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The Stopping And Ranges Of Ions In Matter The Stopping And Range Of Ions In Solids
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Book Synopsis SRIM, the Stopping and Range of Ions in Matter by : James F. Ziegler
Download or read book SRIM, the Stopping and Range of Ions in Matter written by James F. Ziegler and published by Lulu.com. This book was released on 2008 with total page 683 pages. Available in PDF, EPUB and Kindle. Book excerpt: "This is a textbook the gives the background of the stopping and range of ions in matter (www.SRIM.org). It is written to be the prime resource for those who use SRIM in scientific work."--Lulu.com.
Book Synopsis Ion Implantation Techniques by : H. Ryssel
Download or read book Ion Implantation Techniques written by H. Ryssel and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 377 pages. Available in PDF, EPUB and Kindle. Book excerpt: In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks 1970, Garmisch-Partenkirchen 1971, Osaka 1974, Warwick 1975, Boulder 1976, Budapest 1978, and Albany 1980). Another series of conferences was devoted more to implantation equipment and tech niques (Salford 1977, Trento 1978, and Kingston 1980). In connection with the Third International Conference on Ion Implantation: Equipment and Tech niques, held at Queen's University, ' Kingston, Ontario, Canada, July 8-11, 1980, a two-day instructional program was organized parallel to an implan tation conference for the first time. This implantation school concentra ted on aspects of implantation-equipment design. This book contains all lectures presented at the International Ion Implantation School organized in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, held at the Convention Center, Berchtesgaden, Germany, September 13-17, 1982. In con trast to the first .school, the main emphasis in thiS school was placed on practical aspects of implanter operation and application. In three chap ters, various machine aspects of ion implantation (general concepts, ion sources, safety, calibration, dOSimetry), range distributions (stopping power, range profiles), and measuring techniques (electrical and nonelec tri ca 1 measu ri ng techni ques, annea 1 i ng) are di scussed. In the appendi x, a review of the state of the art in modern implantation equipment is given.
Book Synopsis Ion-Solid Interactions by : Michael Nastasi
Download or read book Ion-Solid Interactions written by Michael Nastasi and published by Cambridge University Press. This book was released on 1996-03-29 with total page 572 pages. Available in PDF, EPUB and Kindle. Book excerpt: Comprehensive guide to an important materials science technique for students and researchers.
Download or read book NASA Technical Memorandum written by and published by . This book was released on 1989 with total page 468 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis The Stopping and Range of Ions in Solids by : James F. Ziegler
Download or read book The Stopping and Range of Ions in Solids written by James F. Ziegler and published by . This book was released on 1985 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Fundamentals of Semiconductor Processing Technology by : Badih El-Kareh
Download or read book Fundamentals of Semiconductor Processing Technology written by Badih El-Kareh and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 605 pages. Available in PDF, EPUB and Kindle. Book excerpt: The drive toward new semiconductor technologies is intricately related to market demands for cheaper, smaller, faster, and more reliable circuits with lower power consumption. The development of new processing tools and technologies is aimed at optimizing one or more of these requirements. This goal can, however, only be achieved by a concerted effort between scientists, engineers, technicians, and operators in research, development, and manufac turing. It is therefore important that experts in specific disciplines, such as device and circuit design, understand the principle, capabil ities, and limitations of tools and processing technologies. It is also important that those working on specific unit processes, such as lithography or hot processes, be familiar with other unit processes used to manufacture the product. Several excellent books have been published on the subject of process technologies. These texts, however, cover subjects in too much detail, or do not cover topics important to modem tech nologies. This book is written with the need for a "bridge" between different disciplines in mind. It is intended to present to engineers and scientists those parts of modem processing technologies that are of greatest importance to the design and manufacture of semi conductor circuits. The material is presented with sufficient detail to understand and analyze interactions between processing and other semiconductor disciplines, such as design of devices and cir cuits, their electrical parameters, reliability, and yield.
Book Synopsis Quantities For Generalized Dosimetry Of Ionizing Radiations in Liquid Water by : D E Watt
Download or read book Quantities For Generalized Dosimetry Of Ionizing Radiations in Liquid Water written by D E Watt and published by CRC Press. This book was released on 2003-09-02 with total page 388 pages. Available in PDF, EPUB and Kindle. Book excerpt: Intended as a reference handbook of quantities used in dosimetry of ionizing radiations. Fields of application are radiological protection, environmental radiation, health physics, nuclear medicine and radiotherapy, radiobiology, radiopharmacy and radiation chemistry. The book is in three parts. The first part deals with electrons, X-rays and gamma-rays. The second part contains data for heavy charged particles ranging from protons to uranium ions, and the final part is concerned with neutrons. Quantities tabulated include quality paramenters recommended by the International Commissions of Radiological Protection and of radiation quantities units and measurements.
Book Synopsis Ion Tracks and Microtechnology by : Reimar Spohr
Download or read book Ion Tracks and Microtechnology written by Reimar Spohr and published by Reimar Spohr. This book was released on 1990 with total page 292 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Swift Heavy Ions for Materials Engineering and Nanostructuring by : Devesh Kumar Avasthi
Download or read book Swift Heavy Ions for Materials Engineering and Nanostructuring written by Devesh Kumar Avasthi and published by Springer Science & Business Media. This book was released on 2011-05-24 with total page 292 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion beams have been used for decades for characterizing and analyzing materials. Now energetic ion beams are providing ways to modify the materials in unprecedented ways. This book highlights the emergence of high-energy swift heavy ions as a tool for tailoring the properties of materials with nanoscale structures. Swift heavy ions interact with materials by exciting/ionizing electrons without directly moving the atoms. This opens a new horizon towards the 'so-called' soft engineering. The book discusses the ion beam technology emerging from the non-equilibrium conditions and emphasizes the power of controlled irradiation to tailor the properties of various types of materials for specific needs.
Book Synopsis Handbook of Semiconductor Manufacturing Technology by : Yoshio Nishi
Download or read book Handbook of Semiconductor Manufacturing Technology written by Yoshio Nishi and published by CRC Press. This book was released on 2000-08-09 with total page 1186 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Handbook of Semiconductor Manufacturing Technology describes the individual processes and manufacturing control, support, and infrastructure technologies of silicon-based integrated-circuit manufacturing, many of which are also applicable for building devices on other semiconductor substrates. Discussing ion implantation, rapid thermal processing, photomask fabrication, chip testing, and plasma etching, the editors explore current and anticipated equipment, devices, materials, and practices of silicon-based manufacturing. The book includes a foreword by Jack S. Kilby, cowinner of the Nobel Prize in Physics 2000 "for his part in the invention of the integrated circuit."
Book Synopsis Journal of Research of the National Institute of Standards and Technology by :
Download or read book Journal of Research of the National Institute of Standards and Technology written by and published by . This book was released on 2000 with total page 548 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Nuclear Physics for Applications by : Stanley G. Prussin
Download or read book Nuclear Physics for Applications written by Stanley G. Prussin and published by John Wiley & Sons. This book was released on 2007-10-29 with total page 659 pages. Available in PDF, EPUB and Kindle. Book excerpt: Written by a researcher and teacher with experience at top institutes in the US and Europe, this textbook provides advanced undergraduates minoring in physics with working knowledge of the principles of nuclear physics. Simplifying models and approaches reveal the essence of the principles involved, with the mathematical and quantum mechanical background integrated in the text where it is needed and not relegated to the appendices. The practicality of the book is enhanced by numerous end-of-chapter problems and solutions available on the Wiley homepage.
Book Synopsis Ion Implantation Science and Technology by : J.F. Ziegler
Download or read book Ion Implantation Science and Technology written by J.F. Ziegler and published by Elsevier. This book was released on 2012-12-02 with total page 649 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion Implantation: Science and Technology serves as both an introduction to and tutorial on the science, techniques, and machines involved in ion implantation. The book is divided into two parts. Part 1 discusses topics such as the history of the ion implantation; the different types and purposes of ion implanters; the penetration of energetic ions into solids; damage annealing in silicon; and ion implantation metallurgy. Part 2 covers areas such as ion implementation system concepts; ion sources; underlying principles related to ion optics; and safety and radiation considerations in ion implantation. The text is recommended for engineers who would like to be acquainted with the principles and processes behind ion implantation or make studies on the field.
Book Synopsis Handbook of Range, Distributions for Energetic Ions in All Elements by : U. Littmark
Download or read book Handbook of Range, Distributions for Energetic Ions in All Elements written by U. Littmark and published by Pergamon. This book was released on 1980 with total page 506 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Exploring Monte Carlo Methods by : William L. Dunn
Download or read book Exploring Monte Carlo Methods written by William L. Dunn and published by Elsevier. This book was released on 2011-05-24 with total page 401 pages. Available in PDF, EPUB and Kindle. Book excerpt: Exploring Monte Carlo Methods is a basic text that describes the numerical methods that have come to be known as "Monte Carlo." The book treats the subject generically through the first eight chapters and, thus, should be of use to anyone who wants to learn to use Monte Carlo. The next two chapters focus on applications in nuclear engineering, which are illustrative of uses in other fields. Five appendices are included, which provide useful information on probability distributions, general-purpose Monte Carlo codes for radiation transport, and other matters. The famous "Buffon's needle problem" provides a unifying theme as it is repeatedly used to illustrate many features of Monte Carlo methods. This book provides the basic detail necessary to learn how to apply Monte Carlo methods and thus should be useful as a text book for undergraduate or graduate courses in numerical methods. It is written so that interested readers with only an understanding of calculus and differential equations can learn Monte Carlo on their own. Coverage of topics such as variance reduction, pseudo-random number generation, Markov chain Monte Carlo, inverse Monte Carlo, and linear operator equations will make the book useful even to experienced Monte Carlo practitioners. - Provides a concise treatment of generic Monte Carlo methods - Proofs for each chapter - Appendixes include Certain mathematical functions; Bose Einstein functions, Fermi Dirac functions, Watson functions
Book Synopsis Handbook of Thin Film Technology by : Hartmut Frey
Download or read book Handbook of Thin Film Technology written by Hartmut Frey and published by Springer Science & Business Media. This book was released on 2015-05-06 with total page 385 pages. Available in PDF, EPUB and Kindle. Book excerpt: “Handbook of Thin Film Technology” covers all aspects of coatings preparation, characterization and applications. Different deposition techniques based on vacuum and plasma processes are presented. Methods of surface and thin film analysis including coating thickness, structural, optical, electrical, mechanical and magnetic properties of films are detailed described. The several applications of thin coatings and a special chapter focusing on nanoparticle-based films can be found in this handbook. A complete reference for students and professionals interested in the science and technology of thin films.
Book Synopsis Particle Penetration and Radiation Effects Volume 2 by : Peter Sigmund
Download or read book Particle Penetration and Radiation Effects Volume 2 written by Peter Sigmund and published by Springer. This book was released on 2014-05-29 with total page 617 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book represents volume 2 of a 3-volume monograph on Particle Penetration and Radiation Effects. While volume 1 addressed the basic theory of scattering and stopping of swift point charges, i.e., protons, antiprotons and alpha particles, the present volume focuses on ions heavier than helium as well as molecules and clusters over an energy range from a few keV/u to a few hundred MeV/u. The book addresses the foundations in atomic-collision physics of a wide variety of application areas within materials and surface science and engineering, micro and nano science and technology, radiation medicine and biology as well as nuclear and particle physics. Problems have been added to all chapters. This should make the book useful for both self-study and advanced university courses. An effort has been made to establish a unified notation throughout the monograph.