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Author : Liqun Han
Publisher :
ISBN 13 :
Total Pages : 302 pages
Book Rating : 4.F/5 ( download)
Download or read book Physical Limitations to Throughput of Electron Beam Systems for Next Generation Lithography written by Liqun Han and published by . This book was released on 2001 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Min Bai
Publisher :
ISBN 13 :
Total Pages : 158 pages
Book Rating : 4.F/5 ( download)
Download or read book Insulator Charging in Electron Beam Lithography written by Min Bai and published by . This book was released on 2003 with total page 158 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher : Elsevier
ISBN 13 : 0081003587
Total Pages : 636 pages
Book Rating : 4.0/5 (81 download)
Download or read book Materials and Processes for Next Generation Lithography written by and published by Elsevier. This book was released on 2016-11-08 with total page 636 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Author : Klaus D. Sattler
Publisher : CRC Press
ISBN 13 : 1420075519
Total Pages : 782 pages
Book Rating : 4.4/5 (2 download)
Download or read book Handbook of Nanophysics written by Klaus D. Sattler and published by CRC Press. This book was released on 2010-09-17 with total page 782 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many bottom-up and top-down techniques for nanomaterial and nanostructure generation have enabled the development of applications in nanoelectronics and nanophotonics. Handbook of Nanophysics: Nanoelectronics and Nanophotonics explores important recent applications of nanophysics in the areas of electronics and photonics. Each peer-reviewed c
Author : Jain Richa & Rai Amrita
Publisher : S. Chand Publishing
ISBN 13 : 8121940001
Total Pages : pages
Book Rating : 4.1/5 (219 download)
Download or read book Principles of VLSI and CMOS Integrated Circuits written by Jain Richa & Rai Amrita and published by S. Chand Publishing. This book was released on with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: For B.E./B.Tech students of all Technical Universities. Microelectronics/VLSI Design is an emerging subject in the field of electronics in recent years. It is an introductory source to internal parts of electronics at minute level. This book is covering CMOS Design from a digital system level to circuit level and providing a background in CMOS Processing Technology. The book includes basic theortical knowledge as well as good engineering practice. This book is recommended for B.Tech., M.Tech. and diploma students of all Indian Universities and also useful for competitive examinations.
Author :
Publisher :
ISBN 13 :
Total Pages : 536 pages
Book Rating : 4.:/5 (31 download)
Download or read book Proceedings of the Symposium on Electron and Ion Beam Science and Technology; International Conference written by and published by . This book was released on 1982 with total page 536 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Arthur T. Hubbard
Publisher : CRC Press
ISBN 13 : 100071490X
Total Pages : 928 pages
Book Rating : 4.0/5 (7 download)
Download or read book The Handbook of Surface Imaging and Visualization written by Arthur T. Hubbard and published by CRC Press. This book was released on 2022-04-13 with total page 928 pages. Available in PDF, EPUB and Kindle. Book excerpt: This exciting new handbook investigates the characterization of surfaces. It emphasizes experimental techniques for imaging of solid surfaces and theoretical strategies for visualization of surfaces, areas in which rapid progress is currently being made. This comprehensive, unique volume is the ideal reference for researchers needing quick access to the latest developments in the field and an excellent introduction to students who want to acquaint themselves with the behavior of electrons, atoms, molecules, and thin-films at surfaces. It's all here, under one cover! The Handbook of Surface Imaging and Visualization is filled with sixty-four of the most powerful techniques for characterization of surfaces and interfaces in the material sciences, medicine, biology, geology, chemistry, and physics. Each discussion is easy to understand, succinct, yet incredibly informative. Data illustrate present research in each area of study. A wide variety of the latest experimental and theoretical approaches are included with both practical and fundamental objectives in mind. Key references are included for the reader's convenience for locating the most recent and useful work on each topic. Readers are encouraged to contact the authors or consult the references for additional information. This is the best ready reference available today. It is a perfect source book or supplemental text on the subject.
Author : Bo Cui
Publisher : BoD – Books on Demand
ISBN 13 : 953307602X
Total Pages : 630 pages
Book Rating : 4.5/5 (33 download)
Download or read book Recent Advances in Nanofabrication Techniques and Applications written by Bo Cui and published by BoD – Books on Demand. This book was released on 2011-12-02 with total page 630 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Author : George Brewer
Publisher : Elsevier
ISBN 13 : 0323153410
Total Pages : 377 pages
Book Rating : 4.3/5 (231 download)
Download or read book Electron-Beam Technology in Microelectronic Fabrication written by George Brewer and published by Elsevier. This book was released on 2012-12-02 with total page 377 pages. Available in PDF, EPUB and Kindle. Book excerpt: Electron-Beam Technology in Microelectronic Fabrication presents a unified description of the technology of high resolution lithography. This book is organized into six chapters, each treating a major segment of the technology of high resolution lithography. The book examines topics such as the physics of interaction of the electrons with the polymer resist in which the patterns are drawn, the machines that generate and control the beam, and ways of applying electron-beam lithography in device fabrication and in the making of masks for photolithographic replication. Chapter 2 discusses fundamental processes by which patterns are created in resist masks. Chapter 3 describes electron-beam lithography machines, including some details of each of the major elements in the electron-optical column and their effect on the focused electron beam. Chapter 4 presents the use of electron-beam lithography to make discrete devices and integrated circuits. Chapter 5 looks at the techniques and economics of mask fabrication by the use of electron beams. Finally, Chapter 6 presents a comprehensive description and evaluation of the several high resolution replication processes currently under development. This book will be of great value to students and to engineers who want to learn the unique features of high resolution lithography so that they can apply it in research, development, or production of the next generation of microelectronic devices and circuits.
Author :
Publisher :
ISBN 13 :
Total Pages : 946 pages
Book Rating : 4.F/5 ( download)
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2008 with total page 946 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Seongbo Shim
Publisher : Springer
ISBN 13 : 331976294X
Total Pages : 144 pages
Book Rating : 4.3/5 (197 download)
Download or read book Physical Design and Mask Synthesis for Directed Self-Assembly Lithography written by Seongbo Shim and published by Springer. This book was released on 2018-03-21 with total page 144 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
Author :
Publisher : ASM International
ISBN 13 : 9780871702852
Total Pages : 1234 pages
Book Rating : 4.7/5 (28 download)
Download or read book Electronic Materials Handbook written by and published by ASM International. This book was released on 1989-11-01 with total page 1234 pages. Available in PDF, EPUB and Kindle. Book excerpt: Volume 1: Packaging is an authoritative reference source of practical information for the design or process engineer who must make informed day-to-day decisions about the materials and processes of microelectronic packaging. Its 117 articles offer the collective knowledge, wisdom, and judgement of 407 microelectronics packaging experts-authors, co-authors, and reviewers-representing 192 companies, universities, laboratories, and other organizations. This is the inaugural volume of ASMAs all-new ElectronicMaterials Handbook series, designed to be the Metals Handbook of electronics technology. In over 65 years of publishing the Metals Handbook, ASM has developed a unique editorial method of compiling large technical reference books. ASMAs access to leading materials technology experts enables to organize these books on an industry consensus basis. Behind every article. Is an author who is a top expert in its specific subject area. This multi-author approach ensures the best, most timely information throughout. Individually selected panels of 5 and 6 peers review each article for technical accuracy, generic point of view, and completeness.Volumes in the Electronic Materials Handbook series are multidisciplinary, to reflect industry practice applied in integrating multiple technology disciplines necessary to any program in advanced electronics. Volume 1: Packaging focusing on the middle level of the electronics technology size spectrum, offers the greatest practical value to the largest and broadest group of users. Future volumes in the series will address topics on larger (integrated electronic assemblies) and smaller (semiconductor materials and devices) size levels.
Author :
Publisher :
ISBN 13 :
Total Pages : 424 pages
Book Rating : 4.6/5 (157 download)
Download or read book The Journal of the Korean Physical Society written by and published by . This book was released on 2002 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : J. P. G. Farr
Publisher : Elsevier
ISBN 13 : 1483257223
Total Pages : 1265 pages
Book Rating : 4.4/5 (832 download)
Download or read book Surface & Coatings Technology written by J. P. G. Farr and published by Elsevier. This book was released on 2016-06-03 with total page 1265 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surface & Coatings Technology represents the start of a new era for the journal, not only with the change in title to Surface and Coatings Technology, but also with the significant change in the journal's scope, which is intended to place it in the forefront of the coatings and surface modification field. This presents volume contains 100 contributions. It is intended to become the principal forum for the interchange of information on the science, technology, and application of coatings and modified surfaces as they relate to modification of the mechanical, chemical, or optical properties of materials. The aim of the journal is to publish research papers and invited review articles on various subjects. A new feature will be the addition of a short section at the beginning of each issue in which each author states which technical problems are being addressed in his article. These will be catalogued at the end of each year in order that a scientist or engineer who has a particular problem related to coatings can determine whether there were any papers that addressed the problem. It is hoped that Surface and Coatings Technology will have a significant impact in one of the most exciting areas of materials research being investigated today.
Author : Vinod Kumar Khanna
Publisher : CRC Press
ISBN 13 : 100033127X
Total Pages : 579 pages
Book Rating : 4.0/5 (3 download)
Download or read book Nanosensors written by Vinod Kumar Khanna and published by CRC Press. This book was released on 2021-02-25 with total page 579 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanosensors are innovative devices that exploit the unique properties exhibited by matter at the nanoscale. A growing and exciting field, nanosensors have recently spurred considerable research endeavors across the globe, driving a need for the development of new device concepts and engineering nanostructured materials with controlled properties. Nanosensors: Physical, Chemical, and Biological, Second Edition offers a panoramic view of the field and related nanotechnologies with extraordinary clarity and depth. Presenting an interdisciplinary approach, blending physics, chemistry and biology, this new edition is broad in scope and organised into six parts; beginning with the fundamentals before moving onto nanomaterials and nanofabrication technologies in the second part. The third and fourth parts provide a critical appraisal of physical nanosensors, and explore the chemical and biological categories of nanosensors. The fifth part sheds light on the emerging applications of nanosensors in the sectors of society, industry, and defense and details the cutting-edge applications of state-of-the-art nanosensors in environmental science, food technology, medical diagnostics, and biotechnology. The final part addresses self-powering and networking issues of nanosensors, and provides glimpses of future trends. This is an ideal reference for researchers and industry professionals engaged in the frontier areas of material science and semiconductor fabrication as well as graduate students in physics and engineering pursuing electrical engineering and electronics courses with a focus on nanoscience and nanotechnology. Key features: Provides an updated, all-encompassing exploration of contemporary nanosensors and highlights the exclusive nanoscale properties on which nanosensors are designed. Presents an accessible approach with a question-and-answer format to allow an easy grasp of the intricacies involved in the complex working mechanisms of devices. Contains clear, illustrative diagrams enabling the visualization of nanosensor operations, along with worked examples, end of chapter questions, and exhaustive up-to-date bibliographies appended to each chapter.
Author : P. Rai-Choudhury
Publisher : SPIE Press
ISBN 13 : 9780819423788
Total Pages : 780 pages
Book Rating : 4.4/5 (237 download)
Download or read book Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography written by P. Rai-Choudhury and published by SPIE Press. This book was released on 1997 with total page 780 pages. Available in PDF, EPUB and Kindle. Book excerpt: The dynamic field of lithography demands an authoritative handbook for process development and production, and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook. Copublished with IEE.
Author : David Attwood
Publisher : Cambridge University Press
ISBN 13 : 9780521652148
Total Pages : 504 pages
Book Rating : 4.6/5 (521 download)
Download or read book Soft X-Rays and Extreme Ultraviolet Radiation written by David Attwood and published by Cambridge University Press. This book was released on 2000 with total page 504 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the ...
