PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing

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Author :
Publisher : Elsevier
ISBN 13 : 0080542921
Total Pages : 434 pages
Book Rating : 4.0/5 (85 download)

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Book Synopsis PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing by :

Download or read book PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing written by and published by Elsevier. This book was released on 1998-10-29 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.

PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing

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Author :
Publisher : Academic Press
ISBN 13 : 9780125330268
Total Pages : 419 pages
Book Rating : 4.3/5 (32 download)

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Book Synopsis PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing by :

Download or read book PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing written by and published by Academic Press. This book was released on 1998-11-06 with total page 419 pages. Available in PDF, EPUB and Kindle. Book excerpt: Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.

Sputtering Materials for VLSI and Thin Film Devices

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Author :
Publisher : William Andrew
ISBN 13 : 0815519877
Total Pages : 608 pages
Book Rating : 4.8/5 (155 download)

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Book Synopsis Sputtering Materials for VLSI and Thin Film Devices by : Jaydeep Sarkar

Download or read book Sputtering Materials for VLSI and Thin Film Devices written by Jaydeep Sarkar and published by William Andrew. This book was released on 2010-12-13 with total page 608 pages. Available in PDF, EPUB and Kindle. Book excerpt: An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements Practical information on technology trends, role of sputtering and major OEMs Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc. Practical case-studies on target performance and troubleshooting Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry

Handbook of Physical Vapor Deposition (PVD) Processing

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Author :
Publisher : Cambridge University Press
ISBN 13 : 0080946585
Total Pages : 947 pages
Book Rating : 4.0/5 (89 download)

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Book Synopsis Handbook of Physical Vapor Deposition (PVD) Processing by : D. M. Mattox

Download or read book Handbook of Physical Vapor Deposition (PVD) Processing written by D. M. Mattox and published by Cambridge University Press. This book was released on 2014-09-19 with total page 947 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

The Foundations of Vacuum Coating Technology

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Author :
Publisher : William Andrew
ISBN 13 : 0128130857
Total Pages : 378 pages
Book Rating : 4.1/5 (281 download)

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Book Synopsis The Foundations of Vacuum Coating Technology by : Donald M. Mattox

Download or read book The Foundations of Vacuum Coating Technology written by Donald M. Mattox and published by William Andrew. This book was released on 2018-08-21 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. History and detailed descriptions of Vacuum Deposition Technologies Review of Enabling Technologies and their importance to current applications Extensively referenced text Patents are referenced as part of the history Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology Glossary of Terms for vacuum coating

Chalcogenide Glasses

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Author :
Publisher : Woodhead Publishing
ISBN 13 : 0857093568
Total Pages : 704 pages
Book Rating : 4.8/5 (57 download)

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Book Synopsis Chalcogenide Glasses by : J-L Adam

Download or read book Chalcogenide Glasses written by J-L Adam and published by Woodhead Publishing. This book was released on 2014-02-14 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: The unique properties and functionalities of chalcogenide glasses make them promising materials for photonic applications. Chalcogenide glasses are transparent from the visible to the near infrared region and can be moulded into lenses or drawn into fibres. They have useful commercial applications as components for lenses for infrared cameras, and chalcogenide glass fibres and optical components are used in waveguides for use with lasers, for optical switching, chemical and temperature sensing and phase change memories. Chalcogenide glasses comprehensively reviews the latest technological advances in this field and the industrial applications of the technology. Part one outlines the preparation methods and properties of chalcogenide glasses, including the thermal properties, structure, and optical properties, before going on to discuss mean coordination and topological constraints in chalcogenide network glasses, and the photo-induced phenomena in chalcogenide glasses. This section also covers the ionic conductivity and physical aging of chalcogenide glasses, deposition techniques for chalcogenide thin films, and transparent chalcogenide glass-ceramics. Part two explores the applications of chalcogenide glasses. Topics discussed include rare-earth-doped chalcogenide glass for lasers and amplifiers, the applications of chalcogenide glasses for infrared sensing, microstructured optical fibres for infrared applications, and chalcogenide glass waveguide devices for all-optical signal processing. This section also discusses the control of light on the nanoscale with chalcogenide thin films, chalcogenide glass resists for lithography, and chalcogenide for phase change optical and electrical memories. The book concludes with an overview of chalcogenide glasses as electrolytes for batteries. Chalcogenide glasses comprehensively reviews the latest technological advances and applications of chalcogenide glasses, and is an essential text for academics, materials scientists and electrical engineers working in the photonics and optoelectronics industry. Outlines preparation methods and properties, and explores applications of chalcogenide glasses. Covers the ionic conductivity and physical aging of chalcogenide glasses, deposition techniques for chalcogenide thin films, and transparent chalcogenide glass-ceramics Discusses the control of light on the nanoscale with chalcogenide thin films, chalcogenide glass resists for lithography, and chalcogenide for phase change optical and electrical memories

Ionized Physical Vapor Deposition

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Author :
Publisher : Academic Press
ISBN 13 : 008054293X
Total Pages : 268 pages
Book Rating : 4.0/5 (85 download)

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Book Synopsis Ionized Physical Vapor Deposition by :

Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-14 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips. For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools. Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference. Key Features: The first comprehensive volume on ionized physical vapor deposition Combines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVD Emphasizes practical applications in the area of IC fabrication and interconnect technology Serves as a guide to select the most appropriate technology for any deposition application *This single source saves time and effort by including comprehensive information at one's finger tips *The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD *The numerous practical applications assist the working engineer to select and refine thin film processes

Springer Handbook of Electronic and Photonic Materials

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Author :
Publisher : Springer
ISBN 13 : 331948933X
Total Pages : 1536 pages
Book Rating : 4.3/5 (194 download)

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Book Synopsis Springer Handbook of Electronic and Photonic Materials by : Safa Kasap

Download or read book Springer Handbook of Electronic and Photonic Materials written by Safa Kasap and published by Springer. This book was released on 2017-10-04 with total page 1536 pages. Available in PDF, EPUB and Kindle. Book excerpt: The second, updated edition of this essential reference book provides a wealth of detail on a wide range of electronic and photonic materials, starting from fundamentals and building up to advanced topics and applications. Its extensive coverage, with clear illustrations and applications, carefully selected chapter sequencing and logical flow, makes it very different from other electronic materials handbooks. It has been written by professionals in the field and instructors who teach the subject at a university or in corporate laboratories. The Springer Handbook of Electronic and Photonic Materials, second edition, includes practical applications used as examples, details of experimental techniques, useful tables that summarize equations, and, most importantly, properties of various materials, as well as an extensive glossary. Along with significant updates to the content and the references, the second edition includes a number of new chapters such as those covering novel materials and selected applications. This handbook is a valuable resource for graduate students, researchers and practicing professionals working in the area of electronic, optoelectronic and photonic materials.

Materials Science of Thin Films

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Author :
Publisher : Academic Press
ISBN 13 : 0125249756
Total Pages : 817 pages
Book Rating : 4.1/5 (252 download)

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Book Synopsis Materials Science of Thin Films by : Milton Ohring

Download or read book Materials Science of Thin Films written by Milton Ohring and published by Academic Press. This book was released on 2002 with total page 817 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first book that can be considered a textbook on thin film science, complete with exercises at the end of each chapter. Ohring has contributed many highly regarded reference books to the AP list, including Reliability and Failure of Electronic Materials and the Engineering Science of Thin Films. The knowledge base is intended for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films and scientists and engineers who are entering or require an overview of the field. Since 1992, when the book was first published, the field of thin films has expanded tremendously, especially with regard to technological applications. The second edition will bring the book up-to-date with regard to these advances. Most chapters have been greatly updated, and several new chapters have been added.

PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing

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Author :
Publisher : Academic Press
ISBN 13 : 9780125330268
Total Pages : 0 pages
Book Rating : 4.3/5 (32 download)

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Book Synopsis PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing by :

Download or read book PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing written by and published by Academic Press. This book was released on 1998-10-23 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.

Fundamentals of Electrochemical Deposition

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Author :
Publisher : John Wiley & Sons
ISBN 13 : 047000939X
Total Pages : 388 pages
Book Rating : 4.4/5 (7 download)

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Book Synopsis Fundamentals of Electrochemical Deposition by : Milan Paunovic

Download or read book Fundamentals of Electrochemical Deposition written by Milan Paunovic and published by John Wiley & Sons. This book was released on 2006-08-11 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt: Excellent teaching and resource material . . . it is concise, coherently structured, and easy to read . . . highly recommended for students, engineers, and researchers in all related fields." -Corrosion on the First Edition of Fundamentals of Electrochemical Deposition From computer hardware to automobiles, medical diagnostics to aerospace, electrochemical deposition plays a crucial role in an array of key industries. Fundamentals of Electrochemical Deposition, Second Edition is a comprehensive introduction to one of today's most exciting and rapidly evolving fields of practical knowledge. The most authoritative introduction to the field so far, the book presents detailed coverage of the full range of electrochemical deposition processes and technologies, including: * Metal-solution interphase * Charge transfer across an interphase * Formation of an equilibrium electrode potential * Nucleation and growth of thin films * Kinetics and mechanisms of electrodeposition * Electroless deposition * In situ characterization of deposition processes * Structure and properties of deposits * Multilayered and composite thin films * Interdiffusion in thin film * Applications in the semiconductor industry and the field of medicine This new edition updates the prior edition to address the new developments in the science and its applications, with new chapters on innovative applications of electrochemical deposition in semiconductor technology, magnetism and microelectronics, and medical instrumentation. Added coverage includes such topics as binding energy, nanoclusters, atomic force, and scanning tunneling microscopy.Example problems at the end of chapters and other features clarify and improve understanding of the material. Written by an author team with extensive experience in both industry and academe, this reference and text provides a well-rounded introduction to the field for students, as well as a means for professional chemists, engineers, and technicians to expand and sharpen their skills in using the technology.

Materials Processing

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Publisher : Academic Press
ISBN 13 : 0123851335
Total Pages : 615 pages
Book Rating : 4.1/5 (238 download)

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Book Synopsis Materials Processing by : Lorraine F. Francis

Download or read book Materials Processing written by Lorraine F. Francis and published by Academic Press. This book was released on 2015-12-28 with total page 615 pages. Available in PDF, EPUB and Kindle. Book excerpt: Materials Processing is the first textbook to bring the fundamental concepts of materials processing together in a unified approach that highlights the overlap in scientific and engineering principles. It teaches students the key principles involved in the processing of engineering materials, specifically metals, ceramics and polymers, from starting or raw materials through to the final functional forms. Its self-contained approach is based on the state of matter most central to the shaping of the material: melt, solid, powder, dispersion and solution, and vapor. With this approach, students learn processing fundamentals and appreciate the similarities and differences between the materials classes. The book uses a consistent nomenclature that allow for easier comparisons between various materials and processes. Emphasis is on fundamental principles that gives students a strong foundation for understanding processing and manufacturing methods. Development of connections between processing and structure builds on students’ existing knowledge of structure-property relationships. Examples of both standard and newer additive manufacturing methods throughout provide students with an overview of the methods that they will likely encounter in their careers. This book is intended primarily for upper-level undergraduates and beginning graduate students in Materials Science and Engineering who are already schooled in the structure and properties of metals, ceramics and polymers, and are ready to apply their knowledge to materials processing. It will also appeal to students from other engineering disciplines who have completed an introductory materials science and engineering course. Coverage of metal, ceramic and polymer processing in a single text provides a self-contained approach and consistent nomenclature that allow for easier comparisons between various materials and processes Emphasis on fundamental principles gives students a strong foundation for understanding processing and manufacturing methods Development of connections between processing and structure builds on students’ existing knowledge of structure - property relationships Examples of both standard and newer additive manufacturing methods throughout provide students with an overview of the methods that they will likely encounter in their careers

Frontiers of Thin Film Technology

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Author :
Publisher : Academic Press
ISBN 13 : 9780080542942
Total Pages : 476 pages
Book Rating : 4.5/5 (429 download)

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Book Synopsis Frontiers of Thin Film Technology by :

Download or read book Frontiers of Thin Film Technology written by and published by Academic Press. This book was released on 2000-11-07 with total page 476 pages. Available in PDF, EPUB and Kindle. Book excerpt: Frontiers of Thin Film Technology, Volume 28 focuses on recent developments in those technologies that are critical to the successful growth, fabrication, and characterization of newly emerging solid-state thin film device architectures. Volume 28 is a condensed sampler of the Handbook for use by professional scientists, engineers, and students involved in the materials, design, fabrication, diagnostics, and measurement aspects of these important new devices.

Cu(In1-xGax)Se2 Based Thin Film Solar Cells

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Author :
Publisher : Academic Press
ISBN 13 : 9780080920320
Total Pages : 700 pages
Book Rating : 4.9/5 (23 download)

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Book Synopsis Cu(In1-xGax)Se2 Based Thin Film Solar Cells by : Subba Ramaiah Kodigala

Download or read book Cu(In1-xGax)Se2 Based Thin Film Solar Cells written by Subba Ramaiah Kodigala and published by Academic Press. This book was released on 2011-01-03 with total page 700 pages. Available in PDF, EPUB and Kindle. Book excerpt: Cu(In1-xGax)Se2 Based Thin Film Solar Cells provides valuable contents about the fabrication and characterization of chalcopyrite Cu(In1-xGax)Se2 based thin film solar cells and modules. The growth of chalcopyrite Cu(In1-xGax)(S1-ySey)2 absorbers, buffers, window layers, antireflection coatings, and finally metallic grids, which are the sole components of solar cells, is clearly illustrated. The absorber, which contains multiple elements, segregates secondary phases if the growth conditions are not well optimized i.e., the main drawback in the fabrication of solar cells. More importantly the solutions for the growth of thin films are given in detail. The properties of all the individual layers and single crystals including solar cells analyzed by different characterization techniques such as SEM, AFM, XPS, AES, TEM, XRD, optical, photoluminescence, and Raman spectroscopy are explicitly demonstrated. The electrical analyses such as conductivities, Hall mobilities, deep level transient spectroscopy measurements etc., provide a broad picture to understand thin films or single crystals and their solar cells. The book clearly explains the working principle of energy conversion from solar to electrical with basic sciences for the chalcopyrite based thin film solar cells. Also, it demonstrates important criteria on how to enhance efficiency of the solar cells and modules. The effect of environmental factors such as temperature, humidity, aging etc., on the devices is mentioned by citing several examples. Illustrates a number of growth techniques to prepare thin film layers for solar cells Discusses characterization techniques such as XRD, TEM, XPS, AFM, SEM, PL, CL, Optical measurements, and Electrical measurements Includes I-V, C-V measurements illustrations Provides analysis of solar cell efficiency Presents current trends in thin film solar cells research and marketing

Non-Crystalline Films for Device Structures

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Author :
Publisher : Elsevier
ISBN 13 : 9780080542959
Total Pages : 265 pages
Book Rating : 4.5/5 (429 download)

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Book Synopsis Non-Crystalline Films for Device Structures by :

Download or read book Non-Crystalline Films for Device Structures written by and published by Elsevier. This book was released on 2001-12-11 with total page 265 pages. Available in PDF, EPUB and Kindle. Book excerpt: Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Volume 29 consists of chapters pulled from Hari Singh Nalwa's forthcoming Handbook of Thin Film Materials (ISBN: 0-12-512908-4). The chapters were selected because they deal exclusively with amorphous film structures and because they have a common relevance to semiconductor, or electronic, devices and circuits. These are subjects not yet stressed in the Thin Films series.

Advances in Plasma-Grown Hydrogenated Films

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Author :
Publisher : Elsevier
ISBN 13 : 0080542875
Total Pages : 281 pages
Book Rating : 4.0/5 (85 download)

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Book Synopsis Advances in Plasma-Grown Hydrogenated Films by :

Download or read book Advances in Plasma-Grown Hydrogenated Films written by and published by Elsevier. This book was released on 2001-12-12 with total page 281 pages. Available in PDF, EPUB and Kindle. Book excerpt: Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Starting with Volume 30, the title of the series, Thin Films, is being changed to Thin Films and Nanostructures. We feel that this new title reflects more accurately the rapidly growing inclusion of research and development efforts on nanostructures, especially in relation to novel solid-state device formats

Cavity Polaritons

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Author :
Publisher : Elsevier
ISBN 13 : 9780080481371
Total Pages : 246 pages
Book Rating : 4.4/5 (813 download)

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Book Synopsis Cavity Polaritons by : Alexey Kavokin

Download or read book Cavity Polaritons written by Alexey Kavokin and published by Elsevier. This book was released on 2003-11-26 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt: Volume 32 of the series addresses one of the most rapidly developing research fields in physics: microcavities. Microcavities form a base for fabrication of opto-electronic devices of XXI century, in particular polariton lasers based on a new physical principle with respect to conventional lasers proposed by Einstein in 1917. This book overviews a theory of all major phenomena linked microcavities and exciton-polaritons and is oriented to the reader having no background in solid state theory as well as to the advanced readers interested in theory of exciton-polaritons in microcavities. All major experimental discoveries in the field are addressed as well. · The book is oriented to a general reader and is easy to read for a non-specialist. · Contains an overview of the most essential effects in physics of microcavities experimentally observed and theoretically predicted during the recent decade such as:. · Bose-Einstein condensation at room temperature. · Lasers without inversion of population. · Microcavity boom: optics of the XXI century! · Frequently asked questions on microcavities and responses without formulas. · Half-light-half-matter quasi-particles: base for the future optoelectronic devices