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Microlithography
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Book Synopsis Microlithography by : Bruce W. Smith
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2018-10-03 with total page 864 pages. Available in PDF, EPUB and Kindle. Book excerpt: This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Book Synopsis Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography by : P. Rai-Choudhury
Download or read book Handbook of Microlithography, Micromachining, and Microfabrication: Microlithography written by P. Rai-Choudhury and published by IET. This book was released on 1997 with total page 784 pages. Available in PDF, EPUB and Kindle. Book excerpt: Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.
Book Synopsis Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology by : Saburo Nonogaki
Download or read book Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology written by Saburo Nonogaki and published by CRC Press. This book was released on 2018-10-08 with total page 336 pages. Available in PDF, EPUB and Kindle. Book excerpt: "Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."
Book Synopsis Handbook of Microlithography, Micromachining, and Microfabrication: Micromachining and microfabrication by : P. Rai-Choudhury
Download or read book Handbook of Microlithography, Micromachining, and Microfabrication: Micromachining and microfabrication written by P. Rai-Choudhury and published by SPIE Press. This book was released on 1997 with total page 706 pages. Available in PDF, EPUB and Kindle. Book excerpt: Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.
Book Synopsis Introduction to Microlithography by : L. F. Thompson
Download or read book Introduction to Microlithography written by L. F. Thompson and published by Academic. This book was released on 1994 with total page 568 pages. Available in PDF, EPUB and Kindle. Book excerpt: Reviews the theory, materials, and processes used in the lithographic process by which circuit elements are fabricated (it is these elements' decreasing size that has made possible the miniaturization of electronic devices). After a brief historical introduction, four major topics are discussed: the physics of the lithographic process, organic resist materials, resist processing, and plasma etching. The new edition reflects the many changes that have occurred since the 1983 publication of this tutorial/reference. Annotation copyright by Book News, Inc., Portland, OR
Book Synopsis Handbook of Microlithography, Micromachining, and Microfabrication: Micromachining and microfabrication by : P. Rai-Choudhury
Download or read book Handbook of Microlithography, Micromachining, and Microfabrication: Micromachining and microfabrication written by P. Rai-Choudhury and published by IET. This book was released on 1997 with total page 716 pages. Available in PDF, EPUB and Kindle. Book excerpt: Contains useful process details, recipes, tables, charts and includes numerous device applications.
Book Synopsis Handbook of VLSI Microlithography, 2nd Edition by : John N. Helbert
Download or read book Handbook of VLSI Microlithography, 2nd Edition written by John N. Helbert and published by Cambridge University Press. This book was released on 2001-04 with total page 1026 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Book Synopsis Optical Imaging in Projection Microlithography by : Alfred Kwok-Kit Wong
Download or read book Optical Imaging in Projection Microlithography written by Alfred Kwok-Kit Wong and published by SPIE Press. This book was released on 2005 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt: Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
Book Synopsis Microlithography: High Integration In Microelectronics - Proceedings Of The First Workshop by : Vitor Baranauskas
Download or read book Microlithography: High Integration In Microelectronics - Proceedings Of The First Workshop written by Vitor Baranauskas and published by World Scientific. This book was released on 1990-05-01 with total page 194 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume is a collection of classical and recent empirical studies of currency options and their implications for issues of exchange rate economics, such as exchange rate risk premium, volatility, market expectations, and credibility of exchange rate regimes. It contains applications on how to extract useful information from option market data for financial forecasting policy purposes. The subjects are discussed in a self-contained, user-friendly format, with introductory chapters on currency option theory and currency option markets.The book can be used as supplementary reading for graduate finance and international economics courses, as training material for central bank and regulatory authorities, or as a reference book for financial analysts.
Book Synopsis Fundamental Principles of Optical Lithography by : Chris Mack
Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Book Synopsis Handbook of VLSI Microlithography by : William B. Glendinning
Download or read book Handbook of VLSI Microlithography written by William B. Glendinning and published by William Andrew. This book was released on 2012-12-02 with total page 672 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Book Synopsis Handbook of VLSI Microlithography by : John N. Helbert
Download or read book Handbook of VLSI Microlithography written by John N. Helbert and published by William Andrew. This book was released on 2001-04-01 with total page 1025 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatingsùincluding optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely coveredùincluding an entire chapter on resist process defectivity and the potential yield limiting effect on device production.Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.
Download or read book Optical Microlithography written by and published by . This book was released on 2000 with total page 882 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Microlithography/Molecular Imprinting by :
Download or read book Microlithography/Molecular Imprinting written by and published by Springer Science & Business Media. This book was released on 2005-02-18 with total page 296 pages. Available in PDF, EPUB and Kindle. Book excerpt: 1. J.D. Marty, M. Mauzac: Molecular Imprinting: State of the Art and Perspectives.- 2. H. Ito: Chemical Amplification Resists for Microlithography
Book Synopsis Principles of Lithography by : Harry J. Levinson
Download or read book Principles of Lithography written by Harry J. Levinson and published by SPIE Press. This book was released on 2005 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Book Synopsis Semiconductor Microlithography V by : Jim Dey
Download or read book Semiconductor Microlithography V written by Jim Dey and published by . This book was released on 1980 with total page 220 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Optical Microlithography VI by : Society of Photo-optical Instrumentation Engineers
Download or read book Optical Microlithography VI written by Society of Photo-optical Instrumentation Engineers and published by . This book was released on 1987 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt:
