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Author :
Publisher :
ISBN 13 : 9780444416858
Total Pages : 0 pages
Book Rating : 4.4/5 (168 download)
Download or read book Silicon Nitride in Electronics written by and published by . This book was released on 1988 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Vi︠a︡cheslav Ivanovich Belyĭ
Publisher : Elsevier Publishing Company
ISBN 13 :
Total Pages : 280 pages
Book Rating : 4.F/5 ( download)
Download or read book Silicon Nitride in Electronics written by Vi︠a︡cheslav Ivanovich Belyĭ and published by Elsevier Publishing Company. This book was released on 1988 with total page 280 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is an English version, expanded and brought up to date, of the Russian book published in 1982. It has been written by a group of authors - chemists and physicists - and is designed particularly for specialists who are developing semiconductor devices. Silicon nitride has long been familiar as a material used in the process of manufacturing fire-proof products. During the past decade, it has come into use as a thin dielectric film in electronics, and at present silicon nitride synthesis underlies the basic technology for integrated circuits. The monograph discusses the characteristics that determine the process of synthesis of silicon nitride films, their structure, chemical composition, optical and electrophysical properties, as well as various applications of silicon nitride in electronics.
Author : J. T. Milek
Publisher : Springer Science & Business Media
ISBN 13 : 1461596092
Total Pages : 124 pages
Book Rating : 4.4/5 (615 download)
Download or read book Silicon Nitride for Microelectronic Applications written by J. T. Milek and published by Springer Science & Business Media. This book was released on 2013-03-14 with total page 124 pages. Available in PDF, EPUB and Kindle. Book excerpt: This survey is concerned with the use of silicon nitride in the semi conductor and microelectronics industries. The Handbook of Electronic Materials, volume 3, comprises part 1 of this survey and includes preparation and properties information. This report was prepared by Hughes Aircraft Company, Culver City, California under Contract Number F336lS-70-C-1348. The work was admini stered under the direction of the Air Force Materials Laboratory, Air Force Systems Command, Wright-Patterson Air Force Base, Ohio, with Hr. B. Emrich, Project Engineer. The Electronic Properties Information Center (EPIC) is a designated Information Analysis Center of the Department of Defense, authorized to pro vide information to the entire DoD community. The purpose of the Center is to provide a highly competent source of information and data on the electronic, optical and magnetic properties of materials of value to the Department of Defense. Its major function is to evaluate, compile and publish the experi mental data from the world's unclassified literature concerned with the properties of materials. All materials relevant to the field of electronics are within the scope of EPIC: insulators, semiconductors, metals, super conductors, ferrites, ferroelectrics, ferromagnetics, electroluminescents, thermionic emitters and optical materials. The Center's scope includes information on over 100 basic properties of materials; information generally regarded as being in the area of devices and/or circuitry is excluded. v CONTENTS Foreword. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . v Introduction. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 1 Diffusion Mask Applications . . . . . . . . . . . . . . . . . . . . . . . . . . . '" 11 Glass-to-Metal Seals . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 23 Passivation Applications . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 24 Isolation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 39 Memory Devices. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 41 Capacitors. . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 76 Radiation Hardening Applications . . . . . . . . . . . . . . . •. . . . . . . . .
Author : John T. Milek
Publisher : Springer Science & Business Media
ISBN 13 : 1468461621
Total Pages : 126 pages
Book Rating : 4.4/5 (684 download)
Download or read book Silicon Nitride for Microelectronic Applications written by John T. Milek and published by Springer Science & Business Media. This book was released on 2013-03-14 with total page 126 pages. Available in PDF, EPUB and Kindle. Book excerpt: The large amount of literature on the technology of thin film silicon nitride indi cates the interest of the Department of Defense, NASA and the semiconductor industry in the development and full utilization of the material. This survey is concerned only with the thin film characteristics and properties of silicon nitride as currently utilized by the semiconductor or microelectronics industry. It also includes the various methods of preparation. Applications in microelectronic devices and circuits are to be provided in Part 2 of the survey. Some bulk silicon nitride property data is included for basic reference and comparison purposes. The survey specifically excludes references and information not within the public domain. ACKNOWLEDGEMENT This survey was generated under U.S. Air Force Contract F33615-70-C-1348, with Mr. B.R. Emrich (MAAM) Air Force Materials Laboratory, Wright-Patterson Air Force Base, Ohio acting as Project Engineer. The author would like to acknowledge the assis tance of Dr. Judd Q. Bartling, Litton Systems, Inc., Guidance and Control Systems Division, Woodland Hills, California and Dr. Thomas C. Hall, Hughes Aircraft Company, Culver City, California in reviewing the survey. v CONTENTS Preface. i Introduction 1 Literature Review. 1 Bulk Characteristics 1 Technology Overview. 2 References 4 Methods of Preparation • 5 Introduction • 5 Direct Nitridation Method 8 Evaporation Method • 9 Glow Discharge Method. 10 Ion Beam Method. 13 Sputtering Methods 13 Pyrolytic Methods. 15 Silane and Ammonia Reaction 15 Silicon Tetrachloride and Tetrafluoride Reaction. 24 Silane and Hydrazine Reaction 27 Production Operations. 28 Equipment.
Author : Vladimir Ivanovič Belyj
Publisher :
ISBN 13 : 9780444416858
Total Pages : 263 pages
Book Rating : 4.4/5 (168 download)
Download or read book Silicon Nitride in Electronics written by Vladimir Ivanovič Belyj and published by . This book was released on 1988 with total page 263 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : F.H.P.M. Habraken
Publisher : Springer
ISBN 13 : 9783642765933
Total Pages : 0 pages
Book Rating : 4.7/5 (659 download)
Download or read book LPCVD Silicon Nitride and Oxynitride Films written by F.H.P.M. Habraken and published by Springer. This book was released on 1991 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The present book collects a broad overview of chemical and physical char acteristics of silicon oxynitrides. Special emphasis is put on the way in which these properties influence the electrical characteristics and behaviour of this important material. The results presented here were obtained in an ex tended European research cooperation in the framework of ESPRIT Project 369 'Physical-chemical characterization of silicon oxynitrides in relation to their electrical properties', which ran from 1984 to 1988. In this project two industrial laboratories (Philips Research Laborato ries in Eindhoven, the Netherlands, and Matra Harris Semiconductors from Nantes, France) cooperated with various academic and government research laboratories (Harwell Laboratory in Great Britain, the Interuniversity Micro electronics Center (IMEC) in Leuven, Belgium, and the Faculty of Physics at the University of Utrecht in the Netherlands). The latter partner acted as prime contractor for the project. General interest in silicon oxynitrides for applications in integrated circuit technology stems from the fact that proper choice of deposition conditions enables one to produce materials with properties which can be either oxide like or nitride-like. Of, course, in I.C. technology one would like to combine the good properties ofthe two materials, i.e. superior electrical properties of silicon oxide and good diffusion barrier behaviour of silicon nitride, to men tion only a few, without paying for such an operation by obtaining all the less desirable properties in such a mixed material.
Author : Vijay Narayanan
Publisher :
ISBN 13 : 9789814740487
Total Pages : 550 pages
Book Rating : 4.7/5 (44 download)
Download or read book Thin Films on Silicon written by Vijay Narayanan and published by . This book was released on 2016 with total page 550 pages. Available in PDF, EPUB and Kindle. Book excerpt: "This volume provides a broad overview of the fundamental materials science of thin films that use silicon as an active substrate or passive template, with an emphasis on opportunities and challenges for practical applications in electronics and photonics. It covers three materials classes on silicon: Semiconductors such as undoped and doped Si and SiGe, SiC, GaN, and III-V arsenides and phosphides; dielectrics including silicon nitride and high-k, low-k, and electro-optically active oxides; and metals, in particular silicide alloys. The impact of film growth and integration on physical, electrical, and optical properties, and ultimately device performance, is highlighted."--Publisher's website.
Author : M. Jamal Deen
Publisher : The Electrochemical Society
ISBN 13 : 9781566771375
Total Pages : 610 pages
Book Rating : 4.7/5 (713 download)
Download or read book Silicon Nitride and Silicon Dioxide Thin Insulating Films written by M. Jamal Deen and published by The Electrochemical Society. This book was released on 1997 with total page 610 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Vikram J. Kapoor
Publisher :
ISBN 13 :
Total Pages : 570 pages
Book Rating : 4.0/5 ( download)
Download or read book Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films written by Vikram J. Kapoor and published by . This book was released on 1987 with total page 570 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : F. H. P. M. Habraken
Publisher : Lecture Notes in Computer Scie
ISBN 13 : 9780387539546
Total Pages : 159 pages
Book Rating : 4.5/5 (395 download)
Download or read book LPCVD Silicon Nitride and Oxynitride Films written by F. H. P. M. Habraken and published by Lecture Notes in Computer Scie. This book was released on 1991 with total page 159 pages. Available in PDF, EPUB and Kindle. Book excerpt: The present book collects a broad overview of chemical and physical char- acteristics of silicon oxynitrides. Special emphasis is put on the way in which these properties influence the electrical characteristics and behaviour of this important material. The results presented here were obtained in an ex- tended European research cooperation in the framework of ESPRIT Project 369 'Physical-chemical characterization of silicon oxynitrides in relation to their electrical properties', which ran from 1984 to 1988. In this project two industrial laboratories (Philips Research Laborato- ries in Eindhoven, the Netherlands, and Matra Harris Semiconductors from Nantes, France) cooperated with various academic and government research laboratories (Harwell Laboratory in Great Britain, the Interuniversity Micro- electronics Center (IMEC) in Leuven, Belgium, and the Faculty of Physics at the University of Utrecht in the Netherlands). The latter partner acted as prime contractor for the project. General interest in silicon oxynitrides for applications in integrated circuit technology stems from the fact that proper choice of deposition conditions enables one to produce materials with properties which can be either oxide- like or nitride-like. Of, course, in I.C. technology one would like to combine the good properties ofthe two materials, i.e. superior electrical properties of silicon oxide and good diffusion barrier behaviour of silicon nitride, to men- tion only a few, without paying for such an operation by obtaining all the less desirable properties in such a mixed material.
Author : Eberhard F. Krimmel
Publisher :
ISBN 13 : 9783662099032
Total Pages : 401 pages
Book Rating : 4.0/5 (99 download)
Download or read book Si Silicon written by Eberhard F. Krimmel and published by . This book was released on with total page 401 pages. Available in PDF, EPUB and Kindle. Book excerpt: This is the first of three Gmelin Handbook volumes in the silicon se ries that will cover silicon nitride, a normaUy solid material with the idealized formula Si N . This volume, 3 4 "Silicon" Supplement Volume B Sc, is devoted to applications of silicon nitride in microelec tronics and solar ceUs. The compendium is the product of a critical selection among more than 17600 publications on silicon nitride issued up to January 1990. Out of a total of 5900 publications dealing with the fabrication and use of microelectronic devices (including 2400 Japanese patent applications), about 4000 papers have been selected for this volume. The current volume is grouped into three parts. Chapters 2 to 8 deal with general, non specific microelectronic applications of silicon nitride, Chapters 9 to 31 cover applications of silicon nitride in specific devices and device components, and Chapter 32 is devoted exclusively to applications in solar ceUs, including information on our general understanding of the role of silicon nitride in photovoltaic devices. Experimental results on the preparation of silicon nitride layers for application in unspeci fied devices are in Chapter 2. Whenever the preparation is in connection with specific devices, the information is presented in the respective chapters. The general preparation of silicon nitride layers is not covered in this volume, but will appear in "Silicon" Supplement Volume B 5a. See also the Introductory Remarks, Chapter 1, p. 1.
Author : B Jayant Baliga
Publisher : World Scientific Publishing Company
ISBN 13 : 9813109424
Total Pages : 592 pages
Book Rating : 4.8/5 (131 download)
Download or read book Gallium Nitride And Silicon Carbide Power Devices written by B Jayant Baliga and published by World Scientific Publishing Company. This book was released on 2016-12-12 with total page 592 pages. Available in PDF, EPUB and Kindle. Book excerpt: During the last 30 years, significant progress has been made to improve our understanding of gallium nitride and silicon carbide device structures, resulting in experimental demonstration of their enhanced performances for power electronic systems. Gallium nitride power devices made by the growth of the material on silicon substrates have gained a lot of interest. Power device products made from these materials have become available during the last five years from many companies.This comprehensive book discusses the physics of operation and design of gallium nitride and silicon carbide power devices. It can be used as a reference by practicing engineers in the power electronics industry and as a textbook for a power device or power electronics course in universities.
Author : John T. Milek
Publisher :
ISBN 13 :
Total Pages : 118 pages
Book Rating : 4.:/5 (13 download)
Download or read book Silicon Nitride for Microelectronic Applications written by John T. Milek and published by . This book was released on 1971 with total page 118 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Emiliano Jose Hierra
Publisher : Nova Science Publishers
ISBN 13 : 9781619428652
Total Pages : 0 pages
Book Rating : 4.4/5 (286 download)
Download or read book Silicon Nitride written by Emiliano Jose Hierra and published by Nova Science Publishers. This book was released on 2012 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon nitride (Si3N4) ceramic is used in numerous applications because of its superior properties, such as high-temperature strength, good oxidation resistance and low thermal expansion coefficient. In this book, the authors present current research in the study of the synthesis, properties and applications of silicon nitride. Topics include the optical and vibration properties of silicon rich nitride; high temperature oxidation of silicon nitride based ceramics; low temperature preparation of phosphate bonded silicon nitride ceramics with high mechanical strength; the SPS-sintering process and use of ceramics for high-temperature engineering applications; synthesis and properties of silicon nitride coatings; and the use of silicon nitride as biomaterial.
Author : John Theophil Milek
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (77 download)
Download or read book Silicon Nitride for Microelectronic Applications written by John Theophil Milek and published by . This book was released on 1971 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
![Download Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII PDF Online Free](https://books.google.com/books/content/images/frontcover/wUnw2OLLYf4C?fife=w200-h370)
Author : Ram Ekwal Sah
Publisher : The Electrochemical Society
ISBN 13 : 9781566774598
Total Pages : 606 pages
Book Rating : 4.7/5 (745 download)
Download or read book Silicon Nitride, Silicon Dioxide Thin Insulating Films, and Other Emerging Diele[c]trics VIII written by Ram Ekwal Sah and published by The Electrochemical Society. This book was released on 2005 with total page 606 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Raymond C. Sangster
Publisher : Trans Tech Publications Ltd
ISBN 13 : 3038269018
Total Pages : 1016 pages
Book Rating : 4.0/5 (382 download)
Download or read book Formation of Silicon Nitride from the 19th to the 21st Century written by Raymond C. Sangster and published by Trans Tech Publications Ltd. This book was released on 2015-05-06 with total page 1016 pages. Available in PDF, EPUB and Kindle. Book excerpt: The elements: Si, N, O, C and H, have strong chemical affinities for one another. Under the correct conditions, Si-N bonding will occur in almost any Si-N-(O/C/H), and many related, reaction systems; although Si-O and Si-C are formidable competitors to Si-N. The most favored Si-N compound is stoichiometric Si3N4. It comes in three common varieties. How they interrelate, how one finds them and (above all ) how one makes them - and how sometimes they just happen to form - are the subjects of this book, with due attention being paid to closely related matters. This revised second edition summarizes and integrates what is recorded in the world literature from 1857through 2014 as being known about the formation of silicon nitride Si3N4 and itsclose relatives. The book is the key to all that has been learned, over the past 150 years, about how silicon nitride comes to exist: in nature, in the laboratory or in the factory and in many reaction systems; together with how it is used in ceramics, electronic films, optical coatings and many other ways (including an introduction to closely related substances). It will aid the researcher in designing new projects, the supervisor in briefing new employees, the salesman in working with new customers, the patent attorney in assessing patents and the professor in designing graduate course assignments. This comprehensive reference gathers information published on the chemistry of silicon nitride and its products, uses, and markets. Separate chapters overview the manufacture of silicon nitride powder, the production of silicon nitride ceramics via the reaction bonding process, the intrinsic reactions between crystalline silicon surfaces and N2 for silicon wafers, nitridation of Si-O based materials, and chemical vapor deposition of Si-H compounds.
