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Electron And Photon Beam Induced Thin Film Growth
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Book Synopsis Electron and Photon-Beam Induced Thin-Film Growth by : Ferenc Bozso
Download or read book Electron and Photon-Beam Induced Thin-Film Growth written by Ferenc Bozso and published by . This book was released on 1992 with total page 4 pages. Available in PDF, EPUB and Kindle. Book excerpt: The small dimensions of novel electronic and optoelectronic device structures and their abruptly and unconventionally changing material compositions require high levels of spatial and kinetic control of the surface chemical reactions which are involved in the materials' growth or modification. These requirements exclude high temperature processes based on thermally activated chemical reactions. Directed energetic beams (electrons, photons, ions), however, can induce reactions at low temperatures, as well as provide for spatial and kinetic control in microfabrication processes. Electrons and photons of sufficient energy can cause fragmentation and desorption of adsorbed molecules or fragments of them, by inducing electronic excitations to dissociative states. The surface species after such excitations arc mostly of highly reactive radical character, which readily react with the substrate and with other radical or molecular species in the adsorbed layer. The formation of such reactive surface species in a controlled way can provides a basis for non-thermal selective area film growth.
Book Synopsis Low Energy Ion Assisted Film Growth by : Agustin Gonzalez-elipe
Download or read book Low Energy Ion Assisted Film Growth written by Agustin Gonzalez-elipe and published by World Scientific. This book was released on 2003-03-21 with total page 299 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book.
Book Synopsis Experimental, Theoretical, and Device Application Development of Nanoscale Focused Electron-beam-induced Deposition by :
Download or read book Experimental, Theoretical, and Device Application Development of Nanoscale Focused Electron-beam-induced Deposition written by and published by . This book was released on 2005 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt: To elucidate the effects of beam heating in electron beam-induced deposition (EBID), a Monte-Carlo electron-solid interaction model has been employed to calculate the energy deposition profiles in bulk and nanostructured SiO2. Using these profiles, a finite element model was used to predict the nanostructure tip temperatures for standard experimental EBID conditions. Depending on the beam energy, beam current, and nanostructure geometry, the heat generated can be substantial. This heat source can subsequently limit the EBID growth by thermally reducing the mean stay time of the precursor gas. Temperature dependent EBID growth experiments qualitatively verified the results of the electron beam-heating model. Additionally, experimental trends for the growth rate as a function of deposition time supported the conclusion that electron beam-induced heating can play a major role in limiting the EBID growth rate of SiO2 nanostructures. In an EBID application development, two approaches to maskless, direct-write lithography using electron beam-induced deposition (EBID) to produce ultra-thin masking layers were investigated. A single layer process used directly written SiO[subscript x] features deposited from a tetraethoxysilane (TEOS) precursor vapor as a masking layer for amorphous silicon thin films. A bilayer process implemented a secondary masking layer consisting of standard photoresist into which a pattern--directly written by EBID tungsten from WF6 precursor--was transferred. The single layer process was found to be extremely sensitive to the etch selectivity of the plasma etch. As a result, patterns were successfully transferred into silicon, but only to a minimal depth. In the bilayer process, EBID tungsten was written onto photoresist and the pattern transferred by means of an oxygen plasma dry development. A brief refractory descum plasma etch was implemented to remove the peripheral tungsten contamination prior to the development process. Conditions were developed to reduce the spatial spread of electrons in the photoresist layer and obtain minimal linewidths, which enabled patterning of [sim] 35 nm lines. Additionally, an EBID-based technique for field emitter repair was applied to the Digital Electrostatically focused e-beam Array Lithography (DEAL) parallel electron beam lithography configuration. Damaged or missing carbon nanofiber (CNF) emitters are very common in these prototype devices, so there is a need for a deterministic repair process. Relatively carbon-free, high aspect ratio tungsten nanofibers were deposited from a WF6 precursor in a gated cathode and a damaged triode (DEAL) device. The I-V response of the devices during vacuum FE testing indicated stable, cold field emission from the EBID cathodes. The field emission threshold voltage was shown to decrease from -130 V to -90 V after a short initiation period. Finally, lithography was performed using the repaired device to write a series of lines in PMMA with variable focus voltage. Successful focusing of the beam with increased focus voltage was evident in the patterned and developed PMMA. The I-V and lithography results were comparable to CNF-based DEAL devices indicating a successful repair technique.
Book Synopsis Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies by : Y. Pauleau
Download or read book Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies written by Y. Pauleau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 372 pages. Available in PDF, EPUB and Kindle. Book excerpt: An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
Book Synopsis Halide Perovskites by : Tze-Chien Sum
Download or read book Halide Perovskites written by Tze-Chien Sum and published by John Wiley & Sons. This book was released on 2019-03-25 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt: Real insight from leading experts in the field into the causes of the unique photovoltaic performance of perovskite solar cells, describing the fundamentals of perovskite materials and device architectures. The authors cover materials research and development, device fabrication and engineering methodologies, as well as current knowledge extending beyond perovskite photovoltaics, such as the novel spin physics and multiferroic properties of this family of materials. Aimed at a better and clearer understanding of the latest developments in the hybrid perovskite field, this is a must-have for material scientists, chemists, physicists and engineers entering or already working in this booming field.
Book Synopsis Thin Film Growth Techniques for Low-Dimensional Structures by : R.F.C. Farrow
Download or read book Thin Film Growth Techniques for Low-Dimensional Structures written by R.F.C. Farrow and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 548 pages. Available in PDF, EPUB and Kindle. Book excerpt: This work represents the account of a NATO Advanced Research Workshop on "Thin Film Growth Techniques for Low Dimensional Structures", held at the University of Sussex, Brighton, England from 15-19 Sept. 1986. The objective of the workshop was to review the problems of the growth and characterisation of thin semiconductor and metal layers. Recent advances in deposition techniques have made it possible to design new material which is based on ultra-thin layers and this is now posing challenges for scientists, technologists and engineers in the assessment and utilisation of such new material. Molecular beam epitaxy (MBE) has become well established as a method for growing thin single crystal layers of semiconductors. Until recently, MBE was confined to the growth of III-V compounds and alloys, but now it is being used for group IV semiconductors and II-VI compounds. Examples of such work are given in this volume. MBE has one major advantage over other crystal growth techniques in that the structure of the growing layer can be continuously monitored using reflection high energy electron diffraction (RHEED). This technique has offered a rare bonus in that the time dependent intensity variations of RHEED can be used to determine growth rates and alloy composition rather precisely. Indeed, a great deal of new information about the kinetics of crystal growth from the vapour phase is beginning to emerge.
Book Synopsis MBE Growth and Processing of III/IV-nitride Semiconductor Thin Film Structures by : Yeonjoon Park
Download or read book MBE Growth and Processing of III/IV-nitride Semiconductor Thin Film Structures written by Yeonjoon Park and published by . This book was released on 2003 with total page 244 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Beam Effects, Surface Topography, and Depth Profiling in Surface Analysis by : Alvin W. Czanderna
Download or read book Beam Effects, Surface Topography, and Depth Profiling in Surface Analysis written by Alvin W. Czanderna and published by Springer Science & Business Media. This book was released on 2006-04-11 with total page 447 pages. Available in PDF, EPUB and Kindle. Book excerpt: Many books are available that detail the basic principles of the different methods of surface characterization. On the other hand, the scientific literature provides a resource of how individual pieces of research are conducted by particular labo- tories. Between these two extremes the literature is thin but it is here that the present volume comfortably sits. Both the newcomer and the more mature scientist will find in these chapters a wealth of detail as well as advice and general guidance of the principal phenomena relevant to the study of real samples. In the analysis of samples, practical analysts have fairly simple models of how everything works. Superimposed on this ideal world is an understanding of how the parameters of the measurement method, the instrumentation, and the char- teristics of the sample distort this ideal world into something less precise, less controlled, and less understood. The guidance given in these chapters allows the scientist to understand how to obtain the most precise and understood measu- ments that are currently possible and, where there are inevitable problems, to have clear guidance as the extent of the problem and its likely behavior.
Book Synopsis Control Method and System for Use when Growing Thin-films on Semiconductor-based Materials by :
Download or read book Control Method and System for Use when Growing Thin-films on Semiconductor-based Materials written by and published by . This book was released on 2001 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A process and system for use during the growth of a thin film upon the surface of a substrate by exposing the substrate surface to vaporized material in a high vacuum (HV) facility involves the directing of an electron beam generally toward the surface of the substrate as the substrate is exposed to vaporized material so that electrons are diffracted from the substrate surface by the beam and the monitoring of the pattern of electrons diffracted from the substrate surface as vaporized material settles upon the substrate surface. When the monitored pattern achieves a condition indicative of the desired condition of the thin film being grown upon the substrate, the exposure of the substrate to the vaporized materials is shut off or otherwise adjusted. To facilitate the adjustment of the crystallographic orientation of the film relative to the electron beam, the system includes a mechanism for altering the orientation of the surface of the substrate relative to the electron beam.
Book Synopsis Nucleation and Growth of Silicon Thin Film Microstructures by Localized Laser Chemical Vapor Deposition by : David Edward Kotecki
Download or read book Nucleation and Growth of Silicon Thin Film Microstructures by Localized Laser Chemical Vapor Deposition written by David Edward Kotecki and published by . This book was released on 1988 with total page 452 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Film Synthesis and Growth Using Energetic Beams: Volume 388 by : H. A. Atwater
Download or read book Film Synthesis and Growth Using Energetic Beams: Volume 388 written by H. A. Atwater and published by . This book was released on 1995-10-10 with total page 472 pages. Available in PDF, EPUB and Kindle. Book excerpt: With over 16 countries represented, this book represents international developments in the field of film synthesis and growth using energetic beams. It focuses on pulsed-laser deposition. Fundamental issues pertaining to the generation of laser ablation plumes, temperature distributions and collisional effects are described. Ion-assisted pulsed-laser deposition, pulsed-ion deposition, applications of hyperthermal beams and aspects of surface dynamics are discussed. The inclusion of an ion beam with the ablation process leads to some unique modifications in the thin-film growth mechanisms, and hence, film properties. Likewise, the collision of high-mass metal cluster ions with substrates shows promise for growth of novel structures. Also featured are new developments of optoelectronic materials, nitrides and carbon films using a variety of techniques. The effects of beam-induced defects on growth and surface morphology, chemical effects during growth, and characterization of film growth and film properties are addressed.
Book Synopsis Amorphous Chalcogenide Semiconductors and Related Materials by : Keiji Tanaka
Download or read book Amorphous Chalcogenide Semiconductors and Related Materials written by Keiji Tanaka and published by Springer Nature. This book was released on 2021-07-01 with total page 300 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides introductory, comprehensive, and concise descriptions of amorphous chalcogenide semiconductors and related materials. It includes comparative portraits of the chalcogenide and related materials including amorphous hydrogenated Si, oxide and halide glasses, and organic polymers. It also describes effects of non-equilibrium disorder, in comparison with those in crystalline semiconductors.
Book Synopsis Handbook of Thin Film Deposition by : Krishna Seshan
Download or read book Handbook of Thin Film Deposition written by Krishna Seshan and published by William Andrew. This book was released on 2001-02-01 with total page 659 pages. Available in PDF, EPUB and Kindle. Book excerpt: New second edition of the popular book on deposition (first edition by Klaus Schruegraf) for engineers, technicians, and plant personnel in the semiconductor and related industries. This book traces the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. The book includes much cutting-edge material. Entirely new chapters on contamination and contamination control describe the basics and the issues—as feature sizes shrink to sub-micron dimensions, cleanliness and particle elimination has to keep pace. A new chapter on metrology explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of sub-micron dimensions. The book also covers PVD, laser and e-beam assisted deposition, MBE, and ion beam methods to bring together all the physical vapor deposition techniques.Two entirely new areas receive full treatment: chemical mechanical polishing which helps attain the flatness that is required by modern lithography methods, and new materials used for interconnect dielectric materials, specifically organic polyimide materials.
Book Synopsis Nanofabrication Using Focused Ion and Electron Beams by : Ivo Utke
Download or read book Nanofabrication Using Focused Ion and Electron Beams written by Ivo Utke and published by OUP USA. This book was released on 2012-05 with total page 830 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.
Book Synopsis Beam Processing and Laser Chemistry by : I.W. Boyd
Download or read book Beam Processing and Laser Chemistry written by I.W. Boyd and published by Elsevier. This book was released on 1990-02-01 with total page 482 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume discusses both the practical and theoretical aspects of energy beam materials processing. It highlights the recent advances in the use of beams and incoherent light sources to enhance or modify chemical processes at solid surfaces. Special attention is given to the latest developments in the use of ion, electron and photon beams, and on laser-assisted process chemistry. Thin film and surface and interface reactions as well as bulk phase transformations are discussed. Practical technological details and the criteria for present and future applications are also reviewed. The papers collected in this volume reflect the continuing strong interest and variety of development in this field.
Book Synopsis Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon by : Krishna Seshan
Download or read book Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment and Applications, Second Editon written by Krishna Seshan and published by CRC Press. This book was released on 2002-02-01 with total page 72 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition tec
Book Synopsis Journal of the Optical Society of America by :
Download or read book Journal of the Optical Society of America written by and published by . This book was released on 1991 with total page 736 pages. Available in PDF, EPUB and Kindle. Book excerpt:
