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Author :
Publisher :
ISBN 13 :
Total Pages : 904 pages
Book Rating : 4.3/5 (91 download)
Download or read book Japanese Journal of Applied Physics written by and published by . This book was released on 1993 with total page 904 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : M. Gentili
Publisher : Springer Science & Business Media
ISBN 13 : 9401582610
Total Pages : 214 pages
Book Rating : 4.4/5 (15 download)
Download or read book Nanolithography written by M. Gentili and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 214 pages. Available in PDF, EPUB and Kindle. Book excerpt: Success in the fabrication of structures at the nanometer length scale has opened up a new horizon to condensed matter physics: the study of quantum phenomena in confined boxes, wires, rings, etc. A new class of electronic devices based on this physics has been proposed, with the promise of a new functionality for ultrafast and/or ultradense electronic circuits. Such applications demand highly sophisticated fabrication techniques, the crucial one being lithography. Nanolithography contains updated reviews by major experts on the well established techniques -- electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL) -- as well as on emergent techniques, such as scanning tunnelling lithography (STL).
Author :
Publisher : Elsevier
ISBN 13 : 0081003587
Total Pages : 636 pages
Book Rating : 4.0/5 (81 download)
Download or read book Materials and Processes for Next Generation Lithography written by and published by Elsevier. This book was released on 2016-11-08 with total page 636 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Author : José María de Teresa
Publisher :
ISBN 13 : 9780750326087
Total Pages : 0 pages
Book Rating : 4.3/5 (26 download)
Download or read book Nanofabrication written by José María de Teresa and published by . This book was released on 2020 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications. The remainder of the book is split into two sections. The first section contains the most important and established nanolithography techniques. As well as a detailed description of each technique, the reader can obtain useful information about the main advantages and drawbacks of each technique in terms of resolution, throughput, number of steps needed, cost, etc. At the end of this section, the reader will be able to decide which technique to use for different applications. The second section explores more specific applications of the nanolithography techniques previously described; as well as new techniques and applications. In some cases, the processes described in these chapters involve a combination of several nanolithography techniques. This section is less general but provides the reader with real examples.
Author : Weilie Zhou
Publisher : Springer Science & Business Media
ISBN 13 : 0387396209
Total Pages : 533 pages
Book Rating : 4.3/5 (873 download)
Download or read book Scanning Microscopy for Nanotechnology written by Weilie Zhou and published by Springer Science & Business Media. This book was released on 2007-03-09 with total page 533 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book presents scanning electron microscopy (SEM) fundamentals and applications for nanotechnology. It includes integrated fabrication techniques using the SEM, such as e-beam and FIB, and it covers in-situ nanomanipulation of materials. The book is written by international experts from the top nano-research groups that specialize in nanomaterials characterization. The book will appeal to nanomaterials researchers, and to SEM development specialists.
Author :
Publisher :
ISBN 13 :
Total Pages : 2092 pages
Book Rating : 4.3/5 (243 download)
Download or read book Electrical & Electronics Abstracts written by and published by . This book was released on 1997 with total page 2092 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Maria Stepanova
Publisher : Springer Science & Business Media
ISBN 13 : 3709104246
Total Pages : 344 pages
Book Rating : 4.7/5 (91 download)
Download or read book Nanofabrication written by Maria Stepanova and published by Springer Science & Business Media. This book was released on 2011-11-08 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.
Author : Bruce W. Smith
Publisher : CRC Press
ISBN 13 : 1420051539
Total Pages : 864 pages
Book Rating : 4.4/5 (2 download)
Download or read book Microlithography written by Bruce W. Smith and published by CRC Press. This book was released on 2018-10-03 with total page 864 pages. Available in PDF, EPUB and Kindle. Book excerpt: This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Author : Gary S. May
Publisher : John Wiley & Sons
ISBN 13 : 0471790273
Total Pages : 428 pages
Book Rating : 4.4/5 (717 download)
Download or read book Fundamentals of Semiconductor Manufacturing and Process Control written by Gary S. May and published by John Wiley & Sons. This book was released on 2006-05-26 with total page 428 pages. Available in PDF, EPUB and Kindle. Book excerpt: A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.
Author : Nan Yao
Publisher : Springer Science & Business Media
ISBN 13 : 1402080069
Total Pages : 745 pages
Book Rating : 4.4/5 (2 download)
Download or read book Handbook of Microscopy for Nanotechnology written by Nan Yao and published by Springer Science & Business Media. This book was released on 2006-07-12 with total page 745 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanostructured materials take on an enormously rich variety of properties and promise exciting new advances in micromechanical, electronic, and magnetic devices as well as in molecular fabrications. The structure-composition-processing-property relationships for these sub 100 nm-sized materials can only be understood by employing an array of modern microscopy and microanalysis tools. Handbook of Microscopy for Nanotechnology aims to provide an overview of the basics and applications of various microscopy techniques for nanotechnology. This handbook highlights various key microcopic techniques and their applications in this fast-growing field. Topics to be covered include the following: scanning near field optical microscopy, confocal optical microscopy, atomic force microscopy, magnetic force microscopy, scanning turning microscopy, high-resolution scanning electron microscopy, orientational imaging microscopy, high-resolution transmission electron microscopy, scanning transmission electron microscopy, environmental transmission electron microscopy, quantitative electron diffraction, Lorentz microscopy, electron holography, 3-D transmission electron microscopy, high-spatial resolution quantitative microanalysis, electron-energy-loss spectroscopy and spectral imaging, focused ion beam, secondary ion microscopy, and field ion microscopy.
Author : Frances M. Ross
Publisher : Cambridge University Press
ISBN 13 : 1107116570
Total Pages : 529 pages
Book Rating : 4.1/5 (71 download)
Download or read book Liquid Cell Electron Microscopy written by Frances M. Ross and published by Cambridge University Press. This book was released on 2017 with total page 529 pages. Available in PDF, EPUB and Kindle. Book excerpt: 2.6.2 Electrodes for Electrochemistry
Author : Peter Michler
Publisher : Springer
ISBN 13 : 3319563785
Total Pages : 457 pages
Book Rating : 4.3/5 (195 download)
Download or read book Quantum Dots for Quantum Information Technologies written by Peter Michler and published by Springer. This book was released on 2017-06-01 with total page 457 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book highlights the most recent developments in quantum dot spin physics and the generation of deterministic superior non-classical light states with quantum dots. In particular, it addresses single quantum dot spin manipulation, spin-photon entanglement and the generation of single-photon and entangled photon pair states with nearly ideal properties. The role of semiconductor microcavities, nanophotonic interfaces as well as quantum photonic integrated circuits is emphasized. The latest theoretical and experimental studies of phonon-dressed light matter interaction, single-dot lasing and resonance fluorescence in QD cavity systems are also provided. The book is written by the leading experts in the field.
Author : Stephen A. Campbell
Publisher : OUP USA
ISBN 13 : 9780195320176
Total Pages : 0 pages
Book Rating : 4.3/5 (21 download)
Download or read book Fabrication Engineering at the Micro and Nanoscale written by Stephen A. Campbell and published by OUP USA. This book was released on 2008-01-10 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Designed for advanced undergraduate or first-year graduate courses in semiconductor or microelectronic fabrication, the third edition of Fabrication Engineering at the Micro and Nanoscale provides a thorough and accessible introduction to all fields of micro and nano fabrication.
Author : Ban Wong
Publisher : John Wiley & Sons
ISBN 13 : 0471678864
Total Pages : 413 pages
Book Rating : 4.4/5 (716 download)
Download or read book Nano-CMOS Circuit and Physical Design written by Ban Wong and published by John Wiley & Sons. This book was released on 2005-04-08 with total page 413 pages. Available in PDF, EPUB and Kindle. Book excerpt: Based on the authors' expansive collection of notes taken over the years, Nano-CMOS Circuit and Physical Design bridges the gap between physical and circuit design and fabrication processing, manufacturability, and yield. This innovative book covers: process technology, including sub-wavelength optical lithography; impact of process scaling on circuit and physical implementation and low power with leaky transistors; and DFM, yield, and the impact of physical implementation.
Author : National Research Council
Publisher : National Academies Press
ISBN 13 : 0309263778
Total Pages : 280 pages
Book Rating : 4.3/5 (92 download)
Download or read book Optics and Photonics written by National Research Council and published by National Academies Press. This book was released on 2013-03-19 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt: Optics and photonics technologies are ubiquitous: they are responsible for the displays on smart phones and computing devices, optical fiber that carries the information in the internet, advanced precision manufacturing, enhanced defense capabilities, and a plethora of medical diagnostics tools. The opportunities arising from optics and photonics offer the potential for even greater societal impact in the next few decades, including solar power generation and new efficient lighting that could transform the nation's energy landscape and new optical capabilities that will be essential to support the continued exponential growth of the Internet. As described in the National Research Council report Optics and Photonics: Essential Technologies for our Nation, it is critical for the United States to take advantage of these emerging optical technologies for creating new industries and generating job growth. The report assesses the current state of optical science and engineering in the United States and abroad-including market trends, workforce needs, and the impact of photonics on the national economy. It identifies the technological opportunities that have arisen from recent advances in, and applications of, optical science and engineering. The report also calls for improved management of U.S. public and private research and development resources, emphasizing the need for public policy that encourages adoption of a portfolio approach to investing in the wide and diverse opportunities now available within photonics. Optics and Photonics: Essential Technologies for our Nation is a useful overview not only for policymakers, such as decision-makers at relevant Federal agencies on the current state of optics and photonics research and applications but also for individuals seeking a broad understanding of the fields of optics and photonics in many arenas.
Author : Mark L. Brongersma
Publisher : Springer
ISBN 13 : 1402043333
Total Pages : 270 pages
Book Rating : 4.4/5 (2 download)
Download or read book Surface Plasmon Nanophotonics written by Mark L. Brongersma and published by Springer. This book was released on 2007-09-18 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book discusses a new class of photonic devices, known as surface plasmon nanophotonic structures. The book highlights several exciting new discoveries, while providing a clear discussion of the underlying physics, the nanofabrication issues, and the materials considerations involved in designing plasmonic devices with new functionality. Chapters written by the leaders in the field of plasmonics provide a solid background to each topic.
Author : Paul A. Schulte
Publisher : Academic Press
ISBN 13 : 0323138578
Total Pages : 609 pages
Book Rating : 4.3/5 (231 download)
Download or read book Molecular Epidemiology written by Paul A. Schulte and published by Academic Press. This book was released on 2012-12-02 with total page 609 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book will serve as a primer for both laboratory and field scientists who are shaping the emerging field of molecular epidemiology. Molecular epidemiology utilizes the same paradigm as traditional epidemiology but uses biological markers to identify exposure, disease or susceptibility. Schulte and Perera present the epidemiologic methods pertinent to biological markers. The book is also designed to enumerate the considerations necessary for valid field research and provide a resource on the salient and subtle features of biological indicators.
