Thin Films of Copper Oxide and Copper Grown by Atomic Layer Deposition for Applications in Metallization Systems of Microelectronic Devices

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Publisher : Thomas Waechtler
ISBN 13 : 3941003178
Total Pages : 247 pages
Book Rating : 4.9/5 (41 download)

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Book Synopsis Thin Films of Copper Oxide and Copper Grown by Atomic Layer Deposition for Applications in Metallization Systems of Microelectronic Devices by : Thomas Wächtler

Download or read book Thin Films of Copper Oxide and Copper Grown by Atomic Layer Deposition for Applications in Metallization Systems of Microelectronic Devices written by Thomas Wächtler and published by Thomas Waechtler. This book was released on 2010 with total page 247 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Thin Films of Copper Oxide and Copper Grown by Atomic Layer Deposition for Applications in Metallization Systems of Microelectronic Devices

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Total Pages : pages
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Book Synopsis Thin Films of Copper Oxide and Copper Grown by Atomic Layer Deposition for Applications in Metallization Systems of Microelectronic Devices by :

Download or read book Thin Films of Copper Oxide and Copper Grown by Atomic Layer Deposition for Applications in Metallization Systems of Microelectronic Devices written by and published by . This book was released on 2006 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Copper-based multi-level metallization systems in today's ultralarge-scale integrated electronic circuits require the fabrication of diffusion barriers and conductive seed layers for the electrochemical metal deposition. Such films of only several nanometers in thickness have to be deposited void-free and conformal in patterned dielectrics. The envisaged further reduction of the geometric dimensions of the interconnect system calls for coating techniques that circumvent the drawbacks of the well-established physical vapor deposition. The atomic layer deposition method (ALD) allows depositing films on the nanometer scale conformally both on three-dimensional objects as well as on large-area substrates. The present work therefore is concerned with the development of an ALD process to grow copper oxide films based on the metal-organic precursor bis(tri-n- butylphosphane)copper(I)acetylacetonate [(nBu3P)2Cu(acac)]. This liquid, non-fluorinated & beta;-diketonate is brought to react with a mixture of water vapor and oxygen at temperatures from 100 to 160°C. Typical ALD-like growth behavior arises between 100 and 130°C, depending on the respective substrate used. On tantalum nitride and silicon dioxide substrates, smooth films and self-saturating film growth, typical for ALD, are obtained. On ruthenium substrates, positive deposition results are obtained as well. However, a considerable intermixing of the ALD copper oxide with the underlying films takes place. Tantalum substrates lead to a fast self-decomposition of the copper precursor. As a consequence, isolated nuclei or larger particles are always obtained together with continuous films. The copper oxide films grown by ALD can be reduced to copper by vapor-phase processes. If formic acid is used as the reducing agent, these processes can already be carried out at similar temperatures as the ALD, so that agglomeration of the films is largely avoided. Also for an integration with.

ALD of Copper and Copper Oxide Thin Films for Applications in Metallization Systems of ULSI Devices

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (315 download)

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Book Synopsis ALD of Copper and Copper Oxide Thin Films for Applications in Metallization Systems of ULSI Devices by :

Download or read book ALD of Copper and Copper Oxide Thin Films for Applications in Metallization Systems of ULSI Devices written by and published by . This book was released on 2008 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Atomic Layer Deposition for Semiconductors

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Publisher : Springer Science & Business Media
ISBN 13 : 146148054X
Total Pages : 266 pages
Book Rating : 4.4/5 (614 download)

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Book Synopsis Atomic Layer Deposition for Semiconductors by : Cheol Seong Hwang

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Scientific and Technical Aerospace Reports

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Publisher :
ISBN 13 :
Total Pages : 704 pages
Book Rating : 4.X/5 (4 download)

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Book Synopsis Scientific and Technical Aerospace Reports by :

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemistry in Microelectronics

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Publisher : John Wiley & Sons
ISBN 13 : 1118578120
Total Pages : 261 pages
Book Rating : 4.1/5 (185 download)

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Book Synopsis Chemistry in Microelectronics by : Yannick Le Tiec

Download or read book Chemistry in Microelectronics written by Yannick Le Tiec and published by John Wiley & Sons. This book was released on 2013-02-28 with total page 261 pages. Available in PDF, EPUB and Kindle. Book excerpt: Microelectronics is a complex world where many sciences need to collaborate to create nano-objects: we need expertise in electronics, microelectronics, physics, optics and mechanics also crossing into chemistry, electrochemistry, as well as biology, biochemistry and medicine. Chemistry is involved in many fields from materials, chemicals, gases, liquids or salts, the basics of reactions and equilibrium, to the optimized cleaning of surfaces and selective etching of specific layers. In addition, over recent decades, the size of the transistors has been drastically reduced while the functionality of circuits has increased. This book consists of five chapters covering the chemicals and sequences used in processing, from cleaning to etching, the role and impact of their purity, along with the materials used in “Front End Of the Line” which corresponds to the heart and performance of individual transistors, then moving on to the “Back End Of the Line” which is related to the interconnection of all the transistors. Finally, the need for specific functionalization also requires key knowledge on surface treatments and chemical management to allow new applications. Contents 1. Chemistry in the “Front End of the Line” (FEOL): Deposits, Gate Stacks, Epitaxy and Contacts, François Martin, Jean-Michel Hartmann, Véronique Carron and Yannick Le Tiec. 2. Chemistry in Interconnects, Vincent Jousseaume, Paul-Henri Haumesser, Carole Pernel, Jeffery Butterbaugh, Sylvain Maîtrejean and Didier Louis. 3. The Chemistry of Wet Surface Preparation: Cleaning, Etching and Drying, Yannick Le Tiec and Martin Knotter. 4. The Use and Management of Chemical Fluids in Microelectronics, Christiane Gottschalk, Kevin Mclaughlin, Julie Cren, Catherine Peyne and Patrick Valenti. 5. Surface Functionalization for Micro- and Nanosystems: Application to Biosensors, Antoine Hoang, Gilles Marchand, Guillaume Nonglaton, Isabelle Texier-Nogues and Francoise Vinet. About the Authors Yannick Le Tiec is a technical expert at CEA-Leti, Minatec since 2002. He is a CEA-Leti assignee at IBM, Albany (NY) to develop the advanced 14 nm CMOS node and the FDSOI technology. He held different technical positions from the advanced 300 mm SOI CMOS pilot line to different assignments within SOITEC for advanced wafer development and later within INES to optimize solar cell ramp-up and yield. He has been part of the ITRS Front End technical working group at ITRS since 2008.

Reduction and Oxidation of Copper Oxide Thin Films and Thermal Stability Issues in Copper-based Metallization

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Publisher :
ISBN 13 :
Total Pages : 314 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis Reduction and Oxidation of Copper Oxide Thin Films and Thermal Stability Issues in Copper-based Metallization by : Jian Li

Download or read book Reduction and Oxidation of Copper Oxide Thin Films and Thermal Stability Issues in Copper-based Metallization written by Jian Li and published by . This book was released on 1992 with total page 314 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Copper Oxide Thin Films Grown by Pulsed Laser Deposition for Photovoltaic Applications

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (16 download)

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Book Synopsis Copper Oxide Thin Films Grown by Pulsed Laser Deposition for Photovoltaic Applications by : Syed Farid Uddin Farhad

Download or read book Copper Oxide Thin Films Grown by Pulsed Laser Deposition for Photovoltaic Applications written by Syed Farid Uddin Farhad and published by . This book was released on 2016 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Oxide Thin Films, Multilayers, and Nanocomposites

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Publisher : Springer
ISBN 13 : 3319144782
Total Pages : 320 pages
Book Rating : 4.3/5 (191 download)

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Book Synopsis Oxide Thin Films, Multilayers, and Nanocomposites by : Paolo Mele

Download or read book Oxide Thin Films, Multilayers, and Nanocomposites written by Paolo Mele and published by Springer. This book was released on 2015-03-26 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides a comprehensive overview of the science of nanostructured oxides. It details the fundamental techniques and methodologies involved in oxides thin film and bulk growth, characterization and device processing, as well as heterostructures. Both, experts in oxide nanostructures and experts in thin film heteroepitaxy, contribute the interactions described within this book.

Thin Films and Heterostructures for Oxide Electronics

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Publisher : Springer Science & Business Media
ISBN 13 : 0387260897
Total Pages : 416 pages
Book Rating : 4.3/5 (872 download)

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Book Synopsis Thin Films and Heterostructures for Oxide Electronics by : Satishchandra B. Ogale

Download or read book Thin Films and Heterostructures for Oxide Electronics written by Satishchandra B. Ogale and published by Springer Science & Business Media. This book was released on 2005-11-21 with total page 416 pages. Available in PDF, EPUB and Kindle. Book excerpt: Oxides form a broad subject area of research and technology development which encompasses different disciplines such as materials science, solid state chemistry, physics etc. The aim of this book is to demonstrate the interplay of these fields and to provide an introduction to the techniques and methodologies involving film growth, characterization and device processing. The literature in this field is thus fairly scattered in different research journals covering one or the other aspect of the specific activity. This situation calls for a book that will consolidate this information and thus enable a beginner as well as an expert to get an overall perspective of the field, its foundations, and its projected progress.

Copper Oxide Thin Films Grown by Pulsed Laser Deposition for Photovoltaic Applications

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Publisher :
ISBN 13 :
Total Pages : 222 pages
Book Rating : 4.:/5 (976 download)

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Book Synopsis Copper Oxide Thin Films Grown by Pulsed Laser Deposition for Photovoltaic Applications by : Farhad Syed

Download or read book Copper Oxide Thin Films Grown by Pulsed Laser Deposition for Photovoltaic Applications written by Farhad Syed and published by . This book was released on 2016 with total page 222 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Growth Monitoring of Ultrathin Copper and Copper Oxide Films Deposited by Atomic Layer Deposition

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (12 download)

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Book Synopsis Growth Monitoring of Ultrathin Copper and Copper Oxide Films Deposited by Atomic Layer Deposition by : Dileep Dhakal

Download or read book Growth Monitoring of Ultrathin Copper and Copper Oxide Films Deposited by Atomic Layer Deposition written by Dileep Dhakal and published by . This book was released on 2016 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Metals Abstracts

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ISBN 13 :
Total Pages : 1628 pages
Book Rating : 4.:/5 (319 download)

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Book Synopsis Metals Abstracts by :

Download or read book Metals Abstracts written by and published by . This book was released on 1996 with total page 1628 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Oxide Ultrathin Films

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Publisher : John Wiley & Sons
ISBN 13 : 3527640185
Total Pages : 526 pages
Book Rating : 4.5/5 (276 download)

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Book Synopsis Oxide Ultrathin Films by : Gianfranco Pacchioni

Download or read book Oxide Ultrathin Films written by Gianfranco Pacchioni and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 526 pages. Available in PDF, EPUB and Kindle. Book excerpt: A wealth of information in one accessible book. Written by international experts from multidisciplinary fields, this in-depth exploration of oxide ultrathin films covers all aspects of these systems, starting with preparation and characterization, and going on to geometrical and electronic structure, as well as applications in current and future systems and devices. From the Contents: Synthesis and Preparation of Oxide Ultrathin Films Characterization Tools of Oxide Ultrathin Films Ordered Oxide Nanostructures on Metal Surfaces Unusual Properties of Oxides and Other Insulators in the Ultrathin Limit Silica and High-K Dielectrics Thin Films in Microelectronics Oxide Passive Films and Corrosion Protection Oxide Films as Catalytic Materials and as Models of Real Catalysts Oxide Films in Spintronics Oxide Ultrathin Films in Solid Oxide Fuel Cells Transparent Conducting and Chromogenic Oxide Films as Solar Energy Materials Oxide Ultrathin Films in Sensor Applications Ferroelectricity in Ultrathin Film Capacitors Titania Thin Films in Biocompatible Materials and Medical Implants Oxide Nanowires for New Chemical Sensor Devices

Metals Abstracts Index

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ISBN 13 :
Total Pages : 1622 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Metals Abstracts Index by :

Download or read book Metals Abstracts Index written by and published by . This book was released on 1996 with total page 1622 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Integration of Atomic Layer Deposition-grown Copper for Advanced Interconnect Applications

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Publisher :
ISBN 13 :
Total Pages : 167 pages
Book Rating : 4.:/5 (14 download)

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Book Synopsis Integration of Atomic Layer Deposition-grown Copper for Advanced Interconnect Applications by : Liqi Wu

Download or read book Integration of Atomic Layer Deposition-grown Copper for Advanced Interconnect Applications written by Liqi Wu and published by . This book was released on 2008 with total page 167 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Copper Oxide by Thermal Oxidation for Electrochemical Cells and Gas Sensors

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Publisher :
ISBN 13 :
Total Pages : 85 pages
Book Rating : 4.:/5 (94 download)

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Book Synopsis Copper Oxide by Thermal Oxidation for Electrochemical Cells and Gas Sensors by : Kevin Limkrailassiri

Download or read book Copper Oxide by Thermal Oxidation for Electrochemical Cells and Gas Sensors written by Kevin Limkrailassiri and published by . This book was released on 2013 with total page 85 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advances in electrolytic and gas sensing technologies continue to be driven by careful selection and engineering of materials. Copper oxides--both cuprous oxide, Cu2O, and cupric oxide, CuO--are abundant, environmentally friendly, and highly versatile. An attractive feature unique to both copper oxides is the ease of synthesis through a one-step thermal oxidation of copper foil in ambient environment, yielding various oxide compositions and morphologies according to the oxidation temperature and time. There are many possible applications for the copper oxide materials, including pigments in ceramics, catalysts, sensors, solar cells, and batteries, to name a few. This work presents applications in electrochemical cells, more specifically photocatalytic water splitting and CO2 reduction, and gas sensors. The synthesis processes of copper oxides are characterized in terms of processing parameters and inspected with X-ray diffraction measurements and scanning electron microscope (SEM). Three kinds of copper oxides were investigated for photocatalytic testing: 1 micrometer-thick, and 5 micrometer-thick Cu2O films via 0.5 hr and 10 hr oxidation at 300 °C, respectively, and a 10 micrometer-thick Cu2O film with 8 micrometer tall vertically-aligned CuO nanowire array on top via a 2 hr oxidation at 500 °C. Under AM 1.5 illumination, photocurrents of 0.8, 1.3, and 1.7 mA/cm2, respectively, were recorded for these samples, exceeding the performance of previously reported as-synthesized, co-catalyst-free copper oxide photocathodes. Possible explanations for the observed performance based on increased minority carrier diffusion length and enhanced surface electric field are discussed. Future prospects of highly photoactive and stable copper oxide-based photocathodes are also explored. The effectiveness of surface passivation for the copper oxide photocathodes using pristine and hydrogenated TiO2 thin films are quantified through prolonged photoelectrochemical testing. Photocathodes protected with TiO2 films of 50 nm thickness deposited by atomic layer deposition exhibited excellent stability, but the photocurrent dropped to ~0.06 mA/cm2. The results of CO2 reduction using electrochemically reduced Cu sites from copper oxide electrodes as precursors for CO2 reduction is also demonstrated. The proportion of reaction products H2, CO, HCOOH, and CH3COOH is shown to be tunable according to the surface morphology and composition of the original oxide electrode. Therefore, these electrodes exhibit the potential for highly selective liquid fuel production, including a measured H2/CO product ratio of ~2.6 for maximized production of liquid fuels using the Fischer-Tropsch process. A simple gas sensing architecture taking advantage of the vertically-aligned growth of CuO nanowires is demonstrated. Complete devices are formed instantly following CuO nanowire synthesis by affixing a pair of electrode pads of a second substrate on top of the nanowire array to form a complete electrical circuit. This device architecture offers simple and facile integration of nanowires into a working device. A resistance change R/R0 of ~6 was observed for 8.1% H2 concentration increasing to ~26 for 25.5% H2 concentration. Recovery time is excellent at ~0.5 min or less. A description for the formation of facile microheater-integrated devices is outlined as a promising next step. A process flow to fabricate this device along with heat transfer analysis to predict the temperature distribution in the device is provided and the power consumption may be further minimized with a proposed pulsed heating strategy.