Rf Reactive Sputter Deposition Of Tin Thin Films For Microelectronic Applications

Download Rf Reactive Sputter Deposition Of Tin Thin Films For Microelectronic Applications full books in PDF, epub, and Kindle. Read online Rf Reactive Sputter Deposition Of Tin Thin Films For Microelectronic Applications ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!

Masters Theses in the Pure and Applied Sciences

Author : Wade H. Shafer
Publisher : Springer Science & Business Media
ISBN 13 : 1461519691
Total Pages : 426 pages
Book Rating : 4.4/5 (615 download)

DOWNLOAD NOW!

Book Synopsis Masters Theses in the Pure and Applied Sciences by : Wade H. Shafer

Download or read book Masters Theses in the Pure and Applied Sciences written by Wade H. Shafer and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 426 pages. Available in PDF, EPUB and Kindle. Book excerpt: Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by the Center for Information and Numerical Data Analysis and Synthesis (CINDAS)* at Purdue University in 1957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dis semination phases of the activity were transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the thought that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we had concluded that it was in the interest of all concerned if the printing and distribution of the volumes were handled by an international publishing house to assure improved service and broader dissemination. Hence, starting with Volume 18, Masters Theses in the Pure and Applied Sciences has been disseminated on a worldwide basis by Plenum Publishing Corporation of New York, and in the same year the coverage was broadened to include Canadian universities. All back issues can also be ordered from Plenum. We have reported in Volume 38 (thesis year 1993) a total of 13,787 thesis titles from 22 Canadian and 164 United States universities. We are sure that this broader base for these titles reported will greatly enhance the value of this impor tant annual reference work. While Volume 38 reports theses submitted in 1993, on occasion, certain uni versities do report theses submitted in previous years but not reported at the time.

Handbook of Deposition Technologies for Films and Coatings

Author : Peter M. Martin
Publisher : William Andrew
ISBN 13 : 0815520328
Total Pages : 932 pages
Book Rating : 4.8/5 (155 download)

DOWNLOAD NOW!

Book Synopsis Handbook of Deposition Technologies for Films and Coatings by : Peter M. Martin

Download or read book Handbook of Deposition Technologies for Films and Coatings written by Peter M. Martin and published by William Andrew. This book was released on 2009-12-01 with total page 932 pages. Available in PDF, EPUB and Kindle. Book excerpt: This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.

Sputtering Materials for VLSI and Thin Film Devices

Author : Jaydeep Sarkar
Publisher : William Andrew
ISBN 13 : 0815519877
Total Pages : 614 pages
Book Rating : 4.8/5 (155 download)

DOWNLOAD NOW!

Book Synopsis Sputtering Materials for VLSI and Thin Film Devices by : Jaydeep Sarkar

Download or read book Sputtering Materials for VLSI and Thin Film Devices written by Jaydeep Sarkar and published by William Andrew. This book was released on 2010-12-13 with total page 614 pages. Available in PDF, EPUB and Kindle. Book excerpt: An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . - Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements - Practical information on technology trends, role of sputtering and major OEMs - Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc. - Practical case-studies on target performance and troubleshooting - Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry

PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing

Author :
Publisher : Elsevier
ISBN 13 : 0080542921
Total Pages : 434 pages
Book Rating : 4.0/5 (85 download)

DOWNLOAD NOW!

Book Synopsis PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing by :

Download or read book PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing written by and published by Elsevier. This book was released on 1998-10-29 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.

Atomic Layer Deposition for Semiconductors

Author : Cheol Seong Hwang
Publisher : Springer Science & Business Media
ISBN 13 : 146148054X
Total Pages : 266 pages
Book Rating : 4.4/5 (614 download)

DOWNLOAD NOW!

Book Synopsis Atomic Layer Deposition for Semiconductors by : Cheol Seong Hwang

Download or read book Atomic Layer Deposition for Semiconductors written by Cheol Seong Hwang and published by Springer Science & Business Media. This book was released on 2013-10-18 with total page 266 pages. Available in PDF, EPUB and Kindle. Book excerpt: Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.

Reactive Sputter Deposition

Author : Diederik Depla
Publisher : Springer Science & Business Media
ISBN 13 : 3540766642
Total Pages : 584 pages
Book Rating : 4.5/5 (47 download)

DOWNLOAD NOW!

Book Synopsis Reactive Sputter Deposition by : Diederik Depla

Download or read book Reactive Sputter Deposition written by Diederik Depla and published by Springer Science & Business Media. This book was released on 2008-06-24 with total page 584 pages. Available in PDF, EPUB and Kindle. Book excerpt: In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.

Titanium in Medicine

Author : D.M. Brunette
Publisher : Springer Science & Business Media
ISBN 13 : 3642564860
Total Pages : 1019 pages
Book Rating : 4.6/5 (425 download)

DOWNLOAD NOW!

Book Synopsis Titanium in Medicine by : D.M. Brunette

Download or read book Titanium in Medicine written by D.M. Brunette and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 1019 pages. Available in PDF, EPUB and Kindle. Book excerpt: Providing scientific and technical in-depth information in a clear format with a homogeneous structure, this text is suited for educational and self-teaching purposes as well as a reference on titanium for biomedical applications. It covers the whole area relevant to the use of titanium for implants, devices and instruments in medicine: material and surface science, physics, chemistry, biology, medicine, quality and regulatory aspects.

Handbook of Sputter Deposition Technology

Author : Kiyotaka Wasa
Publisher : William Andrew
ISBN 13 : 1437734847
Total Pages : 657 pages
Book Rating : 4.4/5 (377 download)

DOWNLOAD NOW!

Book Synopsis Handbook of Sputter Deposition Technology by : Kiyotaka Wasa

Download or read book Handbook of Sputter Deposition Technology written by Kiyotaka Wasa and published by William Andrew. This book was released on 2012-12-31 with total page 657 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thoroughly updated new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications of sputtering technology. It forms a bridge between fundamental theory and practical application, giving an insight into innovative new materials, devices and systems. Organized into three parts for ease of use, this Handbook introduces the fundamentals of thin films and sputtering deposition, explores the theory and practices of this field, and also covers new technology such as nano-functional materials and MEMS. Wide varieties of functional thin film materials and processing are described, and experimental data is provided with detailed examples and theoretical descriptions. - A strong applications focus, covering current and emerging technologies, including nano-materials and MEMS (microelectrolmechanical systems) for energy, environments, communications, and/or bio-medical field. New chapters on computer simulation of sputtering and MEMS completes the update and insures that the new edition includes the most current and forward-looking coverage available - All applications discussed are supported by theoretical discussions, offering readers both the "how" and the "why" of each technique - 40% revision: the new edition includes an entirely new team of contributing authors with backgrounds specializing in the various new applications that are covered in the book and providing the most up-to-date coverage available anywhere

Masters Theses in the Pure and Applied Sciences

Author : Sade H Shafer
Publisher : Springer Science & Business Media
ISBN 13 :
Total Pages : 440 pages
Book Rating : 4.0/5 ( download)

DOWNLOAD NOW!

Book Synopsis Masters Theses in the Pure and Applied Sciences by : Sade H Shafer

Download or read book Masters Theses in the Pure and Applied Sciences written by Sade H Shafer and published by Springer Science & Business Media. This book was released on 1995 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt: Cited in Sheehy, Chen, and Hurt . Volume 38 (thesis year 1993) reports a total of 13,787 thesis titles from 22 Canadian and 164 US universities. As in previous volumes, thesis titles are arranged by discipline and by university within each discipline. Any accredited university or college with a grad

Research in Progress

Author :
Publisher :
ISBN 13 :
Total Pages : 294 pages
Book Rating : 4.:/5 (31 download)

DOWNLOAD NOW!

Book Synopsis Research in Progress by :

Download or read book Research in Progress written by and published by . This book was released on 1987 with total page 294 pages. Available in PDF, EPUB and Kindle. Book excerpt:

The Materials Science of Thin Films

Author : Milton Ohring
Publisher : Academic Press
ISBN 13 : 9780125249904
Total Pages : 744 pages
Book Rating : 4.2/5 (499 download)

DOWNLOAD NOW!

Book Synopsis The Materials Science of Thin Films by : Milton Ohring

Download or read book The Materials Science of Thin Films written by Milton Ohring and published by Academic Press. This book was released on 1992 with total page 744 pages. Available in PDF, EPUB and Kindle. Book excerpt: Prepared as a textbook complete with problems after each chapter, specifically intended for classroom use in universities.

Handbook of Manufacturing Engineering and Technology

Author : Andrew Y. C. Nee
Publisher : Springer
ISBN 13 : 9781447146698
Total Pages : 0 pages
Book Rating : 4.1/5 (466 download)

DOWNLOAD NOW!

Book Synopsis Handbook of Manufacturing Engineering and Technology by : Andrew Y. C. Nee

Download or read book Handbook of Manufacturing Engineering and Technology written by Andrew Y. C. Nee and published by Springer. This book was released on 2014-10-31 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.

Ionized Physical Vapor Deposition

Author :
Publisher : Academic Press
ISBN 13 : 008054293X
Total Pages : 268 pages
Book Rating : 4.0/5 (85 download)

DOWNLOAD NOW!

Book Synopsis Ionized Physical Vapor Deposition by :

Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-14 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools.Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application*This single source saves time and effort by including comprehensive information at one's finger tips*The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD*The numerous practical applications assist the working engineer to select and refine thin film processes

Advanced Techniques for Surface Engineering

Author : W. Gissler
Publisher : Springer Science & Business Media
ISBN 13 : 9780792320067
Total Pages : 416 pages
Book Rating : 4.3/5 (2 download)

DOWNLOAD NOW!

Book Synopsis Advanced Techniques for Surface Engineering by : W. Gissler

Download or read book Advanced Techniques for Surface Engineering written by W. Gissler and published by Springer Science & Business Media. This book was released on 1992-10-31 with total page 416 pages. Available in PDF, EPUB and Kindle. Book excerpt: The hardest requirements on a material are in general imposed at the surface: it has to be wear resistant for tools and bearings; corrosion resistant for turbine blades; antireflecting for solar cells; and it must combine several of these properties in other applications. `Surface engineering' is the general term that incorporates all the techniques by which a surface modification can be accomplished. These techniques include both the more traditional methods, such as nitriding, boriding and carburizing, and the newer ones, such as ion implantation, laser beam melting and, in particular, coating. This book comprises and compares in a unique way all these techniques of surface engineering. It is a compilation of lectures which were held by renowned scientists and engineers in the frame of the well known `EuroCourses' of the Joint Research Centre of the Commission of the European Communities. The book is principally addressed to material and surface scientists, physicists and chemists, engineers and technicians of industries and institutes where surface engineering problems arise.

Application of Particle and Laser Beams in Materials Technology

Author : P. Misaelides
Publisher : Springer Science & Business Media
ISBN 13 : 9780792333241
Total Pages : 702 pages
Book Rating : 4.3/5 (332 download)

DOWNLOAD NOW!

Book Synopsis Application of Particle and Laser Beams in Materials Technology by : P. Misaelides

Download or read book Application of Particle and Laser Beams in Materials Technology written by P. Misaelides and published by Springer Science & Business Media. This book was released on 1995-01-31 with total page 702 pages. Available in PDF, EPUB and Kindle. Book excerpt: The development of advanced materials with preselected properties is one of the main goals of materials research. Of especial interest are electronics, high-temperature and superhard materials for various applications, as well as alloys with improved wear, corrosion and mechanical resistance properties. The technical challenge connected with the production of these materials is not only associated with the development of new specialised preparation techniques but also with quality control. The energetic charged particle, electron and photon beams offer the possibility of modifying the properties of the near-surface regions of materials without seriously affecting their bulk, and provide unique analytical tools for testing their quality. Application of Particle and Laser Beams in Materials Technology provides an overview of this rapidly expanding field. Fundamental aspects concerning the interactions and collisions on atomic, nuclear and solid state scale are presented in a didactic way, along with the application of a variety of techniques for the solution of problems ranging from the development of electronics materials to corrosion research and from archaeometry to environmental protection. The book is divided into six thematic units: Fundamentals, Surface Analysis Techniques, Laser Beams in Materials Technology, Accelerator-Based Techniques in Materials Technology, Materials Modification and Synchrotron Radiation.

Introduction to Surface Engineering

Author : P. A. Dearnley
Publisher : Cambridge University Press
ISBN 13 : 1316785084
Total Pages : 798 pages
Book Rating : 4.3/5 (167 download)

DOWNLOAD NOW!

Book Synopsis Introduction to Surface Engineering by : P. A. Dearnley

Download or read book Introduction to Surface Engineering written by P. A. Dearnley and published by Cambridge University Press. This book was released on 2017-01-16 with total page 798 pages. Available in PDF, EPUB and Kindle. Book excerpt: This highly illustrated reference work covers the three principal types of surface technologies that best protect engineering devices and products: diffusion technologies, deposition technologies, and other less commonly acknowledged surface engineering (SE) techniques. Various applications are noted throughout the text and additionally whole chapters are devoted to specific SE applications across the automotive, gas turbine engine (GTE), metal machining, and biomedical implant sectors. Along with the benefits of SE, this volume also critically examines SE's limitations. Materials degradation pathways - those which can and those which cannot be mitigated by SE - are rigorously explained. Written from a scientific, materials engineering perspective, this concise text is supported by high-quality images and photo-micrographs which show how surfaces can be engineered to overcome the limits of conventionally produced materials, even in complex or hostile operating environments. This book is a useful resource for undergraduate and postgraduate students as well as professional engineers.

High Power Impulse Magnetron Sputtering

Author : Daniel Lundin
Publisher : Elsevier
ISBN 13 : 0128124547
Total Pages : 398 pages
Book Rating : 4.1/5 (281 download)

DOWNLOAD NOW!

Book Synopsis High Power Impulse Magnetron Sputtering by : Daniel Lundin

Download or read book High Power Impulse Magnetron Sputtering written by Daniel Lundin and published by Elsevier. This book was released on 2019-08-30 with total page 398 pages. Available in PDF, EPUB and Kindle. Book excerpt: High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.