Sputter Deposition Processes For Thin Film Oxide Dielectrics

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Sputtering Materials for VLSI and Thin Film Devices

Author : Jaydeep Sarkar
Publisher : William Andrew
ISBN 13 : 0815519877
Total Pages : 614 pages
Book Rating : 4.8/5 (155 download)

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Book Synopsis Sputtering Materials for VLSI and Thin Film Devices by : Jaydeep Sarkar

Download or read book Sputtering Materials for VLSI and Thin Film Devices written by Jaydeep Sarkar and published by William Andrew. This book was released on 2010-12-13 with total page 614 pages. Available in PDF, EPUB and Kindle. Book excerpt: An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . - Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements - Practical information on technology trends, role of sputtering and major OEMs - Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc. - Practical case-studies on target performance and troubleshooting - Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry

Thin Film Processes

Author : John L. Vossen
Publisher : Elsevier
ISBN 13 : 0323138985
Total Pages : 577 pages
Book Rating : 4.3/5 (231 download)

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Book Synopsis Thin Film Processes by : John L. Vossen

Download or read book Thin Film Processes written by John L. Vossen and published by Elsevier. This book was released on 2012-12-02 with total page 577 pages. Available in PDF, EPUB and Kindle. Book excerpt: Remarkable advances have been made in recent years in the science and technology of thin film processes for deposition and etching. It is the purpose of this book to bring together tutorial reviews of selected filmdeposition and etching processes from a process viewpoint. Emphasis is placed on the practical use of the processes to provide working guidelines for their implementation, a guide to the literature, and an overview of each process.

Handbook of Sputter Deposition Technology

Author : Kiyotaka Wasa
Publisher : William Andrew
ISBN 13 : 1437734847
Total Pages : 657 pages
Book Rating : 4.4/5 (377 download)

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Book Synopsis Handbook of Sputter Deposition Technology by : Kiyotaka Wasa

Download or read book Handbook of Sputter Deposition Technology written by Kiyotaka Wasa and published by William Andrew. This book was released on 2012-12-31 with total page 657 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. - A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available - All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique - 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere

Handbook of Thin-film Deposition Processes and Techniques

Author : Krishna Seshan
Publisher :
ISBN 13 : 9786612253195
Total Pages : 629 pages
Book Rating : 4.2/5 (531 download)

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Book Synopsis Handbook of Thin-film Deposition Processes and Techniques by : Krishna Seshan

Download or read book Handbook of Thin-film Deposition Processes and Techniques written by Krishna Seshan and published by . This book was released on 2002 with total page 629 pages. Available in PDF, EPUB and Kindle. Book excerpt: The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

Oxidation of Tungsten

Author : Vincent David Barth
Publisher :
ISBN 13 :
Total Pages : 192 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Oxidation of Tungsten by : Vincent David Barth

Download or read book Oxidation of Tungsten written by Vincent David Barth and published by . This book was released on 1961 with total page 192 pages. Available in PDF, EPUB and Kindle. Book excerpt: The report presents a detailed review of available information on the oxidation of W and its alloys. W is relatively inert below 700 C. As the temperature is increased above this level, however, oxidation becomes progressively more rapid, reaching catastrophic rates at temperatures around 1200 C and above. Various theories for the mechanism and rates of W oxidation at different temperatures are reviewed, and the effect of pressure and water vapor on the stability of W oxides is discussed in detail. The elevatedtemperature reactions of W with other materials, such as refractory oxides, and with gases other than oxygen also are covered. Information on the protection of W by alloying and coating is included. (Author).

The Foundations of Vacuum Coating Technology

Author : Donald M. Mattox
Publisher : William Andrew
ISBN 13 : 0128130857
Total Pages : 383 pages
Book Rating : 4.1/5 (281 download)

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Book Synopsis The Foundations of Vacuum Coating Technology by : Donald M. Mattox

Download or read book The Foundations of Vacuum Coating Technology written by Donald M. Mattox and published by William Andrew. This book was released on 2018-08-21 with total page 383 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. - History and detailed descriptions of Vacuum Deposition Technologies - Review of Enabling Technologies and their importance to current applications - Extensively referenced text - Patents are referenced as part of the history - Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology - Glossary of Terms for vacuum coating

Handbook of Physical Vapor Deposition (PVD) Processing

Author : D. M. Mattox
Publisher : Cambridge University Press
ISBN 13 : 0080946585
Total Pages : 947 pages
Book Rating : 4.0/5 (89 download)

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Book Synopsis Handbook of Physical Vapor Deposition (PVD) Processing by : D. M. Mattox

Download or read book Handbook of Physical Vapor Deposition (PVD) Processing written by D. M. Mattox and published by Cambridge University Press. This book was released on 2014-09-19 with total page 947 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.

Advances in Ferroelectrics

Author : Aimé Peláiz-Barranco
Publisher : BoD – Books on Demand
ISBN 13 : 9535108859
Total Pages : 546 pages
Book Rating : 4.5/5 (351 download)

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Book Synopsis Advances in Ferroelectrics by : Aimé Peláiz-Barranco

Download or read book Advances in Ferroelectrics written by Aimé Peláiz-Barranco and published by BoD – Books on Demand. This book was released on 2012-11-19 with total page 546 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ferroelectricity is one of the most studied phenomena in the scientific community due the importance of ferroelectric materials in a wide range of applications including high dielectric constant capacitors, pyroelectric devices, transducers for medical diagnostic, piezoelectric sonars, electrooptic light valves, electromechanical transducers and ferroelectric random access memories. Actually the ferroelectricity at nanoscale receives a great attention to the development of new technologies. The demand for ferroelectric systems with specific applications enforced the in-depth research in addition to the improvement of processing and characterization techniques. This book contains twenty two chapters and offers an up-to-date view of recent research into ferroelectricity. The chapters cover various formulations, their forms (bulk, thin films, ferroelectric liquid crystals), fabrication, properties, theoretical topics and ferroelectricity at nanoscale.

Thin film materials technology

Author : Kiyotaka Wasa
Publisher : Springer Science & Business Media
ISBN 13 : 9783540211181
Total Pages : 538 pages
Book Rating : 4.2/5 (111 download)

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Book Synopsis Thin film materials technology by : Kiyotaka Wasa

Download or read book Thin film materials technology written by Kiyotaka Wasa and published by Springer Science & Business Media. This book was released on 2004-09-24 with total page 538 pages. Available in PDF, EPUB and Kindle. Book excerpt: This title contains rich historical coverage of the basics and new experimental and technological information about ceramic thin film and large-area functional coating. Included are principles and examples of making thin-film materials and devices.

Atomic Layer Deposition for Semiconductors

Author : Cheol Seong Hwang
Publisher : Springer Science & Business Media
ISBN 13 : 146148054X
Total Pages : 266 pages
Book Rating : 4.4/5 (614 download)

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Book Synopsis Atomic Layer Deposition for Semiconductors by : Cheol Seong Hwang

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Handbook of Low and High Dielectric Constant Materials and Their Applications, Two-Volume Set

Author : Hari Singh Nalwa
Publisher : Elsevier
ISBN 13 : 0080533531
Total Pages : 562 pages
Book Rating : 4.0/5 (85 download)

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Book Synopsis Handbook of Low and High Dielectric Constant Materials and Their Applications, Two-Volume Set by : Hari Singh Nalwa

Download or read book Handbook of Low and High Dielectric Constant Materials and Their Applications, Two-Volume Set written by Hari Singh Nalwa and published by Elsevier. This book was released on 1999-09-07 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent developments in microelectronics technologies have created a great demand for interlayer dielectric materials with a very low dielectric constant. They will play a crucial role in the future generation of IC devices (VLSI/UISI and high speed IC packaging). Considerable efforts have been made to develop new low as well as high dielectric constant materials for applications in electronics industries. Besides achieving either low or high dielectric constants, other materials' properties such as good processability, high mechanical strength, high thermal and environmental stability, low thermal expansion, low current leakage, low moisture absorption, corrosion resistant, etc., are of equal importance. Many chemical and physical strategies have been employed to get desired dielectric materials with high performance. This is a rapidly growing field of science--both in novel materials and their applications to future packing technologies. The experimental data on inorganic and organic materials having low or high dielectric constant remail scattered in the literature. It is timely, therfore, to consolidate the current knowledge on low and high dielectric constant materials into a sigle reference source. Handbook of Low and High Dielectric Constant Materials and Their Applications is aimed at bringing together under a sigle cover (in two volumes) all low and high dielectric constant materials currently studied in academic and industrial research covering all spects of inorgani an organic materials from their synthetic chemistry, processing techniques, physics, structure-property relationship to applications in IC devices. This book will summarize the current status of the field covering important scientific developments made over the past decade with contributions from internationally recognized experts from all over the world. Fully cross-referenced, this book has clear, precise, and wide appeal as an essential reference source for all those interested in low and high dielectric constant material.

Handbook of Thin Film Deposition

Author : Krishna Seshan
Publisher : William Andrew
ISBN 13 : 1437778747
Total Pages : 411 pages
Book Rating : 4.4/5 (377 download)

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Book Synopsis Handbook of Thin Film Deposition by : Krishna Seshan

Download or read book Handbook of Thin Film Deposition written by Krishna Seshan and published by William Andrew. This book was released on 2012-12-06 with total page 411 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes. In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films. - A practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance and applications - Covers core processes and applications in the semiconductor industry and new developments in the photovoltaic and optical thin film industries - The new edition takes covers the transition taking place in the semiconductor world from Al/SiO2 to copper interconnects with low-k dielectrics - Written by acknowledged industry experts from key companies in the semiconductor industry including Intel and IBM - Foreword by Gordon E. Moore, co-founder of Intel and formulator of the renowned 'Moore's Law' relating to the technology development cycle in the semiconductor industry

Silicon Heterojunction Solar Cells

Author : W.R. Fahrner
Publisher : Trans Tech Publications Ltd
ISBN 13 : 3038131024
Total Pages : 204 pages
Book Rating : 4.0/5 (381 download)

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Book Synopsis Silicon Heterojunction Solar Cells by : W.R. Fahrner

Download or read book Silicon Heterojunction Solar Cells written by W.R. Fahrner and published by Trans Tech Publications Ltd. This book was released on 2006-08-15 with total page 204 pages. Available in PDF, EPUB and Kindle. Book excerpt: The world of today must face up to two contradictory energy problems: on the one hand, there is the sharply growing consumer demand in countries such as China and India. On the other hand, natural resources are dwindling. Moreover, many of those countries which still possess substantial gas and oil supplies are politically unstable. As a result, renewable natural energy sources have received great attention. Among these, solar-cell technology is one of the most promising candidates. However, there still remains the problem of the manufacturing costs of such cells. Many attempts have been made to reduce the production costs of “conventional” solar cells (manufactured from monocrystalline silicon using diffusion methods) by instead using cheaper grades of silicon, and simpler pn-junction fabrication. That is the ‘hero’ of this book; the heterojunction solar cell.

The Materials Science of Thin Films

Author : Milton Ohring
Publisher : Academic Press
ISBN 13 : 9780125249904
Total Pages : 744 pages
Book Rating : 4.2/5 (499 download)

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Book Synopsis The Materials Science of Thin Films by : Milton Ohring

Download or read book The Materials Science of Thin Films written by Milton Ohring and published by Academic Press. This book was released on 1992 with total page 744 pages. Available in PDF, EPUB and Kindle. Book excerpt: Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.

Advances In Smart Coatings And Thin Films For Future Industrial and Biomedical Engineering Applications

Author : Abdel Salam Hamdy Makhlouf
Publisher : Elsevier
ISBN 13 : 0128118938
Total Pages : 681 pages
Book Rating : 4.1/5 (281 download)

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Book Synopsis Advances In Smart Coatings And Thin Films For Future Industrial and Biomedical Engineering Applications by : Abdel Salam Hamdy Makhlouf

Download or read book Advances In Smart Coatings And Thin Films For Future Industrial and Biomedical Engineering Applications written by Abdel Salam Hamdy Makhlouf and published by Elsevier. This book was released on 2019-10-25 with total page 681 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances In Smart Coatings And Thin Films For Future Industrial and Biomedical Engineering Applications discusses in detail, the recent trends in designing, fabricating and manufacturing of smart coatings and thin films for future high-tech. industrial applications related to transportation, aerospace and biomedical engineering. Chapters cover fundamental aspects and diverse approaches used to fabricate smart self-healing anti-corrosion coatings, shape-memory coatings, polymeric and nano-bio-ceramic cotings, bio-inspired and stimuli-responsive coatings for smart surfaces with antibacterial activkity and controlled wettability, and electrically conductive coatings and their emerging applications. With the emphasis on advanced methodologies and recent emerging applications of smart multifunctional coatings and thin films, this book is essential reading for materials scientists and rsearchers working in chemical sciences, advanced materials, sensors, pharmaceutical and biomedical engineering. - Discusses the most recent advances and innovations in smart multifunctional coatings and thin films in the transportation, aerospace and biomedical engineering industries - Highlights the synthesis methods, processing, testing and characterization of smart coatings and thin films - Reviews the current prospects and future trends within the industry

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

Author : Y. Pauleau
Publisher : Springer Science & Business Media
ISBN 13 : 940100353X
Total Pages : 372 pages
Book Rating : 4.4/5 (1 download)

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Book Synopsis Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies by : Y. Pauleau

Download or read book Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies written by Y. Pauleau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 372 pages. Available in PDF, EPUB and Kindle. Book excerpt: An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.

Handbook of Thin Film Deposition

Author : Dominic Schepis
Publisher : Elsevier
ISBN 13 : 044313524X
Total Pages : 428 pages
Book Rating : 4.4/5 (431 download)

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Book Synopsis Handbook of Thin Film Deposition by : Dominic Schepis

Download or read book Handbook of Thin Film Deposition written by Dominic Schepis and published by Elsevier. This book was released on 2024-10-08 with total page 428 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Thin Film Deposition, Fifth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry. When pursuing patents, there is a phase called 'reduction to practice' where the idea for a technology transitions from a concept to actual use. The section 'Thin Film Reduction to Practice' includes chapters that review the most relevant methods to fabricate thin films towards practical applications. Then, the latest applications of thin film deposition technologies are discussed. Handbook of Thin Film Deposition, 5th Edition is suitable for materials scientists and engineers in academia and working in semiconductor R&D. - Offers a practical survey of thin film technologies including design, fabrication, and reliability - Covers core processes and applications in the semiconductor industry and discusses latest advances in new thin film development - Features new chapters that review methods on front-end and back-end thin films