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A Study Of Fabrication Of Ultra High Resolution Mano Devices Through Electron Beam Lithography Process And Its Application To Electron Optical Systems
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Book Synopsis A Study of Fabrication of Ultra-high Resolution Mano Devices Through Electron Beam Lithography Process and Its Application to Electron-optical Systems by :
Download or read book A Study of Fabrication of Ultra-high Resolution Mano Devices Through Electron Beam Lithography Process and Its Application to Electron-optical Systems written by and published by . This book was released on 2007 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt: Today's semiconductor industry has been significantly changing in its techniques and processes for the fabrication of devices and accordingly, there has been dramatic increase in performance and a reduction in cost. To obtain still higher device performances and still further cost reduction, the dimensions of patterns in integrated circuits should be as small as possible and the 3-dimensional accuracy of multidimensional semiconductor structures should be also achieved as well. The manufacturing of smaller feature dimensions and 3-dimensional devices has been enabled by developments in lithography - the technology which transfers designed patterns onto the silicon wafer. Especially, electron beam lithography is widely adapted in the nano fabrication technology due to its ability to achieve nanometer-scale resolution. The aim of this work is to fabricate test devices by the electron beam lithography possesses and apply them to the test of electron optical systems. In this thesis, we first develop methods to fabricate a high resolution nano scale Fresnel zone plate and 3-dimenstional stair case structure by E-beam lithography. To optimize the fabrication we optimized the lithographic process and the subsequent process steps accounted for proximity effects via a correction program and controlled pattern transfer through reactive ion etching (RIE). The completed devices were tested in a Scanning Electron Microscopy (SEM) and the accuracy of feature parameters were examined by Fast Fourier Transformation methods (FFT). Finally, the application of these structures to the calibration and testing of e-beam systems was explored.
Book Synopsis High Aspect-ratio Nanoscale Etching in Silicon Using Electron Beam Lithography and Deep Reactive Ion Etching (DRIE) Technique by : John Kangchun Perng
Download or read book High Aspect-ratio Nanoscale Etching in Silicon Using Electron Beam Lithography and Deep Reactive Ion Etching (DRIE) Technique written by John Kangchun Perng and published by . This book was released on 2006 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis reports the characterization and development of nanolithography using Electron Beam Lithography system and nanoscale plasma etching. The standard Bosch process and a modified three-pulse Bosch process were developed in STS ICP and Plasma ICP system separately. The limit of the Bosch process at the nanoscale regime was investigated and documented. Furthermore, the effect of different control parameters on the process were studied and summarized in this report. 28nm-wide trench with aspect-ratio of 25 (smallest trench), and 50nm-wide trench with aspect ratio of 37 (highest aspect-ratio) have been demonstrated using the modified three-pulse process. Capacitive resonators, SiBAR and IBAR devices have been fabricated using the process developed in this work. IBARs (15MHz) with ultra-high Q (210,000) have been reported.
Book Synopsis Advanced Manufacturing of Optical and Electronic Devices Using Novel Lithographic and Contact Transfer Techniques by : Nan Liu (Chemical engineer)
Download or read book Advanced Manufacturing of Optical and Electronic Devices Using Novel Lithographic and Contact Transfer Techniques written by Nan Liu (Chemical engineer) and published by . This book was released on 2022 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: "This study focuses on the application of silicon-based micromachining techniques for fabrication of novel materials and opto-electronic devices. Micro/nano scale structures generated via surface patterning techniques are commonly used in various materials and devices due to their unique surface geometries or the flexible materials integration of the structure itself. Our study demonstrates the applications of silicon-based microstructures in the field of contact transfer printing, microparticles generation and optics, as well as the study on the structure fabrication processes including lithography, deposition, and etching. Contact transfer printing is a patterning technique, which is used to transfer ink materials between surfaces. It achieves clean and efficient generation of microfeature arrays with high resolution and fidelity. In our study, we demonstrated a transfer printing process using polyurethane acrylate (PUA) stamps to preform programmable adhesions via thermo-mechanical cycles to enable transfer printing with high precision and low defect density. Our process relies on reusable donor substrates with under-cut microfeatures to achieve selective picking-up of organic/inorganic multilayer stacks by pre-separating target materials from rigid continuous layers. We also applied maskless holographic lithography and parallel patterning techniques to produce oriented magnetic micro-particles (OMMPs), which are sensitive to both optical trapping and magnetic field alignment. Such particles can potentially be used in opto-magnetic trapping applications. For demonstration, we developed holographic lithography and parallel patterning techniques to produce both organic and inorganic particles with high yield. We also built an optical system with the capability of both holographic lithography and optical trapping to demonstrate the particle generation and trapping. We also studied the manufacturing process of optical silica-based structures. In particular, we studied how the micro-manufacturing techniques affect the surface composition of optical grating devices and their performance in high power laser application. The cleaning of optical gratings plays a significant role in the optical performance since the organic residues on the surface can reduce the laser induced damage threshold (LIDT) of the gratings by heat accumulation and phase changes. Thus, we studied the origin of the organic contaminants during manufacturing, their impact on the LIDT, and methods to remove such contaminants. To enable these studies, we developed a deep silica etching process to create mm-wide grating-like structures. Characterization techniques including XPS, SEM, EDX, etc. were applied for the analysis"--Pages viii-ix
Book Synopsis Characterization of Processes Used in Nanofabrication of Digital Electrostatic E-beam Array Lithography (DEAL) Devices by : Ryan Benjamine Rucker
Download or read book Characterization of Processes Used in Nanofabrication of Digital Electrostatic E-beam Array Lithography (DEAL) Devices written by Ryan Benjamine Rucker and published by . This book was released on 2006 with total page 121 pages. Available in PDF, EPUB and Kindle. Book excerpt: The ultimate goal of this research was to nanofabricate an advanced field emission electron beam lithography platform using an electron beam induced deposition process (EBID) to deposit tungsten (W) nanofibers cathodes. In order to fabricate the devices, it was necessary to characterize the reactive ion etching (RIE) processes for the fabrication of the Digital Electrostatic e-beam Array Lithography (DEAL) device. To optimize the reactive ion etch processes of the silicon and silicon dioxide layers, a JMP desktop statistical discovery software from SAS® was employed to design a set of experiments. The design of experiments (DOE) employed variable conditions of R.F. power, gas pressure, and gas ratios. Specifically for the silicon etch DOE the R.F. power ranged from 100 to 400 (W), the gas pressure ranged from 75 To 400 (mTorr) and a SF6/O2 gas flow ratio varied from 2 to 10. Single crystal silicon wafers were used due to the thickness of the n polycrystalline silicon film and the effectiveness of characterizing such a thin film. The responses that were measured included the silicon etch rate, the silicon to silicon dioxide etch selectivity, the silicon to photoresist etch selectivity, and the silicon etch profile. For the silicon oxide etch DOE, the R.F. power ranged from 200 to 300, the gas pressure ranged from 30 to 70 and a CF4/CHF3 gas flow ratio varied from 0.34 to 1.34. The responses that were measured included the silicon oxide etch rate, the silicon oxide to silicon etch selectivity, and the silicon oxide to photoresist etch selectivity. The results from both experimental designs adequately optimized the etch processes for the n polycrystalline silicon and silicon oxide and will be used for v subsequent nanofabrication of DEAL devices. A DOE for the growth of tungsten nanopillars via electron beam induced deposition (EBID) was also performed as a method to deposit nanoscale field emission cathodes. The goal was to correlate the growth parameters to the nanopillar structure and ultimately the structure to the field emission properties. The DOE varied the precursor pressure, beam energy, and specimen current, and the responses were growth rate, nanopillar width, and the sharpness of the nanopillar tip. An optimum high growth rate, sharp pillar process was determined, however field emission the field emission measurements could not be made.
Book Synopsis Electron Beam Nanolithography for the Fabrication of Gallium Arsenide Heterojunction Transistors and Lasers by : Richard Charles Tiberio
Download or read book Electron Beam Nanolithography for the Fabrication of Gallium Arsenide Heterojunction Transistors and Lasers written by Richard Charles Tiberio and published by . This book was released on 1994 with total page 154 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Ultrahigh Resolution Electron Beam Lithography for Molecular Electronics by : Wenchuang Hu
Download or read book Ultrahigh Resolution Electron Beam Lithography for Molecular Electronics written by Wenchuang Hu and published by . This book was released on 2004 with total page 334 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis An Advanced Gray-scale Technology and Its Applications to Micro-devices by : Zhou Zhou
Download or read book An Advanced Gray-scale Technology and Its Applications to Micro-devices written by Zhou Zhou and published by . This book was released on 2009 with total page 161 pages. Available in PDF, EPUB and Kindle. Book excerpt: This dissertation introduces a kind of new gray-scale technology. The new gray-scale technology uses a carbon-based light-attenuating material. This material can reach a very high optical density (~3.0) for deep ultraviolet (DUV) lithography applications. This property is out the reach of the often-used High-Energy-Beam-Sensitive (HEBS) gray-scale mask. HEBS gray-scale mask cannot be used for wavelength below 300 nm and it cannot provide enough optical density at wavelengths shorter than 350 nm for high-resolution component fabrication. Higher optical density at shorter wavelengths means that the components of more levels and with higher resolution are achievable. Compared with Binary Half-Tone (BHT) gray-scale mask, the new mask offers a much higher resolution. Two-beam-current method is invented for the e-beam writing in the fabrication of gray-scale masks. Compared with the simpler single-current method, two-beam-current method offers two important advantages. First it can achieve a much larger dynamic range for the e-beam exposure. The second advantage is the writing time for a gray-scale mask could be reduced significantly when a large pattern is to be written. By applying the new gray-scale mask in DUV and UV lithography respectively, gray-scale patterns were successfully generated in optical resists. Finally devices were fabricated after the gray-scale patterns in resists were transferred into the substrate material in the etching step. Different micro-structures with different resolution and depth requirements have been fabricated successfully. The carbon-based material has a big hardness, comparable to diamond film, and stays at the quartz surface very firmly. The life time of the mask is comparable to the normal chrome mask used in semiconductor industry, and thus pretty long. This new gray-scale technology could also lead to lower-cost mass production of higher quality micro- and meso-scale micro-devices in different substrates, e.g. quartz and silicon et al.
Book Synopsis The Fabrication and Theoretical Evaluation of an Electron Lens for Ultra-high Resolution Scanning Electron Microscopy by : Larry E. Plew
Download or read book The Fabrication and Theoretical Evaluation of an Electron Lens for Ultra-high Resolution Scanning Electron Microscopy written by Larry E. Plew and published by . This book was released on 1973 with total page 206 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Nanofabrication by : Maria Stepanova
Download or read book Nanofabrication written by Maria Stepanova and published by Springer Science & Business Media. This book was released on 2011-11-08 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Intended to update scientists and engineers on the current state of the art in a variety of key techniques used extensively in the fabrication of structures at the nanoscale. The present work covers the essential technologies for creating sub 25 nm features lithographically, depositing layers with nanometer control, and etching patterns and structures at the nanoscale. A distinguishing feature of this book is a focus not on extension of microelectronics fabrication, but rather on techniques applicable for building NEMS, biosensors, nanomaterials, photonic crystals, and other novel devices and structures that will revolutionize society in the coming years.
Book Synopsis High-resolution Fabrication of Electron Devices by : R. F. W. Pease
Download or read book High-resolution Fabrication of Electron Devices written by R. F. W. Pease and published by . This book was released on 1981 with total page 178 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Fabrication of Ultrasmall, Single-electron Tunnel Junctions by Electron-beam Lithography by : Steven John Koester
Download or read book Fabrication of Ultrasmall, Single-electron Tunnel Junctions by Electron-beam Lithography written by Steven John Koester and published by . This book was released on 1991 with total page 188 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Index to IEEE Publications by : Institute of Electrical and Electronics Engineers
Download or read book Index to IEEE Publications written by Institute of Electrical and Electronics Engineers and published by . This book was released on 1980 with total page 722 pages. Available in PDF, EPUB and Kindle. Book excerpt: Issues for 1973- cover the entire IEEE technical literature.
Book Synopsis Surface Microscopy with Low Energy Electrons by : Ernst Bauer
Download or read book Surface Microscopy with Low Energy Electrons written by Ernst Bauer and published by Springer. This book was released on 2014-07-10 with total page 513 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book, written by a pioneer in surface physics and thin film research and the inventor of Low Energy Electron Microscopy (LEEM), Spin-Polarized Low Energy Electron Microscopy (SPLEEM) and Spectroscopic Photo Emission and Low Energy Electron Microscopy (SPELEEM), covers these and other techniques for the imaging of surfaces with low energy (slow) electrons. These techniques also include Photoemission Electron Microscopy (PEEM), X-ray Photoemission Electron Microscopy (XPEEM), and their combination with microdiffraction and microspectroscopy, all of which use cathode lenses and slow electrons. Of particular interest are the fundamentals and applications of LEEM, PEEM, and XPEEM because of their widespread use. Numerous illustrations illuminate the fundamental aspects of the electron optics, the experimental setup, and particularly the application results with these instruments. Surface Microscopy with Low Energy Electrons will give the reader a unified picture of the imaging, diffraction, and spectroscopy methods that are possible using low energy electron microscopes.
Book Synopsis Frontiers in High Energy Density Physics by : National Research Council
Download or read book Frontiers in High Energy Density Physics written by National Research Council and published by National Academies Press. This book was released on 2003-05-11 with total page 177 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent scientific and technical advances have made it possible to create matter in the laboratory under conditions relevant to astrophysical systems such as supernovae and black holes. These advances will also benefit inertial confinement fusion research and the nation's nuclear weapon's program. The report describes the major research facilities on which such high energy density conditions can be achieved and lists a number of key scientific questions about high energy density physics that can be addressed by this research. Several recommendations are presented that would facilitate the development of a comprehensive strategy for realizing these research opportunities.
Book Synopsis Electrospun Nanofibers by : Mehdi Afshari
Download or read book Electrospun Nanofibers written by Mehdi Afshari and published by Woodhead Publishing. This book was released on 2016-09-13 with total page 650 pages. Available in PDF, EPUB and Kindle. Book excerpt: Electrospun Nanofibers covers advances in the electrospinning process including characterization, testing and modeling of electrospun nanofibers, and electrospinning for particular fiber types and applications. Electrospun Nanofibers offers systematic and comprehensive coverage for academic researchers, industry professionals, and postgraduate students working in the field of fiber science. Electrospinning is the most commercially successful process for the production of nanofibers and rising demand is driving research and development in this field. Rapid progress is being made both in terms of the electrospinning process and in the production of nanofibers with superior chemical and physical properties. Electrospinning is becoming more efficient and more specialized in order to produce particular fiber types such as bicomponent and composite fibers, patterned and 3D nanofibers, carbon nanofibers and nanotubes, and nanofibers derived from chitosan. Provides systematic and comprehensive coverage of the manufacture, properties, and applications of nanofibers Covers recent developments in nanofibers materials including electrospinning of bicomponent, chitosan, carbon, and conductive fibers Brings together expertise from academia and industry to provide comprehensive, up-to-date information on nanofiber research and development Offers systematic and comprehensive coverage for academic researchers, industry professionals, and postgraduate students working in the field of fiber science
Book Synopsis NANOTECHNOLOGY AND THE ENVIRONMENT. by :
Download or read book NANOTECHNOLOGY AND THE ENVIRONMENT. written by and published by . This book was released on 2023 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis DNA in Supramolecular Chemistry and Nanotechnology by : Eugen Stulz
Download or read book DNA in Supramolecular Chemistry and Nanotechnology written by Eugen Stulz and published by John Wiley & Sons. This book was released on 2015-09-28 with total page 538 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers the emerging topic of DNA nanotechnology and DNA supramolecular chemistry in its broader sense. By taking DNA out of its biological role, this biomolecule has become a very versatile building block in materials chemistry, supramolecular chemistry and bio-nanotechnology. Many novel structures have been realized in the past decade, which are now being used to create molecular machines, drug delivery systems, diagnosis platforms or potential electronic devices. The book combines many aspects of DNA nanotechnology, including formation of functional structures based on covalent and non-covalent systems, DNA origami, DNA based switches, DNA machines, and alternative structures and templates. This broad coverage is very appealing since it combines both the synthesis of modified DNA as well as designer concepts to successfully plan and make DNA nanostructures. Contributing authors have provided first a general introduction for the non-specialist reader, followed by a more in-depth analysis and presentation of their topic. In this way the book is attractive and useful for both the non-specialist who would like to have an overview of the topic, as well as the specialist reader who requires more information and inspiration to foster their own research.
