Thin Film Growth

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Thin Film Growth

Author : Zexian Cao
Publisher : Elsevier
ISBN 13 : 0857093290
Total Pages : 432 pages
Book Rating : 4.8/5 (57 download)

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Book Synopsis Thin Film Growth by : Zexian Cao

Download or read book Thin Film Growth written by Zexian Cao and published by Elsevier. This book was released on 2011-07-18 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin film technology is used in many applications such as microelectronics, optics, hard and corrosion resistant coatings and micromechanics, and thin films form a uniquely versatile material base for the development of novel technologies within these industries. Thin film growth provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films. Part one focuses on the theory of thin film growth, with chapters covering nucleation and growth processes in thin films, phase-field modelling of thin film growth and surface roughness evolution. Part two covers some of the techniques used for thin film growth, including oblique angle deposition, reactive magnetron sputtering and epitaxial growth of graphene films on single crystal metal surfaces. This section also includes chapters on the properties of thin films, covering topics such as substrate plasticity and buckling of thin films, polarity control, nanostructure growth dynamics and network behaviour in thin films. With its distinguished editor and international team of contributors, Thin film growth is an essential reference for engineers in electronics, energy materials and mechanical engineering, as well as those with an academic research interest in the topic. Provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films Focusses on the theory and modelling of thin film growth, techniques and mechanisms used for thin film growth and properties of thin films An essential reference for engineers in electronics, energy materials and mechanical engineering

In Situ Characterization of Thin Film Growth

Author : Gertjan Koster
Publisher : Elsevier
ISBN 13 : 0857094955
Total Pages : 296 pages
Book Rating : 4.8/5 (57 download)

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Book Synopsis In Situ Characterization of Thin Film Growth by : Gertjan Koster

Download or read book In Situ Characterization of Thin Film Growth written by Gertjan Koster and published by Elsevier. This book was released on 2011-10-05 with total page 296 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advanced techniques for characterizing thin film growth in situ help to develop improved understanding and faster diagnosis of issues with the process. In situ characterization of thin film growth reviews current and developing techniques for characterizing the growth of thin films, covering an important gap in research. Part one covers electron diffraction techniques for in situ study of thin film growth, including chapters on topics such as reflection high-energy electron diffraction (RHEED) and inelastic scattering techniques. Part two focuses on photoemission techniques, with chapters covering ultraviolet photoemission spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in situ spectroscopic ellipsometry for characterization of thin film growth. Finally, part three discusses alternative in situ characterization techniques. Chapters focus on topics such as ion beam surface characterization, real time in situ surface monitoring of thin film growth, deposition vapour monitoring and the use of surface x-ray diffraction for studying epitaxial film growth. With its distinguished editors and international team of contributors, In situ characterization of thin film growth is a standard reference for materials scientists and engineers in the electronics and photonics industries, as well as all those with an academic research interest in this area. Chapters review electron diffraction techniques, including the methodology for observations and measurements Discusses the principles and applications of photoemission techniques Examines alternative in situ characterisation techniques

Surface Science

Author : K. Oura
Publisher : Springer Science & Business Media
ISBN 13 : 3662051796
Total Pages : 443 pages
Book Rating : 4.6/5 (62 download)

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Book Synopsis Surface Science by : K. Oura

Download or read book Surface Science written by K. Oura and published by Springer Science & Business Media. This book was released on 2013-03-14 with total page 443 pages. Available in PDF, EPUB and Kindle. Book excerpt: The most important aspects of modern surface science are covered. All topics are presented in a concise and clear form accessible to a beginner. At the same time, the coverage is comprehensive and at a high technical level, with emphasis on the fundamental physical principles. Numerous examples, references, practice exercises, and problems complement this remarkably complete treatment, which will also serve as an excellent reference for researchers and practitioners. The textbook is idea for students in engineering and physical sciences.

Evolution of Thin Film Morphology

Author : Matthew Pelliccione
Publisher : Springer Science & Business Media
ISBN 13 : 0387751092
Total Pages : 206 pages
Book Rating : 4.3/5 (877 download)

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Book Synopsis Evolution of Thin Film Morphology by : Matthew Pelliccione

Download or read book Evolution of Thin Film Morphology written by Matthew Pelliccione and published by Springer Science & Business Media. This book was released on 2008-01-29 with total page 206 pages. Available in PDF, EPUB and Kindle. Book excerpt: The focus of this book is on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem. The book will enable readers themselves to set up a computational program to investigate specific topics of interest in thin film deposition. It will benefit those working in any discipline that requires an understanding of thin film growth processes.

Thin Film Physics And Devices: Fundamental Mechanism, Materials And Applications For Thin Films

Author : Jianguo Zhu
Publisher : World Scientific
ISBN 13 : 9811224005
Total Pages : 706 pages
Book Rating : 4.8/5 (112 download)

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Book Synopsis Thin Film Physics And Devices: Fundamental Mechanism, Materials And Applications For Thin Films by : Jianguo Zhu

Download or read book Thin Film Physics And Devices: Fundamental Mechanism, Materials And Applications For Thin Films written by Jianguo Zhu and published by World Scientific. This book was released on 2021-06-18 with total page 706 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin films have an extremely broad range of applications from electronics and optics to new materials and devices. Collaborative and multidisciplinary efforts from physicists, materials scientists, engineers and others have established and advanced a field with key pillars constituting (i) the synthesis and processing of thin films, (ii) the understanding of physical properties in relation to the nanometer scale, (iii) the design and fabrication of nano-devices or devices with thin film materials as building blocks, and (iv) the design and construction of novel tools for characterization of thin films.Against the backdrop of the increasingly interdisciplinary field, this book sets off to inform the basics of thin film physics and thin film devices. Readers are systematically introduced to the synthesis, processing and application of thin films; they will also study the formation of thin films, their structure and defects, and their various properties — mechanical, electrical, semiconducting, magnetic, and superconducting. With a primary focus on inorganic thin film materials, the book also ventures on organic materials such as self-assembled monolayers and Langmuir-Blodgett films.This book will be effective as a teaching or reference material in the various disciplines, ranging from Materials Science and Engineering, Electronic Science and Engineering, Electronic Materials and Components, Semiconductor Physics and Devices, to Applied Physics and more. The original Chinese publication has been instrumental in this purpose across many Chinese universities and colleges.

Principles of Vapor Deposition of Thin Films

Author : Professor K.S. K.S Sree Harsha
Publisher : Elsevier
ISBN 13 : 9780080480312
Total Pages : 1176 pages
Book Rating : 4.4/5 (83 download)

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Book Synopsis Principles of Vapor Deposition of Thin Films by : Professor K.S. K.S Sree Harsha

Download or read book Principles of Vapor Deposition of Thin Films written by Professor K.S. K.S Sree Harsha and published by Elsevier. This book was released on 2005-12-16 with total page 1176 pages. Available in PDF, EPUB and Kindle. Book excerpt: The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

Nucleation and Growth of Thin Films

Author : Brian Lewis
Publisher :
ISBN 13 :
Total Pages : 518 pages
Book Rating : 4.:/5 (319 download)

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Book Synopsis Nucleation and Growth of Thin Films by : Brian Lewis

Download or read book Nucleation and Growth of Thin Films written by Brian Lewis and published by . This book was released on 1978 with total page 518 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Introduction to Surface and Thin Film Processes

Author : John Venables
Publisher : Cambridge University Press
ISBN 13 : 9780521785006
Total Pages : 392 pages
Book Rating : 4.7/5 (85 download)

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Book Synopsis Introduction to Surface and Thin Film Processes by : John Venables

Download or read book Introduction to Surface and Thin Film Processes written by John Venables and published by Cambridge University Press. This book was released on 2000-08-31 with total page 392 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers the experimental and theoretical understanding of surface and thin film processes. It presents a unique description of surface processes in adsorption and crystal growth, including bonding in metals and semiconductors. Emphasis is placed on the strong link between science and technology in the description of, and research for, new devices based on thin film and surface science. Practical experimental design, sample preparation and analytical techniques are covered, including detailed discussions of Auger electron spectroscopy and microscopy. Thermodynamic and kinetic models of structure are emphasised throughout. The book provides extensive leads into practical and research literature, as well as resources on the World Wide Web (see http://venables.asu.edu/book). Each chapter contains problems which aim to develop awareness of the subject and the methods used. Aimed as a graduate textbook, this book will also be useful as a sourcebook for graduate students, researchers and practitioners in physics, chemistry, materials science and engineering.

The Materials Science of Thin Films

Author : Milton Ohring
Publisher : Academic Press
ISBN 13 : 9780125249904
Total Pages : 744 pages
Book Rating : 4.2/5 (499 download)

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Book Synopsis The Materials Science of Thin Films by : Milton Ohring

Download or read book The Materials Science of Thin Films written by Milton Ohring and published by Academic Press. This book was released on 1992 with total page 744 pages. Available in PDF, EPUB and Kindle. Book excerpt: Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.

Handbook of Crystal Growth

Author : Peter Rudolph
Publisher : Elsevier
ISBN 13 : 0444633065
Total Pages : 1418 pages
Book Rating : 4.4/5 (446 download)

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Book Synopsis Handbook of Crystal Growth by : Peter Rudolph

Download or read book Handbook of Crystal Growth written by Peter Rudolph and published by Elsevier. This book was released on 2014-11-04 with total page 1418 pages. Available in PDF, EPUB and Kindle. Book excerpt: Vol 2A: Basic Technologies Handbook of Crystal Growth, 2nd Edition Volume IIA (Basic Technologies) presents basic growth technologies and modern crystal cutting methods. Particularly, the methodical fundamentals and development of technology in the field of bulk crystallization on both industrial and research scales are explored. After an introductory chapter on the formation of minerals, ruling historically the basic crystal formation parameters, advanced basic technologies from melt, solution, and vapour being applied for research and production of the today most important materials, like silicon, semiconductor compounds and oxides are presented in detail. The interdisciplinary and general importance of crystal growth for human live are illustrated. Vol 2B: Growth Mechanisms and Dynamics Handbook of Crystal Growth, 2nd Edition Volume IIB (Growth Mechanisms and Dynamics) deals with characteristic mechanisms and dynamics accompanying each bulk crystal growth method discussed in Volume IIA. Before the atoms or molecules pass over from a position in the fluid medium (gas, melt or solution) to their place in the crystalline face they must be transported in the fluid over macroscopic distances by diffusion, buoyancy-driven convection, surface-tension-driven convection, and forced convection (rotation, acceleration, vibration, magnetic mixing). Further, the heat of fusion and the part carried by the species on their way to the crystal by conductive and convective transport must be dissipated in the solid phase by well-organized thermal conduction and radiation to maintain a stable propagating interface. Additionally, segregation and capillary phenomena play a decisional role for chemical composition and crystal shaping, respectively. Today, the increase of high-quality crystal yield, its size enlargement and reproducibility are imperative conditions to match the strong economy. Volume 2A Presents the status and future of Czochralski and float zone growth of dislocation-free silicon Examines directional solidification of silicon ingots for photovoltaics, vertical gradient freeze of GaAs, CdTe for HF electronics and IR imaging as well as antiferromagnetic compounds and super alloys for turbine blades Focuses on growth of dielectric and conducting oxide crystals for lasers and non-linear optics Topics on hydrothermal, flux and vapour phase growth of III-nitrides, silicon carbide and diamond are explored Volume 2B Explores capillarity control of the crystal shape at the growth from the melt Highlights modeling of heat and mass transport dynamics Discusses control of convective melt processes by magnetic fields and vibration measures Includes imperative information on the segregation phenomenon and validation of compositional homogeneity Examines crystal defect generation mechanisms and their controllability Illustrates proper automation modes for ensuring constant crystal growth process Exhibits fundamentals of solution growth, gel growth of protein crystals, growth of superconductor materials and mass crystallization for food and pharmaceutical industries

Pulsed Laser Deposition of Thin Films

Author : Robert Eason
Publisher : John Wiley & Sons
ISBN 13 : 0470052112
Total Pages : 754 pages
Book Rating : 4.4/5 (7 download)

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Book Synopsis Pulsed Laser Deposition of Thin Films by : Robert Eason

Download or read book Pulsed Laser Deposition of Thin Films written by Robert Eason and published by John Wiley & Sons. This book was released on 2007-12-14 with total page 754 pages. Available in PDF, EPUB and Kindle. Book excerpt: Edited by major contributors to the field, this text summarizes current or newly emerging pulsed laser deposition application areas. It spans the field of optical devices, electronic materials, sensors and actuators, biomaterials, and organic polymers. Every scientist, technologist and development engineer who has a need to grow and pattern, to apply and use thin film materials will regard this book as a must-have resource.

Advanced Strategies in Thin Film Engineering by Magnetron Sputtering

Author : Alberto Palmero
Publisher : MDPI
ISBN 13 : 3039364294
Total Pages : 148 pages
Book Rating : 4.0/5 (393 download)

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Book Synopsis Advanced Strategies in Thin Film Engineering by Magnetron Sputtering by : Alberto Palmero

Download or read book Advanced Strategies in Thin Film Engineering by Magnetron Sputtering written by Alberto Palmero and published by MDPI. This book was released on 2020-12-10 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent years have witnessed the flourishing of numerous novel strategies based on the magnetron sputtering technique aimed at the advanced engineering of thin films, such as HiPIMS, combined vacuum processes, the implementation of complex precursor gases or the inclusion of particle guns in the reactor, among others. At the forefront of these approaches, investigations focused on nanostructured coatings appear today as one of the priorities in many scientific and technological communities: The science behind them appears in most of the cases as a "terra incognita", fascinating both the fundamentalist, who imagines new concepts, and the experimenter, who is able to create and study new films with as of yet unprecedented performances. These scientific and technological challenges, along with the existence of numerous scientific issues that have yet to be clarified in classical magnetron sputtering depositions (e.g., process control and stability, nanostructuration mechanisms, connection between film morphology and properties or upscaling procedures from the laboratory to industrial scales) have motivated us to edit a specialized volume containing the state-of-the art that put together these innovative fundamental and applied research topics. These include, but are not limited to: • Nanostructure-related properties; • Atomistic processes during film growth; • Process control, process stability, and in situ diagnostics; • Fundamentals and applications of HiPIMS; • Thin film nanostructuration phenomena; • Tribological, anticorrosion, and mechanical properties; • Combined procedures based on the magnetron sputtering technique; • Industrial applications; • Devices.

Thin Film Growth Techniques for Low-Dimensional Structures

Author : R.F.C. Farrow
Publisher : Springer Science & Business Media
ISBN 13 : 1468491458
Total Pages : 548 pages
Book Rating : 4.4/5 (684 download)

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Book Synopsis Thin Film Growth Techniques for Low-Dimensional Structures by : R.F.C. Farrow

Download or read book Thin Film Growth Techniques for Low-Dimensional Structures written by R.F.C. Farrow and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 548 pages. Available in PDF, EPUB and Kindle. Book excerpt: This work represents the account of a NATO Advanced Research Workshop on "Thin Film Growth Techniques for Low Dimensional Structures", held at the University of Sussex, Brighton, England from 15-19 Sept. 1986. The objective of the workshop was to review the problems of the growth and characterisation of thin semiconductor and metal layers. Recent advances in deposition techniques have made it possible to design new material which is based on ultra-thin layers and this is now posing challenges for scientists, technologists and engineers in the assessment and utilisation of such new material. Molecular beam epitaxy (MBE) has become well established as a method for growing thin single crystal layers of semiconductors. Until recently, MBE was confined to the growth of III-V compounds and alloys, but now it is being used for group IV semiconductors and II-VI compounds. Examples of such work are given in this volume. MBE has one major advantage over other crystal growth techniques in that the structure of the growing layer can be continuously monitored using reflection high energy electron diffraction (RHEED). This technique has offered a rare bonus in that the time dependent intensity variations of RHEED can be used to determine growth rates and alloy composition rather precisely. Indeed, a great deal of new information about the kinetics of crystal growth from the vapour phase is beginning to emerge.

Thin Film Structures in Energy Applications

Author : Suresh Babu Krishna Moorthy
Publisher : Springer
ISBN 13 : 3319147749
Total Pages : 292 pages
Book Rating : 4.3/5 (191 download)

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Book Synopsis Thin Film Structures in Energy Applications by : Suresh Babu Krishna Moorthy

Download or read book Thin Film Structures in Energy Applications written by Suresh Babu Krishna Moorthy and published by Springer. This book was released on 2015-03-10 with total page 292 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a comprehensive overview of thin film structures in energy applications. Each chapter contains both fundamentals principles for each thin film structure as well as the relevant energy application technologies. The authors cover thin films for a variety of energy sectors including inorganic and organic solar cells, DSSCs, solid oxide fuel cells, thermoelectrics, phosphors and cutting tools.

Polycrystalline And Amorphous Thin Films And Devices

Author : Lawrence Kazmerski
Publisher : Elsevier
ISBN 13 : 0323156045
Total Pages : 320 pages
Book Rating : 4.3/5 (231 download)

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Book Synopsis Polycrystalline And Amorphous Thin Films And Devices by : Lawrence Kazmerski

Download or read book Polycrystalline And Amorphous Thin Films And Devices written by Lawrence Kazmerski and published by Elsevier. This book was released on 2012-12-02 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt: Polycrystalline and Amorphous Thin Films and Devices is a compilation of papers that discusses the electronic, optical, and physical properties of thin material layers and films. This compilation reviews the different applications of thin films of various materials used as protective and optical coatings, thermal transfer layers, and selective membranes from submicron- area VLSI memory units to large-area energy conservation devices. Some papers discuss the basic properties, such as growth, structure, electrical, and optical mechanisms that are encountered in amorphous and polycrystalline thin semiconductor films. For example, experiments on electronic structure of dislocations have led to a model for the intrinsic properties of grain boundaries in polycrystalline semiconductor thin films that can have an impact on the designs of high-efficiency, thin-film solar cells. Other papers review the problems encountered in these thin layers in active semiconductor devices and passive technologies. Techniques in film growth and control variables of source, substrate temperature, and substrate properties will determine the successful performance of the devices installed with these thin film layers. This compilation can prove valuable for chemists, materials engineers, industrial technologists, and researchers in thin-film technology.

Thin Film Ferroelectric Materials and Devices

Author : R. Ramesh
Publisher : Springer Science & Business Media
ISBN 13 : 146156185X
Total Pages : 250 pages
Book Rating : 4.4/5 (615 download)

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Book Synopsis Thin Film Ferroelectric Materials and Devices by : R. Ramesh

Download or read book Thin Film Ferroelectric Materials and Devices written by R. Ramesh and published by Springer Science & Business Media. This book was released on 2013-11-27 with total page 250 pages. Available in PDF, EPUB and Kindle. Book excerpt: The past five years have witnessed some dramatic developments in the general area of ferroelectric thin films materials and devices. Ferroelectrics are not new materials by any stretch ofimagination. Indeed, they have been known since the early partofthis century and popular ferroelectric materials such as Barium Titanate have been in use since the second world war. In the late sixties and seventies, a considerable amountofresearch and development effort was made to create a solid state nonvolatile memory using ferroelectrics in a vary simple matrix-addressed scheme. These attempts failed primarily due to problems associated with either the materials ordue to device architectures. The early eighties saw the advent of new materials processing approaches, such as sol-gel processing, that enabled researchers to fabricate sub-micron thin films of ferroelectric materials on a silicon substrate. These pioneering developments signaled the onsetofa revival in the areaofferroelectric thin films, especially ferroelectric nonvolatile memories. Research and development effort in ferroelectric materials and devices has now hit a feverish pitch, Many university laboratories, national laboratories and advanced R&D laboratories oflarge IC manufacturers are deeply involved in the pursuit of ferroelectric device technologies. Many companies worldwide are investing considerable manpower and resources into ferroelectric technologies. Some have already announced products ranging from embedded memories in micro controllers, low density stand-alone memories, microwave circuit elements, andrf identification tags. There is now considerable optimism that ferroelectric devices andproducts will occupy a significant market-share in the new millennium.

Advanced Techniques for Surface Engineering

Author : W. Gissler
Publisher : Springer Science & Business Media
ISBN 13 : 940170631X
Total Pages : 402 pages
Book Rating : 4.4/5 (17 download)

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Book Synopsis Advanced Techniques for Surface Engineering by : W. Gissler

Download or read book Advanced Techniques for Surface Engineering written by W. Gissler and published by Springer Science & Business Media. This book was released on 2013-04-17 with total page 402 pages. Available in PDF, EPUB and Kindle. Book excerpt: Today's shortages of resources make the search for wear and corrosion resistant materials one of the most important tasks of the next century. Since the surface of a material is the location where any interaction occurs, it is that there the hardest requirements on the material are imposed: to be wear resistant for tools and bearings; to be corrosion resistant for turbine blades and tubes in the petrochemical industry; to be antireflecting for solar cells; to be decorative for architectural panels and to combine several of these properties in other applications. Surface engineering is the general term that incorporates all the techniques by which a surface modification can be accomplished. These techniques include both coating and modification of the surface by ion implantation and laser beam melting. In recent years a continuously growing number of these techniques were developed to the extent that it became more and more difficult to maintain an overlook and to understand which of these highly differentiated techniques might be applied to resolve a given surface engineering problem. A similar development is also occuring for surface characterization techniques. This volume contains contributions from renowned scientists and engineers to the Eurocourse the aim of which was to inform about the various techniques and to give a comprehensive survey of the latest development on this subject.