Flash Lamp Annealing

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Publisher :
ISBN 13 : 9783030233006
Total Pages : 304 pages
Book Rating : 4.2/5 (33 download)

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Book Synopsis Flash Lamp Annealing by : Lars Rebohle

Download or read book Flash Lamp Annealing written by Lars Rebohle and published by . This book was released on 2019 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a comprehensive survey of the technology of flash lamp annealing (FLA) for thermal processing of semiconductors. It gives a detailed introduction to the FLA technology and its physical background. Advantages, drawbacks and process issues are addressed in detail and allow the reader to properly plan and perform their own thermal processing. Moreover, this books gives a broad overview of the applications of flash lamp annealing, including a comprehensive literature survey. Several case studies of simulated temperature profiles in real material systems give the reader the necessary insight into the underlying physics and simulations. This book is a valuable reference work for both novice and advanced users.

Flash Lamp Annealing

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Author :
Publisher : Springer
ISBN 13 : 3030232999
Total Pages : 304 pages
Book Rating : 4.0/5 (32 download)

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Book Synopsis Flash Lamp Annealing by : Lars Rebohle

Download or read book Flash Lamp Annealing written by Lars Rebohle and published by Springer. This book was released on 2019-07-27 with total page 304 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a comprehensive survey of the technology of flash lamp annealing (FLA) for thermal processing of semiconductors. It gives a detailed introduction to the FLA technology and its physical background. Advantages, drawbacks and process issues are addressed in detail and allow the reader to properly plan and perform their own thermal processing. Moreover, this books gives a broad overview of the applications of flash lamp annealing, including a comprehensive literature survey. Several case studies of simulated temperature profiles in real material systems give the reader the necessary insight into the underlying physics and simulations. This book is a valuable reference work for both novice and advanced users.

Process Technology for Silicon Carbide Devices

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Author :
Publisher : IET
ISBN 13 : 9780852969984
Total Pages : 202 pages
Book Rating : 4.9/5 (699 download)

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Book Synopsis Process Technology for Silicon Carbide Devices by : Carl-Mikael Zetterling

Download or read book Process Technology for Silicon Carbide Devices written by Carl-Mikael Zetterling and published by IET. This book was released on 2002 with total page 202 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book explains why SiC is so useful in electronics, gives clear guidance on the various processing steps (growth, doping, etching, contact formation, dielectrics etc) and describes how these are integrated in device manufacture.

Advanced Short-time Thermal Processing for Si-based CMOS Devices 2

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Author :
Publisher : The Electrochemical Society
ISBN 13 : 9781566774062
Total Pages : 444 pages
Book Rating : 4.7/5 (74 download)

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Book Synopsis Advanced Short-time Thermal Processing for Si-based CMOS Devices 2 by : Mehmet C. Öztürk

Download or read book Advanced Short-time Thermal Processing for Si-based CMOS Devices 2 written by Mehmet C. Öztürk and published by The Electrochemical Society. This book was released on 2004 with total page 444 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Advanced Short-time Thermal Processing for Si-based CMOS Devices

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Author :
Publisher : The Electrochemical Society
ISBN 13 : 9781566773966
Total Pages : 488 pages
Book Rating : 4.7/5 (739 download)

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Book Synopsis Advanced Short-time Thermal Processing for Si-based CMOS Devices by : Fred Roozeboom

Download or read book Advanced Short-time Thermal Processing for Si-based CMOS Devices written by Fred Roozeboom and published by The Electrochemical Society. This book was released on 2003 with total page 488 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Advanced Strategies in Thin Film Engineering by Magnetron Sputtering

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Author :
Publisher : MDPI
ISBN 13 : 3039364294
Total Pages : 148 pages
Book Rating : 4.0/5 (393 download)

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Book Synopsis Advanced Strategies in Thin Film Engineering by Magnetron Sputtering by : Alberto Palmero

Download or read book Advanced Strategies in Thin Film Engineering by Magnetron Sputtering written by Alberto Palmero and published by MDPI. This book was released on 2020-12-10 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent years have witnessed the flourishing of numerous novel strategies based on the magnetron sputtering technique aimed at the advanced engineering of thin films, such as HiPIMS, combined vacuum processes, the implementation of complex precursor gases or the inclusion of particle guns in the reactor, among others. At the forefront of these approaches, investigations focused on nanostructured coatings appear today as one of the priorities in many scientific and technological communities: The science behind them appears in most of the cases as a "terra incognita", fascinating both the fundamentalist, who imagines new concepts, and the experimenter, who is able to create and study new films with as of yet unprecedented performances. These scientific and technological challenges, along with the existence of numerous scientific issues that have yet to be clarified in classical magnetron sputtering depositions (e.g., process control and stability, nanostructuration mechanisms, connection between film morphology and properties or upscaling procedures from the laboratory to industrial scales) have motivated us to edit a specialized volume containing the state-of-the art that put together these innovative fundamental and applied research topics. These include, but are not limited to: • Nanostructure-related properties; • Atomistic processes during film growth; • Process control, process stability, and in situ diagnostics; • Fundamentals and applications of HiPIMS; • Thin film nanostructuration phenomena; • Tribological, anticorrosion, and mechanical properties; • Combined procedures based on the magnetron sputtering technique; • Industrial applications; • Devices.

Subsecond Annealing of Advanced Materials

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Publisher : Springer Science & Business Media
ISBN 13 : 3319031317
Total Pages : 330 pages
Book Rating : 4.3/5 (19 download)

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Book Synopsis Subsecond Annealing of Advanced Materials by : Wolfgang Skorupa

Download or read book Subsecond Annealing of Advanced Materials written by Wolfgang Skorupa and published by Springer Science & Business Media. This book was released on 2013-12-16 with total page 330 pages. Available in PDF, EPUB and Kindle. Book excerpt: The thermal processing of materials ranges from few fem to seconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes the solid phase and/or liquid phase processing of elemental and compound semiconductors, dielectric composites and organic materials.

Advanced Gate Stack, Source/drain and Channel Engineering for Si-based CMOS

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Author :
Publisher :
ISBN 13 :
Total Pages : 658 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis Advanced Gate Stack, Source/drain and Channel Engineering for Si-based CMOS by :

Download or read book Advanced Gate Stack, Source/drain and Channel Engineering for Si-based CMOS written by and published by . This book was released on 2005 with total page 658 pages. Available in PDF, EPUB and Kindle. Book excerpt:

High Purity and High Mobility Semiconductors 13

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Publisher : The Electrochemical Society
ISBN 13 : 1607685485
Total Pages : 315 pages
Book Rating : 4.6/5 (76 download)

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Book Synopsis High Purity and High Mobility Semiconductors 13 by : E. Simoen

Download or read book High Purity and High Mobility Semiconductors 13 written by E. Simoen and published by The Electrochemical Society. This book was released on 2014 with total page 315 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Silicon Devices and Process Integration

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Publisher : Springer Science & Business Media
ISBN 13 : 0387690107
Total Pages : 614 pages
Book Rating : 4.3/5 (876 download)

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Book Synopsis Silicon Devices and Process Integration by : Badih El-Kareh

Download or read book Silicon Devices and Process Integration written by Badih El-Kareh and published by Springer Science & Business Media. This book was released on 2009-01-09 with total page 614 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon Devices and Process Integration covers state-of-the-art silicon devices, their characteristics, and their interactions with process parameters. It serves as a comprehensive guide which addresses both the theoretical and practical aspects of modern silicon devices and the relationship between their electrical properties and processing conditions. The book is compiled from the author’s industrial and academic lecture notes and reflects years of experience in the development of silicon devices. Features include: A review of silicon properties which provides a foundation for understanding the device properties discussion, including mobility-enhancement by straining silicon; State-of-the-art technologies on high-K gate dielectrics, low-K dielectrics, Cu interconnects, and SiGe BiCMOS; CMOS-only applications, such as subthreshold current and parasitic latch-up; Advanced Enabling processes and process integration. This book is written for engineers and scientists in semiconductor research, development and manufacturing. The problems at the end of each chapter and the numerous charts, figures and tables also make it appropriate for use as a text in graduate and advanced undergraduate courses in electrical engineering and materials science.

Crystal Growth of Silicon for Solar Cells

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Publisher : Springer Science & Business Media
ISBN 13 : 3642020445
Total Pages : 259 pages
Book Rating : 4.6/5 (42 download)

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Book Synopsis Crystal Growth of Silicon for Solar Cells by : Kazuo Nakajima

Download or read book Crystal Growth of Silicon for Solar Cells written by Kazuo Nakajima and published by Springer Science & Business Media. This book was released on 2010-03-12 with total page 259 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book, a continuation of the series “Advances in Materials Research,” is intended to provide the general basis of the science and technology of crystal growth of silicon for solar cells. In the face of the destruction of the global environment,the degradationofworld-widenaturalresourcesandtheexha- tion of energy sources in the twenty-?rst century, we all have a sincere desire for a better/safer world in the future. In these days, we strongly believe that it is important for us to rapidly developanewenvironment-friendlycleanenergyconversionsystemusingsolar energyastheultimatenaturalenergysource. Forinstance,mostofournatural resources and energy sources will be exhausted within the next 100 years. Speci?cally, the consumption of oil, natural gas, and uranium is a serious problem. Solar energy is the only ultimate natural energy source. Although 30% of total solar energy is re?ected at the earth’s surface, 70% of total solar energy can be available for us to utilize. The available solar energy amounts to severalthousand times larger than the world’s energy consumption in 2000 of about 9,000 Mtoe (M ton oil equivalent). To manage 10% of the world’s energy consumption at 2050 by solar energy, we must manufacture 40 GW solar cells per year continuously for 40 years. The required silicon feedstock is about 400,000 ton per year. We believe that this is an attainable target, since it can be realized by increasing the world production of silicon feedstock by 12times asmuchasthe presentproductionat2005.

Advanced Rare Earth-Based Ceramic Nanomaterials

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Publisher : Elsevier
ISBN 13 : 0323899587
Total Pages : 413 pages
Book Rating : 4.3/5 (238 download)

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Book Synopsis Advanced Rare Earth-Based Ceramic Nanomaterials by : Sahar Zinatloo-Ajabshir

Download or read book Advanced Rare Earth-Based Ceramic Nanomaterials written by Sahar Zinatloo-Ajabshir and published by Elsevier. This book was released on 2022-01-15 with total page 413 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advanced Rare Earth-Based Ceramic Nanomaterials focuses on recent advances related to preparation methods and applications of advanced rare earth-based ceramic nanomaterials. Different approaches for synthesizing rare earth-based ceramic nanomaterials are discussed, along with their advantages and disadvantages for applications in various fields. Sections cover rare earth-based ceramic nanomaterials like ceria and rare earth oxides (R2O3), rare earth vanadates, rare earth titanates, rare earth zirconates, rare earth stannates, rare earth-based tungstates, rare earth-based manganites, ferrites, cobaltites, nickelates, rare earth doped semiconductor nanomaterials, rare earth molybdates, rare earth-based nanocomposites, rare earth-based compounds for solar cells, and laser nanomaterials based on rare-earth compounds. - Reviews the chemistry and processing of rare earth doped ceramic nanomaterials and their characteristics and applications - Covers a broad range of materials, including ceria and rare earth oxides (R2O3), vanadates, titanates, zirconates, stannates, tungstates, manganites, ferrites, cobaltites, nickelates, rare earth doped semiconductor nanomaterials, rare earth molybdates, rare earth-based nanocomposites, rare earth-based compounds for solar cells, and laser nanomaterials based on rare-earth compounds - Includes different approaches to synthesizing each family of rare earth-based ceramic nanomaterials, along with their advantages and disadvantages - Provides green chemistry-based methods for the preparation of advanced rare earth-based ceramic nanomaterials

Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 4: New Materials, Processes, and Equipment

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Author :
Publisher : The Electrochemical Society
ISBN 13 : 1566776260
Total Pages : 488 pages
Book Rating : 4.5/5 (667 download)

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Book Synopsis Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 4: New Materials, Processes, and Equipment by : P. J. Timans

Download or read book Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 4: New Materials, Processes, and Equipment written by P. J. Timans and published by The Electrochemical Society. This book was released on 2008-05 with total page 488 pages. Available in PDF, EPUB and Kindle. Book excerpt: This issue describes processing, materials and equipment for CMOS front-end integration including gate stack, source/drain and channel engineering. Topics: strained Si/SiGe and Si/SiGe on insulator; high-mobility channels including III-V¿s, etc.; nanowires and carbon nanotubes; high-k dielectrics, metal and FUSI gate electrodes; doping/annealing for ultra-shallow junctions; low-resistivity contacts; advanced deposition (e.g. ALD, CVD, MBE), RTP, UV, plasma and laser-assisted processes.

Handbook of Industrial Inkjet Printing

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Publisher : John Wiley & Sons
ISBN 13 : 3527687203
Total Pages : 946 pages
Book Rating : 4.5/5 (276 download)

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Book Synopsis Handbook of Industrial Inkjet Printing by : Werner Zapka

Download or read book Handbook of Industrial Inkjet Printing written by Werner Zapka and published by John Wiley & Sons. This book was released on 2017-09-29 with total page 946 pages. Available in PDF, EPUB and Kindle. Book excerpt: Unique in its integration of individual topics to achieve a full-system approach, this book addresses all the aspects essential for industrial inkjet printing. After an introduction listing the industrial printing techniques available, the text goes on to discuss individual topics, such as ink, printheads and substrates, followed by metrology techniques that are required for reliable systems. Three iteration cycles are then described, including the adaptation of the ink to the printhead, the optimization of the ink to the substrate and the integration of machine manufacturing, monitoring, and data handling, among others. Finally, the book summarizes a number of case studies and success stories from selected areas, including graphics, printed electronics, and 3D printing as well a list of ink suppliers, printhead manufacturers and integrators. Practical hints are included throughout for a direct hands-on experience. Invaluable for industrial users and academics, whether ink developers or mechanical engineers, and working in areas ranging from metrology to intellectual property.

Inkjet Printing in Industry

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Publisher : John Wiley & Sons
ISBN 13 : 3527347801
Total Pages : 1718 pages
Book Rating : 4.5/5 (273 download)

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Book Synopsis Inkjet Printing in Industry by : Werner Zapka

Download or read book Inkjet Printing in Industry written by Werner Zapka and published by John Wiley & Sons. This book was released on 2022-08-22 with total page 1718 pages. Available in PDF, EPUB and Kindle. Book excerpt: This handbook provides an indispensable overview of all essential aspects of industrial-scale inkjet printing. Inkjet printing, as a scalable deposition technique, has grown in popularity due to its being additive, digital, and contact-free. Given these advantages, the technology can now be used in stable and mature industrial-scale applications. As the mechanisms for inkjet printing have improved, so too have the versatility and applicability of this machinery within industry. The handbook's coverage includes inks, printhead technology, substrates, metrology, software, as well as machine integration and pre- and post-processing approaches. This information is complemented by an overview of printing strategies and application development and covers technological advances in packaging, security printing, printed electronics, robotics, 3D printing, and bioprinting. Important topics like standardisation, regulatory requirements, ecological aspects, and patents. Readers will find: The most comprehensive work on the topic with over 75 chapters and more than 1,500 pages relating to inkjet printing technology The inkjet-printing expertise of corporate development engineers and academic researchers in one manual A hands-on approach utilizing case studies, success stories, and practical hints that allow the reader direct, first-hand experience with the power of inkjet printing technology. The ideal resource for material scientists, engineering scientists in industry, electronic engineers, and surface and solid-state chemists,Inkjet Printing in Industry is an all-in-one tool for modern professionals and researchers alike.

Thin Film Transistor Technologies 14 (TFTT 14)

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Author :
Publisher : The Electrochemical Society
ISBN 13 : 1607688573
Total Pages : 204 pages
Book Rating : 4.6/5 (76 download)

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Book Synopsis Thin Film Transistor Technologies 14 (TFTT 14) by : Y. Kuo

Download or read book Thin Film Transistor Technologies 14 (TFTT 14) written by Y. Kuo and published by The Electrochemical Society. This book was released on 2018-09-21 with total page 204 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 5: New Materials, Processes, and Equipment

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Author :
Publisher : The Electrochemical Society
ISBN 13 : 1566777097
Total Pages : 367 pages
Book Rating : 4.5/5 (667 download)

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Book Synopsis Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 5: New Materials, Processes, and Equipment by : V. Narayanan

Download or read book Advanced Gate Stack, Source/Drain, and Channel Engineering for Si-Based CMOS 5: New Materials, Processes, and Equipment written by V. Narayanan and published by The Electrochemical Society. This book was released on 2009-05 with total page 367 pages. Available in PDF, EPUB and Kindle. Book excerpt: This issue of ¿ECS Transactions¿ describes processing, materials and equipment for CMOS front-end integration including gate stack, source/drain and channel engineering. Topics include strained Si/SiGe and Si/SiGe on insulator; high-mobility channels including III-V¿s, etc.; nanowires and carbon nanotubes; high-k dielectrics, metal and FUSI gate electrodes; doping/annealing for ultra-shallow junctions; low-resistivity contacts; advanced deposition (e.g. ALD, CVD, MBE), RTP, UV, plasma and laser-assisted processes.