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Author : James Edward Andrews
Publisher :
ISBN 13 :
Total Pages : 450 pages
Book Rating : 4.:/5 (749 download)
Download or read book Low Temperature, Epitaxial Growth and Characterization of Thin GaN Films written by James Edward Andrews and published by . This book was released on 1979 with total page 450 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Karen Heinselman
Publisher :
ISBN 13 :
Total Pages : 248 pages
Book Rating : 4.:/5 (1 download)
Download or read book Hot-wall Low Pressure Chemical Vapor Deposition Growth and Characterization of GaN and Epitaxial AlN on Si (111) written by Karen Heinselman and published by . This book was released on 2016 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt: The physical and electronic properties of aluminum nitride (AlN) have made it attractive for a wide variety of applications, including bulk and surface acoustic wave (B/SAW) resonators and thin film dielectric coatings. Due to its wide band gap of 6.2 eV, AlN is a good insulator. The chemical durability of AlN makes it appealing for extreme environmental conditions. Its thermal expansion coefficient is similar to those of other semiconductor materials such as Si and SiC, making it appropriate for use in high temperature applications as well. In this work, we demonstrate the growth of AlN and GaN thin films using hotwall low pressure chemical vapor deposition (LPCVD) in order to obtain epitaxial AlN growth with a parallelizable, inexpensive method (relative to the current epitaxial growth method, molecular beam epitaxy). This dissertation demonstrates the growth of aluminum nitride thin films (between 70 nm and 1 [MICRO SIGN]m in thickness) on Si (111) substrates using hot-wall low pressure chemical vapor deposition (LPCVD) at 1000 ? C and 2 torr. Prior to growth, the substrates were pretreated in situ with dichlorosilane cleaning step, the parameters of which were varied to optimize the c-axis alignment of the grown thin film AlN. In addition, nucleation time for the aluminum precursor, trimethylaluminum (TMAl) was varied and optimized. X-ray diffraction (XRD) was performed on the samples for characterization. With the optimal nucleation time and dichlorosilane pretreatment, the 2[theta]-[omega] FWHM of the resulting AlN film was 1160 arcsec, and the FWHM of the [omega] rocking curve was 1.6? . These optimal parameters exhibited epitaxial AlN peaks aligned with the Si (111) substrate when characterized using a tilted phi scan XRD technique. Transmission electron microscopy (TEM) provides a second epitaxial alignment confirmation. Backside etching of the Si (111) substrate to create freestanding AlN thin film drums is demonstrated. This access to the back side of the AlN thin films allows the fabrication of future bulk acoustic wave (BAW) resonator devices and testing the piezoelectric response of these materials. For alternate applications, GaN was grown on AlN buffer layers on Si (111) substrates using hot-wall LPCVD. The resulting film was c-axis aligned, with an XRD FWHM of 1420 arcsec for the GaN (001) 2[theta]-[omega] peak, and the FWHM of the rocking curve was 3.8? . Capacitance-voltage data on the grown GaN on AlN indicate n-type films with residual electron concentrations of roughly 1017 cm[-]3 .
Author : Tom Kuech
Publisher : Elsevier
ISBN 13 : 0444633057
Total Pages : 1384 pages
Book Rating : 4.4/5 (446 download)
Download or read book Handbook of Crystal Growth written by Tom Kuech and published by Elsevier. This book was released on 2014-11-02 with total page 1384 pages. Available in PDF, EPUB and Kindle. Book excerpt: Volume IIIA Basic Techniques Handbook of Crystal Growth, Second Edition Volume IIIA (Basic Techniques), edited by chemical and biological engineering expert Thomas F. Kuech, presents the underpinning science and technology associated with epitaxial growth as well as highlighting many of the chief and burgeoning areas for epitaxial growth. Volume IIIA focuses on major growth techniques which are used both in the scientific investigation of crystal growth processes and commercial development of advanced epitaxial structures. Techniques based on vacuum deposition, vapor phase epitaxy, and liquid and solid phase epitaxy are presented along with new techniques for the development of three-dimensional nano-and micro-structures. Volume IIIB Materials, Processes, and Technology Handbook of Crystal Growth, Second Edition Volume IIIB (Materials, Processes, and Technology), edited by chemical and biological engineering expert Thomas F. Kuech, describes both specific techniques for epitaxial growth as well as an array of materials-specific growth processes. The volume begins by presenting variations on epitaxial growth process where the kinetic processes are used to develop new types of materials at low temperatures. Optical and physical characterizations of epitaxial films are discussed for both in situ and exit to characterization of epitaxial materials. The remainder of the volume presents both the epitaxial growth processes associated with key technology materials as well as unique structures such as monolayer and two dimensional materials. Volume IIIA Basic Techniques Provides an introduction to the chief epitaxial growth processes and the underpinning scientific concepts used to understand and develop new processes. Presents new techniques and technologies for the development of three-dimensional structures such as quantum dots, nano-wires, rods and patterned growth Introduces and utilizes basic concepts of thermodynamics, transport, and a wide cross-section of kinetic processes which form the atomic level text of growth process Volume IIIB Materials, Processes, and Technology Describes atomic level epitaxial deposition and other low temperature growth techniques Presents both the development of thermal and lattice mismatched streams as the techniques used to characterize the structural properties of these materials Presents in-depth discussion of the epitaxial growth techniques associated with silicone silicone-based materials, compound semiconductors, semiconducting nitrides, and refractory materials
Author : Bi-Ke Yang
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (392 download)
Download or read book Low Temperature Epitaxial Growth of Ge-C and Ge-Si-C Alloy Thin Films written by Bi-Ke Yang and published by . This book was released on 1998 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
![Download Nucleation, Epitaxial Growth, and Characterization of [beta]-SiC Thin Films on Si by Rapid Thermal Chemical Vapor Deposition PDF Online Free](https://books.google.com/books/content/images/frontcover/TWLutgAACAAJ?fife=w200-h370)
Author : JiPing Li
Publisher :
ISBN 13 :
Total Pages : 278 pages
Book Rating : 4.:/5 (323 download)
Download or read book Nucleation, Epitaxial Growth, and Characterization of [beta]-SiC Thin Films on Si by Rapid Thermal Chemical Vapor Deposition written by JiPing Li and published by . This book was released on 1994 with total page 278 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Takashi Hariu
Publisher : World Scientific
ISBN 13 : 9789971508395
Total Pages : 356 pages
Book Rating : 4.5/5 (83 download)
Download or read book Low Temperature Epitaxial Growth of Semiconductors written by Takashi Hariu and published by World Scientific. This book was released on 1991 with total page 356 pages. Available in PDF, EPUB and Kindle. Book excerpt: Low temperature processes for semiconductors have been recently under intensive development to fabricate controlled device structures with minute dimensions in order to achieve the highest device performance and new device functions as well as high integration density. Comprising reviews by experts long involved in the respective pioneering work, this volume makes a useful contribution toward maturing the process of low temperature epitaxy as a whole.
Download or read book Growth Via Low Pressure Metalorganic Vapor PhaseEpitaxy and Surface Characterization of GaN and In(x)Ga(1-x)N Thin Films written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: he purpose of the research presented herein has been to determine the underlyingmechanisms of and to optimize the growth parameters for the growth of smooth surfaceson InGaN and GaN thin films via metalorganic vapor phase epitaxy. Relationshipsamong dislocation density, film thickness, flow rates of the reactants, kinetic growthregime, and thermodynamic growth mode with the surface morphology and surfaceroughness were determined. The two chief parameters affecting template surface roughness in both growth of GaN above 1000 & deg;C were determined to be temperature and layer thickness. An optimumtemperature of 1020 & deg;C was found for the former process, below which the islands formedin the growth on AlN buffer layers did not coalesce properly, and above which a hillockgrowth instability was pervasive on the surface. Increasing the GaN film depositiontemperature to 1100 & deg;C for GaN film deposition via PE enhanced sidewall growth;however, surface roughness was increased on the (0001) growth plane through theformation of hillocks. Template thickness above 2.5 microns had the lowest root mean squaresurface roughness of 0.48nm over 100 square microns. This was attributed to reductions indislocation density, as measured by corresponding 50% reductions in symmetric andasymmetric full width half maximum values of X-ray rocking curves. GaN films were grown at 780 & deg;C to remove the influence of indium incorporationon the surface roughness. V-defects covered the surface at a density of 2E9 per square centimeter andwere linked with a boundary dragging effect. Growth parameters that affect Inincorporation into the InGaN films were investigated and measured using roomtemperature photoluminescence, x-ray diffraction, and x-ray photoelectron spectroscopy. Temperature and growth rate had the greatest effect on incorporation over the range of760 to 820 & deg;C and 25 and 180nm/hr, respectively, through kinetically limiting InNdecomposition. Additions of In into the GaN film produced h.
Author : Ashish Garg
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (16 download)
Download or read book Growth and Characterization of Epitaxial Oxide Thin Films written by Ashish Garg and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Epitaxial oxide thin films are used in many technologically important device applications. This work deals with the deposition and characterization of epitaxial WO3 and SrBi2Ta2O9 (SBT) thin films on single crystal oxide substrates. WO3 thin films were chosen as a subject of study because of recent findings of superconductivity at surfaces and twin boundaries in the bulk form of this oxide. Highly epitaxial thin films would be desirable in order to be able to create a device within a film without patterning it, by locally creating superconducting regions (e.g. twins) within an otherwise defect free film by reducing or doping the film with Na. Films were deposited by reactive magnetron sputtering at various temperatures on single crystal SrTiO3 (100) and R-sapphire substrates. X-ray diffraction studies showed that the optimised films were highly (001) oriented, quality of epitaxy improving with decreasing deposition temperature. AFM studies revealed columnar growth of these films. Films were heat treated with Na vapour in order to reduce or dope them with Na. Low temperature measurements of the reduced films did not show existence of any superconductivity. SBT is a ferroelectric oxide and its thin films are attractive candidates for non-volatile ferroelectric random access memory (FRAM) applications. High structural anisotropy leads to a high degree of anisotropy in its ferroelectric properties which makes it essential to study epitaxial SBT films of different orientations. In this study, SBT films of different orientations were deposited on different single crystal substrates by pulsed laser ablation. Highly epitaxial c-axis oriented and smooth SBT films were deposited on SrTiO3 (100) substrates. AFM studies revealed the growth of these films by 3-D Stranski-Krastanov mode. However, these films did not exhibit any ferroelectric activity. Highly epitaxial (116)-oriented films were deposited on SrTiO3 (110) substrates. These films were also very smooth with root mean square (RMS) roughness of 15-20 Å. Films deposited on TiO2 (110) were partially a-/b-axis oriented and showed the formation of c-axis oriented SBT and many impurities. Completely a-/b-axis oriented SBT films were deposited on LaSrAlO4 (110) substrates. Films deposited at non-optimal growth temperatures showed the formation of many impurities. Attempts were also made towards depositing Sr2RuO4 films on LaSrAlO4 (110) substrates, which can act as a bottom electrode for ferroelectric SBT films.
Download or read book Growth and Characterization of Epitaxial ZnO Thin Films on GaN(0001) Epilayers and ZnO{0001} Substrates Using Metalorganic Chemical Vapor Depositon written by and published by . This book was released on 2004 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: ZnO thin films were produced on GaN(0001) epilayers and ZnO(0001) substrates utilizing an iterative process requiring a structured low temperature (480 & deg;C) layer followed by a high temperature (800 & deg;C) densification step to create approximately 200 nm of contiguous film. This process is subsequently repeated to achieve thicker films with each iteration producing approximately 200 nm of dense film. Diethylzinc was used as the zinc source, UHP oxygen (O2) as the oxygen source, and UHP argon as both the carrier and diluent gas. Nitrous (N2O) and nitric oxide (NO2) were also used both as potential oxygen sources in the pure state as well as mixed with oxygen in the chamber and for nitrogen doping of the growing film. Major impurities of C, H, and N were incorporated into the films with the majority of the incorporation occurring during the low temperature step. Films grown using N2O + O2 contained an average of 5 x 1017 cm-3 atomic nitrogen while films using NO2 + O2 had an average nitrogen concentrations of 9 x 1019 cm-3. Needle microstructures were observed for low temperature layers using O2 and N2O + O2, while networked structures formed when using NO2 + O2. The surface of the densified films contained hexagonal pits that increased in number and depth with an increase in film thickness. Triple-axis XRD measurements indicated that the crystal structure of the films mimic the underlying substrates. A comparative analysis of undoped and N-doped films using capacitance voltage and photoluminescence measurements showed that the N-doped films were more insulating than the undoped films and the incorporation of nitrogen decreases the amount of excitonic peaks observed in the PL spectra. The 3.367 eV ionized donor bound exciton becomes dominant in N-doped films relative to the 3.361 eV donor bound exciton that dominates the undoped films. A preliminary inductively coupled plasma etching study determined that the smoothest sidewalls and surfaces were obtained using an.
Author : Shengxi Duan
Publisher :
ISBN 13 :
Total Pages : 142 pages
Book Rating : 4.:/5 (319 download)
Download or read book Epitaxial Growth and Characterization of Thin Films and Superlattices of Wide Band Gap II-VI Semiconductors Grown by Pulsed Laser Deposition written by Shengxi Duan and published by . This book was released on 1994 with total page 142 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Brian Paul Wagner
Publisher :
ISBN 13 :
Total Pages : 70 pages
Book Rating : 4.:/5 (622 download)
Download or read book Conventional and Pendeo-epitaxial Growth of Non-polar GaN(11-20) Thin Films on AlN/4H-SiC(11-20) Substrates and Their Characterization and Reduction in Defect Density written by Brian Paul Wagner and published by . This book was released on 2005 with total page 70 pages. Available in PDF, EPUB and Kindle. Book excerpt: Keywords: Thin Film Growth, Non-polar GaN, Growth Rates, Pendeo-Epitaxy, MOVPE, AFM, Defect Density Reduction, TEM, SEM.
Author : Andrew David Hanser
Publisher :
ISBN 13 :
Total Pages : 366 pages
Book Rating : 4.:/5 (46 download)
Download or read book Growth Via Low Pressure Metalorganic Vapor Phase Epitaxy and Characterization of GaN and In(subscript X)Ga(subscript 1-x)N Thin Films written by Andrew David Hanser and published by . This book was released on 1998 with total page 366 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Peter Quinn Miraglia
Publisher :
ISBN 13 :
Total Pages : 176 pages
Book Rating : 4.:/5 (473 download)
Download or read book Growth Via Low Pressure Metalorganic Vapor Phase Epitaxy and Surface Characterization of GaN and In(x)Ga(1-x)N Thin Films written by Peter Quinn Miraglia and published by . This book was released on 2001 with total page 176 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : B Gil
Publisher : World Scientific
ISBN 13 : 9814548421
Total Pages : 714 pages
Book Rating : 4.8/5 (145 download)
Download or read book Semiconductor Heteroepitaxy: Growth Characterization And Device Applications written by B Gil and published by World Scientific. This book was released on 1995-12-15 with total page 714 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book develops the mathematics of differential geometry in a way more intelligible to physicists and other scientists interested in this field. This book is basically divided into 3 levels; level 0, the nearest to intuition and geometrical experience, is a short summary of the theory of curves and surfaces; level 1 repeats, comments and develops upon the traditional methods of tensor algebra analysis and level 2 is an introduction to the language of modern differential geometry. A final chapter (chapter IV) is devoted to fibre bundles and their applications to physics. Exercises are provided to amplify the text material.
Author :
Publisher :
ISBN 13 :
Total Pages : 704 pages
Book Rating : 4.:/5 (31 download)
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Woo
Publisher : CRC Press
ISBN 13 : 9780750303422
Total Pages : 1352 pages
Book Rating : 4.3/5 (34 download)
Download or read book Compound Semiconductors 1995, Proceedings of the Twenty-Second INT Symposium on Compound Semiconductors held in Cheju Island, Korea, 28 August-2 September, 1995 written by Woo and published by CRC Press. This book was released on 1996-04-25 with total page 1352 pages. Available in PDF, EPUB and Kindle. Book excerpt: Compound Semiconductors 1995 focuses on emerging applications for GaAs and other compound semiconductors, such as InP, GaN, GaSb, ZnSe, and SiC, in the electronics and optoelectronics industries. The book presents the research and development work in all aspects of compound semiconductors. It reflects the maturity of GaAs as a semiconductor material and the rapidly increasing pool of research information on many other compound semiconductors. Covering the full breadth of the subject, from growth through processing to devices and integrated circuits, this volume provides researchers in materials science, device physics, condensed matter physics, and electrical and electronic engineering with a comprehensive overview of developments in this well-established research area.
Author : Henry Kressel
Publisher : Elsevier Science & Technology
ISBN 13 :
Total Pages : 236 pages
Book Rating : 4.3/5 (91 download)
Download or read book Characterization of Epitaxial Semiconductor Films written by Henry Kressel and published by Elsevier Science & Technology. This book was released on 1976 with total page 236 pages. Available in PDF, EPUB and Kindle. Book excerpt:
