of physics. The research presented in this book provides essential background and knowledge to grasp the following principles: Traditional and modern photolithography, the primary limiting factor of Moore’s law Innovations in semiconductor manufacturing that makes current generation CMOS processing possible Multi-disciplinary technologies that could drive Moore's law forward significantly Design principles for microelectronic circuits and components that take advantage of technology miniaturization The semiconductor industry economic market trends and technical driving factors The complexity and cost associated with technology scaling have compelled researchers in the disciplines of engineering and physics to optimize previous generation nodes to improve system-on-chip performance. This is especially relevant to participate in the increased attractiveness of the Internet of Things (IoT). This book additionally provides scholarly and practical examples of principles in microelectronic circuit design and layout to mitigate technology limits of previous generation nodes. Readers are encouraged to intellectually apply the knowledge derived from this book to further research and innovation in prolonging Moore’s law and associated principles.
Author :Burn Jeng Lin Publisher :SPIE-International Society for Optical Engineering ISBN 13 :9781510639959 Total Pages :0 pages Book Rating :4.6/5 (399 download)
Book Synopsis Optical Lithography by : Burn Jeng Lin
Download or read book Optical Lithography written by Burn Jeng Lin and published by SPIE-International Society for Optical Engineering. This book was released on 2021 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies.
Book Synopsis Design for Manufacturability and Statistical Design by : Michael Orshansky
Download or read book Design for Manufacturability and Statistical Design written by Michael Orshansky and published by Springer Science & Business Media. This book was released on 2007-10-28 with total page 319 pages. Available in PDF, EPUB and Kindle. Book excerpt: Design for Manufacturability and Statistical Design: A Comprehensive Approach presents a comprehensive overview of methods that need to be mastered in understanding state-of-the-art design for manufacturability and statistical design methodologies. Broadly, design for manufacturability is a set of techniques that attempt to fix the systematic sources of variability, such as those due to photolithography and CMP. Statistical design, on the other hand, deals with the random sources of variability. Both paradigms operate within a common framework, and their joint comprehensive treatment is one of the objectives of this book and an important differentation.
Book Synopsis Handbook of Photomask Manufacturing Technology by : Syed Rizvi
Download or read book Handbook of Photomask Manufacturing Technology written by Syed Rizvi and published by CRC Press. This book was released on 2018-10-03 with total page 728 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
Book Synopsis Applied Digital Optics by : Bernard C. Kress
Download or read book Applied Digital Optics written by Bernard C. Kress and published by John Wiley & Sons. This book was released on 2009-11-04 with total page 638 pages. Available in PDF, EPUB and Kindle. Book excerpt: Miniaturization and mass replications have begun to lead the optical industry in the transition from traditional analog to novel digital optics. As digital optics enter the realm of mainstream technology through the worldwide sale of consumer electronic devices, this timely book aims to present the topic of digital optics in a unified way. Ranging from micro-optics to nanophotonics, and design to fabrication through to integration in final products, it reviews the various physical implementations of digital optics in either micro-refractives, waveguide (planar lightwave chips), diffractive and hybrid optics or sub-wavelength structures (resonant gratings, surface plasmons, photonic crystals and metamaterials). Finally, it presents a comprehensive list of industrial and commercial applications that are taking advantage of the unique properties of digital optics. Applied Digital Optics is aimed primarily at optical engineers and product development and technical marketing managers; it is also of interest to graduate-level photonics students and micro-optic foundries. Helps optical engineers review and choose the appropriate software tools to design, model and generate fabrication files. Gives product managers access to an exhaustive list of applications available in today’s market for integrating such digital optics, as well as where the next potential application of digital optics might be. Provides a broad view for technical marketing managers in all aspects of digital optics, and how such optics can be classified. Explains the numerical implementation of optical design and modelling techniques. Enables micro-optics foundries to integrate the latest fabrication and replication techniques, and accordingly fine tune their own fabrication processes.
Book Synopsis Handbook of Optical Systems, Volume 2 by : Wolfgang Singer
Download or read book Handbook of Optical Systems, Volume 2 written by Wolfgang Singer and published by John Wiley & Sons. This book was released on 2006-05-12 with total page 714 pages. Available in PDF, EPUB and Kindle. Book excerpt: The state-of-the-art full-colored handbook gives a comprehensive introduction to the principles and the practice of calculation, layout, and understanding of optical systems and lens design. Written by reputed industrial experts in the field, this text introduces the user to the basic properties of optical systems, aberration theory, classification and characterization of systems, advanced simulation models, measuring of system quality and manufacturing issues. In this Volume Volume 2 continues the introduction given in volume 1 with the more advanced texts about the foundations of image formation. Emphasis is placed on an intuitive while theoretically exact presentation. More than 400 color graphs and selected references on the end of each chapter support this undertaking. From the contents: 17 Wave equation 18 Diffraction 19 Interference and coherence 20 Imaging 21 Imaging with partial coherence 22 Three dimensional imaging 23 Polarization 24 Polarization and optical imaging A1 Mathematical appendix Other Volumes Volume 1: Fundamentals of Technical Optics Volume 3: Aberration Theory and Correction of Optical Systems Volume 4: Survey of Optical Instruments Volume 5: Advanced Physical Optics
Book Synopsis Superresolution Optical Microscopy by : Barry R. Masters
Download or read book Superresolution Optical Microscopy written by Barry R. Masters and published by Springer Nature. This book was released on 2020-03-21 with total page 415 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents a comprehensive and coherent summary of techniques for enhancing the resolution and image contrast provided by far-field optical microscopes. It takes a critical look at the body of knowledge that comprises optical microscopy, compares and contrasts the various instruments, provides a clear discussion of the physical principles that underpin these techniques, and describes advances in science and medicine for which superresolution microscopes are required and are making major contributions. The text fills significant gaps that exist in other works on superresolution imaging, firstly by placing a new emphasis on the specimen, a critical component of the microscope setup, giving equal importance to the enhancement of both resolution and contrast. Secondly, it covers several topics not typically discussed in depth, such as Bessel and Airy beams, the physics of the spiral phase plate, vortex beams and singular optics, photoactivated localization microscopy (PALM), stochastic optical reconstruction microscopy (STORM), structured illumination microscopy (SIM), and light-sheet fluorescence microscopy (LSFM). Several variants of these techniques are critically discussed. Noise, optical aberrations, specimen damage, and artifacts in microscopy are also covered. The importance of validation of superresolution images with electron microscopy is stressed. Additionally, the book includes translations and discussion of seminal papers by Abbe and Helmholtz that proved to be pedagogically relevant as well as historically significant. This book is written for students, researchers, and engineers in the life sciences, medicine, biological engineering, and materials science who plan to work with or already are working with superresolution light microscopes. The volume can serve as a reference for these areas while a selected set of individual chapters can be used as a textbook for a one-semester undergraduate or first-year graduate course on superresolution microscopy. Moreover, the text provides a captivating account of curiosity, skepticism, risk-taking, innovation, and creativity in science and technology. Good scientific practice is emphasized throughout, and the author’s lecture slides on responsible conduct of research are included as an online resource which will be of interest to students, course instructors, and scientists alike.
Download or read book Nanofabrication written by Zheng Cui and published by Springer Science & Business Media. This book was released on 2009-01-01 with total page 350 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides the reader with the most up-to-date information and development in the Nanofabrication area. It presents a one-stop description at the introduction level on most of the technologies that have been developed which are capable of making structures below 100nm. Principles of each technology are introduced and illustrated with minimum mathematics involved. The book serves as a practical guide and first hand reference for those working in nanostructure fabrication.
