Three Dimensional Transport and Kinetic Modeling of Horizontal Chemical Vapor Deposition Reactors

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ISBN 13 :
Total Pages : 556 pages
Book Rating : 4.:/5 (319 download)

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Book Synopsis Three Dimensional Transport and Kinetic Modeling of Horizontal Chemical Vapor Deposition Reactors by : Erik Oddmund Einset

Download or read book Three Dimensional Transport and Kinetic Modeling of Horizontal Chemical Vapor Deposition Reactors written by Erik Oddmund Einset and published by . This book was released on 1991 with total page 556 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapor Deposition

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Publisher : The Electrochemical Society
ISBN 13 : 9781566771788
Total Pages : 1686 pages
Book Rating : 4.7/5 (717 download)

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Book Synopsis Chemical Vapor Deposition by : Electrochemical Society. High Temperature Materials Division

Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Transport Phenomena in Materials Processing

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Publisher : Academic Press
ISBN 13 : 008057582X
Total Pages : 447 pages
Book Rating : 4.0/5 (85 download)

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Book Synopsis Transport Phenomena in Materials Processing by :

Download or read book Transport Phenomena in Materials Processing written by and published by Academic Press. This book was released on 1996-06-25 with total page 447 pages. Available in PDF, EPUB and Kindle. Book excerpt: Materials processing and manufacturing are fields of growing importance whereby transport phenomena play a central role in many of the applications. This volume is one of the first collections of contributions on thesubject. The five papers cover a wide variety of applications

CVD-XI

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ISBN 13 :
Total Pages : 762 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis CVD-XI by : Karl E. Spear

Download or read book CVD-XI written by Karl E. Spear and published by . This book was released on 1990 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

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Publisher : Springer Science & Business Media
ISBN 13 : 940100353X
Total Pages : 372 pages
Book Rating : 4.4/5 (1 download)

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Book Synopsis Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies by : Y. Pauleau

Download or read book Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies written by Y. Pauleau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 372 pages. Available in PDF, EPUB and Kindle. Book excerpt: An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.

Proceedings of the Symposium Om Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing

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Publisher : The Electrochemical Society
ISBN 13 : 9781566770965
Total Pages : 644 pages
Book Rating : 4.7/5 (79 download)

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Book Synopsis Proceedings of the Symposium Om Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing by : M. Meyyappan

Download or read book Proceedings of the Symposium Om Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing written by M. Meyyappan and published by The Electrochemical Society. This book was released on 1995 with total page 644 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Modeling of Chemical Vapor Deposition of Tungsten Films

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Publisher : Birkhäuser
ISBN 13 : 3034877412
Total Pages : 138 pages
Book Rating : 4.0/5 (348 download)

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Book Synopsis Modeling of Chemical Vapor Deposition of Tungsten Films by : Chris R. Kleijn

Download or read book Modeling of Chemical Vapor Deposition of Tungsten Films written by Chris R. Kleijn and published by Birkhäuser. This book was released on 2013-11-11 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.

NASA Technical Memorandum

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Publisher :
ISBN 13 :
Total Pages : 492 pages
Book Rating : 4.:/5 (319 download)

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Book Synopsis NASA Technical Memorandum by :

Download or read book NASA Technical Memorandum written by and published by . This book was released on 1994 with total page 492 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Proceedings of the Second International Symposium on Process Physics and Modeling in Semiconductor Technology

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Publisher :
ISBN 13 :
Total Pages : 826 pages
Book Rating : 4.:/5 (31 download)

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Book Synopsis Proceedings of the Second International Symposium on Process Physics and Modeling in Semiconductor Technology by : G. R. Srinivasan

Download or read book Proceedings of the Second International Symposium on Process Physics and Modeling in Semiconductor Technology written by G. R. Srinivasan and published by . This book was released on 1991 with total page 826 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemically Reacting Flow

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Publisher : John Wiley & Sons
ISBN 13 : 1119186293
Total Pages : 1013 pages
Book Rating : 4.1/5 (191 download)

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Book Synopsis Chemically Reacting Flow by : Robert J. Kee

Download or read book Chemically Reacting Flow written by Robert J. Kee and published by John Wiley & Sons. This book was released on 2017-09-27 with total page 1013 pages. Available in PDF, EPUB and Kindle. Book excerpt: A guide to the theoretical underpinnings and practical applications of chemically reacting flow Chemically Reacting Flow: Theory, Modeling, and Simulation, Second Edition combines fundamental concepts in fluid mechanics and physical chemistry while helping students and professionals to develop the analytical and simulation skills needed to solve real-world engineering problems. The authors clearly explain the theoretical and computational building blocks enabling readers to extend the approaches described to related or entirely new applications. New to this Second Edition are substantially revised and reorganized coverage of topics treated in the first edition. New material in the book includes two important areas of active research: reactive porous-media flows and electrochemical kinetics. These topics create bridges between traditional fluid-flow simulation approaches and transport within porous-media electrochemical systems. The first half of the book is devoted to multicomponent fluid-mechanical fundamentals. In the second half the authors provide the necessary fundamental background needed to couple reaction chemistry into complex reacting-flow models. Coverage of such topics is presented in self-contained chapters, allowing a great deal of flexibility in course curriculum design. • Features new chapters on reactive porous-media flow, electrochemistry, chemical thermodynamics, transport properties, and solving differential equations in MATLAB • Provides the theoretical underpinnings and practical applications of chemically reacting flow • Emphasizes fundamentals, allowing the analyst to understand fundamental theory underlying reacting-flow simulations • Helps readers to acquire greater facility in the derivation and solution of conservation equations in new or unusual circumstances • Reorganized to facilitate use as a class text and now including a solutions manual for academic adopters Computer simulation of reactive systems is highly efficient and cost-effective in the development, enhancement, and optimization of chemical processes. Chemically Reacting Flow: Theory, Modeling, and Simulation, Second Edition helps prepare graduate students in mechanical or chemical engineering, as well as research professionals in those fields take utmost advantage of that powerful capability.

The CRC Handbook of Mechanical Engineering

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Publisher : CRC Press
ISBN 13 : 1420041584
Total Pages : 2690 pages
Book Rating : 4.4/5 (2 download)

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Book Synopsis The CRC Handbook of Mechanical Engineering by : D. Yogi Goswami

Download or read book The CRC Handbook of Mechanical Engineering written by D. Yogi Goswami and published by CRC Press. This book was released on 2004-09-29 with total page 2690 pages. Available in PDF, EPUB and Kindle. Book excerpt: The second edition of this standard-setting handbook provides and all-encompassing reference for the practicing engineer in industry, government, and academia, with relevant background and up-to-date information on the most important topics of modern mechanical engineering. These topics include modern manufacturing and design, robotics, computer engineering, environmental engineering, economics, patent law, and communication/information systems. The final chapter and appendix provide information regarding physical properties and mathematical and computational methods. New topics include nanotechnology, MEMS, electronic packaging, global climate change, electric and hybrid vehicles, and bioengineering.

Annual Report, 1989

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ISBN 13 :
Total Pages : 256 pages
Book Rating : 4.:/5 (31 download)

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Book Synopsis Annual Report, 1989 by : Lewis Research Center

Download or read book Annual Report, 1989 written by Lewis Research Center and published by . This book was released on 1989 with total page 256 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Proceedings of the ... International Conference on Finite Element Methods in Flow Problems

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ISBN 13 :
Total Pages : 1624 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis Proceedings of the ... International Conference on Finite Element Methods in Flow Problems by :

Download or read book Proceedings of the ... International Conference on Finite Element Methods in Flow Problems written by and published by . This book was released on 1989 with total page 1624 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Annual Report

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ISBN 13 :
Total Pages : 264 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis Annual Report by : Lewis Research Center

Download or read book Annual Report written by Lewis Research Center and published by . This book was released on with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapour Deposition (CVD)

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Publisher : CRC Press
ISBN 13 : 1000691071
Total Pages : 501 pages
Book Rating : 4.0/5 (6 download)

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Book Synopsis Chemical Vapour Deposition (CVD) by : Kwang-Leong Choy

Download or read book Chemical Vapour Deposition (CVD) written by Kwang-Leong Choy and published by CRC Press. This book was released on 2019-06-07 with total page 501 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book offers a timely and complete overview on chemical vapour deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites. Chapters discuss key aspects, from processing, material structure and properties to practical use, cost considerations, versatility, and sustainability. The author presents a comprehensive overview of CVD and its potential in producing high performance, cost-effective nanomaterials and thin and thick films. Features Provides an up-to-date introduction to CVD technology for the fabrication of nanomaterials, nanostructured films, and composite coatings Discusses processing, structure, functionalization, properties, and use in clean energy, engineering, and biomedical grand challenges Covers thin and thick films and composites Compares CVD with other processing techniques in terms of structure/properties, cost, versatility, and sustainability Kwang-Leong Choy is the Director of the UCL Centre for Materials Discovery and Professor of Materials Discovery in the Institute for Materials Discovery at the University College London. She earned her D.Phil. from the University of Oxford, and is the recipient of numerous honors including the Hetherington Prize, Oxford Metallurgical Society Award, and Grunfeld Medal and Prize from the Institute of Materials (UK). She is an elected fellow of the Institute of Materials, Minerals and Mining, and the Royal Society of Chemistry.

Chemical Vapour Deposition

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Publisher : Royal Society of Chemistry
ISBN 13 : 0854044655
Total Pages : 600 pages
Book Rating : 4.8/5 (54 download)

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Book Synopsis Chemical Vapour Deposition by : Anthony C. Jones

Download or read book Chemical Vapour Deposition written by Anthony C. Jones and published by Royal Society of Chemistry. This book was released on 2009 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The book is one of the most comprehensive overviews ever written on the key aspects of chemical vapour deposition processes and it is more comprehensive, technically detailed and up-to-date than other books on CVD. The contributing authors are all practising CVD technologists and are leading international experts in the field of CVD. It presents a logical and progressive overview of the various aspects of CVD processes. Basic concepts, such as the various types of CVD processes, the design of CVD reactors, reaction modelling and CVD precursor chemistry are covered in the first few"--Jacket

Springer Handbook of Crystal Growth

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Publisher : Springer Science & Business Media
ISBN 13 : 3540747613
Total Pages : 1823 pages
Book Rating : 4.5/5 (47 download)

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Book Synopsis Springer Handbook of Crystal Growth by : Govindhan Dhanaraj

Download or read book Springer Handbook of Crystal Growth written by Govindhan Dhanaraj and published by Springer Science & Business Media. This book was released on 2010-10-20 with total page 1823 pages. Available in PDF, EPUB and Kindle. Book excerpt: Over the years, many successful attempts have been chapters in this part describe the well-known processes made to describe the art and science of crystal growth, such as Czochralski, Kyropoulos, Bridgman, and o- and many review articles, monographs, symposium v- ing zone, and focus speci cally on recent advances in umes, and handbooks have been published to present improving these methodologies such as application of comprehensive reviews of the advances made in this magnetic elds, orientation of the growth axis, intro- eld. These publications are testament to the grow- duction of a pedestal, and shaped growth. They also ing interest in both bulk and thin- lm crystals because cover a wide range of materials from silicon and III–V of their electronic, optical, mechanical, microstructural, compounds to oxides and uorides. and other properties, and their diverse scienti c and The third part, Part C of the book, focuses on - technological applications. Indeed, most modern ad- lution growth. The various aspects of hydrothermal vances in semiconductor and optical devices would growth are discussed in two chapters, while three other not have been possible without the development of chapters present an overview of the nonlinear and laser many elemental, binary, ternary, and other compound crystals, KTP and KDP. The knowledge on the effect of crystals of varying properties and large sizes. The gravity on solution growth is presented through a c- literature devoted to basic understanding of growth parison of growth on Earth versus in a microgravity mechanisms, defect formation, and growth processes environment.