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Author : George Rob Misium
Publisher :
ISBN 13 :
Total Pages : 194 pages
Book Rating : 4.:/5 (218 download)
Download or read book Modeling of RF Plasma Discharges for IC Processing written by George Rob Misium and published by . This book was released on 1988 with total page 194 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Vahid Vahedi
Publisher :
ISBN 13 :
Total Pages : 316 pages
Book Rating : 4.:/5 (33 download)
Download or read book Modeling and Simulation of RF Discharges Used for Plasma Processing written by Vahid Vahedi and published by . This book was released on 1993 with total page 316 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Michael Scott Barnes
Publisher :
ISBN 13 :
Total Pages : 282 pages
Book Rating : 4.:/5 (132 download)
Download or read book Computer Modeling of RF Glow Discharges for the Study of Plasma Processing in Microelectronics written by Michael Scott Barnes and published by . This book was released on 1989 with total page 282 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Manish Chandhok
Publisher :
ISBN 13 :
Total Pages : 570 pages
Book Rating : 4.3/5 (91 download)
Download or read book Phenomenological Modeling of Plasma Generation for the Real-time Control of RIE Systems written by Manish Chandhok and published by . This book was released on 1996 with total page 570 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Yuri P. Raizer
Publisher : CRC Press
ISBN 13 : 135141996X
Total Pages : 305 pages
Book Rating : 4.3/5 (514 download)
Download or read book Radio-Frequency Capacitive Discharges written by Yuri P. Raizer and published by CRC Press. This book was released on 2017-12-14 with total page 305 pages. Available in PDF, EPUB and Kindle. Book excerpt: The first publication of its kind in the field, this book describes comprehensively and systematically radio-frequency (rf) capacitive gas discharges of intermediate and low pressure and their application to gas laser excitation and to plasma processing. Text presents the physics underlying rf discharges along with techniques for obtaining such discharges, experimental methods and results, and theoretical and numerical modeling findings. Radio-Frequency Capacitive Discharges is written by well-known specialists in the field, authors of many theoretical and experimental works. They provide simple and clear discussions of complicated physical phenomena. A complete review on the state of the art is included. This interesting new book can be used as a textbook for students and postgraduates and as a comprehensive guidebook by specialists.
Author : George Rob Misium
Publisher :
ISBN 13 :
Total Pages : 18 pages
Book Rating : 4.:/5 (439 download)
Download or read book Macroscopic Modeling of R.f. Plasma Discharges written by George Rob Misium and published by . This book was released on 1988 with total page 18 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : P.F. Williams
Publisher : Springer Science & Business Media
ISBN 13 : 9401158843
Total Pages : 610 pages
Book Rating : 4.4/5 (11 download)
Download or read book Plasma Processing of Semiconductors written by P.F. Williams and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 610 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Processing of Semiconductors contains 28 contributions from 18 experts and covers plasma etching, plasma deposition, plasma-surface interactions, numerical modelling, plasma diagnostics, less conventional processing applications of plasmas, and industrial applications. Audience: Coverage ranges from introductory to state of the art, thus the book is suitable for graduate-level students seeking an introduction to the field as well as established workers wishing to broaden or update their knowledge.
Author : National Research Council
Publisher : National Academies Press
ISBN 13 : 0309045975
Total Pages : 88 pages
Book Rating : 4.3/5 (9 download)
Download or read book Plasma Processing of Materials written by National Research Council and published by National Academies Press. This book was released on 1991-02-01 with total page 88 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Author :
Publisher :
ISBN 13 :
Total Pages : 842 pages
Book Rating : 4.E/5 ( download)
Download or read book Journal of Research of the National Institute of Standards and Technology written by and published by . This book was released on 1995 with total page 842 pages. Available in PDF, EPUB and Kindle. Book excerpt: Reports NIST research and development in the physical and engineering sciences in which the Institute is active. These include physics, chemistry, engineering, mathematics, and computer sciences. Emphasis on measurement methodology and the basic technology underlying standardization.
Author : G.A. Armstrong
Publisher : IET
ISBN 13 : 0863417434
Total Pages : 457 pages
Book Rating : 4.8/5 (634 download)
Download or read book Technology Computer Aided Design for Si, SiGe and GaAs Integrated Circuits written by G.A. Armstrong and published by IET. This book was released on 2007-11-30 with total page 457 pages. Available in PDF, EPUB and Kindle. Book excerpt: The first book to deal with a broad spectrum of process and device design, and modeling issues related to semiconductor devices, bridging the gap between device modelling and process design using TCAD. Presents a comprehensive perspective of emerging fields and covers topics ranging from materials to fabrication, devices, modelling and applications. Aimed at research-and-development engineers and scientists involved in microelectronics technology and device design via Technology CAD, and TCAD engineers and developers.
Author : HENRY WILLIAM TROMBLEY
Publisher :
ISBN 13 :
Total Pages : 332 pages
Book Rating : 4.3/5 (91 download)
Download or read book MODELING RF GLOW DISCHARGES FOR MICROELECTRONICS MANUFACTURING PROCESSES. written by HENRY WILLIAM TROMBLEY and published by . This book was released on 1991 with total page 332 pages. Available in PDF, EPUB and Kindle. Book excerpt: and with experimental measurements.
Author : Michael A. Lieberman
Publisher : John Wiley & Sons
ISBN 13 : 1394245378
Total Pages : 837 pages
Book Rating : 4.3/5 (942 download)
Download or read book Principles of Plasma Discharges and Materials Processing written by Michael A. Lieberman and published by John Wiley & Sons. This book was released on 2024-10-15 with total page 837 pages. Available in PDF, EPUB and Kindle. Book excerpt: A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.
Author : Justin David Bukowski
Publisher :
ISBN 13 :
Total Pages : 402 pages
Book Rating : 4.:/5 (34 download)
Download or read book Computer Simulation of Low Pressure Plasma Discharges written by Justin David Bukowski and published by . This book was released on 1996 with total page 402 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : R.J. Shul
Publisher : Springer Science & Business Media
ISBN 13 : 3642569897
Total Pages : 664 pages
Book Rating : 4.6/5 (425 download)
Download or read book Handbook of Advanced Plasma Processing Techniques written by R.J. Shul and published by Springer Science & Business Media. This book was released on 2011-06-28 with total page 664 pages. Available in PDF, EPUB and Kindle. Book excerpt: Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.
Author : James K. Olthoff
Publisher : DIANE Publishing
ISBN 13 : 078812708X
Total Pages : 181 pages
Book Rating : 4.7/5 (881 download)
Download or read book Gaseous Electronics Conference Radio-Frequency Reference Cell written by James K. Olthoff and published by DIANE Publishing. This book was released on 1996 with total page 181 pages. Available in PDF, EPUB and Kindle. Book excerpt: The GEC RF Reference Cell is a parallel plate, capacity-coupled, rf plasma reactor that, in principle, is suitable for studies of basic discharge phenomena, investigation of industrial-type plasmas, and theoretical modeling. This report contains 12 articles that review nearly all of the experiments and theoretical modeling efforts that have been performed over the last 5 years using GEC cells. Together, they serve as a "users' guide" to the operation and performance of the GEC cell.
Author : Maxim Yu. Orlov
Publisher : Springer Nature
ISBN 13 : 9819718724
Total Pages : 382 pages
Book Rating : 4.8/5 (197 download)
Download or read book Proceedings of the XII All Russian Scientific Conference on Current Issues of Continuum Mechanics and Celestial Mechanics written by Maxim Yu. Orlov and published by Springer Nature. This book was released on with total page 382 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Electrochemical Society. Dielectric Science and Technology Division
Publisher : The Electrochemical Society
ISBN 13 : 9781566770774
Total Pages : 622 pages
Book Rating : 4.7/5 (77 download)
Download or read book Proceedings of the Tenth Symposium on Plasma Processing written by Electrochemical Society. Dielectric Science and Technology Division and published by The Electrochemical Society. This book was released on 1994 with total page 622 pages. Available in PDF, EPUB and Kindle. Book excerpt:
