Author : Esmail Issa
Publisher : BoD – Books on Demand
ISBN 13 : 3863602633
Total Pages : 243 pages
Book Rating : 4.8/5 (636 download)
Book Synopsis Novel Reactor Design and Method for Atmospheric Pressure Chemical Vapor Deposition of Micro and Nano SiO2-x Films in Photovoltaic Applications by : Esmail Issa
Download or read book Novel Reactor Design and Method for Atmospheric Pressure Chemical Vapor Deposition of Micro and Nano SiO2-x Films in Photovoltaic Applications written by Esmail Issa and published by BoD – Books on Demand. This book was released on 2022-01-01 with total page 243 pages. Available in PDF, EPUB and Kindle. Book excerpt: A laboratory-scale reactor and a novel method for the atmospheric pressure chemical vapor deposition (APCVD) of SiO2-x films are developed. The deposited films are investigated to synthesize heterogeneously upon the substrate surface with the elimination of the so-called gas-phase reaction, hence preventing parasitic oxide particles upon the substrate surface and the reactor inner walls. The films are extensively inspected in terms of chemical and optical properties and utilized for crystalline silicon solar cell applications. Simple reactor design with low safety measures, a wide range of deposition rates, high film resilience, and stability for the intended applications are successfully achieved. The newly developed APCVD SiO2-x is proven to protect the Si wafer surface against texturing in alkaline and acidic solutions. Electroplated metallization schemes of heterojunction and passivated emitter rear contact solar cells are examined with the use of the SiO2-x as a masking layer in the grid electrode-free area.