Thin Films of Aluminum Nitride

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ISBN 13 :
Total Pages : 48 pages
Book Rating : 4.:/5 ( download)

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Book Synopsis Thin Films of Aluminum Nitride by : Y. Pauleau

Download or read book Thin Films of Aluminum Nitride written by Y. Pauleau and published by . This book was released on 1979 with total page 48 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Electron Tunneling Through Thin Films of Aluminum Nitride

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ISBN 13 :
Total Pages : 238 pages
Book Rating : 4.:/5 (437 download)

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Book Synopsis Electron Tunneling Through Thin Films of Aluminum Nitride by : George W. Lewicki

Download or read book Electron Tunneling Through Thin Films of Aluminum Nitride written by George W. Lewicki and published by . This book was released on 1966 with total page 238 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Aluminum Nitride Thin Films - Deposition for Fabrication, Characterization and Fabrication of Surface Acoustic Wave Devices

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ISBN 13 : 9783836469722
Total Pages : 124 pages
Book Rating : 4.4/5 (697 download)

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Book Synopsis Aluminum Nitride Thin Films - Deposition for Fabrication, Characterization and Fabrication of Surface Acoustic Wave Devices by : Charlee Fansler

Download or read book Aluminum Nitride Thin Films - Deposition for Fabrication, Characterization and Fabrication of Surface Acoustic Wave Devices written by Charlee Fansler and published by . This book was released on 2008 with total page 124 pages. Available in PDF, EPUB and Kindle. Book excerpt: Aluminum Nitride (AlN) thin films can be used for many device applications; for example, Surface Acoustic Wave (SAW) devices, microelectromechanical systems (MEMS) applications, and packaging applications. In this work, AlN is the critical layer in the fabrication process. One challenge is reliable deposition over wafer size substrates. The method of interest for deposition is pulsed DC sputtering. The (002) plane is the desired plane for its piezoelectric properties. The surface roughness of the deposited AlN is low and adheres well to the substrate. An AlN layer was deposited on a UNCD/Si substrate. Al was deposited on the AlN layer to form the IDTs (interdigital transducers) for SAW devices. SAW devices were fabricated on quartz - ST substrate. To verify the SAW devices work, they were tested using a network analyzer. This book discusses these results and parameters for AlN film deposition, film properties and implications for devices. This book would be beneficial for professionals, scientists, engineers, and graduate students in science and engineering working in the areas of wide bandgap semi-conductors, nitrides and piezoelectric materials and various acoustic wave devices.

Development and Applications of Aluminum Nitride Thin Film Technology

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ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (139 download)

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Book Synopsis Development and Applications of Aluminum Nitride Thin Film Technology by : Cícero Cunha

Download or read book Development and Applications of Aluminum Nitride Thin Film Technology written by Cícero Cunha and published by . This book was released on 2019 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Aluminum nitride (AlN) thin films have aroused the interest of researchers due to their unique physicochemical properties. However, further studies on these semiconductor materials are still necessary to establish the manufacturing of high-performance devices for applications in various areas, such as telecommunications, microelectronics, and biomedicine. This chapter introduces AlN thin film technology that has made a wide range of applications possible. First, the main physicochemical properties of AlN, its wurtzite crystalline structure, and the incorporation of oxygen during the thin film deposition process are presented. Furthermore, the growth of AlN films by different techniques and their applications as a buffer layer and sensing layer are summarized. Special attention was given to the sputtering deposition process and the use of sputtered AlN films in SAW sensors.

Laser Processing and Characterization of Aluminum Nitride Thin Films

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ISBN 13 :
Total Pages : 154 pages
Book Rating : 4.:/5 (339 download)

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Book Synopsis Laser Processing and Characterization of Aluminum Nitride Thin Films by : Hong Wu

Download or read book Laser Processing and Characterization of Aluminum Nitride Thin Films written by Hong Wu and published by . This book was released on 1995 with total page 154 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Synthesis of Aluminum Nitride Thin Films at Lower Temperatures by Metalorganic Chemical Vapor Deposition

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ISBN 13 :
Total Pages : 368 pages
Book Rating : 4.:/5 (366 download)

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Book Synopsis Synthesis of Aluminum Nitride Thin Films at Lower Temperatures by Metalorganic Chemical Vapor Deposition by : John N. Kidder

Download or read book Synthesis of Aluminum Nitride Thin Films at Lower Temperatures by Metalorganic Chemical Vapor Deposition written by John N. Kidder and published by . This book was released on 1996 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Electrical and Optical Properties of Thin Films of Oxidized Aluminum Nitride

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ISBN 13 :
Total Pages : 122 pages
Book Rating : 4.:/5 (426 download)

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Book Synopsis Electrical and Optical Properties of Thin Films of Oxidized Aluminum Nitride by : Enam Ahmed Chowdhury

Download or read book Electrical and Optical Properties of Thin Films of Oxidized Aluminum Nitride written by Enam Ahmed Chowdhury and published by . This book was released on 1999 with total page 122 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Diamond and Aluminum Nitride Thin Films

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ISBN 13 :
Total Pages : 392 pages
Book Rating : 4.:/5 (47 download)

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Book Synopsis Diamond and Aluminum Nitride Thin Films by : Been-Yu Liaw

Download or read book Diamond and Aluminum Nitride Thin Films written by Been-Yu Liaw and published by . This book was released on 1995 with total page 392 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Rare Earth-doped Aluminum Nitride Thin Films for Optical Applications

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (13 download)

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Book Synopsis Rare Earth-doped Aluminum Nitride Thin Films for Optical Applications by : Alaa Eldin Giba

Download or read book Rare Earth-doped Aluminum Nitride Thin Films for Optical Applications written by Alaa Eldin Giba and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Synthesis and Characterization of Hydrogenated Aluminum Nitride (AlN:H) Thin Films for Photovoltaic Applications

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (1 download)

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Book Synopsis Synthesis and Characterization of Hydrogenated Aluminum Nitride (AlN:H) Thin Films for Photovoltaic Applications by : Sandro Renato Espinoza Monsalve

Download or read book Synthesis and Characterization of Hydrogenated Aluminum Nitride (AlN:H) Thin Films for Photovoltaic Applications written by Sandro Renato Espinoza Monsalve and published by . This book was released on 2017 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: AlN:H ist ein vielversprechendes Material unter anderem für die Oberflächenpassivierung in Silizium-Sonnenzellen, um höhere Effizienzen zu erreichen. Oberflächenpassivierung ist die Verminderung der Oberflächenrekombinationsrate von Ladungsträgern (Elektronen und Löcher). Um ein besseres Verständnis des AlN:H als Passivierungsschicht zu erhalten, ist es entscheidend, zuvor die strukturellen und morphologischen Eigenschaften von verschiedenen dünnen AlN:H Filmen zu kennen. Diese Masterarbeit untersucht den Einfluss von Wasserstoff auf die strukturellen und morphologischen Eigenschaften von hydrierten dünnen Aluminiumnitrid Filmen (AlN:H) mit einer Dicke von ~ 100 nm. Um dieses Ziel zu erreichen, wurden Proben durch reaktives Sputtering auf p-Typ c-Si (CZ, 100, Boron) unter Zugabe von drei verschiedenen Wasserstoffflüssen und bei unterschiedlichen Substrattemperaturen während der Deposition erzeugt. Die Charakterisierung und Analyse der dünnen Filme wurde mittels EDX, FTIR und GDOES Messungen für die Analyse der chemischen Zusammensetzung und mittels XRD und XRR Messungen für die strukturelle und morphologische Analyse durchgeführt. In dieser Arbeit wurde schließlich herausgefunden, dass der Wasserstoffgehalt in den dünnen Filmen einige morphologische und strukturelle Änderungen in dünnen AlN Filmen erzeugt. Alle abgelegten dünnen Filme haben die sechseckige wurtzite Kristallstruktur. Die XRD Messungen zeigen eine Abnahme des (002) Peaks und eine Erhöhung der (100) und (110) Peaks, mit Zunahmen des H2-Flusses. Diese Variation impliziert, dass sich die c-Achse des Films von senkrecht (002) zu parallel (100, 110) bezüglich der Substratoberfläche ändert. Die XRR Messwerte offenbaren, dass eine Zunahme des H2-Flusses die Oberflächenrauheit reduziert und die Grenzflächenrauheit (Rauigkeit zwischen zwei Flächen) unwesentliche Änderungen aufweist. Mittels GDOES Messungen wurde die Gegenwart von Wasserstoff im kompletten Dünnschichtvolumen bestätigt.

Fabrication and Characterization of Aluminum Nitride Thin Films Deposited by RF Magnetron Sputtering

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ISBN 13 :
Total Pages : 146 pages
Book Rating : 4.:/5 (255 download)

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Book Synopsis Fabrication and Characterization of Aluminum Nitride Thin Films Deposited by RF Magnetron Sputtering by : William A. Carrington

Download or read book Fabrication and Characterization of Aluminum Nitride Thin Films Deposited by RF Magnetron Sputtering written by William A. Carrington and published by . This book was released on 1991 with total page 146 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Aluminum Nitride Thin Films by Reactive Sputtering

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ISBN 13 :
Total Pages : 160 pages
Book Rating : 4.:/5 (375 download)

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Book Synopsis Aluminum Nitride Thin Films by Reactive Sputtering by : Alvin G. Randolph

Download or read book Aluminum Nitride Thin Films by Reactive Sputtering written by Alvin G. Randolph and published by . This book was released on 1996 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Aluminum nitride thin films ( -1000 A) have been deposited on silicon substrate by re active sputtering using Al target in 1 : 1 Ar:N2 environment. The atomic force microscopy examination revealed continuous microcrystalline film structure. The Auger electron spectroscopic analysis shows the presence of oxygen in the films. The annealing at 850 C in nitrogen is found to cause recrystallinization and, by FTIR analysis, further oxidation of the films. The films can be characterized as lossy dielectrics with relative permittivity ~ 10, higher than the bulk value of 8.9. Annealing the films is found to reduce anion vacancies and improve the dielectric strength within a range of a few MV/cm in these thin films. Optical constants, n & k, have been obtained from reflectance and transmittance spec tra (190-900 nm) of films on fused silica. The results indicate the presence of a low energy absorption tail, and exponential absorption that is proportional to degree of disorder in the film. The average defect density of the film as deposited was 1.1 x 10^20 cm"3. Annealing the film at 760 C increased the degree of disorder resulting in an average defect density of 3.4 x 10^20 cm^-3. Subsequent annealing at 800 C and 850 C systematically decreased the degree of disorder and the average defect density. The real part of permittivity (e1) of the annealed films over this frequency range varies approximately +-0.5 from the e(infinity) of 4.84"--Abstract.

Spectroscopic Ellipsometry

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Publisher : Momentum Press
ISBN 13 : 1606507281
Total Pages : 138 pages
Book Rating : 4.6/5 (65 download)

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Book Synopsis Spectroscopic Ellipsometry by : Harland G. Tompkins

Download or read book Spectroscopic Ellipsometry written by Harland G. Tompkins and published by Momentum Press. This book was released on 2015-12-16 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ellipsometry is an experimental technique for determining the thickness and optical properties of thin films. It is ideally suited for films ranging in thickness from sub-nanometer to several microns. Spectroscopic measurements have greatly expanded the capabilities of this technique and introduced its use into all areas where thin films are found: semiconductor devices, flat panel and mobile displays, optical coating stacks, biological and medical coatings, protective layers, and more. While several scholarly books exist on the topic, this book provides a good introduction to the basic theory of the technique and its common applications. The target audience is not the ellipsometry scholar, but process engineers and students of materials science who are experts in their own fields and wish to use ellipsometry to measure thin film properties without becoming an expert in ellipsometry itself.

Pulsed Laser Deposition of Aluminum Nitride and Silicon Nitride Thin Films

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ISBN 13 :
Total Pages : 110 pages
Book Rating : 4.:/5 (3 download)

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Book Synopsis Pulsed Laser Deposition of Aluminum Nitride and Silicon Nitride Thin Films by : Xiangqun Xu

Download or read book Pulsed Laser Deposition of Aluminum Nitride and Silicon Nitride Thin Films written by Xiangqun Xu and published by . This book was released on 1993 with total page 110 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Diamond Based Composites

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Publisher : Springer Science & Business Media
ISBN 13 : 9401155925
Total Pages : 378 pages
Book Rating : 4.4/5 (11 download)

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Book Synopsis Diamond Based Composites by : Mark A. Prelas

Download or read book Diamond Based Composites written by Mark A. Prelas and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt: Diamond-based composites, with their advantages of hardness, high Young's modulus and the like, have demonstrated new and unusual features, such as stability to high temperatures and pressure shocks and a large internal surface that can be controlled to offer customised electrical, magnetic and optical properties, leading to efficient filters, absorbents, sensors and other tools for environmental control and monitoring. The current book covers the synthesis of materials, their characterization and properties, trends in high pressure and high temperature technologies, low pressure technologies, basic principles of DBC material science, and future developments in electronics, optics, industrial tools and components, biotechnology, and medicine. Wide band-gap materials are considered, ranging from molecular clusters, nanophase materials, growth, processing and synthesis. The processing of composite based materials can be classified into six basic methods: in situ growth, high pressure/high temperature catalytic conversion; mix and sinter (c-BN plus metal-ceramic polymer mix); direct sintering; direct polymorphic conversion; shock detonation; and SHS sintering.

The Electrical, Structural, and Optical Properties of Aluminum Nitride Thin Films Deposited by Atmospheric Pressure Metal-organic Chemical Vapor Deposition

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ISBN 13 :
Total Pages : 418 pages
Book Rating : 4.:/5 (265 download)

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Book Synopsis The Electrical, Structural, and Optical Properties of Aluminum Nitride Thin Films Deposited by Atmospheric Pressure Metal-organic Chemical Vapor Deposition by : Akhter Uddin Ahmed

Download or read book The Electrical, Structural, and Optical Properties of Aluminum Nitride Thin Films Deposited by Atmospheric Pressure Metal-organic Chemical Vapor Deposition written by Akhter Uddin Ahmed and published by . This book was released on 1992 with total page 418 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Aluminum Nitride Thin Films for MEMS Resonators

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ISBN 13 : 9780542681318
Total Pages : 530 pages
Book Rating : 4.6/5 (813 download)

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Book Synopsis Aluminum Nitride Thin Films for MEMS Resonators by : Vanni Lughi

Download or read book Aluminum Nitride Thin Films for MEMS Resonators written by Vanni Lughi and published by . This book was released on 2006 with total page 530 pages. Available in PDF, EPUB and Kindle. Book excerpt: High quality aluminum nitride films, meeting all the requirements for the fabrication of the resonators, were deposited at low temperature (