Low Pressure Chemical Vapor Deposition Of Silicon Nitride

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Principles of Chemical Vapor Deposition

Author : Daniel Dobkin
Publisher : Springer Science & Business Media
ISBN 13 : 9781402012488
Total Pages : 298 pages
Book Rating : 4.0/5 (124 download)

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Book Synopsis Principles of Chemical Vapor Deposition by : Daniel Dobkin

Download or read book Principles of Chemical Vapor Deposition written by Daniel Dobkin and published by Springer Science & Business Media. This book was released on 2003-04-30 with total page 298 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.

Polarization Effects in Semiconductors

Author : Debdeep Jena
Publisher : Springer Science & Business Media
ISBN 13 : 0387368310
Total Pages : 523 pages
Book Rating : 4.3/5 (873 download)

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Book Synopsis Polarization Effects in Semiconductors by : Debdeep Jena

Download or read book Polarization Effects in Semiconductors written by Debdeep Jena and published by Springer Science & Business Media. This book was released on 2008 with total page 523 pages. Available in PDF, EPUB and Kindle. Book excerpt: Polarization Effects in Semiconductors: From Ab Initio Theory to Device Applications presents the latest understanding of the solid state physics, electronic implications and practical applications of the unique spontaneous or pyro-electric polarization charge of wurtzite compound semiconductors, and associated piezo-electric effects in strained thin film heterostructures. These heterostructures are used in wide band gap semiconductor based sensors, in addition to various electronic and opto-electronic semiconductor devices. The book covers the ab initio theory of polarization in cubic and hexagonal semiconductors, growth of thin film GaN, GaN/AlGaN GaAlN/ AlGaInN, and other nitrides, and SiC heterostructures. It discusses the effects of spontaneous and piezoelectric polarization on band diagrams and electronic properties of abrupt and compositionally graded heterostructures, electronic characterization of polarization-induced charge distributions by scanning-probe spectroscopies, and gauge factors and strain effects. In addition, polarization in extended defects, piezo-electric strain/charge engineering, and application to device design and processing are covered. The effects of polarization on the fundamental electron transport properties, and on the basic optical transitions are described. The crucial role of polarization in devices such as high electron mobility transistors (HEMTs) and light-emitting diodes (LEDs) is covered. The chapters are authored by professors and researchers in the fields of physics, applied physics and electrical engineering, who worked for 5 years under the "Polarization Effects in Semiconductors" DOD funded Multi Disciplinary University Research Initiative. This book will be of interest to graduate students and researchers working in the field of wide-bandgap semiconductor physics and their device applications. It will also be useful for practicing engineers in the field of wide-bandgap semiconductor device research and development.

Photovoltaic Solar Energy

Author : Angèle Reinders
Publisher : John Wiley & Sons
ISBN 13 : 111892746X
Total Pages : 755 pages
Book Rating : 4.1/5 (189 download)

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Book Synopsis Photovoltaic Solar Energy by : Angèle Reinders

Download or read book Photovoltaic Solar Energy written by Angèle Reinders and published by John Wiley & Sons. This book was released on 2017-02-06 with total page 755 pages. Available in PDF, EPUB and Kindle. Book excerpt: Solar PV is now the third most important renewable energy source, after hydro and wind power, in terms of global installed capacity. Bringing together the expertise of international PV specialists Photovoltaic Solar Energy: From Fundamentals to Applications provides a comprehensive and up-to-date account of existing PV technologies in conjunction with an assessment of technological developments. Key features: Written by leading specialists active in concurrent developments in material sciences, solar cell research and application-driven R&D. Provides a basic knowledge base in light, photons and solar irradiance and basic functional principles of PV. Covers characterization techniques, economics and applications of PV such as silicon, thin-film and hybrid solar cells. Presents a compendium of PV technologies including: crystalline silicon technologies; chalcogenide thin film solar cells; thin-film silicon based PV technologies; organic PV and III-Vs; PV concentrator technologies; space technologies and economics, life-cycle and user aspects of PV technologies. Each chapter presents basic principles and formulas as well as major technological developments in a contemporary context with a look at future developments in this rapidly changing field of science and engineering. Ideal for industrial engineers and scientists beginning careers in PV as well as graduate students undertaking PV research and high-level undergraduate students.

Carbide, Nitride and Boride Materials Synthesis and Processing

Author : A.W. Weimer
Publisher : Springer Science & Business Media
ISBN 13 : 9400900716
Total Pages : 675 pages
Book Rating : 4.4/5 (9 download)

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Book Synopsis Carbide, Nitride and Boride Materials Synthesis and Processing by : A.W. Weimer

Download or read book Carbide, Nitride and Boride Materials Synthesis and Processing written by A.W. Weimer and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 675 pages. Available in PDF, EPUB and Kindle. Book excerpt: Carbide, Nitride and Boride Materials Synthesis and Processing is a major reference text addressing methods for the synthesis of non-oxides. Each chapter has been written by an expert practising in the subject area, affiliated with industry, academia or government research, thus providing a broad perspective of information for the reader. The subject matter ranges from materials properties and applications to methods of synthesis including pre- and post-synthesis processing. Although most of the text is concerned with the synthesis of powders, chapters are included for other materials such as whiskers, platelets, fibres and coatings. Carbide, Nitride and Boride Materials Synthesis and Processing is a comprehensive overview of the subject and is suitable for practitioners in the industry as well as those looking for an introduction to the field. It will be of interest to chemical, mechanical and ceramic engineers, materials scientists and chemists in both university and industrial environments working on or with refractory carbides, nitrides and borides.

Gallium Oxide

Author : Masataka Higashiwaki
Publisher : Springer Nature
ISBN 13 : 3030371530
Total Pages : 768 pages
Book Rating : 4.0/5 (33 download)

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Book Synopsis Gallium Oxide by : Masataka Higashiwaki

Download or read book Gallium Oxide written by Masataka Higashiwaki and published by Springer Nature. This book was released on 2020-04-23 with total page 768 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides comprehensive coverage of the new wide-bandgap semiconductor gallium oxide (Ga2O3). Ga2O3 has been attracting much attention due to its excellent materials properties. It features an extremely large bandgap of greater than 4.5 eV and availability of large-size, high-quality native substrates produced from melt-grown bulk single crystals. Ga2O3 is thus a rising star among ultra-wide-bandgap semiconductors and represents a key emerging research field for the worldwide semiconductor community. Expert chapters cover physical properties, synthesis, and state-of-the-art applications, including materials properties, growth techniques of melt-grown bulk single crystals and epitaxial thin films, and many types of devices. The book is an essential resource for academic and industry readers who have an interest in, or plan to start, a new R&D project related to Ga2O3.

Catalytic Chemical Vapor Deposition

Author : Hideki Matsumura
Publisher : John Wiley & Sons
ISBN 13 : 352734523X
Total Pages : 438 pages
Book Rating : 4.5/5 (273 download)

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Book Synopsis Catalytic Chemical Vapor Deposition by : Hideki Matsumura

Download or read book Catalytic Chemical Vapor Deposition written by Hideki Matsumura and published by John Wiley & Sons. This book was released on 2019-08-05 with total page 438 pages. Available in PDF, EPUB and Kindle. Book excerpt: The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology. This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications. Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD) Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles Presents comparisons of different Cat-CVD methods which are usually not found in research papers Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry. Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.

Silicon Nitride and Silicon Dioxide Thin Insulating Films VII

Author : Electrochemical Society. Meeting
Publisher : The Electrochemical Society
ISBN 13 : 9781566773478
Total Pages : 652 pages
Book Rating : 4.7/5 (734 download)

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Book Synopsis Silicon Nitride and Silicon Dioxide Thin Insulating Films VII by : Electrochemical Society. Meeting

Download or read book Silicon Nitride and Silicon Dioxide Thin Insulating Films VII written by Electrochemical Society. Meeting and published by The Electrochemical Society. This book was released on 2003 with total page 652 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Handbook of Chemical Vapor Deposition

Author : Hugh O. Pierson
Publisher : William Andrew
ISBN 13 : 0815517432
Total Pages : 507 pages
Book Rating : 4.8/5 (155 download)

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Book Synopsis Handbook of Chemical Vapor Deposition by : Hugh O. Pierson

Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 1999-09-01 with total page 507 pages. Available in PDF, EPUB and Kindle. Book excerpt: Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.

Proceedings of the Third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films

Author : Vikram J. Kapoor
Publisher : The Electrochemical Society
ISBN 13 : 9781566770484
Total Pages : 644 pages
Book Rating : 4.7/5 (74 download)

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Book Synopsis Proceedings of the Third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films by : Vikram J. Kapoor

Download or read book Proceedings of the Third Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films written by Vikram J. Kapoor and published by The Electrochemical Society. This book was released on 1994 with total page 644 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Silicon Nitride and Silicon Dioxide Thin Insulating Films

Author :
Publisher :
ISBN 13 :
Total Pages : 660 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Silicon Nitride and Silicon Dioxide Thin Insulating Films by :

Download or read book Silicon Nitride and Silicon Dioxide Thin Insulating Films written by and published by . This book was released on 2003 with total page 660 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Handbook of Chemicals and Gases for the Semiconductor Industry

Author : Ashutosh Misra
Publisher : John Wiley & Sons
ISBN 13 : 0471316717
Total Pages : 386 pages
Book Rating : 4.4/5 (713 download)

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Book Synopsis Handbook of Chemicals and Gases for the Semiconductor Industry by : Ashutosh Misra

Download or read book Handbook of Chemicals and Gases for the Semiconductor Industry written by Ashutosh Misra and published by John Wiley & Sons. This book was released on 2002-03-22 with total page 386 pages. Available in PDF, EPUB and Kindle. Book excerpt: The first comprehensive guide to the chemicals and gases used in semiconductor manufacturing The fabrication of semiconductor devices involves a series of complex chemical processes such as photolithography, etching, cleaning, thin film deposition, and polishing. Until now, there has been no convenient source of information on the properties, applications, and health and safety considerations of the chemicals used in these processes. The Handbook of Chemicals and Gases for the Semiconductor Industry meets this need. Each of the Handbook's eight chapters is related to a specific area of semiconductor processing. The authors provide a brief overview of each step in the process, followed by tables containing physical properties, handling, safety, and other pertinent information on chemicals and gases typically used in these processes. The 270 chemical and gas entries include data on physical properties, emergency treatment procedures, waste disposal, and incompatible materials, as well as descriptions of applications, chemical mechanisms involved, and references to the literature. Appendices cross-reference entries by process, chemical name, and CAS number. The Handbook's eight chapters are: Thin Film Deposition Materials Wafer Cleaning Materials Photolithography Materials Wet and Dry Etching Materials Chemical Mechanical Planarizing Methods Carrier Gases Uncategorized Materials Semiconductor Chemicals Analysis No other single source brings together these useful and important data on chemicals and gases used in the manufacture of semiconductor devices. The Handbook of Chemicals and Gases for the Semiconductor Industry will be a valuable reference for process engineers, scientists, suppliers to the semiconductor industry, microelectronics researchers, and students.

Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition

Author : Theodore M. Besmann
Publisher : The Electrochemical Society
ISBN 13 : 9781566771559
Total Pages : 922 pages
Book Rating : 4.7/5 (715 download)

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Book Synopsis Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition by : Theodore M. Besmann

Download or read book Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition written by Theodore M. Besmann and published by The Electrochemical Society. This book was released on 1996 with total page 922 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Principles of Chemical Vapor Deposition

Author : D.M. Dobkin
Publisher : Springer Science & Business Media
ISBN 13 : 9401703698
Total Pages : 277 pages
Book Rating : 4.4/5 (17 download)

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Book Synopsis Principles of Chemical Vapor Deposition by : D.M. Dobkin

Download or read book Principles of Chemical Vapor Deposition written by D.M. Dobkin and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 277 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.

Silicon Nitride and Silicon Dioxide Thin Insulating Films

Author : Electrochemical Society. Dielectric Science and Technology Division
Publisher : The Electrochemical Society
ISBN 13 : 9781566773133
Total Pages : 304 pages
Book Rating : 4.7/5 (731 download)

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Book Synopsis Silicon Nitride and Silicon Dioxide Thin Insulating Films by : Electrochemical Society. Dielectric Science and Technology Division

Download or read book Silicon Nitride and Silicon Dioxide Thin Insulating Films written by Electrochemical Society. Dielectric Science and Technology Division and published by The Electrochemical Society. This book was released on 2001 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

Author : Y. Pauleau
Publisher : Springer Science & Business Media
ISBN 13 : 940100353X
Total Pages : 372 pages
Book Rating : 4.4/5 (1 download)

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Book Synopsis Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies by : Y. Pauleau

Download or read book Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies written by Y. Pauleau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 372 pages. Available in PDF, EPUB and Kindle. Book excerpt: An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.

Synthesis and Properties of Boron Nitride

Author : J.J. Pouch
Publisher : Trans Tech Publications Ltd
ISBN 13 : 3035704511
Total Pages : 421 pages
Book Rating : 4.0/5 (357 download)

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Book Synopsis Synthesis and Properties of Boron Nitride by : J.J. Pouch

Download or read book Synthesis and Properties of Boron Nitride written by J.J. Pouch and published by Trans Tech Publications Ltd. This book was released on 1990-01-01 with total page 421 pages. Available in PDF, EPUB and Kindle. Book excerpt: Boron nitride thin films can be deposited on different substrates using techniques such as plasma deposition, ion beam deposition and reactive sputter deposition.

Handbook of Thin Film Deposition

Author : Krishna Seshan
Publisher : William Andrew
ISBN 13 : 1437778739
Total Pages : 412 pages
Book Rating : 4.4/5 (377 download)

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Book Synopsis Handbook of Thin Film Deposition by : Krishna Seshan

Download or read book Handbook of Thin Film Deposition written by Krishna Seshan and published by William Andrew. This book was released on 2012-06-27 with total page 412 pages. Available in PDF, EPUB and Kindle. Book excerpt: Resumen: The 2nd edition contains new chapters on contamination and contamination control that describe the basics and the issues. Another new chapter on meteorology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together physical vapor deposition techniques. Two entirely new areas are focused on: chemical mechanical polishing, which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.