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The Ion Assisted Etching And Profile Development Of Silicon In Molecular And Atomic Chlorine
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Book Synopsis The Ion-assisted Etching and Profile Development of Silicon in Molecular and Atomic Chlorine by : Joshua Aaron Levinson
Download or read book The Ion-assisted Etching and Profile Development of Silicon in Molecular and Atomic Chlorine written by Joshua Aaron Levinson and published by . This book was released on 1999 with total page 318 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Ion-assisted Etching and Profile Development of Silicon in Molecular and Atomic Chlorine by : Joshua A. Levinson
Download or read book Ion-assisted Etching and Profile Development of Silicon in Molecular and Atomic Chlorine written by Joshua A. Levinson and published by . This book was released on 1998 with total page 5 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Atomic and Molecular Beams by : Cyril Bernard Lucas
Download or read book Atomic and Molecular Beams written by Cyril Bernard Lucas and published by CRC Press. This book was released on 2013-12-13 with total page 396 pages. Available in PDF, EPUB and Kindle. Book excerpt: Atomic and molecular beams are employed in physics and chemistry experiments and, to a lesser extent, in the biological sciences. These beams enable atoms to be studied under collision-free conditions and allow the study of their interaction with other atoms, charged particles, radiation, and surfaces. Atomic and Molecular Beams: Production and Collimation explores the latest techniques for producing a beam from any substance as well as from the dissociation of hydrogen, oxygen, nitrogen, and the halogens. The book not only provides the basic expressions essential to beam design but also offers in-depth coverage of: Design of ovens and furnaces for atomic beam production Creation of atomic beams that require higher evaporation temperatures Theory of beam formation including the Clausing equation and the transmission probability Construction of collimating arrays in metals, plastics, glass, and other materials Optimization of the design of atomic beam collimators While many review articles and books discuss the application of atomic beams, few give technical details of their production. Focusing on practical application in the laboratory, the author critically reviews over 800 references to compare the atomic and molecular beam formation theories with actual experiments. Atomic and Molecular Beams: Production and Collimation is a comprehensive source of material for experimentalists facing the design of any atomic or molecular beam and theoreticians wishing to extend the theory.
Book Synopsis Plasma Processing of Nanomaterials by : R. Mohan Sankaran
Download or read book Plasma Processing of Nanomaterials written by R. Mohan Sankaran and published by CRC Press. This book was released on 2017-12-19 with total page 433 pages. Available in PDF, EPUB and Kindle. Book excerpt: We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress. Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits. An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of: Nanoscale etching/deposition of thin films Catalytic growth of carbon nanotubes and semiconductor nanowires Silicon nanoparticle synthesis Functionalization of carbon nanotubes Self-organized nanostructures Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work. About the Author: R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.
Book Synopsis Journal of Vacuum Science & Technology by : American Vacuum Society
Download or read book Journal of Vacuum Science & Technology written by American Vacuum Society and published by . This book was released on 2000 with total page 1172 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Atomic Layer Processing by : Thorsten Lill
Download or read book Atomic Layer Processing written by Thorsten Lill and published by John Wiley & Sons. This book was released on 2021-06-28 with total page 306 pages. Available in PDF, EPUB and Kindle. Book excerpt: Learn about fundamental and advanced topics in etching with this practical guide Atomic Layer Processing: Semiconductor Dry Etching Technology delivers a hands-on, one-stop resource for understanding etching technologies and their applications. The distinguished scientist, executive, and author offers readers in-depth information on the various etching technologies used in the semiconductor industry, including thermal, isotropic atomic layer, radical, ion-assisted, and reactive ion etching. The book begins with a brief history of etching technology and the role it has played in the information technology revolution, along with a collection of commonly used terminology in the industry. It then moves on to discuss a variety of different etching techniques, before concluding with discussions of the fundamentals of etching reactor design and newly emerging topics in the field such as the role played by artificial intelligence in the technology. Atomic Layer Processing includes a wide variety of other topics as well, all of which contribute to the author's goal of providing the reader with an atomic-level understanding of dry etching technology sufficient to develop specific solutions for existing and emerging semiconductor technologies. Readers will benefit from: A complete discussion of the fundamentals of how to remove atoms from various surfaces An examination of emerging etching technologies, including laser and electron beam assisted etching A treatment of process control in etching technology and the role played by artificial intelligence Analyses of a wide variety of etching methods, including thermal or vapor etching, isotropic atomic layer etching, radical etching, directional atomic layer etching, and more Perfect for materials scientists, semiconductor physicists, and surface chemists, Atomic Layer Processing will also earn a place in the libraries of engineering scientists in industry and academia, as well as anyone involved with the manufacture of semiconductor technology. The author's close involvement with corporate research & development and academic research allows the book to offer a uniquely multifaceted approach to the subject.
Book Synopsis Electrical & Electronics Abstracts by :
Download or read book Electrical & Electronics Abstracts written by and published by . This book was released on 1997 with total page 2304 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Molecular Dynamics Simulations and Thermochemistry of Reactive Ion Etching of Silicon by Chlorine, Chlorine Dimer, Bromine, and Bromine Dimer Cations by :
Download or read book Molecular Dynamics Simulations and Thermochemistry of Reactive Ion Etching of Silicon by Chlorine, Chlorine Dimer, Bromine, and Bromine Dimer Cations written by and published by . This book was released on 1998 with total page 7 pages. Available in PDF, EPUB and Kindle. Book excerpt: Simulations of Cl plasma etch of Si surfaces with MD techniques agree reasonably well with the available experimental information on yields and surface morphologies. This information has been supplied to a Monte Carlo etch profile resulting in substantial agreement with comparable inputs provided through controlled experiments. To the extent that more recent measurements of etch rates are more reliable than older ones, preliminary MD simulations using bond-order corrections to the atomic interactions between neighboring Si atoms on the surface improves agreement with experiment through an increase in etch rate and improved agreement with XPS measurements of surface stoichiometry. Thermochemical and geometric analysis of small Si-Br molecules is consistent with the current notions of the effects of including brominated species in etchant gases.
Book Synopsis 3D Integration for VLSI Systems by : Chuan Seng Tan
Download or read book 3D Integration for VLSI Systems written by Chuan Seng Tan and published by CRC Press. This book was released on 2016-04-19 with total page 376 pages. Available in PDF, EPUB and Kindle. Book excerpt: Three-dimensional (3D) integration is identified as a possible avenue for continuous performance growth in integrated circuits (IC) as the conventional scaling approach is faced with unprecedented challenges in fundamental and economic limits. Wafer level 3D IC can take several forms, and they usually include a stack of several thinned IC layers th
Book Synopsis Chlorine Reactive Ion Beam Etching of Single Crystal Silicon by : Eugene Eric Krueger
Download or read book Chlorine Reactive Ion Beam Etching of Single Crystal Silicon written by Eugene Eric Krueger and published by . This book was released on 1988 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Annual Commencement by : Stanford University
Download or read book Annual Commencement written by Stanford University and published by . This book was released on 1996 with total page 506 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Computional Studies of Plasma-surface Interactions by : David W. Humbird
Download or read book Computional Studies of Plasma-surface Interactions written by David W. Humbird and published by . This book was released on 2004 with total page 524 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis IBM Journal of Research and Development by :
Download or read book IBM Journal of Research and Development written by and published by . This book was released on 2002 with total page 854 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Development of Silicon/chlorine Plasma Etching System for Fundamental Studies on Shape Evolution by : Jee-Loon Look
Download or read book Development of Silicon/chlorine Plasma Etching System for Fundamental Studies on Shape Evolution written by Jee-Loon Look and published by . This book was released on 1988 with total page 238 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Feature Profile Evolution During the High Density Plasma Etching of Polysilicon by : Arpan Pravin Mahorowala
Download or read book Feature Profile Evolution During the High Density Plasma Etching of Polysilicon written by Arpan Pravin Mahorowala and published by . This book was released on 1998 with total page 200 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Dry Etching Technology for Semiconductors by : Kazuo Nojiri
Download or read book Dry Etching Technology for Semiconductors written by Kazuo Nojiri and published by Springer. This book was released on 2014-10-25 with total page 126 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. The author describes the device manufacturing flow, and explains in which part of the flow dry etching is actually used. The content is designed as a practical guide for engineers working at chip makers, equipment suppliers and materials suppliers, and university students studying plasma, focusing on the topics they need most, such as detailed etching processes for each material (Si, SiO2, Metal etc) used in semiconductor devices, etching equipment used in manufacturing fabs, explanation of why a particular plasma source and gas chemistry are used for the etching of each material, and how to develop etching processes. The latest, key technologies are also described, such as 3D IC Etching, Dual Damascene Etching, Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double Patterning etc.
Book Synopsis Plasma Processing of Materials by : National Research Council
Download or read book Plasma Processing of Materials written by National Research Council and published by National Academies Press. This book was released on 1991-02-01 with total page 88 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
