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Author :
Publisher :
ISBN 13 :
Total Pages : 526 pages
Book Rating : 4.0/5 ( download)
Download or read book VLSI Science and Technology written by and published by . This book was released on 1984 with total page 526 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Kenneth E. Bean
Publisher :
ISBN 13 :
Total Pages : 554 pages
Book Rating : 4.:/5 (41 download)
Download or read book VLSI Science and Technology/1984 written by Kenneth E. Bean and published by . This book was released on 1984 with total page 554 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : J.F. Ziegler
Publisher : Elsevier
ISBN 13 : 0323144012
Total Pages : 649 pages
Book Rating : 4.3/5 (231 download)
Download or read book Ion Implantation Science and Technology written by J.F. Ziegler and published by Elsevier. This book was released on 2012-12-02 with total page 649 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided into two parts. Part 1 discusses topics such as the history of the ion implantation; the different types and purposes of ion implanters; the penetration of energetic ions into solids; damage annealing in silicon; and ion implantation metallurgy. Part 2 covers areas such as ion implementation system concepts; ion sources; underlying principles related to ion optics; and safety and radiation considerations in ion implantation. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.
Author : Rafael Reif
Publisher :
ISBN 13 :
Total Pages : 634 pages
Book Rating : 4.:/5 (2 download)
Download or read book Proceedings of the Symposium on Reduced Temperature Processing for VLSI written by Rafael Reif and published by . This book was released on 1986 with total page 634 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : W. Dietze
Publisher : Springer Science & Business Media
ISBN 13 : 9783540114741
Total Pages : 680 pages
Book Rating : 4.1/5 (147 download)
Download or read book Technology of Si, Ge, and SiC / Technologie Von Si, Ge und SiC written by W. Dietze and published by Springer Science & Business Media. This book was released on 1983-12 with total page 680 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : National Institute of Standards and Technology (U.S.)
Publisher :
ISBN 13 :
Total Pages : 140 pages
Book Rating : 4.3/5 ( download)
Download or read book Semiconductor Measurement Technology written by National Institute of Standards and Technology (U.S.) and published by . This book was released on 1990 with total page 140 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : United States. National Bureau of Standards
Publisher :
ISBN 13 :
Total Pages : 64 pages
Book Rating : 4.F/5 ( download)
Download or read book Semiconductor Measurement Technology written by United States. National Bureau of Standards and published by . This book was released on 1983 with total page 64 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : R.A. Levy
Publisher : Springer Science & Business Media
ISBN 13 : 9400909179
Total Pages : 992 pages
Book Rating : 4.4/5 (9 download)
Download or read book Microelectronic Materials and Processes written by R.A. Levy and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 992 pages. Available in PDF, EPUB and Kindle. Book excerpt: The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result of a NATO-sponsored Advanced Study Institute (AS!) held in Castelvecchio Pascoli, Italy. Invited speakers at this institute provided manuscripts which were edited, updated, and integrated with other contributions solicited from non-participants to this AS!.
Author :
Publisher :
ISBN 13 :
Total Pages : 1146 pages
Book Rating : 4.:/5 (44 download)
Download or read book Semiconductor Silicon written by and published by . This book was released on 1986 with total page 1146 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : S. Broydo
Publisher :
ISBN 13 :
Total Pages : 874 pages
Book Rating : 4.E/5 ( download)
Download or read book ULSI Science and Technology/1987 written by S. Broydo and published by . This book was released on 1987 with total page 874 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Fumio Shimura
Publisher : Elsevier
ISBN 13 : 0323150489
Total Pages : 435 pages
Book Rating : 4.3/5 (231 download)
Download or read book Semiconductor Silicon Crystal Technology written by Fumio Shimura and published by Elsevier. This book was released on 2012-12-02 with total page 435 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor Silicon Crystal Technology provides information pertinent to silicon, which is the dominant material in the semiconductor industry. This book discusses the technology of integrated circuits (ICs) in electronic materials manufacturer. Comprised of eight chapters, this book provides an overview of the basic science, silicon materials, IC device fabrication processes, and their interaction for enhancing both the processes and materials. This text then proceeds with a discussion of the atomic structure and bonding mechanisms in order to understand the nature and formation of crystal structures, which are the fundamentals of material science. Other chapters consider the technological crystallography and classify natural crystal morphologies based on observation. The final chapter deals with the interrelationships among silicon material characteristics, circuit design, and IC fabrication in order to ensure the fabrication of very-large-scale-integration/ultra-large-scale-integration circuits. This book is a valuable resource for graduate students, physicists, engineers, materials scientists, and professionals involved in semiconductor industry.
Author : R.A. Powell
Publisher : Elsevier
ISBN 13 : 0080983588
Total Pages : 312 pages
Book Rating : 4.0/5 (89 download)
Download or read book Dry Etching for Microelectronics written by R.A. Powell and published by Elsevier. This book was released on 2012-12-02 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume collects together for the first time a series of in-depth, critical reviews of important topics in dry etching, such as dry processing of III-V compound semiconductors, dry etching of refractory metal silicides and dry etching aluminium and aluminium alloys. This topical format provides the reader with more specialised information and references than found in a general review article. In addition, it presents a broad perspective which would otherwise have to be gained by reading a large number of individual research papers. An additional important and unique feature of this book is the inclusion of an extensive literature review of dry processing, compiled by search of computerized data bases. A subject index allows ready access to the key points raised in each of the chapters.
Author : L. B. Rothman
Publisher :
ISBN 13 :
Total Pages : 288 pages
Book Rating : 4.:/5 (44 download)
Download or read book Proceedings of the Symposium on Multilevel Metallization, Interconnection, and Contact Technologies written by L. B. Rothman and published by . This book was released on 1987 with total page 288 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Werner Kern
Publisher : Elsevier
ISBN 13 : 0080524214
Total Pages : 881 pages
Book Rating : 4.0/5 (85 download)
Download or read book Thin Film Processes II written by Werner Kern and published by Elsevier. This book was released on 2012-12-02 with total page 881 pages. Available in PDF, EPUB and Kindle. Book excerpt: This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to the literature. Though edited to stand alone, when taken together, Thin Film Processes II and its predecessor present a thorough grounding in modern thin film techniques. Provides an all-new sequel to the 1978 classic, Thin Film Processes Introduces new topics, and several key topics presented in the original volume are updated Emphasizes practical applications of major thin film deposition and etching processes Helps readers find the appropriate technology for a particular application
Author : Michael J. Kelly
Publisher : Springer Science & Business Media
ISBN 13 : 3642714463
Total Pages : 481 pages
Book Rating : 4.6/5 (427 download)
Download or read book The Physics and Fabrication of Microstructures and Microdevices written by Michael J. Kelly and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 481 pages. Available in PDF, EPUB and Kindle. Book excerpt: les Houches This Winter School on "The Physics and Fabrication of Microstructures" originated with a European industrial decision to investigate in some detail the potential of custom-designed microstructures for new devices. Beginning in 1985, GEC and THOMSON started a collaboration on these subjects, supported by an ESPRIT grant from the Commission of the European Com munity. To the outside observer of the whole field, it appears clear that the world effort is very largely based in the United States and Japan. It also appears that cooperation and dissemination of results are very well organised outside Europe and act as a major influence on the development of new concepts and devices. In Japan, a main research programme of the Research and Development for Basic Technology for Future Industries is focused on "Future Electron Devices". In Japan and in the United States, many workshops are organised annually in order to bring together the major specialists in industry and academia, allowing fast dissemination of advances and contacts for setting up cooperative efforts.
Author : Dinesh C. Gupta
Publisher : ASTM International
ISBN 13 : 0803104596
Total Pages : 701 pages
Book Rating : 4.8/5 (31 download)
Download or read book Emerging Semiconductor Technology written by Dinesh C. Gupta and published by ASTM International. This book was released on 1987 with total page 701 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : D.F. Downey
Publisher : Elsevier
ISBN 13 : 0444599800
Total Pages : 716 pages
Book Rating : 4.4/5 (445 download)
Download or read book Ion Implantation Technology - 92 written by D.F. Downey and published by Elsevier. This book was released on 2012-12-02 with total page 716 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion implantation technology has made a major contribution to the dramatic advances in integrated circuit technology since the early 1970's. The ever-present need for accurate models in ion implanted species will become absolutely vital in the future due to shrinking feature sizes. Successful wide application of ion implantation, as well as exploitation of newly identified opportunities, will require the development of comprehensive implant models. The 141 papers (including 24 invited papers) in this volume address the most recent developments in this field. New structures and possible approaches are described. The implications for ion implantation technology as well as additional observations of needs and opportunities are discussed. The volume will be of value to all those who are interested in acquiring a more complete understanding of the current developments in ion implantation processes and comprehensive implant models.
