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Author : M. Garfinkel
Publisher :
ISBN 13 :
Total Pages : 92 pages
Book Rating : 4.F/5 ( download)
Download or read book Floating substrate process written by M. Garfinkel and published by . This book was released on 1976 with total page 92 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : M. Garfinkel
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (252 download)
Download or read book Floating substrate process written by M. Garfinkel and published by . This book was released on 1979 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : M. Garfinkel
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (88 download)
Download or read book Floating Substrate Process written by M. Garfinkel and published by . This book was released on 1977 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Floating Substrate Process Large-area Silicon Task, Low-cost Solar Array Project written by and published by . This book was released on 1978 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Floating Substrate Process. Second Quarterly Progress Report, March 29, 1976--June 20, 1976 written by and published by . This book was released on 1976 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This research program began January 6, 1976. Its objective is to demonstrate the feasibility of the floating substrate sheet growth process for the growth of silicon sheet. This process is an approach to the formation of single-crystal silicon by direct epitaxial conversion from a gaseous silane. Incoming feedstock gas impinges upon a silicon substrate which is floating upon a thin pool of liquid tin. Single-crystal silicon grows to the desired thickness by means of vapor phase epitaxy. Nucleation of fresh substrate silicon takes place by rapid growth from the edge of the growing sheet into a region at the surface of the liquid tin which is supersaturated in the silicon. The process lends itself to continuous operation with the growing sheet being continuously withdrawn from the growth zone. (WDM).
Download or read book Floating Substrate Process. Large-Area Silicon Sheet Task, Low-Cost Solar Array Project. Final Report written by and published by . This book was released on 1978 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The work described was directed toward the demonstration of the practical feasibility of the Floating Substrate Process for the growth of silicon sheet. Supercooling of silicon--tin alloy melts was studied. Values as high as 78°C at 1100°C and 39°C at 1200°C were observed, corresponding to supersaturation parameter values 0.025 and 0.053 at 1050°C and 1150°C, respectively. The interaction of tin with silane gas streams was investigated over the temperature range 1000 to 1200°C. Single-pass conversion efficiencies exceeding 30% were obtained. The growth habit of spontaneously-nucleated surface growth was determined to be consistent with dendritic and web growth from 111 singly-twinned triangular nucleii. Surface growth of interlocking silicon crystals, thin enough to follow the surface of the liquid and with growth velocity as high as 5 mm/min, was obtained. Large area single-crystal growth along the melt surface was not achieved. Small single-crystal surface growth was obtained which did not propagate beyond a few millimeters. The probable reason for the polycrystalline growth is the poisoning of the growth interface by impurities.
Author : Yves Pauleau
Publisher : Elsevier
ISBN 13 : 0080458963
Total Pages : 745 pages
Book Rating : 4.0/5 (84 download)
Download or read book Materials Surface Processing by Directed Energy Techniques written by Yves Pauleau and published by Elsevier. This book was released on 2006-04-25 with total page 745 pages. Available in PDF, EPUB and Kindle. Book excerpt: The current status of the science and technology related to coatings, thin films and surface modifications produced by directed energy techniques is assessed in Materials Surface Processing by Directed Energy Techniques. The subject matter is divided into 20 chapters - each presented at a tutorial level – rich with fundamental science and experimental results. New trends and new results are also evoked to give an overview of future developments and applications. Provides a broad overview on modern coating and thin film deposition techniques, and their applications Presents and discusses various problems of physics and chemistry involved in the production, characterization and applications of coatings and thin films Each chapter includes experimental results illustrating various models, mechanisms or theories
Download or read book Floating Substrate Process. First Quarterly Progress Report, January 6, 1976--March 28, 1976 written by and published by . This book was released on 1976 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Laboratory apparatus has been designed, built, and put into operation to study the supercooling of Sn--Si melts and the uptake of silicon from silanes. Values of supercooling of Sn--Si melts as high as 78°C at 1100°C and 39°C at 1200°C have been observed. Results to date have been limited by nucleation caused by foreign material floating on the surface of the melt. Spontaneously nucleated planar platelet growth has been observed at the Sn--Si supercooled surface having growth rates of approximately 0.5 cm/min. Homogeneous nucleation of silane decomposition has been studied at 1015°C and 1135°C. The flow rates of HCl required to suppress gas phase decomposition have been determined for silane flow rates up to 4.5 x 10−3 mole/min. Initial silicon uptake experiments have shown that at least 20 percent of the incoming silicon contained in a flowing silane gas stream can be incorporated into liquid tin at 1040°C.
Author : Donald M. Mattox
Publisher : William Andrew
ISBN 13 : 0815520387
Total Pages : 793 pages
Book Rating : 4.8/5 (155 download)
Download or read book Handbook of Physical Vapor Deposition (PVD) Processing written by Donald M. Mattox and published by William Andrew. This book was released on 2010-04-29 with total page 793 pages. Available in PDF, EPUB and Kindle. Book excerpt: This updated version of the popular handbook further explains all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the new edition remains on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications, with additional information to support the original material. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called "war stories", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language. Fully revised and updated to include the latest developments in PVD process technology ‘War stories’ drawn from the author’s extensive experience emphasize important points in development and manufacturing Appendices include listings of periodicals and professional societies, terms and acronyms, and material on transferring technology between R&D and manufacturing
Author : David Louis Harame
Publisher : The Electrochemical Society
ISBN 13 : 9781566774208
Total Pages : 1242 pages
Book Rating : 4.7/5 (742 download)
Download or read book SiGe--materials, Processing, and Devices written by David Louis Harame and published by The Electrochemical Society. This book was released on 2004 with total page 1242 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : C. Claeys
Publisher : The Electrochemical Society
ISBN 13 : 1566777445
Total Pages : 547 pages
Book Rating : 4.5/5 (667 download)
Download or read book ULSI Process Integration 6 written by C. Claeys and published by The Electrochemical Society. This book was released on 2009-09 with total page 547 pages. Available in PDF, EPUB and Kindle. Book excerpt: ULSI Process Integration 6 covers all aspects of process integration. Sections are devoted to 1) Device Technologies, 2) Front-end-of-line integration (gate stacks, shallow junctions, dry etching, etc.), 3) Back-end-of-line integration (CMP, low-k, Cu interconnect, air-gaps, 3D packaging, etc.), 4) Alternative channel technologies (Ge, III-V, hybrid integration), and 5) Emerging technologies (CNT, graphene, polymer electronics, nanotubes).
Author : Tegze P. Haraszti
Publisher : Springer Science & Business Media
ISBN 13 : 0306470357
Total Pages : 567 pages
Book Rating : 4.3/5 (64 download)
Download or read book CMOS Memory Circuits written by Tegze P. Haraszti and published by Springer Science & Business Media. This book was released on 2007-05-08 with total page 567 pages. Available in PDF, EPUB and Kindle. Book excerpt: CMOS Memory Circuits is a systematic and comprehensive reference work designed to aid in the understanding of CMOS memory circuits, architectures, and design techniques. CMOS technology is the dominant fabrication method and almost the exclusive choice for semiconductor memory designers. Both the quantity and the variety of complementary-metal-oxide-semiconductor (CMOS) memories are staggering. CMOS memories are traded as mass-products worldwide and are diversified to satisfy nearly all practical requirements in operational speed, power, size, and environmental tolerance. Without the outstanding speed, power, and packing density characteristics of CMOS memories, neither personal computing, nor space exploration, nor superior defense systems, nor many other feats of human ingenuity could be accomplished. Electronic systems need continuous improvements in speed performance, power consumption, packing density, size, weight, and costs. These needs continue to spur the rapid advancement of CMOS memory processing and circuit technologies. CMOS Memory Circuits is essential for those who intend to (1) understand, (2) apply, (3) design and (4) develop CMOS memories.
Author :
Publisher :
ISBN 13 :
Total Pages : 520 pages
Book Rating : 4.:/5 (3 download)
Download or read book Energy Research Abstracts written by and published by . This book was released on 1979 with total page 520 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Klaus D. Sattler
Publisher : CRC Press
ISBN 13 : 1000651738
Total Pages : 509 pages
Book Rating : 4.0/5 (6 download)
Download or read book 21st Century Nanoscience – A Handbook written by Klaus D. Sattler and published by CRC Press. This book was released on 2019-11-26 with total page 509 pages. Available in PDF, EPUB and Kindle. Book excerpt: This up-to-date reference is the most comprehensive summary of the field of nanoscience and its applications. It begins with fundamental properties at the nanoscale and then goes well beyond into the practical aspects of the design, synthesis, and use of nanomaterials in various industries. It emphasizes the vast strides made in the field over the past decade – the chapters focus on new, promising directions as well as emerging theoretical and experimental methods. The contents incorporate experimental data and graphs where appropriate, as well as supporting tables and figures with a tutorial approach.
Author :
Publisher :
ISBN 13 :
Total Pages : 874 pages
Book Rating : 4.3/5 (91 download)
Download or read book Solar Energy Update written by and published by . This book was released on 1977 with total page 874 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : United States. Patent and Trademark Office
Publisher :
ISBN 13 :
Total Pages : 1498 pages
Book Rating : 4.0/5 ( download)
Download or read book Official Gazette of the United States Patent and Trademark Office written by United States. Patent and Trademark Office and published by . This book was released on 2002 with total page 1498 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Andrew Marshall
Publisher : Morgan & Claypool Publishers
ISBN 13 : 1598299417
Total Pages : 151 pages
Book Rating : 4.5/5 (982 download)
Download or read book Mismatch and Noise in Modern IC Processes written by Andrew Marshall and published by Morgan & Claypool Publishers. This book was released on 2009 with total page 151 pages. Available in PDF, EPUB and Kindle. Book excerpt: Component variability, mismatch, and various noise effects are major contributors to design limitations in most modern IC processes. Mismatch and Noise in Modern IC Processes examines these related effects and how they affect the building block circuits of modern integrated circuits, from the perspective of a circuit designer. Variability usually refers to a large scale variation that can occur on a wafer to wafer and lot to lot basis, and over long distances on a wafer. This phenomenon is well understood and the effects of variability are included in most integrated circuit design with the use of corner or statistical component models. Mismatch, which is the emphasis of section I of the book, is a local level of variability that leaves the characteristics of adjacent transistors unmatched. This is of particular concern in certain analog and memory systems, but also has an effect on digital logic schemes, where uncertainty is introduced into delay times, which can reduce margins and introduce 'race' conditions. Noise is a dynamic effect that causes a local mismatch or variability that can vary during operation of a circuit, and is considered in section II. Noise can be the result of atomic effects in devices or circuit interactions, and both of these are discussed in terms of analog and digital circuitry. Table of Contents: Part I: Mismatch / Introduction / Variability and Mismatch in Digital Systems / Variability and Mismatch in Analog Systems I / Variability and Mismatch in Analog Systems II / Lifetime-Induced Variability / Mismatch in Nonconventional Processes / Mismatch Correction Circuits / Part II: Noise / Component and Digital Circuit Noise / Noise Effects in Digital Systems / Noise Effects in Analog Systems / Circuit Design to Minimize Noise Effects / Noise Considerations in SOI
