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Author : O. Hildreth
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (939 download)
Download or read book Metal Assisted Chemical Etching of Silicon and Other Semiconductors written by O. Hildreth and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Lucia Romano
Publisher : MDPI
ISBN 13 : 303943845X
Total Pages : 106 pages
Book Rating : 4.0/5 (394 download)
Download or read book Micro- and Nano-Fabrication by Metal Assisted Chemical Etching written by Lucia Romano and published by MDPI. This book was released on 2021-01-13 with total page 106 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates—Si, Ge, poly-Si, GaAs, and SiC—and using different catalysts—Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale—nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications.
Author : Ruby A. Lai
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (13 download)
Download or read book Thin Silicon and Metal-assisted Chemical Etching for Photovoltaic and Electronic Devices written by Ruby A. Lai and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Ultrathin silicon membranes, less than 20um thick, have extreme flexibility, lightness, and the superior materials quality and advantages in silicon micro-processing. There are two major roadblocks in developing ultrathin silicon membranes: the fabrication processing of the more delicate material in traditional CMOS fabrication, and the manufacturing of high quality, ultrathin sheets from bulk Si material. First, I use alkaline silicon etching of silicon wafers to form ultrathin silicon sheets, supported by a thick ring of Si material on its edge, that enable facile processing of large 3" sheets in traditional CMOS apparatuses. Second, I explored the novel use of a "chemical wafer-saw" for silicon by using metal-assisted chemical etching, as a possible pathway to create thin silicon sheets. Third, I developed a new theoretical model for the mechanism of metal-assisted chemical etching of silicon, which explained for the first time the silicon doping dependence of the etch. Fourth, I present computational design and fabrication of a novel nanophotonic solar cell contact for a metal-insulator-semiconductor solar cell, as well as other nanostructures, fabricated using metal-assisted chemical etching.
Author : R.A. Powell
Publisher : Elsevier
ISBN 13 : 0080983588
Total Pages : 312 pages
Book Rating : 4.0/5 (89 download)
Download or read book Dry Etching for Microelectronics written by R.A. Powell and published by Elsevier. This book was released on 2012-12-02 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume collects together for the first time a series of in-depth, critical reviews of important topics in dry etching, such as dry processing of III-V compound semiconductors, dry etching of refractory metal silicides and dry etching aluminium and aluminium alloys. This topical format provides the reader with more specialised information and references than found in a general review article. In addition, it presents a broad perspective which would otherwise have to be gained by reading a large number of individual research papers. An additional important and unique feature of this book is the inclusion of an extensive literature review of dry processing, compiled by search of computerized data bases. A subject index allows ready access to the key points raised in each of the chapters.
Author : Crystal Barrera
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (134 download)
Download or read book Resolution Limits of Metal Assisted Chemical Etching of Polysilicon written by Crystal Barrera and published by . This book was released on 2021 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Patterning and etching high aspect ratio, sub-50 nanometer structures for 3D device architectures is becoming a critical challenge in advanced semiconductor device fabrication. Metal assisted chemical etching (MACE) is a wet etch process that has demonstrated very high aspect ratio structures in single crystal silicon at sub-50 nanometer scale. The capabilities of this process can be applied to etching of gate structures made in bulk or epitaxially grown single crystal silicon, however, it is important to extend MACE to other materials for a range of semiconductor device architectures. In this research, we build on preliminary results published in the literature showing MACE for polycrystalline silicon. If it can be demonstrated that MACE of polysilicon can retain the sub-50 nanometer resolution and high aspect ratio produced with MACE of single crystal silicon, process techniques can be developed around polysilicon MACE to fabricate critical structures needed in advanced Dynamic RAM, 3D Flash and vias for logic devices. It is also important to demonstrate that atomically precise side walls that are near-perfect in maintaining 90-degree wall angle, as demonstrated with MACE applied to single crystal silicon, can also be achieved in polycrystalline silicon. Metal assisted chemical etching (MACE) is a promising approach that addresses many issues that arise from underperforming reactive ion etching (RIE) methods that have limitations in fabricating high aspect ratio sub-50 nanometer nanostructures due to presence of tapered profiles and high side wall roughness. However, MACE is extremely limited in the types of materials for which it has been demonstrated. MACE has shown reliable etching only in single crystal silicon which limits its applications to a small number of front-end semiconductor device layers. This work extends the capabilities of MACE to polysilicon which when combined with additional process steps has the potential to create patterns for metal vias and deep trench capacitors, both of which are important in the semiconductor industry. Much of the existing literature on MACE for polysilicon builds an underlying hypothesis; etch quality of polysilicon is compromised by the inherent crystalline structure of the material. There is an especial lack in understanding how MACE works at crystal grain boundaries, which presents risk in reduced atomic precision due to sidewall roughness induced by these boundaries –limiting the value of MACE for sub-50 nanometer structures. In this work, we present a MACE wet etch of polysilicon that produces structure arrays with sub-50nm resolution and anisotropic profile. The three demonstrated structures are pillars of 6:1 aspect ratio and 50nm spacing for comparison to MACE literature, pillars of 30nm spacing to establish resolution limitations of polysilicon etch, and a diamond pillar array with potential to fabricate holes with as low as 15nm spacing
Author : Kazuo Nojiri
Publisher : Springer
ISBN 13 : 3319102958
Total Pages : 126 pages
Book Rating : 4.3/5 (191 download)
Download or read book Dry Etching Technology for Semiconductors written by Kazuo Nojiri and published by Springer. This book was released on 2014-10-25 with total page 126 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.
Download or read book Metal-assisted Chemical Etching as a Disruptive Platform for Multi-dimensional Semiconductor Sculpting written by and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Xiang Zhao
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (951 download)
Download or read book Metal-assisted Chemical Etching of III-V Semiconductor Materials for Optoelectronic Applications written by Xiang Zhao and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Daniel Lu
Publisher : Springer
ISBN 13 : 3319450980
Total Pages : 974 pages
Book Rating : 4.3/5 (194 download)
Download or read book Materials for Advanced Packaging written by Daniel Lu and published by Springer. This book was released on 2016-11-18 with total page 974 pages. Available in PDF, EPUB and Kindle. Book excerpt: Significant progress has been made in advanced packaging in recent years. Several new packaging techniques have been developed and new packaging materials have been introduced. This book provides a comprehensive overview of the recent developments in this industry, particularly in the areas of microelectronics, optoelectronics, digital health, and bio-medical applications. The book discusses established techniques, as well as emerging technologies, in order to provide readers with the most up-to-date developments in advanced packaging.
Author : Henry G. Hughes
Publisher :
ISBN 13 :
Total Pages : 230 pages
Book Rating : 4.:/5 (31 download)
Download or read book Proceedings of the Symposium on Etching for Pattern Definition written by Henry G. Hughes and published by . This book was released on 1976 with total page 230 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Munir H. Nayfeh
Publisher : Elsevier
ISBN 13 : 044318674X
Total Pages : 568 pages
Book Rating : 4.4/5 (431 download)
Download or read book Integrated Silicon-Metal Systems at the Nanoscale written by Munir H. Nayfeh and published by Elsevier. This book was released on 2023-04-12 with total page 568 pages. Available in PDF, EPUB and Kindle. Book excerpt: Integrated Silicon-Metal Systems at the Nanoscale: Applications in Photonics, Quantum Computing, Networking, and Internet is a comprehensive guide to the interaction, materials and functional integration at the nanoscale of the silicon-metal binary system and a variety of emerging and next-generation advanced device applications, from energy and electronics, to sensing, quantum computing and quantum internet networks. The book guides the readers through advanced techniques and etching processes, combining underlying principles, materials science, design, and operation of metal-Si nanodevices. Each chapter focuses on a specific use of integrated metal-silicon nanostructures, including storage and resistive next-generation nano memory and transistors, photo and molecular sensing, harvest and storage device electrodes, phosphor light converters, and hydrogen fuel cells, as well as future application areas, such as spin transistors, quantum computing, hybrid quantum devices, and quantum engineering, networking, and internet. Provides detailed coverage of materials, design and operation of metal-Si nanodevices Offers a step-by-step approach, supported by principles, methods, illustrations and equations Explores a range of cutting-edge emerging applications across electronics, sensing and quantum computing
Author : Perrin Walker
Publisher : CRC Press
ISBN 13 : 9781439822531
Total Pages : 1434 pages
Book Rating : 4.8/5 (225 download)
Download or read book CRC Handbook of Metal Etchants written by Perrin Walker and published by CRC Press. This book was released on 1990-12-11 with total page 1434 pages. Available in PDF, EPUB and Kindle. Book excerpt: This publication presents cleaning and etching solutions, their applications, and results on inorganic materials. It is a comprehensive collection of etching and cleaning solutions in a single source. Chemical formulas are presented in one of three standard formats - general, electrolytic or ionized gas formats - to insure inclusion of all necessary operational data as shown in references that accompany each numbered formula. The book describes other applications of specific solutions, including their use on other metals or metallic compounds. Physical properties, association of natural and man-made minerals, and materials are shown in relationship to crystal structure, special processing techniques and solid state devices and assemblies fabricated. This publication also presents a number of organic materials which are widely used in handling and general processing...waxes, plastics, and lacquers for example. It is useful to individuals involved in study, development, and processing of metals and metallic compounds. It is invaluable for readers from the college level to industrial R & D and full-scale device fabrication, testing and sales. Scientific disciplines, work areas and individuals with great interest include: chemistry, physics, metallurgy, geology, solid state, ceramic and glass, research libraries, individuals dealing with chemical processing of inorganic materials, societies and schools.
Author : J. Grabmaier
Publisher : Springer Science & Business Media
ISBN 13 : 3642687652
Total Pages : 234 pages
Book Rating : 4.6/5 (426 download)
Download or read book Silicon Chemical Etching written by J. Grabmaier and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the first contribution to this volume we read that the world-wide production of single crystal silicon amounts to some 2000 metric tons per year. Given the size of present-day silicon-crystals, this number is equivalent to 100000 silicon-crystals grown every year by either the Czochralski (80%) or the floating-zone (20%) technique. But, to the best of my knowledge, no coherent and comprehensive article has been written that deals with "the art and science", as well as the practical and technical aspects of growing silicon crystals by the Czochralski technique. The same could be said about the floating-zone technique were it not for the review article by W. Dietze, W. Keller and A. Miihlbauer which was published in the preceding Volume 5 ("Silicon") of this series (and for a monograph by two of the above authors published about the same time). As editor of this volume I am very glad to have succeeded in persuading two scien tists, W. Zulehner and D. Huber, of Wacker-Chemitronic GmbH - the world's largest producer of silicon-crystals - to write a comprehensive article about the practical and scientific aspects of growing silicon-crystals by the Czochralski method and about silicon wafer manufacture. I am sure that many scientists or engineers who work with silicon crystals -be it in the laboratory or in a production environment - will profit from the first article in this volume.
Author : Monika Freunek Muller
Publisher : John Wiley & Sons
ISBN 13 : 1119242010
Total Pages : 154 pages
Book Rating : 4.1/5 (192 download)
Download or read book Photovoltaic Manufacturing written by Monika Freunek Muller and published by John Wiley & Sons. This book was released on 2021-08-16 with total page 154 pages. Available in PDF, EPUB and Kindle. Book excerpt: PHOTOVOLTAIC MANUFACTURING This book covers the state-of-the-art and the fundamentals of silicon wafer solar cells manufacturing, written by world-class researchers and experts in the field. High quality and economic photovoltaic manufacturing is central to realizing reliable photovoltaic power supplies at reasonable cost. While photovoltaic silicon wafer manufacturing is at a mature, industrial and mass production stage, knowing and applying the fundamentals in solar manufacturing is essential to anyone working in this field. This is the first book on photovoltaic wet processing for silicon wafers, both mono- and multi-crystalline. The comprehensive book provides information for process, equipment, and device engineers and researchers in the solar manufacturing field. The authors of the chapters are world-class researchers and experts in their field of endeavor. The fundamentals of wet processing chemistry are introduced, covering etching, texturing, cleaning and metrology. New developments, innovative approaches, as well as current challenges are presented. Benefits of reading the book include: The book includes a detailed discussion of the important new development of black silicon, which is considered to have started a new wave in photovoltaics and become the new standard while substantially lowering the cost. Photovoltaics are central to any country’s “New Green Deal” and this book shows how to manufacture competitively. The book’s central goal is to show photovoltaic manufacturing can be done with enhanced quality and lowering costs. Audience Engineers, chemists, physicists, process technologists, in both academia and industry, that work with photovoltaics and their manufacture.
Author : Jeong Dong Kim
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (18 download)
Download or read book Metal-assisted Chemical Etching of Semiconductor Nanostructures for Electronic Applications written by Jeong Dong Kim and published by . This book was released on 2017 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Ghenadii Korotcenkov
Publisher : CRC Press
ISBN 13 : 1482264552
Total Pages : 429 pages
Book Rating : 4.4/5 (822 download)
Download or read book Porous Silicon: From Formation to Application: Formation and Properties, Volume One written by Ghenadii Korotcenkov and published by CRC Press. This book was released on 2016-04-21 with total page 429 pages. Available in PDF, EPUB and Kindle. Book excerpt: Porous silicon is rapidly attracting increasing interest in various fields, including optoelectronics, microelectronics, photonics, medicine, chemistry, biosensing, and energy. Porous Silicon: Formation and Properties fills a gap in the literature of the field today, providing a thorough introduction to current knowledge of the formation, processin
Author : Thorsten Lill
Publisher : John Wiley & Sons
ISBN 13 : 3527346686
Total Pages : 306 pages
Book Rating : 4.5/5 (273 download)
Download or read book Atomic Layer Processing written by Thorsten Lill and published by John Wiley & Sons. This book was released on 2021-06-28 with total page 306 pages. Available in PDF, EPUB and Kindle. Book excerpt: Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
