Rapid Thermal And Integrated Processing Iv Volume 387

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Rapid Thermal and Integrated Processing IV: Volume 387

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Author : Steven R. J. Brueck
Publisher : Materials Research Society
ISBN 13 : 9781558992900
Total Pages : 0 pages
Book Rating : 4.9/5 (929 download)

Book Synopsis Rapid Thermal and Integrated Processing IV: Volume 387 by : Steven R. J. Brueck

Download or read book Rapid Thermal and Integrated Processing IV: Volume 387 written by Steven R. J. Brueck and published by Materials Research Society. This book was released on 1995-10-27 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fourth in a continuing series on rapid thermal processing (RTP), this volume addresses work in traditional RTP processes such as dielectric growth, annealing and silicides, as well as developments in integrated processes. The primary focus, however, is the manufacturing aspects of RTP and the successful integration of RTP into production semiconductor fabs. Emphasis is placed on process and equipment modelling and the critical aspects of RTP, such as temperature measurement, uniformity and control. Topics include: modelling, sensors and control; integrated processing and manufacturing; dielectrics; epitaxy, polysilicon and devices; and junctions, metallization and contacts.

Rapid Thermal and Integrated Processing V: Volume 429

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Author : J. C. Gelpey
Publisher :
ISBN 13 :
Total Pages : 416 pages
Book Rating : 4.:/5 (318 download)

Book Synopsis Rapid Thermal and Integrated Processing V: Volume 429 by : J. C. Gelpey

Download or read book Rapid Thermal and Integrated Processing V: Volume 429 written by J. C. Gelpey and published by . This book was released on 1996-10-14 with total page 416 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is the latest in a continuing series on rapid thermal processing and related topics. It embraces a diversity of research, development and manufacturing activities that require rapid thermal and integrated processing techniques which are recognized by their acronyms, such as rapid thermal annealing (RTA), rapid thermal processing (RTP), rapid thermal chemical vapor deposition (RTCVP), rapid thermal oxidation (RTO), and others. This fifth anniversary volume reports notable advances in the use of rapid thermal techniques in processing science and technology, and for process control in industrial fabrication facilities. It is organized around progress obtained through: evaluation methodology; equipment and process modelling; temperature control; defects and diffusion associated with annealing; metallizations such as silicidation; novel processing of sol-gel and magnetic films; dielectric growth and deposition; and silicon or silicon-germanium film deposition.

Rapid Thermal and Integrated Processing

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Author :
Publisher :
ISBN 13 :
Total Pages : 914 pages
Book Rating : 4.3/5 (91 download)

Book Synopsis Rapid Thermal and Integrated Processing by :

Download or read book Rapid Thermal and Integrated Processing written by and published by . This book was released on 1998 with total page 914 pages. Available in PDF, EPUB and Kindle. Book excerpt:

SiGe--materials, Processing, and Devices

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Author : David Louis Harame
Publisher : The Electrochemical Society
ISBN 13 : 9781566774208
Total Pages : 1242 pages
Book Rating : 4.7/5 (742 download)

Book Synopsis SiGe--materials, Processing, and Devices by : David Louis Harame

Download or read book SiGe--materials, Processing, and Devices written by David Louis Harame and published by The Electrochemical Society. This book was released on 2004 with total page 1242 pages. Available in PDF, EPUB and Kindle. Book excerpt:

SiGe and Si Strained-Layer Epitaxy for Silicon Heterostructure Devices

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Author : John D. Cressler
Publisher : CRC Press
ISBN 13 : 1351834797
Total Pages : 373 pages
Book Rating : 4.3/5 (518 download)

Book Synopsis SiGe and Si Strained-Layer Epitaxy for Silicon Heterostructure Devices by : John D. Cressler

Download or read book SiGe and Si Strained-Layer Epitaxy for Silicon Heterostructure Devices written by John D. Cressler and published by CRC Press. This book was released on 2017-12-19 with total page 373 pages. Available in PDF, EPUB and Kindle. Book excerpt: What seems routine today was not always so. The field of Si-based heterostructures rests solidly on the shoulders of materials scientists and crystal growers, those purveyors of the semiconductor “black arts” associated with the deposition of pristine films of nanoscale dimensionality onto enormous Si wafers with near infinite precision. We can now grow near-defect free, nanoscale films of Si and SiGe strained-layer epitaxy compatible with conventional high-volume silicon integrated circuit manufacturing. SiGe and Si Strained-Layer Epitaxy for Silicon Heterostructure Devices tells the materials side of the story and details the many advances in the Si-SiGe strained-layer epitaxy for device applications. Drawn from the comprehensive and well-reviewed Silicon Heterostructure Handbook, this volume defines and details the many advances in the Si/SiGe strained-layer epitaxy for device applications. Mining the talents of an international panel of experts, the book covers modern SiGe epitaxial growth techniques, epi defects and dopant diffusion in thin films, stability constraints, and electronic properties of SiGe, strained Si, and Si-C alloys. It includes appendices on topics such as the properties of Si and Ge, the generalized Moll-Ross relations, integral charge-control relations, and sample SiGe HBT compact model parameters.

Advances in Rapid Thermal and Integrated Processing

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Author : F. Roozeboom
Publisher : Springer Science & Business Media
ISBN 13 : 9401587116
Total Pages : 568 pages
Book Rating : 4.4/5 (15 download)

Book Synopsis Advances in Rapid Thermal and Integrated Processing by : F. Roozeboom

Download or read book Advances in Rapid Thermal and Integrated Processing written by F. Roozeboom and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 568 pages. Available in PDF, EPUB and Kindle. Book excerpt: Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.

Silicon Heterostructure Handbook

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Author : John D. Cressler
Publisher : CRC Press
ISBN 13 : 1420026585
Total Pages : 1248 pages
Book Rating : 4.4/5 (2 download)

Book Synopsis Silicon Heterostructure Handbook by : John D. Cressler

Download or read book Silicon Heterostructure Handbook written by John D. Cressler and published by CRC Press. This book was released on 2018-10-03 with total page 1248 pages. Available in PDF, EPUB and Kindle. Book excerpt: An extraordinary combination of material science, manufacturing processes, and innovative thinking spurred the development of SiGe heterojunction devices that offer a wide array of functions, unprecedented levels of performance, and low manufacturing costs. While there are many books on specific aspects of Si heterostructures, the Silicon Heterostructure Handbook: Materials, Fabrication, Devices, Circuits, and Applications of SiGe and Si Strained-Layer Epitaxy is the first book to bring all aspects together in a single source. Featuring broad, comprehensive, and in-depth discussion, this handbook distills the current state of the field in areas ranging from materials to fabrication, devices, CAD, circuits, and applications. The editor includes "snapshots" of the industrial state-of-the-art for devices and circuits, presenting a novel perspective for comparing the present status with future directions in the field. With each chapter contributed by expert authors from leading industrial and research institutions worldwide, the book is unequalled not only in breadth of scope, but also in depth of coverage, timeliness of results, and authority of references. It also includes a foreword by Dr. Bernard S. Meyerson, a pioneer in SiGe technology. Containing nearly 1000 figures along with valuable appendices, the Silicon Heterostructure Handbook authoritatively surveys materials, fabrication, device physics, transistor optimization, optoelectronics components, measurement, compact modeling, circuit design, and device simulation.

Advances in Rapid Thermal Processing

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Author : Fred Roozeboom
Publisher : The Electrochemical Society
ISBN 13 : 9781566772327
Total Pages : 470 pages
Book Rating : 4.7/5 (723 download)

Book Synopsis Advances in Rapid Thermal Processing by : Fred Roozeboom

Download or read book Advances in Rapid Thermal Processing written by Fred Roozeboom and published by The Electrochemical Society. This book was released on 1999 with total page 470 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Chemical Vapor Deposition

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Author : Electrochemical Society. High Temperature Materials Division
Publisher : The Electrochemical Society
ISBN 13 : 9781566771788
Total Pages : 1686 pages
Book Rating : 4.7/5 (717 download)

Book Synopsis Chemical Vapor Deposition by : Electrochemical Society. High Temperature Materials Division

Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Fabrication of SiGe HBT BiCMOS Technology

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Author : John D. Cressler
Publisher : CRC Press
ISBN 13 : 1420066897
Total Pages : 258 pages
Book Rating : 4.4/5 (2 download)

Book Synopsis Fabrication of SiGe HBT BiCMOS Technology by : John D. Cressler

Download or read book Fabrication of SiGe HBT BiCMOS Technology written by John D. Cressler and published by CRC Press. This book was released on 2018-10-03 with total page 258 pages. Available in PDF, EPUB and Kindle. Book excerpt: SiGe HBT BiCMOS technology is the obvious groundbreaker of the Si heterostructures application space. To date virtually every major player in the communications electronics market either has SiGe up and running in-house or is using someone else’s SiGe fab as foundry for their designers. Key to this success lies in successful integration of the SiGe HBT and Si CMOS, with no loss of performance from either device. Filled with contributions from leading experts, Fabrication of SiGe HBT BiCMOS Technologies brings together a complete discussion of these topics into a single resource. Drawn from the comprehensive and well-reviewed Silicon Heterostructure Handbook, this volume examines the design, fabrication, and application of silicon heterostructure transistors. A novel aspect of this book the inclusion of numerous snapshot views of the industrial state-of-the-art for SiGe HBT BiCMOS technology. It has been carefully designed to provide a useful basis of comparison for the current status and future course of the global industry. In addition to the copious technical material and the numerous references contained in each chapter, the book includes easy-to-reference appendices on the properties of Si and Ge, the generalized Moll-Ross relations, integral charge-control relations, and sample SiGe HBT compact model parameters.

Ultraclean Semiconductor Processing Technology and Surface Chemical Cleaning and Passivation

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Author : Michael Liehr
Publisher :
ISBN 13 :
Total Pages : 440 pages
Book Rating : 4.3/5 (91 download)

Book Synopsis Ultraclean Semiconductor Processing Technology and Surface Chemical Cleaning and Passivation by : Michael Liehr

Download or read book Ultraclean Semiconductor Processing Technology and Surface Chemical Cleaning and Passivation written by Michael Liehr and published by . This book was released on 1995 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt: Wafer cleaning, microcontamination and surface passivation are the key focus of this proceedings volume, the 3rd in a successful series from MRS. It is a field in which control of surface chemistry and surface morphology, as well as particle and molecular contamination removal, are of critical importance. This volume expands the scope of the topic to include ultraclean technology in a broader sense, emphasizing the identification and characterization of trace contamination, strategies for removal, and equipment considerations, as well as critical limits for impact on devices. Novel processes, such as chemical mechanical polishing (CMP), and their ramifications for contamination removal are also addressed.

International Aerospace Abstracts

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Author :
Publisher :
ISBN 13 :
Total Pages : 948 pages
Book Rating : 4.F/5 ( download)

Book Synopsis International Aerospace Abstracts by :

Download or read book International Aerospace Abstracts written by and published by . This book was released on 1996 with total page 948 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Advanced Laser Processing of Materials: Volume 397

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Author : Rajiv K. Singh
Publisher :
ISBN 13 :
Total Pages : 704 pages
Book Rating : 4.3/5 (91 download)

Book Synopsis Advanced Laser Processing of Materials: Volume 397 by : Rajiv K. Singh

Download or read book Advanced Laser Processing of Materials: Volume 397 written by Rajiv K. Singh and published by . This book was released on 1996-09-09 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Laser processing has been used in a wide variety of applications and materials such as semiconductors, superconductors, ceramics, polymers and metals. Lasers provide a controlled source of atomic and electronic excitations involving nonequilibrium phenomena that lend themselves to processing of novel materials and structures. The range of laser-solid interactions involving electronic excitation, melting and evaporation result in the formation of novel phases, selective gas excitations, surface modification and low-temperature thin-film deposition. This book from MRS focuses on the use of lasers in both the fundamental understanding and applied aspects of laser-solid and laser-gas interactions relevant to materials processing. Applications featured include thin-film transistors formed by laser-induced crystallization of amorphous silicon, diamond coatings and micromachining. Topics include: fundamentals of laser-solid interactions; fundamentals of pulsed laser ablation; pulsed laser deposition; novel applications of laser processing; laser-driven formation of nanocrystals; laser annealing; surface modification and etching; and laser-assisted chemical vapor deposition.

Thermodynamics and Kinetics of Phase Transformations: Volume 398

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Author : James S. Im
Publisher :
ISBN 13 :
Total Pages : 714 pages
Book Rating : 4.3/5 (91 download)

Book Synopsis Thermodynamics and Kinetics of Phase Transformations: Volume 398 by : James S. Im

Download or read book Thermodynamics and Kinetics of Phase Transformations: Volume 398 written by James S. Im and published by . This book was released on 1996-09-10 with total page 714 pages. Available in PDF, EPUB and Kindle. Book excerpt: The emphasis of this book is on the quantitative analysis of transformation kinetics, integrated with thermodynamics. Solidification is a success story for quantitative kinetics analysis. The work reported concentrates on phase selection under extreme processing - large undercooling or ultrarapid quenching - of the liquid. Theoretical treatments are concerned mainly with the analysis of morphological instabilities during directional solidification at more conventional rates. The coverage of particle-beam effects is distinguished by the materials studied: alkali halides, minerals, semiconductors and metals. The thermodynamics of interfaces are a particular focus, especially in connection with the solid-state formation of amorphous phases. A highlight of the book is the coverage of the Johnson-Mehl-Avrami-Kolmogorov analysis of overall transformation kinetics. This venerable treatment is revisited and new insights and limitations are explored. Topics include: transformations in undercooled liquids; directional solidification; particle beam-induced transformations; interfaces - thermodynamics and reactions; amorphous materials - structure and transformations; solid-state transformations and ordering and phase separation.

Rapid Thermal and Integrated Processing III: Volume 342

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Author : Jimmie J. Wortman
Publisher :
ISBN 13 :
Total Pages : 472 pages
Book Rating : 4.:/5 (318 download)

Book Synopsis Rapid Thermal and Integrated Processing III: Volume 342 by : Jimmie J. Wortman

Download or read book Rapid Thermal and Integrated Processing III: Volume 342 written by Jimmie J. Wortman and published by . This book was released on 1994-08-02 with total page 472 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Strained Layer Epitaxy: Volume 379

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Author : Eugene Fitzgerald
Publisher :
ISBN 13 :
Total Pages : 552 pages
Book Rating : 4.3/5 (91 download)

Book Synopsis Strained Layer Epitaxy: Volume 379 by : Eugene Fitzgerald

Download or read book Strained Layer Epitaxy: Volume 379 written by Eugene Fitzgerald and published by . This book was released on 1995-11-09 with total page 552 pages. Available in PDF, EPUB and Kindle. Book excerpt: An interdisciplinary discussion of key materials issues and controversies in strained layer epitaxy is presented in this new volume from MRS. Research involving GeSi alloys and Si:C alloys are well represented. In the case of GeSi alloys, utilizing both strained and relaxed structures appears to be a strong component of the current research. Applications, devices and synthesis of improved relaxed and strained materials are featured. Special efforts to integrate the III-V and IV communities were also made during this symposium, and those efforts are reflected in the proceedings volume as well. Results on compositional graded layers in both the GeSi and III-V materials systems are presented. Topics include: general issues; ordering/low dimensional structures; characterization; device applications; growth of Si-based materials; and growth of compound semiconductors.

Rapid Thermal and Integrated Processing

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Author :
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (112 download)

Book Synopsis Rapid Thermal and Integrated Processing by :

Download or read book Rapid Thermal and Integrated Processing written by and published by . This book was released on 1992 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: