Tantalum Nitride And Tantalum Lanthanum Nitride

Author : Anna Zaman
Publisher :
ISBN 13 :
Total Pages : 78 pages
Book Rating : 4.:/5 (892 download)

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Download or read book Characterization of Tantalum Nitride Thin Films Synthesized by Magnetron Sputtering written by Anna Zaman and published by . This book was released on 2014 with total page 78 pages. Available in PDF, EPUB and Kindle. Book excerpt: Tantalum Nitride is chemically inert, oxidation resistant and hard. TaN finds applications as a protective coating due to its excellent wear properties. It has become a very promising diffusion barrier material in Cu interconnect technology in microelectronics. TaN has not been analyzed as much as other transition metal nitrides like the TiN system because TaN exhibits various stable and metastable phases. The emergence of these phases and the different physical, chemical and mechanical properties depend on the growth technique and deposition conditions. TaN thin films were deposited using magnetron PVD sputtering in the SaNEL lab. The aim of this study was to identify the effect of processing parameters like N2/Ar ratio, substrate bias and temperature on the emergence of the different phases present in TaN thin films and the effect of deposition conditions on the mechanical properties of these films. The phases present in the films, deposited at various conditions were explored via low angle X-Ray Diffraction (XRD), hardness response by using Nanoindentation and tribological testing out to assess their frictional and wear behavior. It was observed that at high percentage of Nitrogen in the gas mixture (10% - 25%) the main phase present was FCC TaN and as the Nitrogen content was decreased a mixture of phases was present in these films. The hardness of the films increases as we decrease the Nitrogen content, yielding a film with a hardness of 37.1 GPa at 3% N2 in the gas mixture with a substrate bias voltage of -100 V.