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Study Of Rotational Temperature And Loss Mechanisms Of Fluorocarbon Radicals In An Inductively Coupled Plasma Reactor
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Book Synopsis Study of Rotational Temperature and Loss Mechanisms of Fluorocarbon Radicals in an Inductively Coupled Plasma Reactor by : Xiaomei Wu
Download or read book Study of Rotational Temperature and Loss Mechanisms of Fluorocarbon Radicals in an Inductively Coupled Plasma Reactor written by Xiaomei Wu and published by . This book was released on 2003 with total page 354 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Understanding the Complex Chemistry of Fluorocarbon Plasmas in a Long Residence Time ICP Reactor by : Sanket Prakash Sant
Download or read book Understanding the Complex Chemistry of Fluorocarbon Plasmas in a Long Residence Time ICP Reactor written by Sanket Prakash Sant and published by . This book was released on 2006 with total page 374 pages. Available in PDF, EPUB and Kindle. Book excerpt: The motivation behind this research is to understand the influence of plasma surface interactions on the gas phase chemistry and surface kinetics of polymerizing fluorocarbon plasmas. In order to achieve this, a modified GEC reference ICP reactor is used with in situ diagnostic tools like multipass Fourier transformed infrared (FTIR) spectroscopy, optical emission spectroscopy (OES) used in an actinometry mode, ellipsometry and self bias probe. A long residence time of 5.2 s was employed to maximize plasma surface interactions and electron impact collisions. This research is divided into three interdependent sections. In the first section a global gas phase model illustrating the gain and loss mechanisms of different fluorocarbon radicals and neutrals qualitatively and quantitatively as a function of source to chuck gap and feed gas stoichiometry has been developed. No bias is applied in that study. An upper bound translational temperature model is also developed. In the second section, a global model describing deposition and etch mechanisms has been developed which is further used to understand surface kinetics on SiO 2 substrate as a function of ion energy, ion flux and feed gas stoichiometry. Influence of surface kinetics on gas phase chemistry of different neutrals and radicals is shown at two different bias powers (0 and 200 W). In the third section, upper bound sticking coefficients for different radicals are developed on the surface. Collectively, this research is an effort to understand the interdependence between gas phase chemistry and surface kinetics in a long residence time fluorocarbon inductively coupled plasma.
Book Synopsis Gain and Loss Mechanisms in Fluorocarbon Plasmas by : Caleb Timothy Nelson
Download or read book Gain and Loss Mechanisms in Fluorocarbon Plasmas written by Caleb Timothy Nelson and published by . This book was released on 2010 with total page 286 pages. Available in PDF, EPUB and Kindle. Book excerpt: Understanding dominant reaction channels for important gas-phase species in fluorocarbon plasmas is crucial to the ability to control surface evolution and morphology. In order to accomplish this goal a modified GEC reference ICP reactor is used in tandem with Fourier transform infrared spectroscopy (FTIR) to measure the densities of stable species. Integrated absorption cross-sections are presented for all fundamental bands in the 650 cm -1 to 2000 cm -1 region for C 3 F 6 , C 4 F 8 , C 3 F 8 , C 2 F 6 , C 2 F 4 , and CF 4 . The results show that although the absorption profile changes significantly, the integrated absorption cross-sections, with the exception of CF 4 , do not change significantly as gas temperature increases from 25°C to 200°C. However, the internal temperature of the absorbing species can be estimated from the rotational band maximum in most cases. Species densities obtained with the aforementioned cross-sections are used with a novel analysis technique to quantify gain and loss rates as functions of residence time, pressure, and deposited power. CF 4 , C 2 F 6 , C 3 F 8 , and C 4 F 10 , share related production channels, which increase in magnitude as the plasma pressure, deposited power, or surface temperature are raised. CF 2 is primarily produced through a combination of surface production (the magnitude also increases with temperature) and electron impact dissociation of C 2 F 4 , while it is predominantly lost in the large reactor to gas-phase addition to form C 2 F 4 . Time-resolved FTIR results are used to measure a cross-section of 1.8x10 -14 cm 3 /s for the reaction between CF 2 radicals creating C 2 F 4 . Finally, C 2 F 4 originates through the electron impact dissociation of c- C 4 F 8 . The loss process for C 2 F 4 is undetermined, but the results indicate that it could occur on reactor surfaces. Neither the density of fluorine nor the ion flux to the chuck surface changes substantially with wall temperature. We show that increases in the deposition rate in a heated chamber are due to an increase in the fluxes of depositing neutral species. Furthermore, the sticking coefficient for these species does not change significantly as a function of surface temperature. Instead, surface temperature elevates the yield of etchant species, which terminate broken bonds to increase the desorption rates of stable species.
Book Synopsis Fluorocarbon Radical Density Measurements in an Inductively Coupled Plasma Reactor by : Todd M. Bauer
Download or read book Fluorocarbon Radical Density Measurements in an Inductively Coupled Plasma Reactor written by Todd M. Bauer and published by . This book was released on 2001 with total page 430 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Flow Reactor Studies of Non-equilibrium Plasma Assisted Combustion Kinetics by : Nicholas Tsolas
Download or read book Flow Reactor Studies of Non-equilibrium Plasma Assisted Combustion Kinetics written by Nicholas Tsolas and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A new experimental facility was developed to study the reactive chemical kinetics associated with plasma-assisted combustion (PAC). Experiments were performed in a nearly isothermal plasma flow reactor (PFR), using reactant mixtures highly diluted in an inert gas (e.g., Ar, He, or N2) to minimize temperature changes from chemical reactions. At the end of the isothermal reaction zone, the gas temperature was rapidly lowered to terminate any continuation in reaction. Product composition as a result of any observed reaction was then determined using ex situ techniques, including non-dispersive infrared (NDIR), and by sample extraction and storage into a multi-position valve for subsequent analysis by gas chromatography (GC). Hydroxyl radical concentrations were measured in situ, using the laser induced fluorescence (LIF) technique. Reactivity maps for a given fuel system were achieved by fixing the flow rate or residence time of the reactant mixture through the PFR and varying the isothermal temperature. Fuels studied were hydrogen, ethylene and C1 to C7 alkane hydrocarbons, to examine pyrolysis and oxidation kinetics with and without the effects of a high-voltage nanosecond pulse duration plasma discharge, at atmospheric pressure from 420 K to 1250 K. In select instances, experimental studies were complimented with detailed chemical kinetic modeling analysis to determine the dominant and rate-controlling mechanisms, while elucidating the influence of the plasma chemistry on the thermal (neutral) chemistry.In the hydrogen oxidation system, no thermal reaction was observed until 860 K, consistent with the second explosion limit at atmospheric pressure, at which point all the hydrogen was rapidly consumed within the residence time of the reactor. With the plasma discharge, oxidation occurred at all temperatures examined, exhibiting a steady increase in the rate of oxidation starting from 470 K, and eventually consuming all the initial hydrogen by 840 K. For ethylene, kinetic results with the discharge indicated that pyrolysis type reactions were nearly as important as oxidative reactions in consuming ethylene below 750 K. Above 750 K, the thermal reactions coupled to the plasma reactions to further enhance the high temperature fuel consuming chemistry. Modeling analysis of plasma-assisted pyrolysis revealed that ethylene dissociation by collisional quenching with electronically-excited argon atoms formed in the presence of the plasma, resulted in the direct formation of acetylene and larger hydrocarbons by way of the ethyl radical. Similarly, during plasma-assisted oxidation, excited argon was able to directly dissociate the initial oxidizer to further enhance fuel consumption, but also facilitate low temperature oxidative chemistry due to the effective production of oxygenated species controlled by R+O2 chemistry. At the highest temperatures, the radical production by neutral thermal reactions became competitive and the effectiveness associated with the plasma coupled chemistry decreased. Under the effects of the plasma, alkane fuels exhibited extended limits of oxidation over the entire temperature range considered, compared to that of the thermal reactions alone. At atmospheric pressure, propane and butane exhibited cool flame chemistry between 420 K to 700 K, which normally occurs at higher pressures (P > 1 atm) for thermally constrained systems. This chemistry is characterized by the alkylperoxy radical formation, isomerization to the hydroperoxyalkyl radical, followed by dissociation to form aldehydes and ketones. Whereas, intermediate temperature chemistry between 700 K to 950 K, is characterized by beta-scission of the initial alkyl radical to form alkenes and smaller alkanes. The culmination of these studies demonstrate new insight into the kinetics governing PAC and provides a new experimental database to facilitate the development and validation of PAC-specific kinetic mechanisms.
Download or read book Nuclear Science Abstracts written by and published by . This book was released on 1974 with total page 786 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Temperature Plasma Technology by : Paul K. Chu
Download or read book Low Temperature Plasma Technology written by Paul K. Chu and published by CRC Press. This book was released on 2013-07-15 with total page 497 pages. Available in PDF, EPUB and Kindle. Book excerpt: Written by a team of pioneering scientists from around the world, Low Temperature Plasma Technology: Methods and Applications brings together recent technological advances and research in the rapidly growing field of low temperature plasmas. The book provides a comprehensive overview of related phenomena such as plasma bullets, plasma penetration into biofilms, discharge-mode transition of atmospheric pressure plasmas, and self-organization of microdischarges. It describes relevant technology and diagnostics, including nanosecond pulsed discharge, cavity ringdown spectroscopy, and laser-induced fluorescence measurement, and explores the increasing research on atmospheric pressure nonequilibrium plasma jets. The authors also discuss how low temperature plasmas are used in the synthesis of nanomaterials, environmental applications, the treatment of biomaterials, and plasma medicine. This book provides a balanced and thorough treatment of the core principles, novel technology and diagnostics, and state-of-the-art applications of low temperature plasmas. It is accessible to scientists and graduate students in low-pressure plasma physics, nanotechnology, plasma medicine, and materials science. The book is also suitable as an advanced reference for senior undergraduate students.
Book Synopsis Advanced Plasma Technology by : Riccardo d'Agostino
Download or read book Advanced Plasma Technology written by Riccardo d'Agostino and published by John Wiley & Sons. This book was released on 2008-09-08 with total page 479 pages. Available in PDF, EPUB and Kindle. Book excerpt: A panel of internationally renowned scientists discuss the latest results in plasma technology. This volume has been compiled with both a didactic approach and an overview of the newest achievements for industrial applications. It is divided into two main sections. One is focused on fundamental technology, including plasma production and control, high-pressure discharges, modeling and simulation, diagnostics, dust control, and etching. The section on application technology covers polymer treatments, silicon solar cell, coating and spray, biomaterials, sterilization and waste treatment, plasma propulsion, plasma display panels, and anti-corrosion coatings. The result is an indispensable work for physicists, chemists and engineers involved in the field of plasma technology.
Book Synopsis Lamps and Lighting by : M. A. Cayless
Download or read book Lamps and Lighting written by M. A. Cayless and published by Routledge. This book was released on 1996-11 with total page 553 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a comprehensive guide to the theory and practice of lighting. Covering the physics of light production, light sources, circuits and a wide variety of lighting applications, it is both suitable as a detailed textbook and as thoroughly practical guide for practising lighting engineers. This fourth edition of Lamps and Lighting has been completely updated with new chapters on the latest lamp technology and applications. The editors ahve called upon a wide range of expertise and as a result many sections have been broadened to include both European and US practice. The book begins with a description of the fundamentals of light, vision, colour and measurement. Part II, the main section of the book, deals with lamps and control equipment and includes descriptions of all lamp types in use today. Part III on lighting covers both interior and exterior applications.
Book Synopsis Uranium Enrichment and Nuclear Weapon Proliferation by : Allan S. Krass
Download or read book Uranium Enrichment and Nuclear Weapon Proliferation written by Allan S. Krass and published by Routledge. This book was released on 2020-11-20 with total page 325 pages. Available in PDF, EPUB and Kindle. Book excerpt: Originally published in 1983, this book presents both the technical and political information necessary to evaluate the emerging threat to world security posed by recent advances in uranium enrichment technology. Uranium enrichment has played a relatively quiet but important role in the history of efforts by a number of nations to acquire nuclear weapons and by a number of others to prevent the proliferation of nuclear weapons. For many years the uranium enrichment industry was dominated by a single method, gaseous diffusion, which was technically complex, extremely capital-intensive, and highly inefficient in its use of energy. As long as this remained true, only the richest and most technically advanced nations could afford to pursue the enrichment route to weapon acquisition. But during the 1970s this situation changed dramatically. Several new and far more accessible enrichment techniques were developed, stimulated largely by the anticipation of a rapidly growing demand for enrichment services by the world-wide nuclear power industry. This proliferation of new techniques, coupled with the subsequent contraction of the commercial market for enriched uranium, has created a situation in which uranium enrichment technology might well become the most important contributor to further nuclear weapon proliferation. Some of the issues addressed in this book are: A technical analysis of the most important enrichment techniques in a form that is relevant to analysis of proliferation risks; A detailed projection of the world demand for uranium enrichment services; A summary and critique of present institutional non-proliferation arrangements in the world enrichment industry, and An identification of the states most likely to pursue the enrichment route to acquisition of nuclear weapons.
Book Synopsis Plasma Kinetics in Atmospheric Gases by : M. Capitelli
Download or read book Plasma Kinetics in Atmospheric Gases written by M. Capitelli and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt: Emphasis is placed on the analysis of translational, rotational, vibrational and electronically excited state kinetics, coupled to the electron Boltzmann equation.
Book Synopsis Standard Methods for the Examination of Water and Wastewater by : American Public Health Association
Download or read book Standard Methods for the Examination of Water and Wastewater written by American Public Health Association and published by . This book was released on 1981 with total page 1254 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Combustion Theory by : Forman A. Williams
Download or read book Combustion Theory written by Forman A. Williams and published by CRC Press. This book was released on 2018-03-05 with total page 549 pages. Available in PDF, EPUB and Kindle. Book excerpt: Combustion Theory delves deeper into the science of combustion than most other texts and gives insight into combustions from a molecular and a continuum point of view. The book presents derivations of the basic equations of combustion theory and contains appendices on the background of subjects of thermodynamics, chemical kinetics, fluid dynamics, and transport processes. Diffusion flames, reactions in flows with negligible transport and the theory of pre-mixed flames are treated, as are detonation phenomena, the combustion of solid propellents, and ignition, extinction, and flamibility pehnomena.
Book Synopsis Lecture Notes on Principles of Plasma Processing by : Francis F. Chen
Download or read book Lecture Notes on Principles of Plasma Processing written by Francis F. Chen and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 213 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma processing of semiconductors is an interdisciplinary field requiring knowledge of both plasma physics and chemical engineering. The two authors are experts in each of these fields, and their collaboration results in the merging of these fields with a common terminology. Basic plasma concepts are introduced painlessly to those who have studied undergraduate electromagnetics but have had no previous exposure to plasmas. Unnecessarily detailed derivations are omitted; yet the reader is led to understand in some depth those concepts, such as the structure of sheaths, that are important in the design and operation of plasma processing reactors. Physicists not accustomed to low-temperature plasmas are introduced to chemical kinetics, surface science, and molecular spectroscopy. The material has been condensed to suit a nine-week graduate course, but it is sufficient to bring the reader up to date on current problems such as copper interconnects, low-k and high-k dielectrics, and oxide damage. Students will appreciate the web-style layout with ample color illustrations opposite the text, with ample room for notes. This short book is ideal for new workers in the semiconductor industry who want to be brought up to speed with minimum effort. It is also suitable for Chemical Engineering students studying plasma processing of materials; Engineers, physicists, and technicians entering the semiconductor industry who want a quick overview of the use of plasmas in the industry.
Book Synopsis Plasma Processes and Polymers by : Riccardo d'Agostino
Download or read book Plasma Processes and Polymers written by Riccardo d'Agostino and published by John Wiley & Sons. This book was released on 2006-03-06 with total page 545 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume compiles essential contributions to the most innovative fields of Plasma Processes and Polymers. High-quality contributions cover the fields of plasma deposition, plasma treatment of polymers and other organic compounds, plasma processes under partial vacuum and at atmospheric pressure, biomedical, textile, automotive, and optical applications as well as surface treatment of bulk materials, clusters, particles and powders. This unique collection of refereed papers is based on the best contributions presented at the 16th International Symposium on Plasma Chemistry in Taormina, Italy (ISPC-16, June 2003). A high class reference of relevance to a large audience in plasma community as well as in the area of its industrial applications.
Book Synopsis Surface and Thin Film Analysis by : Gernot Friedbacher
Download or read book Surface and Thin Film Analysis written by Gernot Friedbacher and published by Wiley-VCH. This book was released on 2011-06-07 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Surveying and comparing all techniques relevant for practical applications in surface and thin film analysis, this second edition of a bestseller is a vital guide to this hot topic in nano- and surface technology. This new book has been revised and updated and is divided into four parts - electron, ion, and photon detection, as well as scanning probe microscopy. New chapters have been added to cover such techniques as SNOM, FIM, atom probe (AP),and sum frequency generation (SFG). Appendices with a summary and comparison of techniques and a list of equipment suppliers make this book a rapid reference for materials scientists, analytical chemists, and those working in the biotechnological industry. From a Review of the First Edition (edited by Bubert and Jenett) "... a useful resource..." (Journal of the American Chemical Society)
Download or read book CMOS written by R. Jacob Baker and published by John Wiley & Sons. This book was released on 2008 with total page 1074 pages. Available in PDF, EPUB and Kindle. Book excerpt: This edition provides an important contemporary view of a wide range of analog/digital circuit blocks, the BSIM model, data converter architectures, and more. The authors develop design techniques for both long- and short-channel CMOS technologies and then compare the two.
