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Author : Yih-Cheng Shih
Publisher :
ISBN 13 :
Total Pages : 298 pages
Book Rating : 4.:/5 (29 download)
Download or read book The Formation of Amorphous Silicon by Light Ion Damage written by Yih-Cheng Shih and published by . This book was released on 1986 with total page 298 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Formation of Amorphous Silicon by Light Ion Damage written by and published by . This book was released on 1985 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Amorphization by implantation of boron ions (which is the lightest element generally used in I.C. fabrication processes) has been systematically studied for various temperatures, various voltages and various dose rates. Based on theoretical considerations and experimental results, a new amorphization model for light and intermediate mass ion damage is proposed consisting of two stages. The role of interstitial type point defects or clusters in amorphization is emphasized. Due to the higher mobility of interstitials out-diffusion to the surface particularly during amorphization with low energy can be significant. From a review of the idealized amorphous structure, diinterstitial-divacancy pairs are suggested to be the embryos of amorphous zones formed during room temperature implantation. The stacking fault loops found in specimens implanted with boron at room temperature are considered to be the origin of secondary defects formed during annealing.
Author : John Robert Dennis
Publisher :
ISBN 13 :
Total Pages : 31 pages
Book Rating : 4.:/5 (62 download)
Download or read book Model Correction for the Formation of Amorphous Silicon by Ion Implantation written by John Robert Dennis and published by . This book was released on 1973 with total page 31 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Lawrence Berkeley Laboratory. Materials and Molecular Research Division
Publisher :
ISBN 13 :
Total Pages : 340 pages
Book Rating : 4.3/5 (91 download)
Download or read book Materials and Molecular Research Division Annual Report written by Lawrence Berkeley Laboratory. Materials and Molecular Research Division and published by . This book was released on 1986 with total page 340 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 704 pages
Book Rating : 4.:/5 (31 download)
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 564 pages
Book Rating : 4.:/5 (3 download)
Download or read book Energy Research Abstracts written by and published by . This book was released on 1990 with total page 564 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Bernd Schmidt
Publisher : Springer Science & Business Media
ISBN 13 : 3211993568
Total Pages : 425 pages
Book Rating : 4.2/5 (119 download)
Download or read book Ion Beams in Materials Processing and Analysis written by Bernd Schmidt and published by Springer Science & Business Media. This book was released on 2012-12-13 with total page 425 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.
Author :
Publisher :
ISBN 13 :
Total Pages : 974 pages
Book Rating : 4.:/5 (31 download)
Download or read book ERDA Energy Research Abstracts written by and published by . This book was released on 1983 with total page 974 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Joseph Sadowski
Publisher :
ISBN 13 :
Total Pages : 282 pages
Book Rating : 4.:/5 (867 download)
Download or read book Amorphous-damage Depth Distributions and the Amorphization of Silicon by Ion Bombardment written by Joseph Sadowski and published by . This book was released on 1980 with total page 282 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 900 pages
Book Rating : 4.3/5 (129 download)
Download or read book Energy Research Abstracts written by and published by . This book was released on 1985 with total page 900 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiannual, with semiannual and annual indexes. References to all scientific and technical literature coming from DOE, its laboratories, energy centers, and contractors. Includes all works deriving from DOE, other related government-sponsored information, and foreign nonnuclear information. Arranged under 39 categories, e.g., Biomedical sciences, basic studies; Biomedical sciences, applied studies; Health and safety; and Fusion energy. Entry gives bibliographical information and abstract. Corporate, author, subject, report number indexes.
Author : George K. Celler
Publisher : The Electrochemical Society
ISBN 13 : 9781566774611
Total Pages : 412 pages
Book Rating : 4.7/5 (746 download)
Download or read book Silicon-on-insulator Technology and Devices XII written by George K. Celler and published by The Electrochemical Society. This book was released on 2005 with total page 412 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Roland Levy
Publisher : Springer Science & Business Media
ISBN 13 : 9780792301547
Total Pages : 1006 pages
Book Rating : 4.3/5 (15 download)
Download or read book Microelectronic Materials and Processes written by Roland Levy and published by Springer Science & Business Media. This book was released on 1989-01-31 with total page 1006 pages. Available in PDF, EPUB and Kindle. Book excerpt: The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result of a NATO-sponsored Advanced Study Institute (AS!) held in Castelvecchio Pascoli, Italy. Invited speakers at this institute provided manuscripts which were edited, updated, and integrated with other contributions solicited from non-participants to this AS!.
Author : Norman Einspruch
Publisher : Academic Press
ISBN 13 : 0323141994
Total Pages : 929 pages
Book Rating : 4.3/5 (231 download)
Download or read book VLSI Handbook written by Norman Einspruch and published by Academic Press. This book was released on 2012-12-02 with total page 929 pages. Available in PDF, EPUB and Kindle. Book excerpt: VLSI Handbook is a reference guide on very large scale integration (VLSI) microelectronics and its aspects such as circuits, fabrication, and systems applications. This handbook readily answers specific questions and presents a systematic compilation of information regarding the VLSI technology. There are a total of 52 chapters in this book and are grouped according to the fields of design, materials and processes, and examples of specific system applications. Some of the chapters under fields of design are design automation for integrated circuits and computer tools for integrated circuit design. For the materials and processes, there are many chapters that discuss this aspect. Some of them are manufacturing process technology for metal-oxide semiconductor (MOS) VLSI; MOS VLSI circuit technology; and facilities for VLSI circuit fabrication. Other concepts and materials discussed in the book are the use of silicon material in different processes of VLSI, nitrides, silicides, metallization, and plasma. This handbook is very useful to students of engineering and physics. Also, researchers (in physics and chemistry of materials and processes), device designers, and system designers can also benefit from this book.
Author : A.G. Cullis
Publisher : CRC Press
ISBN 13 : 1000112160
Total Pages : 533 pages
Book Rating : 4.0/5 (1 download)
Download or read book Microscopy of Semiconducting Materials 1983, Third Oxford Conference on Microscopy of Semiconducting Materials, St Catherines College, March 1983 written by A.G. Cullis and published by CRC Press. This book was released on 2020-11-25 with total page 533 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume contains invited and contributed papers at the conference on Microscopy of Semiconducting Materials which took place on 21–23 March 1983 in St Cathernine's College, Oxford. The conference was the third in the series devoted to advances in microscopical studies of semiconductors.
Author : G. R. Srinivasan
Publisher : The Electrochemical Society
ISBN 13 : 9781566771542
Total Pages : 546 pages
Book Rating : 4.7/5 (715 download)
Download or read book Proceedings of the Fourth International Symposium of Process Physics and Modeling in Semiconductor Technology written by G. R. Srinivasan and published by The Electrochemical Society. This book was released on 1996 with total page 546 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : B. R. Appleton
Publisher :
ISBN 13 :
Total Pages : 426 pages
Book Rating : 4.:/5 (2 download)
Download or read book Ion Beam Processes in Advanced Electronic Materials and Device Technology: Volume 45 written by B. R. Appleton and published by . This book was released on 1985-08-30 with total page 426 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author : J. S. Williams
Publisher : Academic Press
ISBN 13 : 1483220648
Total Pages : 432 pages
Book Rating : 4.4/5 (832 download)
Download or read book Ion Implantation and Beam Processing written by J. S. Williams and published by Academic Press. This book was released on 2014-06-28 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion Implantation and Beam Processing covers the scientific and technological advances in the fields of ion implantation and beam processing. The book discusses the amorphization and crystallization of semiconductors; the application of the Boltzmann transport equation to ion implantation in semiconductors and multilayer targets; and the high energy density collision cascades and spike effects. The text also describes the implantation of insulators (ices and lithographic materials); the ion-bombardment-induced compositions changes in alloys and compounds; and the fundamentals and applications of ion beam and laser mixing. The high-dose implantation and the trends of ion implantation in silicon technology are also considered. The book further tackles the implantation in gaAs technology and the contacts and interconnections on semiconductors. Engineers and people involved in microelectronics will find the book invaluable.
