Proceedings of the Symposium on Heteroepitaxial Approaches in Semiconductors--Lattice Mismatch and Its Consequences

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ISBN 13 :
Total Pages : 426 pages
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Book Synopsis Proceedings of the Symposium on Heteroepitaxial Approaches in Semiconductors--Lattice Mismatch and Its Consequences by : A. T. Macrander

Download or read book Proceedings of the Symposium on Heteroepitaxial Approaches in Semiconductors--Lattice Mismatch and Its Consequences written by A. T. Macrander and published by . This book was released on 1989 with total page 426 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Directory of Published Proceedings

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ISBN 13 :
Total Pages : 836 pages
Book Rating : 4.3/5 (91 download)

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Molecular Beam Epitaxy

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Publisher : Elsevier
ISBN 13 : 0128121378
Total Pages : 790 pages
Book Rating : 4.1/5 (281 download)

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Book Synopsis Molecular Beam Epitaxy by : Mohamed Henini

Download or read book Molecular Beam Epitaxy written by Mohamed Henini and published by Elsevier. This book was released on 2018-06-27 with total page 790 pages. Available in PDF, EPUB and Kindle. Book excerpt: Molecular Beam Epitaxy (MBE): From Research to Mass Production, Second Edition, provides a comprehensive overview of the latest MBE research and applications in epitaxial growth, along with a detailed discussion and 'how to' on processing molecular or atomic beams that occur on the surface of a heated crystalline substrate in a vacuum. The techniques addressed in the book can be deployed wherever precise thin-film devices with enhanced and unique properties for computing, optics or photonics are required. It includes new semiconductor materials, new device structures that are commercially available, and many that are at the advanced research stage. This second edition covers the advances made by MBE, both in research and in the mass production of electronic and optoelectronic devices. Enhancements include new chapters on MBE growth of 2D materials, Si-Ge materials, AIN and GaN materials, and hybrid ferromagnet and semiconductor structures. - Condenses the fundamental science of MBE into a modern reference, speeding up literature review - Discusses new materials, novel applications and new device structures, grounding current commercial applications with modern understanding in industry and research - Includes coverage of MBE as mass production epitaxial technology and how it enhances processing efficiency and throughput for the semiconductor industry and nanostructured semiconductor materials research community

Proceedings in Print

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ISBN 13 :
Total Pages : 508 pages
Book Rating : 4.X/5 (6 download)

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Download or read book Proceedings in Print written by and published by . This book was released on 1996 with total page 508 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Index of Conference Proceedings

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ISBN 13 :
Total Pages : 870 pages
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Book Synopsis Index of Conference Proceedings by : British Library. Document Supply Centre

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Index of Conference Proceedings Received

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ISBN 13 :
Total Pages : 456 pages
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Book Synopsis Index of Conference Proceedings Received by : British Library. Lending Division

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National Semiconductor Metrology Program

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ISBN 13 :
Total Pages : 136 pages
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Book Synopsis National Semiconductor Metrology Program by : National Semiconductor Metrology Program (U.S.)

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National Semiconductor Metrology Program

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ISBN 13 :
Total Pages : 160 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis National Semiconductor Metrology Program by : National Institute of Standards and Technology (U.S.)

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New Developments In Applied Superconductivity - Proceedings Of The International Symposium

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Publisher : World Scientific
ISBN 13 : 9813201401
Total Pages : 830 pages
Book Rating : 4.8/5 (132 download)

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Book Synopsis New Developments In Applied Superconductivity - Proceedings Of The International Symposium by : Yukitaka Murakami

Download or read book New Developments In Applied Superconductivity - Proceedings Of The International Symposium written by Yukitaka Murakami and published by World Scientific. This book was released on 1989-06-01 with total page 830 pages. Available in PDF, EPUB and Kindle. Book excerpt: This symposium focused on new superconductors, electronics, magnet technology, energy and new applications. Recent discoveries in HTc, with transition temperatures over 90 K, have spawned a search for practical new applications. These applications extend from current uses such as that of the medical MRI to future applications, represented by research on new high-temperature materials. They span from microcircuit applications to the proposed SMES and fusion reactor applications.

Information Science for Materials Discovery and Design

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Publisher : Springer
ISBN 13 : 331923871X
Total Pages : 316 pages
Book Rating : 4.3/5 (192 download)

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Book Synopsis Information Science for Materials Discovery and Design by : Turab Lookman

Download or read book Information Science for Materials Discovery and Design written by Turab Lookman and published by Springer. This book was released on 2015-12-12 with total page 316 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book deals with an information-driven approach to plan materials discovery and design, iterative learning. The authors present contrasting but complementary approaches, such as those based on high throughput calculations, combinatorial experiments or data driven discovery, together with machine-learning methods. Similarly, statistical methods successfully applied in other fields, such as biosciences, are presented. The content spans from materials science to information science to reflect the cross-disciplinary nature of the field. A perspective is presented that offers a paradigm (codesign loop for materials design) to involve iteratively learning from experiments and calculations to develop materials with optimum properties. Such a loop requires the elements of incorporating domain materials knowledge, a database of descriptors (the genes), a surrogate or statistical model developed to predict a given property with uncertainties, performing adaptive experimental design to guide the next experiment or calculation and aspects of high throughput calculations as well as experiments. The book is about manufacturing with the aim to halving the time to discover and design new materials. Accelerating discovery relies on using large databases, computation, and mathematics in the material sciences in a manner similar to the way used to in the Human Genome Initiative. Novel approaches are therefore called to explore the enormous phase space presented by complex materials and processes. To achieve the desired performance gains, a predictive capability is needed to guide experiments and computations in the most fruitful directions by reducing not successful trials. Despite advances in computation and experimental techniques, generating vast arrays of data; without a clear way of linkage to models, the full value of data driven discovery cannot be realized. Hence, along with experimental, theoretical and computational materials science, we need to add a “fourth leg’’ to our toolkit to make the “Materials Genome'' a reality, the science of Materials Informatics.

Scientific and Technical Aerospace Reports

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ISBN 13 :
Total Pages : 994 pages
Book Rating : 4.:/5 (31 download)

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Handbook of Nitride Semiconductors and Devices, Materials Properties, Physics and Growth

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Publisher : John Wiley & Sons
ISBN 13 : 3527628460
Total Pages : 1311 pages
Book Rating : 4.5/5 (276 download)

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Book Synopsis Handbook of Nitride Semiconductors and Devices, Materials Properties, Physics and Growth by : Hadis Morkoç

Download or read book Handbook of Nitride Semiconductors and Devices, Materials Properties, Physics and Growth written by Hadis Morkoç and published by John Wiley & Sons. This book was released on 2009-07-30 with total page 1311 pages. Available in PDF, EPUB and Kindle. Book excerpt: The three volumes of this handbook treat the fundamentals, technology and nanotechnology of nitride semiconductors with an extraordinary clarity and depth. They present all the necessary basics of semiconductor and device physics and engineering together with an extensive reference section. Volume 1 deals with the properties and growth of GaN. The deposition methods considered are: hydride VPE, organometallic CVD, MBE, and liquid/high pressure growth. Additionally, extended defects and their electrical nature, point defects, and doping are reviewed.

National Semiconductor Metrology Program, Semiconductor Electronics Division, NIST List Of Publications, LP 103, March 1999

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ISBN 13 :
Total Pages : 148 pages
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National Semiconductor Metrology Program, NIST List OF Publications, LP 103, May 2000

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ISBN 13 :
Total Pages : 160 pages
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Download or read book National Semiconductor Metrology Program, NIST List OF Publications, LP 103, May 2000 written by and published by . This book was released on 2000 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:

SERI Photovoltaic Advanced Research and Development Bibliography, 1982-1985

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ISBN 13 :
Total Pages : 186 pages
Book Rating : 4.3/5 (91 download)

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Handbook of Thin Film Deposition

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Publisher : William Andrew
ISBN 13 : 0815517785
Total Pages : 659 pages
Book Rating : 4.8/5 (155 download)

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Book Synopsis Handbook of Thin Film Deposition by : Krishna Seshan

Download or read book Handbook of Thin Film Deposition written by Krishna Seshan and published by William Andrew. This book was released on 2001-02-01 with total page 659 pages. Available in PDF, EPUB and Kindle. Book excerpt: New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques.Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon

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Publisher : CRC Press
ISBN 13 : 1482269686
Total Pages : 658 pages
Book Rating : 4.4/5 (822 download)

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Book Synopsis Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon by : Krishna Seshan

Download or read book Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon written by Krishna Seshan and published by CRC Press. This book was released on 2002-02-01 with total page 658 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec