Study Of Polycrystalline Diamond Thin Films Grown In A Custom Built Ecr Pe Cvd System

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Study of Polycrystalline Diamond Thin Films Grown in a Custom Built ECR PE-CVD System

Author : Vidhya Sagar Jayaseelan
Publisher :
ISBN 13 :
Total Pages : 212 pages
Book Rating : 4.:/5 (481 download)

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Book Synopsis Study of Polycrystalline Diamond Thin Films Grown in a Custom Built ECR PE-CVD System by : Vidhya Sagar Jayaseelan

Download or read book Study of Polycrystalline Diamond Thin Films Grown in a Custom Built ECR PE-CVD System written by Vidhya Sagar Jayaseelan and published by . This book was released on 2000 with total page 212 pages. Available in PDF, EPUB and Kindle. Book excerpt: The increasing importance of high temperature electronics has necessitated a search for new materials. Silicon provides low reliability or fails to function altogether at elevated (>500F /260(C) temperatures. Diamond, being a wide-band-gap semiconductor, is a very promising candidate for these applications as well as others that function in adverse conditions. However, the present day diamond film technology, with respect to quality and consistency of properties of the films, has not seen the advancement required for its commercial application. This research is an effort to investigate the growth of diamond thin films to enable their application for advanced electronic devices. The first objective of the research was to construct a state of the art Electron Cyclotron Resonance Microwave Plasma Chemical Vapor Deposition (ECR-MPCVD) system for processing diamond and diamond like materials. Such a facility is the most advanced and powerful tool for CVD of poly-crystalline diamond and cubic Boron Nitride. Important factors like ease of operation and maintenance, stability and reproducibility of process conditions, reliability, safety, cost etc were considered while constructing the machine. The system was subjected to a series of tests to ensure that these factors were adequately satisfied. The second objective of this project was to grow polycrystalline diamond films under various conditions of chamber pressure, substrate temperature, hydrogen flow rate, composition and substrate pretreatment. The properties of the films grown under these conditions were evaluated by various modern characterization techniques such as optical microscopy, scanning electron microscopy, Raman spectroscopy and X-ray diffraction. Optical microscopy is an inexpensive, quick and effective method for initial evaluation of the uniformity and general morphology of the films obtained. Scanning electron microscopy gives information about the grain size, thickness, growth rate, uniformity, faceting, roughness, and continuous nature of the film. Raman spectroscopy is probably the most important characterization method for diamond films for electronic applications. It helps to identify the presence of diamond and the nature of the film. Raman spectrum is used to evaluate the quality of the diamond grains in the film, defect concentration and crystallinity. It also gives information about the presence of the non-diamond graphite phase and hence indirectly the intrinsic conductivity. XRD is also a positive identification tool. It was also used to derive information about the grain orientation with respect to the silicon substrate. The properties of the films obtained were correlated with the growth parameters and conclusions were drawn about the effect of these parameters on the film properties. This also helped in the characterization of the MPCVD reactor and in determining an effective range of parameters for future studies on the selective growth, long term growth, or growth of films with oxygen addition to the precursor.

Innovative Processing and Synthesis of Ceramics, Glasses, and Composites VI

Author : Narottam P. Bansal
Publisher : John Wiley & Sons
ISBN 13 : 1118380819
Total Pages : 262 pages
Book Rating : 4.1/5 (183 download)

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Book Synopsis Innovative Processing and Synthesis of Ceramics, Glasses, and Composites VI by : Narottam P. Bansal

Download or read book Innovative Processing and Synthesis of Ceramics, Glasses, and Composites VI written by Narottam P. Bansal and published by John Wiley & Sons. This book was released on 2012-04-11 with total page 262 pages. Available in PDF, EPUB and Kindle. Book excerpt: This collection of papers describes the various innovative techniques and approaches for synthesis and processing of novel ceramics, glass, and composite materials and their fabrication in various forms, shapes, and complex structures. Special emphasis is given to state-of-the-art methods such as reaction bonding, microwave, CVD, CVI, electrophoresis, sol-gel, plasma, combustion, and more. Proceedings of the symposium held at the 104th Annual Meeting of The American Ceramic Society, April 28-May1, 2002 in Missouri; Ceramic Transactions, Volume 135.

Chemical Vapor Deposited Boron Doped Polycrystalline Diamond Thin Film Growth on Silicon and Sapphire Growth, Doping, Metallization, and Characterization

Download Chemical Vapor Deposited Boron Doped Polycrystalline Diamond Thin Film Growth on Silicon and Sapphire Growth, Doping, Metallization, and Characterization PDF Online Free

Author : Hassan Golestanian
Publisher :
ISBN 13 :
Total Pages : 272 pages
Book Rating : 4.:/5 (419 download)

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Book Synopsis Chemical Vapor Deposited Boron Doped Polycrystalline Diamond Thin Film Growth on Silicon and Sapphire Growth, Doping, Metallization, and Characterization by : Hassan Golestanian

Download or read book Chemical Vapor Deposited Boron Doped Polycrystalline Diamond Thin Film Growth on Silicon and Sapphire Growth, Doping, Metallization, and Characterization written by Hassan Golestanian and published by . This book was released on 1997 with total page 272 pages. Available in PDF, EPUB and Kindle. Book excerpt: Diamond's unique properties are potentially superior among the existing substrate materials for electronic applications. Among these properties, diamond's physical hardness, molar density, thermal conductivity, and sound velocity are the highest while its thermal expansion coefficient, compressibility, and bulk modules are the lowest. Because of this unique combination of properties, diamond has diverse applications in electronics, optics, and material coatings. Scientists around the world have been studying possible applications of diamond and its synthesis by chemical vapor deposition (CVD) in the semiconductor industry for almost the latter half of this century. The use of bulk crystals severely limits semiconductor applications of diamond due to difficulty in doping, device integration, high cost, and small area of bulk diamond. Therefore, a great deal of effort has been undertaken by researchers around the world on diamond synthesis by chemical vapor deposition (CVD). With some of the same limitations, homoepitaxial growth of diamond is not considered to be a feasible solution. As a result, heteroepitaxial growth of diamond is being considered to be an attractive possibility. Heteroepitaxial diamond growth has been the main subject of research since the first successful growth of diamond thin films on foreign substrates was reported. Polycrystalline and highly oriented diamond thin films grown on various substrates, especially silicon, have been reported over the years. There also have been reports of device fabrication on diamond such as diamond based point contact transistors, Schottky diodes, and field effect transistors at a laboratory level. The technology has been very challenging and there remain many obstacles to overcome before diamond based devices are to become part of the semiconductor industry. For example, epitaxial growth of CVD diamond, selective doping, n-type doping, and metallization of the grown films are not totally understood due to the polycrystalline nature of CVD diamond films. The objective of this work is the study of hot-filament chemical vapor deposited boron doped polycrystalline diamond thin films grown on both silicon and sapphire. A new horizontal gas flow configuration rather than the typical vertical gas flow configuration is utilized to provide larger area and better quality films grown on these substrates. The study includes characterization of grown films using scanning electron microscopy, Raman spectroscopy, X-ray diffraction analysis, and electrical characterization. Two types of contacts to the films grown on silicon substrates are fabricated enabling various electrical measurements. However, on sapphire substrates, low volume resistivity diamond films are grown despite severe adhesion problems. The effects of various substrate pre-treatments, growth conditions, and doping concentrations are presented.

Thin Films by Chemical Vapour Deposition

Author : C.E. Morosanu
Publisher : Elsevier
ISBN 13 : 1483291731
Total Pages : 720 pages
Book Rating : 4.4/5 (832 download)

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Book Synopsis Thin Films by Chemical Vapour Deposition by : C.E. Morosanu

Download or read book Thin Films by Chemical Vapour Deposition written by C.E. Morosanu and published by Elsevier. This book was released on 2016-06-22 with total page 720 pages. Available in PDF, EPUB and Kindle. Book excerpt: The explosive growth in the semiconductor industry has caused a rapid evolution of thin film materials that lend themselves to the fabrication of state-of-the-art semiconductor devices. Early in the 1960s an old research technique named chemical vapour phase deposition (CVD), which has several unique advantages, developed into the most widely used technique for thin film preparation in electronics technology. In the last 25 years, tremendous advances have been made in the science and technology of thin films prepared by means of CVD. This book presents in a single volume, an up-to-date overview of the important field of CVD processes which has never been completely reviewed previously. Contents: Part I. 1. Evolution of CVD Films. Introductory remarks. Short history of CVD thin films. II. Fundamentals. 2. Techniques of Preparing Thin Films. Electrolytic deposition techniques. Vacuum deposition techniques. Plasma deposition techniques. Liquid-phase deposition techniques. Solid-phase deposition techniques. Chemical vapour conversion of substrate. Chemical vapour deposition. Comparison between CVD and other thin film deposition techniques. 3. Chemical Processes Used in CVD. Introduction. Description of chemical reactions used in CVD. 4. Thermodynamics of CVD. Feasibility of a CVD process. Techniques for equilibrium calculations in CVD systems. Examples of thermodynamic studies of CVD systems. 5. Kinetics of CVD. Steps and control type of a CVD heterogeneous reaction. Influence of experimental parameters on thin film deposition rate. Continuous measurement of the deposition rate. Experimental methods for studying CVD kinetics. Role of homogeneous reactions in CVD. Mechanism of CVD processes. Kinetics and mechanism of dopant incorporation. Transport phenomena in CVD. Status of kinetic and mechanism investigations in CVD systems. 6. Measurement of Thin Film Thickness. Mechanical methods. Mechanical-optical methods. Optical methods. Electrical methods. Miscellaneous methods. 7. Nucleation and Growth of CVD Films. Stages in the nucleation and growth mechanism. Regimes of nucleation and growth. Nucleation theory. Dependence of nucleation on deposition parameters. Heterogeneous nucleation and CVD film structural forms. Homogeneous nucleation. Experimental techniques. Experimental results of CVD film nucleation. 8. Thin Film Structure. Techniques for studying thin film structure. Structural defects in CVD thin films. 9. Analysis of CVD Films. Analysis techniques of thin film bulk. Analysis techniques of thin film surfaces. Film composition measurement. Depth concentration profiling. 10. Properties of CVD Films. Mechanical properties. Thermal properties. Optical properties. Photoelectric properties. Electrical properties. Magnetic properties. Chemical properties. Part III. 11. Equipment and Substrates. Equipment for CVD. Safety in CVD. Substrates. 12. Preparation and Properties of Semiconducting Thin Films. Homoepitaxial semiconducting films. Heteroepitaxial semiconducting films. 13. Preparation and Properties of Amorphous Insulating Thin Films. Oxides. Nitrides and Oxynitrides. Polymeric thin films. 14. Preparation and Properties of Conductive Thin Films. Metals and metal alloys. Resistor materials. Transparent conducting films. Miscellaneous materials. 15. Preparation and Properties of Superconducting and Magnetic Thin Films. Superconducting materials. Magnetic materials. 16. Uses of CVD Thin Films. Applications in electronics and microelectronics. Applications in the field of microwaves and optoelectronics. Miscellaneous applications. Artificial heterostructures (Quantum wells, superlattices, monolayers, two-dimensional electron gases). Part V. 17. Present and Future Importance of CVD Films.

Growth and Characterization of Polycrystalline Silicon and Microcrystalline Silicon Carbide Thin Films Using ECR-PECVD

Author : Bryan Kent Oliver
Publisher :
ISBN 13 :
Total Pages : 138 pages
Book Rating : 4.:/5 (414 download)

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Book Synopsis Growth and Characterization of Polycrystalline Silicon and Microcrystalline Silicon Carbide Thin Films Using ECR-PECVD by : Bryan Kent Oliver

Download or read book Growth and Characterization of Polycrystalline Silicon and Microcrystalline Silicon Carbide Thin Films Using ECR-PECVD written by Bryan Kent Oliver and published by . This book was released on 1999 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: On the other hand, with He dilution at 15 mTorr the percent crystallinity obtained was also 86%, with decreasing crystallinity at lower pressures. We found that a dilution consisting of a 50%-50% mixture of H2-He, which allows a high ion bombardment deposition from the helium that is also benefited by the hydrogen etching effect, did not compromise the quality of the films. This plasma selection produced about 84% crystalline films, independent of the pressure setting. X-ray diffraction reveals the dominant crystal textures are 111 and 220 orientations, with 220 preferential growth at higher deposition pressures. The CH4/SiH4 flow ratio was found critical to the formation of microcrystalline SiC.

Growth and Characterization of Diamond Thin Films

Author : Sattar Mirzakuchaki
Publisher :
ISBN 13 :
Total Pages : 272 pages
Book Rating : 4.:/5 (373 download)

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Book Synopsis Growth and Characterization of Diamond Thin Films by : Sattar Mirzakuchaki

Download or read book Growth and Characterization of Diamond Thin Films written by Sattar Mirzakuchaki and published by . This book was released on 1996 with total page 272 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposited (CVD) diamond thin films grown homoepitaxially as well as on non-diamond substrates have been the subject of intense investigation since the beginning of the last decade. Diamond's remarkable properties such as physical hardness, chemical inertness, high thermal conductivity, high breakdown voltage, and high carrier mobility are the main factors for the attention it has received from many researchers around the world. Although these properties are somewhat degraded in polycrystalline diamond films, they are still superior to many other materials. One of the most potentially useful applications of diamond thin films is in the semiconductor industry. Although a few prototype devices such as field effect transistors and Schottky diodes have been fabricated on diamond, some major obstacles remain to be overcome before full scale commercial applications of diamond as a semiconductor is possible. The high cost of large area monocrystalline diamond substrates has forced researchers to look for alternative substrates for the heteroepitaxial growth of diamond. So far only marginal results have been reported on the growth of highly oriented diamond films and on the heteroepitaxial growth involving substrates that are as costly as diamond. Silicon, as the dominant material in semiconductor industry, has been the subject of much research as a substrate for the growth of polycrystalline diamond. Another problem in development of diamond as a semiconductor is the effective doping of diamond, particularly for n-type conductivity. Although many researchers have studied boron-doped (p-type) diamond thin films in the past several years, there have been few reports on the effects of doping diamond films with phosphorous (n-type). Once these two issues have been solved, other fabrication steps such as oxidation, etching, masking, etc. may be attempted. The present work is a study directed toward solving some of these problems by looking at in-situ doping of n-type hot filament CVD (HFCVD) grown diamond films on silicon substrates. The study includes electrical characterization, stable metallic contacts, effect of silicon substrate surface pretreatment, and selective area deposition. A number of different techniques for inducing diamond nucleation on Si substrates are studied and the resulting diamond films characterized by common techniques such as Raman spectroscopy, X-ray diffraction, optical and scanning electron microscopy, and profilometery. The effect of doping the diamond films with different concentrations of phosphorous as well as calculation of the activation energy by temperature measurement was also carried out in this work. A new technique is presented for the selective deposition of diamond films onto silicon substrates.

A Study of the Factors Influencing the Morphology of Diamond Thin Films Grown Via Hot Filament Chemical Vapor Deposition

Author : Prabhjot Mehta
Publisher :
ISBN 13 :
Total Pages : 456 pages
Book Rating : 4.:/5 (414 download)

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Book Synopsis A Study of the Factors Influencing the Morphology of Diamond Thin Films Grown Via Hot Filament Chemical Vapor Deposition by : Prabhjot Mehta

Download or read book A Study of the Factors Influencing the Morphology of Diamond Thin Films Grown Via Hot Filament Chemical Vapor Deposition written by Prabhjot Mehta and published by . This book was released on 1997 with total page 456 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Diamond Thin Films Grown by Plasma Enhanced Chemical Vapor Deposition

Author : Charles Jianjun Zhang
Publisher :
ISBN 13 :
Total Pages : 78 pages
Book Rating : 4.:/5 (285 download)

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Book Synopsis Diamond Thin Films Grown by Plasma Enhanced Chemical Vapor Deposition by : Charles Jianjun Zhang

Download or read book Diamond Thin Films Grown by Plasma Enhanced Chemical Vapor Deposition written by Charles Jianjun Zhang and published by . This book was released on 1992 with total page 78 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Nanodiamond

Author : Oliver A Williams
Publisher : Royal Society of Chemistry
ISBN 13 : 1849737614
Total Pages : 553 pages
Book Rating : 4.8/5 (497 download)

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Book Synopsis Nanodiamond by : Oliver A Williams

Download or read book Nanodiamond written by Oliver A Williams and published by Royal Society of Chemistry. This book was released on 2014-03-18 with total page 553 pages. Available in PDF, EPUB and Kindle. Book excerpt: The exceptional mechanical, optical, surface and biocompatibility properties of nanodiamond have gained it much interest. Exhibiting the outstanding bulk properties of diamond at the nanoscale in the form of a film or small particle makes it an inexpensive alternative for many applications. Nanodiamond is the first comprehensive book on the subject. The book reviews the state of the art of nanodiamond films and particles covering the fundamentals of growth, purification and spectroscopy and some of its diverse applications such as MEMS, drug delivery and biomarkers and biosensing. Specific chapters include the theory of nanodiamond, diamond nucleation, low temperature growth, diamond nanowires, electrochemistry of nanodiamond, nanodiamond flexible implants, and cell labelling with nanodiamond particles. Edited by a leading expert in nanodiamonds, this is the perfect resource for those new to, and active in, nanodiamond research and those interested in its applications.

The Materials Science of Thin Films

Author : Milton Ohring
Publisher : Academic Press
ISBN 13 : 9780125249904
Total Pages : 744 pages
Book Rating : 4.2/5 (499 download)

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Book Synopsis The Materials Science of Thin Films by : Milton Ohring

Download or read book The Materials Science of Thin Films written by Milton Ohring and published by Academic Press. This book was released on 1992 with total page 744 pages. Available in PDF, EPUB and Kindle. Book excerpt: Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.

Atomic Layer Deposition for Semiconductors

Author : Cheol Seong Hwang
Publisher : Springer Science & Business Media
ISBN 13 : 146148054X
Total Pages : 266 pages
Book Rating : 4.4/5 (614 download)

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Book Synopsis Atomic Layer Deposition for Semiconductors by : Cheol Seong Hwang

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Physics Briefs

Author :
Publisher :
ISBN 13 :
Total Pages : 1288 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Physics Briefs by :

Download or read book Physics Briefs written by and published by . This book was released on 1993 with total page 1288 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Principles of Vapor Deposition of Thin Films

Author : Professor K.S. K.S Sree Harsha
Publisher : Elsevier
ISBN 13 : 0080480314
Total Pages : 1173 pages
Book Rating : 4.0/5 (84 download)

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Book Synopsis Principles of Vapor Deposition of Thin Films by : Professor K.S. K.S Sree Harsha

Download or read book Principles of Vapor Deposition of Thin Films written by Professor K.S. K.S Sree Harsha and published by Elsevier. This book was released on 2005-12-16 with total page 1173 pages. Available in PDF, EPUB and Kindle. Book excerpt: The goal of producing devices that are smaller, faster, more functional, reproducible, reliable and economical has given thin film processing a unique role in technology. Principles of Vapor Deposition of Thin Films brings in to one place a diverse amount of scientific background that is considered essential to become knowledgeable in thin film depostition techniques. Its ultimate goal as a reference is to provide the foundation upon which thin film science and technological innovation are possible. * Offers detailed derivation of important formulae. * Thoroughly covers the basic principles of materials science that are important to any thin film preparation. * Careful attention to terminologies, concepts and definitions, as well as abundance of illustrations offer clear support for the text.

Thin Film Analysis by X-Ray Scattering

Author : Mario Birkholz
Publisher : John Wiley & Sons
ISBN 13 : 3527607048
Total Pages : 378 pages
Book Rating : 4.5/5 (276 download)

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Book Synopsis Thin Film Analysis by X-Ray Scattering by : Mario Birkholz

Download or read book Thin Film Analysis by X-Ray Scattering written by Mario Birkholz and published by John Wiley & Sons. This book was released on 2006-05-12 with total page 378 pages. Available in PDF, EPUB and Kindle. Book excerpt: With contributions by Paul F. Fewster and Christoph Genzel While X-ray diffraction investigation of powders and polycrystalline matter was at the forefront of materials science in the 1960s and 70s, high-tech applications at the beginning of the 21st century are driven by the materials science of thin films. Very much an interdisciplinary field, chemists, biochemists, materials scientists, physicists and engineers all have a common interest in thin films and their manifold uses and applications. Grain size, porosity, density, preferred orientation and other properties are important to know: whether thin films fulfill their intended function depends crucially on their structure and morphology once a chemical composition has been chosen. Although their backgrounds differ greatly, all the involved specialists a profound understanding of how structural properties may be determined in order to perform their respective tasks in search of new and modern materials, coatings and functions. The author undertakes this in-depth introduction to the field of thin film X-ray characterization in a clear and precise manner.

Photovoltaic and Photoactive Materials

Author : Joseph M. Marshall
Publisher : Springer Science & Business Media
ISBN 13 : 9401006326
Total Pages : 361 pages
Book Rating : 4.4/5 (1 download)

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Book Synopsis Photovoltaic and Photoactive Materials by : Joseph M. Marshall

Download or read book Photovoltaic and Photoactive Materials written by Joseph M. Marshall and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 361 pages. Available in PDF, EPUB and Kindle. Book excerpt: The primary objective of this NATO Advanced Study Institute (ASI) was to present an up-to-date overview of various current areas of interest in the field of photovoltaic and related photoactive materials. This is a wide-ranging subject area, of significant commercial and environmental interest, and involves major contributions from the disciplines of physics, chemistry, materials, electrical and instrumentation engineering, commercial realisation etc. Therefore, we sought to adopt an inter disciplinary approach, bringing together recognised experts in the various fields while retaining a level of treatment accessible to those active in specific individual areas of research and development. The lecture programme commenced with overviews of the present relevance and historical development of the subject area, plus an introduction to various underlying physical principles of importance to the materials and devices to be addressed in later lectures. Building upon this, the ASI then progressed to more detailed aspects of the subject area. We were also fortunately able to obtain a contribution from Thierry Langlois d'Estaintot of the European Commission Directorate, describing present and future EC support for activities in this field. In addition, poster sessions were held throughout the meeting, to allow participants to present and discuss their current activities. These were supported by what proved to be very effective feedback sessions (special thanks to Martin Stutzmann), prior to which groups of participants enthusiastically met (often in the bar) to identify and agree topics of common interest.

Electrical & Electronics Abstracts

Author :
Publisher :
ISBN 13 :
Total Pages : 2240 pages
Book Rating : 4.3/5 (243 download)

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Book Synopsis Electrical & Electronics Abstracts by :

Download or read book Electrical & Electronics Abstracts written by and published by . This book was released on 1997 with total page 2240 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Carbon Nanowalls

Author : Mineo Hiramatsu
Publisher : Springer Science & Business Media
ISBN 13 : 3211997180
Total Pages : 168 pages
Book Rating : 4.2/5 (119 download)

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Book Synopsis Carbon Nanowalls by : Mineo Hiramatsu

Download or read book Carbon Nanowalls written by Mineo Hiramatsu and published by Springer Science & Business Media. This book was released on 2010-07-23 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt: Representing the first text to cover this exciting new area of research, this book will describe synthesis techniques of CNWs, their characterization and various expected applications using CNWs. Carbon-nanowalls (CNWs) can be described as two-dimensional graphite nanostructures with edges comprised of stacks of plane graphene sheets standing almost vertically on the substrate. These sheets form a wall structure with a high aspect ratio. The thickness of CNWs ranges from a few nm to a few tens of nm. The large surface area and sharp edges of CNWs may prove useful for a number of applications such as electrochemical devices, field electron emitters, storage materials for hydrogen gas, catalyst support. In particular, vertically standing CNWs with a high surface-to-volume ratio, serve as an ideal material for catalyst support for fuel cells and in gas storage materials.