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Process Development And Characterization Of Chemical Vapor Deposited Tungsten For Gun Barrel Applications
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Book Synopsis Process Development and Characterization of Chemical Vapor Deposited Tungsten for Gun Barrel Applications by : Richard A. Harlow
Download or read book Process Development and Characterization of Chemical Vapor Deposited Tungsten for Gun Barrel Applications written by Richard A. Harlow and published by . This book was released on 1973 with total page 69 pages. Available in PDF, EPUB and Kindle. Book excerpt: A 20-month program was conducted to develop improved chemical vapor deposition (CVD) processes for applying tungsten to the bores of gun barrels, and further, to characterize the physical and mechanical properties of the CVD tungsten as deposited. Conventional and high strain-rate tensile and compression tests were conducted on CVD tungsten as deposited on 4150 steel at temperatures of -65 F, ambient, and 200 F. Density, thermal expansion, and thermal conductance measurements were also made. Barrel materials of 4150 steel, CG-27, L-605, 718, and Pyromet X-15 were investigated. Based on test firings, acceptable CVD tungsten adherence was demonstrated on 4150, but the other four alloys revealed only marginal quality. Fourteen .220 Swift/MG-3 tests barrels of the five materials were fabricated and delivered to the Air Force. (Author).
Book Synopsis Chemical Vapor Deposition and Characterization of Tungsten Boron Alloy Films by :
Download or read book Chemical Vapor Deposition and Characterization of Tungsten Boron Alloy Films written by and published by . This book was released on 1993 with total page 8 pages. Available in PDF, EPUB and Kindle. Book excerpt: A low pressure chemical vapor deposition (LPCVD) process for depositing W{sub X}B{sub (1-X)} films from WF6 and B2H6 is described. The depositions were performed in a cold wall reactor on 6 in. Si wafers at 400C. During deposition, pressure was maintained at a fixed level in the range of 200 to 260 mTorr. Ratio of WF6/B2H6 was varied from 0.05 to 1.07. Carrier gas was either 100 sccm of Ar with a gas flow of 308 to 591 sccm, or 2000 sccm of Ar and 2000 sccm of H2 with the overall gas flow from 4213 to 4452 sccm. Two stable deposition regions were found separated by an unstable region that produced non-uniform films. The B-rich films produced in one of the stable deposition regions had W concentrations of 30 at.% and resistivities between 200 and 300 [mu]ohm·cm. The W-rich films produced in the other stable deposition region had W concentrations of 80 at.% and resistivities of 100 [mu]ohm·cm. As-deposited films had densities similar to bulk material of similar stoichiometry. Barrier properties of the films against diffusion of Cu to 700C in vacuum were measured by 4-point probe. Also, annealing was carried out to 900C in order to determine phases formed as the films crystallize. These studies indicate that W{sub X}B{sub (1-X)} films may be useful barriers in ULSI metallization applications.
Book Synopsis Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications by : John E.J. Schmitz
Download or read book Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications written by John E.J. Schmitz and published by William Andrew. This book was released on 1992-12-31 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Publisher description.
Download or read book Nuclear Science Abstracts written by and published by . This book was released on 1975 with total page 1550 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition Growth and Characterization of Monolayer Tungsten Disulfide by : Kyle André Godin
Download or read book Chemical Vapor Deposition Growth and Characterization of Monolayer Tungsten Disulfide written by Kyle André Godin and published by . This book was released on 2020 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Programmed Rate Chemical Vapor Deposition by : Kathryn M. Tracy
Download or read book Programmed Rate Chemical Vapor Deposition written by Kathryn M. Tracy and published by . This book was released on 1996 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis FORMATION AND CHARACTERIZATION OF THE A 15-TYPE STRUCTURE IN CHEMICAL VAPOR DEPOSITED TUNGSTEN--RHENIUM ALLOYS. by :
Download or read book FORMATION AND CHARACTERIZATION OF THE A 15-TYPE STRUCTURE IN CHEMICAL VAPOR DEPOSITED TUNGSTEN--RHENIUM ALLOYS. written by and published by . This book was released on 1967 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Kinetics and Characterization of Tungsten CVD Processes by : Johannes Andreas Maria Ammerlaan
Download or read book Kinetics and Characterization of Tungsten CVD Processes written by Johannes Andreas Maria Ammerlaan and published by Coronet Books. This book was released on 1994-12-01 with total page 172 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Plasma-enhanced Chemical Vapor Deposition and Characterization of Tungsten Films by : John Ka-ngai Chu
Download or read book Plasma-enhanced Chemical Vapor Deposition and Characterization of Tungsten Films written by John Ka-ngai Chu and published by . This book was released on 1982 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Metallurgical Aspects of the Chemical Vapor Deposition of Tungsten on Gun Barrel Bores by : K. H. Meyer
Download or read book Metallurgical Aspects of the Chemical Vapor Deposition of Tungsten on Gun Barrel Bores written by K. H. Meyer and published by . This book was released on with total page 21 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Particle Characterization for an Eight Inch Wafer Tungsten Chemical Vapor Deposition System by : Troy Morrison
Download or read book Particle Characterization for an Eight Inch Wafer Tungsten Chemical Vapor Deposition System written by Troy Morrison and published by . This book was released on 1994 with total page 97 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Formation and Characterization of the A15-type Structure in Chemical Vapor Deposited Tungsten-rhenium Alloys by : John Irwin Federer
Download or read book Formation and Characterization of the A15-type Structure in Chemical Vapor Deposited Tungsten-rhenium Alloys written by John Irwin Federer and published by . This book was released on 1967 with total page 48 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition: 1960-1980 by : Donald T. Hawkins
Download or read book Chemical Vapor Deposition: 1960-1980 written by Donald T. Hawkins and published by Springer. This book was released on 1981-11-30 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Deposition and Characterization of Blanket Tungsten Films Using Atmospheric Pressure Chemical Vapor Deposition by : Uday Vinod Patel
Download or read book Deposition and Characterization of Blanket Tungsten Films Using Atmospheric Pressure Chemical Vapor Deposition written by Uday Vinod Patel and published by . This book was released on 1994 with total page 224 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Characterization of Low Pressure Chemical Vapor Deposition of Tungsten Thin Film by : Yelitza Maldonado
Download or read book Characterization of Low Pressure Chemical Vapor Deposition of Tungsten Thin Film written by Yelitza Maldonado and published by . This book was released on 2000 with total page 156 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book INIS Atomindex written by and published by . This book was released on 1974 with total page 1222 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Handbook of Physical Vapor Deposition (PVD) Processing by : D. M. Mattox
Download or read book Handbook of Physical Vapor Deposition (PVD) Processing written by D. M. Mattox and published by Cambridge University Press. This book was released on 2014-09-19 with total page 947 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
