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Author : S. Simon Wong
Publisher :
ISBN 13 : 9781558990685
Total Pages : 427 pages
Book Rating : 4.9/5 (96 download)
Download or read book Tungsten and Other Advanced Metals for VLSI-ULSI Applications V written by S. Simon Wong and published by . This book was released on 1990 with total page 427 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 456 pages
Book Rating : 4.:/5 (2 download)
Download or read book Tungsten and Other Advanced Metals for VLSI/ULSI Applications written by and published by . This book was released on 1990 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 427 pages
Book Rating : 4.:/5 (489 download)
Download or read book Tungsten and Other Advanced Metals for VLSI/ULSI Applications V written by and published by . This book was released on 1990 with total page 427 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Tungsten and Other Advanced Metals for VLSI/ULSI Applications written by and published by . This book was released on 1990 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Gregory C. Smith
Publisher : Mrs Conference Proceedings
ISBN 13 :
Total Pages : 422 pages
Book Rating : 4.0/5 ( download)
Download or read book Tungsten and Other Advanced Metals for ULSI Applications in 1990: Volume 6 written by Gregory C. Smith and published by Mrs Conference Proceedings. This book was released on 1991-03 with total page 422 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author : S. Simon Wong
Publisher :
ISBN 13 :
Total Pages : 427 pages
Book Rating : 4.:/5 (258 download)
Download or read book Tungsten and Other Advanced Metals for VLSI/ULSI Applications written by S. Simon Wong and published by . This book was released on 1990 with total page 427 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Yoshio Nishi
Publisher : CRC Press
ISBN 13 : 1351829823
Total Pages : 3276 pages
Book Rating : 4.3/5 (518 download)
Download or read book Handbook of Semiconductor Manufacturing Technology written by Yoshio Nishi and published by CRC Press. This book was released on 2017-12-19 with total page 3276 pages. Available in PDF, EPUB and Kindle. Book excerpt: Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Author : Gregory C. Smith
Publisher :
ISBN 13 :
Total Pages : 397 pages
Book Rating : 4.:/5 (657 download)
Download or read book Tungsten and Other Advanced Metals for ULSI Applications in 1990 written by Gregory C. Smith and published by . This book was released on 1991 with total page 397 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : O. Auciello
Publisher : Springer Science & Business Media
ISBN 13 : 9401117276
Total Pages : 625 pages
Book Rating : 4.4/5 (11 download)
Download or read book Multicomponent and Multilayered Thin Films for Advanced Microtechnologies: Techniques, Fundamentals and Devices written by O. Auciello and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 625 pages. Available in PDF, EPUB and Kindle. Book excerpt: The synthesis of multicomponent/multilayered superconducting, conducting, semiconducting and insulating thin films has become the subject of an intensive, worldwide, interdisciplinary research effort. The development of deposition-characterization techniques and the science and technology related to the synthesis of these films are critical for the successful evolution of this interdisciplinary field of research and the implementation of the new materials in a whole new generation of advanced microdevices. This book contains the lectures and contributed papers on various scientific and technological aspects of multicomponent and multilayered thin films presented at a NATO/ASI. Compared to other recent books on thin films, the distinctive character of this book is the interdisciplinary treatment of the various fields of research related to the different thin film materials mentioned above. The wide range of topics discussed in this book include vacuum-deposition techniques, synthesis-processing, characterization, and devices of multicomponent/multilayered oxide high temperature superconducting, ferroelectric, electro-optic, optical, metallic, silicide, and compound semiconductor thin films. The book presents an unusual intedisciplinary exchange of ideas between researchers with cross-disciplinary backgrounds and it will be useful to established investigators as well as postdoctoral and graduate students.
Author : John E.J. Schmitz
Publisher : William Andrew
ISBN 13 :
Total Pages : 264 pages
Book Rating : 4.3/5 (91 download)
Download or read book Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications written by John E.J. Schmitz and published by William Andrew. This book was released on 1992-12-31 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Publisher description.
Author : Chris R. Kleijn
Publisher : Birkhäuser
ISBN 13 : 3034877412
Total Pages : 138 pages
Book Rating : 4.0/5 (348 download)
Download or read book Modeling of Chemical Vapor Deposition of Tungsten Films written by Chris R. Kleijn and published by Birkhäuser. This book was released on 2013-11-11 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Author : Robert Havemann
Publisher : Mrs Conference Proceedings
ISBN 13 :
Total Pages : 640 pages
Book Rating : 4.3/5 (91 download)
Download or read book Advanced Metallization and Interconnect Systems for ULSI Applications in 1996: Volume 12 written by Robert Havemann and published by Mrs Conference Proceedings. This book was released on 1997 with total page 640 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author :
Publisher :
ISBN 13 :
Total Pages : 616 pages
Book Rating : 4.3/5 (91 download)
Download or read book Advanced Metallization for ULSI Applications written by and published by . This book was released on 1992 with total page 616 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Geraldine Cogin Shwartz
Publisher : CRC Press
ISBN 13 : 1420017659
Total Pages : 533 pages
Book Rating : 4.4/5 (2 download)
Download or read book Handbook of Semiconductor Interconnection Technology written by Geraldine Cogin Shwartz and published by CRC Press. This book was released on 2006-02-22 with total page 533 pages. Available in PDF, EPUB and Kindle. Book excerpt: First introduced about a decade ago, the first edition of the Handbook of Semiconductor Interconnection Technology became widely popular for its thorough, integrated treatment of interconnect technologies and its forward-looking perspective. The field has grown tremendously in the interim and many of the "likely directions" outlined in the first ed
Author : Srinivasan Sivaram
Publisher : Springer Science & Business Media
ISBN 13 : 1475747519
Total Pages : 302 pages
Book Rating : 4.4/5 (757 download)
Download or read book Chemical Vapor Deposition written by Srinivasan Sivaram and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt: In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Author :
Publisher :
ISBN 13 :
Total Pages : 730 pages
Book Rating : 4.3/5 (91 download)
Download or read book Advanced Metallization Conference in ... written by and published by . This book was released on 2007 with total page 730 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Avishay Katz
Publisher :
ISBN 13 :
Total Pages : 672 pages
Book Rating : 4.3/5 (91 download)
Download or read book Advanced Metallizations in Microelectronics: Volume 181 written by Avishay Katz and published by . This book was released on 1990-09-12 with total page 672 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
