The Effect Of Rf Sputtering Deposition Parameters On The Functional Properties Of Chrom Ium Oxide Thin Films

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The Effect of RF Sputtering Deposition Parameters on the Functional Properties of Chrom Ium Oxide Thin Films

Author : John Gerald Kavanagh
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (861 download)

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Book Synopsis The Effect of RF Sputtering Deposition Parameters on the Functional Properties of Chrom Ium Oxide Thin Films by : John Gerald Kavanagh

Download or read book The Effect of RF Sputtering Deposition Parameters on the Functional Properties of Chrom Ium Oxide Thin Films written by John Gerald Kavanagh and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: An investigation was made into the effect of rf magnetron deposition parameters on the resulting properties of chromium oxide thin films. The films were sputtered in an argon/ oxygen plasma environment with the main deposition parameters being the argon and oxygen flow rate, chamber pressure, deposition-time and the deposition power (forward and back). Tire effect of the sputter deposition regime which is controlled by the sputtering hysteresis phenomenon i.e. the reactive and metallic regimes, are expected to have a significant effect on the properties of the sputtered films and will have to be taken into account. The films were deposited on a range of substrates such as silicon, glass micro-slides and stainless steel 304 and the composition of the mainly amorphous sputtered films was determined through XPS, EDX and XRD. Optical characterisation and determination of optical constants was undertaken by transmission/reflection spectrophotometry, ellipsometry and Raman and FTIR analysis. Two designs of a solar thermal absorber (multilayer interference and tandem absorber) were designed and fabricated based on the optical constants measured by the methods previously stated and their performance analysed. The surface energy was calculated through measurement of the contact angle with three different liquids and the corrosion resistance of the films measured by OCP, linear sweep and EIS analysis in 3.5wt% NaCI solution. The mechanical properties were measured by nanoindentation, from which the hardness and elastic modulus of the samples could be obtained. The electrical properties were measured using a four point probe to calculate the thin film resistivity and the Kelvin probe analysis was used to measure the work function of the samples.

Handbook of Sputter Deposition Technology

Author : Kiyotaka Wasa
Publisher : William Andrew
ISBN 13 : 1437734839
Total Pages : 658 pages
Book Rating : 4.4/5 (377 download)

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Book Synopsis Handbook of Sputter Deposition Technology by : Kiyotaka Wasa

Download or read book Handbook of Sputter Deposition Technology written by Kiyotaka Wasa and published by William Andrew. This book was released on 2012-11-20 with total page 658 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere

The Formation and Characterization of RF Reactively Sputtered Iron Oxide Thin Films as Magnetic Recording Media

Author : Jong-Kai Lin
Publisher :
ISBN 13 :
Total Pages : 624 pages
Book Rating : 4.:/5 (319 download)

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Book Synopsis The Formation and Characterization of RF Reactively Sputtered Iron Oxide Thin Films as Magnetic Recording Media by : Jong-Kai Lin

Download or read book The Formation and Characterization of RF Reactively Sputtered Iron Oxide Thin Films as Magnetic Recording Media written by Jong-Kai Lin and published by . This book was released on 1986 with total page 624 pages. Available in PDF, EPUB and Kindle. Book excerpt:

High Entropy Thin Films by Magnetron Sputtering

Author : Mohamed El Garah
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (139 download)

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Book Synopsis High Entropy Thin Films by Magnetron Sputtering by : Mohamed El Garah

Download or read book High Entropy Thin Films by Magnetron Sputtering written by Mohamed El Garah and published by . This book was released on 2019 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surface coating is of a great interest to increase the performances of the materials and extend its lifetime. High entropy films (HEFs) become the hot spot for developing surface engineering applications due to their good performances. They are reported to have superior properties such as good corrosion, wear resistance and excellent high temperature oxidation. Various deposition techniques have been exploited to fabricate HEFs such as laser cladding, spraying, sputter deposition and electrochemical deposition. These techniques are known to be an easy process to achieve a rapid quenching. Magnetron sputtering is seen as the most efficient methods to deposit the HEFs. Different gas can be used to prepare the ceramic materials. Besides, the deposition parameters reveal a strong influence on the physicochemical properties of HEFs. Working pressure, substrate temperature, bias voltage and gas mixture flow ratios have been reported to influence the morphology, microstructure, and functional properties of HEFs. The chapter overviews the development of the recent HEFs prepared by magnetron sputtering technique. First, it describes the principal of the technique. Then, it reports the classes of HEFs followed by the effect of the deposition parameters on their different properties. Applications have been developed using some HEFs for biomaterials and machining process.

Sputtering Materials for VLSI and Thin Film Devices

Author : Jaydeep Sarkar
Publisher : William Andrew
ISBN 13 : 0815519877
Total Pages : 614 pages
Book Rating : 4.8/5 (155 download)

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Book Synopsis Sputtering Materials for VLSI and Thin Film Devices by : Jaydeep Sarkar

Download or read book Sputtering Materials for VLSI and Thin Film Devices written by Jaydeep Sarkar and published by William Andrew. This book was released on 2010-12-13 with total page 614 pages. Available in PDF, EPUB and Kindle. Book excerpt: An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements Practical information on technology trends, role of sputtering and major OEMs Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc. Practical case-studies on target performance and troubleshooting Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry

Thin Film Metal-Oxides

Author : Shriram Ramanathan
Publisher : Springer Science & Business Media
ISBN 13 : 1441906649
Total Pages : 344 pages
Book Rating : 4.4/5 (419 download)

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Book Synopsis Thin Film Metal-Oxides by : Shriram Ramanathan

Download or read book Thin Film Metal-Oxides written by Shriram Ramanathan and published by Springer Science & Business Media. This book was released on 2009-12-03 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: Thin Film Metal-Oxides provides a representative account of the fundamental structure-property relations in oxide thin films. Functional properties of thin film oxides are discussed in the context of applications in emerging electronics and renewable energy technologies. Readers will find a detailed description of deposition and characterization of metal oxide thin films, theoretical treatment of select properties and their functional performance in solid state devices, from leading researchers. Scientists and engineers involved with oxide semiconductors, electronic materials and alternative energy will find Thin Film Metal-Oxides a useful reference.

Chemical Abstracts

Author :
Publisher :
ISBN 13 :
Total Pages : 2002 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Chemical Abstracts by :

Download or read book Chemical Abstracts written by and published by . This book was released on 2002 with total page 2002 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Effects of deposition parameters on properties of rf sputtered molybdenum films

Author : R. S. Nowicki
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (141 download)

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Book Synopsis Effects of deposition parameters on properties of rf sputtered molybdenum films by : R. S. Nowicki

Download or read book Effects of deposition parameters on properties of rf sputtered molybdenum films written by R. S. Nowicki and published by . This book was released on 1974 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Nanostructured Metal Oxides and Devices

Author : M. K. Jayaraj
Publisher : Springer Nature
ISBN 13 : 9811533148
Total Pages : 348 pages
Book Rating : 4.8/5 (115 download)

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Book Synopsis Nanostructured Metal Oxides and Devices by : M. K. Jayaraj

Download or read book Nanostructured Metal Oxides and Devices written by M. K. Jayaraj and published by Springer Nature. This book was released on 2020-04-16 with total page 348 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book primarily covers the fundamental science, synthesis, characterization, optoelectronic properties, and applications of metal oxide nanomaterials. It discusses the basic aspects of synthetic procedures and fabrication technologies, explains the related experimental techniques and also elaborates on the current status of nanostructured oxide materials and related devices. Two major aspects of metal oxide nanostructures – their optical and electrical properties – are described in detail. The first five chapters focus on the optical characteristics of semiconducting materials, especially metal oxides at the nanoscale. The following five chapters discuss the electrical properties observed in metal oxide-based semiconductors and the status quo of device-level developments in a variety of applications such as sensors, transistors, dilute magnetic semiconductors, and dielectric materials. The basic science and mechanism behind the optoelectronic phenomena are explained in detail, to aid readers interested in the structure–property symbiosis in semiconducting nanomaterials. In short, the book offers a valuable reference guide for researchers and academics in the areas of material science and semiconductor technology, especially nanophotonics and electronics.

Physics Briefs

Author :
Publisher :
ISBN 13 :
Total Pages : 1170 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Physics Briefs by :

Download or read book Physics Briefs written by and published by . This book was released on 1994 with total page 1170 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Advanced Strategies in Thin Film Engineering by Magnetron Sputtering

Author : Alberto Palmero
Publisher : MDPI
ISBN 13 : 3039364294
Total Pages : 148 pages
Book Rating : 4.0/5 (393 download)

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Book Synopsis Advanced Strategies in Thin Film Engineering by Magnetron Sputtering by : Alberto Palmero

Download or read book Advanced Strategies in Thin Film Engineering by Magnetron Sputtering written by Alberto Palmero and published by MDPI. This book was released on 2020-12-10 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt: Recent years have witnessed the flourishing of numerous novel strategies based on the magnetron sputtering technique aimed at the advanced engineering of thin films, such as HiPIMS, combined vacuum processes, the implementation of complex precursor gases or the inclusion of particle guns in the reactor, among others. At the forefront of these approaches, investigations focused on nanostructured coatings appear today as one of the priorities in many scientific and technological communities: The science behind them appears in most of the cases as a "terra incognita", fascinating both the fundamentalist, who imagines new concepts, and the experimenter, who is able to create and study new films with as of yet unprecedented performances. These scientific and technological challenges, along with the existence of numerous scientific issues that have yet to be clarified in classical magnetron sputtering depositions (e.g., process control and stability, nanostructuration mechanisms, connection between film morphology and properties or upscaling procedures from the laboratory to industrial scales) have motivated us to edit a specialized volume containing the state-of-the art that put together these innovative fundamental and applied research topics. These include, but are not limited to: • Nanostructure-related properties; • Atomistic processes during film growth; • Process control, process stability, and in situ diagnostics; • Fundamentals and applications of HiPIMS; • Thin film nanostructuration phenomena; • Tribological, anticorrosion, and mechanical properties; • Combined procedures based on the magnetron sputtering technique; • Industrial applications; • Devices.

RF- Sputtered Cadmium Oxide Thin Films for Gas Sensing Application

Author : Anil Kumar Gadipelly
Publisher : LAP Lambert Academic Publishing
ISBN 13 : 9783659539350
Total Pages : 176 pages
Book Rating : 4.5/5 (393 download)

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Book Synopsis RF- Sputtered Cadmium Oxide Thin Films for Gas Sensing Application by : Anil Kumar Gadipelly

Download or read book RF- Sputtered Cadmium Oxide Thin Films for Gas Sensing Application written by Anil Kumar Gadipelly and published by LAP Lambert Academic Publishing. This book was released on 2015-02-04 with total page 176 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this book we have discussed the preparation and characterization of CdO thin films using RF reactive magnetron sputtering technique. The deposition parameters such as oxygen partial pressure, substrate temperature and film thickness are optimized for producing good quality films. Systematic characterization of as deposited and annealed films has been discussed from the crystal structure, surface morphology, film composition, optical and electrical properties. The films prepared under optimized conditions are tested for gas sensing characteristics towards ammonia gas.

The Deposition of Chromium Oxide Thin Films by Metallo-organic Chemical Vapor Deposition

Author : Sanghamitra Baral
Publisher :
ISBN 13 :
Total Pages : 108 pages
Book Rating : 4.:/5 (815 download)

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Book Synopsis The Deposition of Chromium Oxide Thin Films by Metallo-organic Chemical Vapor Deposition by : Sanghamitra Baral

Download or read book The Deposition of Chromium Oxide Thin Films by Metallo-organic Chemical Vapor Deposition written by Sanghamitra Baral and published by . This book was released on 1990 with total page 108 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Scientific and Technical Aerospace Reports

Author :
Publisher :
ISBN 13 :
Total Pages : 798 pages
Book Rating : 4.:/5 (31 download)

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Book Synopsis Scientific and Technical Aerospace Reports by :

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1981 with total page 798 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Thin Films and Heterostructures for Oxide Electronics

Author : Satishchandra B. Ogale
Publisher : Springer Science & Business Media
ISBN 13 : 0387260897
Total Pages : 416 pages
Book Rating : 4.3/5 (872 download)

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Book Synopsis Thin Films and Heterostructures for Oxide Electronics by : Satishchandra B. Ogale

Download or read book Thin Films and Heterostructures for Oxide Electronics written by Satishchandra B. Ogale and published by Springer Science & Business Media. This book was released on 2005-11-21 with total page 416 pages. Available in PDF, EPUB and Kindle. Book excerpt: Oxides form a broad subject area of research and technology development which encompasses different disciplines such as materials science, solid state chemistry, physics etc. The aim of this book is to demonstrate the interplay of these fields and to provide an introduction to the techniques and methodologies involving film growth, characterization and device processing. The literature in this field is thus fairly scattered in different research journals covering one or the other aspect of the specific activity. This situation calls for a book that will consolidate this information and thus enable a beginner as well as an expert to get an overall perspective of the field, its foundations, and its projected progress.

Oxide Ultrathin Films

Author : Gianfranco Pacchioni
Publisher : John Wiley & Sons
ISBN 13 : 3527640193
Total Pages : 368 pages
Book Rating : 4.5/5 (276 download)

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Book Synopsis Oxide Ultrathin Films by : Gianfranco Pacchioni

Download or read book Oxide Ultrathin Films written by Gianfranco Pacchioni and published by John Wiley & Sons. This book was released on 2012-09-19 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt: A wealth of information in one accessible book. Written by international experts from multidisciplinary fields, this in-depth exploration of oxide ultrathin films covers all aspects of these systems, starting with preparation and characterization, and going on to geometrical and electronic structure, as well as applications in current and future systems and devices. From the Contents: Synthesis and Preparation of Oxide Ultrathin Films Characterization Tools of Oxide Ultrathin Films Ordered Oxide Nanostructures on Metal Surfaces Unusual Properties of Oxides and Other Insulators in the Ultrathin Limit Silica and High-K Dielectrics Thin Films in Microelectronics Oxide Passive Films and Corrosion Protection Oxide Films as Catalytic Materials and as Models of Real Catalysts Oxide Films in Spintronics Oxide Ultrathin Films in Solid Oxide Fuel Cells Transparent Conducting and Chromogenic Oxide Films as Solar Energy Materials Oxide Ultrathin Films in Sensor Applications Ferroelectricity in Ultrathin Film Capacitors Titania Thin Films in Biocompatible Materials and Medical Implants Oxide Nanowires for New Chemical Sensor Devices

Sputter Deposition Processes For Thin Film Oxide Dielectrics

Author : Sara Cordero Barron
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (422 download)

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Book Synopsis Sputter Deposition Processes For Thin Film Oxide Dielectrics by : Sara Cordero Barron

Download or read book Sputter Deposition Processes For Thin Film Oxide Dielectrics written by Sara Cordero Barron and published by . This book was released on 2009 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: As new semiconductor systems are developed and implemented in niche or mainstream applications, the need for new dielectric materials becomes prevalent. Sputter deposition is a versatile approach to preparing candidate materials for thin film dielectrics, affording a large processing space for optimization. The choices made for these sputtering parameters can effect significant variation in dielectric properties. We find that for the complex amorphous dielectric oxide of Zr0.2 Sn0.2 Ti0.6 O2 , the dielectric constant is strongly dependent on substrate temperature during reactive sputter deposition, with [epsilon]r ~55 if deposited at 150 to 280 ? C; at higher and lower temperatures, the dielectric constant falls to ~3035. A high quality dysprosium-substituted titania is prepared by reactive RF sputter deposition on unheated substrates. Preparation by thermal oxidation of a sputtered metal film, however, results in an oxide with a defect polarization along phase boundaries. Finally, we develop a methodology to co-sputter dielectric oxides in a composition gradient. When deposited from an oblique sputtering source, such as that used in composition spreads, dielectric thin films exhibit an abnormal low frequency polarization. We implement a negative electrical bias to the substrate, which eliminates the void-mediated polarization and recovers the intrinsic properties of the dielectric. The validity of this technique is demonstrated in the model system Ta2 O5 . Implementation of the technique and its implications for resputtering are considered in the mixed TaO x -GeO x dielectric system.