Radio Frequency Plasma Assisted Chemical Vapor Deposition of Carbon Films from Ethane-hydrogen Mixtures

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ISBN 13 :
Total Pages : 148 pages
Book Rating : 4.:/5 (236 download)

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Book Synopsis Radio Frequency Plasma Assisted Chemical Vapor Deposition of Carbon Films from Ethane-hydrogen Mixtures by : Shyankay Jou

Download or read book Radio Frequency Plasma Assisted Chemical Vapor Deposition of Carbon Films from Ethane-hydrogen Mixtures written by Shyankay Jou and published by . This book was released on 1990 with total page 148 pages. Available in PDF, EPUB and Kindle. Book excerpt:

The Characterization of Thin Carbon Films Created Via Radio Frequency Plasma-enhanced Chemical Vapor Deposition

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ISBN 13 :
Total Pages : 112 pages
Book Rating : 4.:/5 (757 download)

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Book Synopsis The Characterization of Thin Carbon Films Created Via Radio Frequency Plasma-enhanced Chemical Vapor Deposition by : George Tecos

Download or read book The Characterization of Thin Carbon Films Created Via Radio Frequency Plasma-enhanced Chemical Vapor Deposition written by George Tecos and published by . This book was released on 2011 with total page 112 pages. Available in PDF, EPUB and Kindle. Book excerpt: Various deposition parameters have been adopted to deposit carbon-based thin films on silicon subtrates via Plasma-Enhanced Chemical Vapor Detection (PECVD) with a Radio-Frequency Plasma. We seek a recipe and formulation for carbon film deposition by varying the ratios of input gases and subtrate temperature, with the goal of observing these effects on the deposited carbon film. Characterization of the samples was carried out through various procedures, including the Ion Beam Analysis (IBA) techniques: Rutherford/Non-Rutherford Backscattering Spectrometry (RBS/NRBS), Elastic Recoil Detection Analysis (ERDA), and Raman Spectroscopy. This data was analyzed to determine the purity, quality, elemental compensation, and interface integrity of each respective sample. We conclude that the films deposited on Si subtrates are polymer-like carbon films with 30-35 at% C and 65-70 at% H. The interface between the film and subtrate was found to be abrupt. The effect of subtrate temperature on the microstructure of the deposited films was found to be inconclusive. This study will lay the basis for future explorations into Western Michigan University produced CVD carbon-based films, and investigate the properties of these unique and profitable materials.

Radio-Frequency Plasma Enhanced Chemical Vapor Deposition of Diamond-like Carbon Using Methanol

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ISBN 13 :
Total Pages : 278 pages
Book Rating : 4.:/5 (435 download)

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Book Synopsis Radio-Frequency Plasma Enhanced Chemical Vapor Deposition of Diamond-like Carbon Using Methanol by : Chiao Wen Liu

Download or read book Radio-Frequency Plasma Enhanced Chemical Vapor Deposition of Diamond-like Carbon Using Methanol written by Chiao Wen Liu and published by . This book was released on 2000 with total page 278 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Radio Frequency Chemical Vapor Deposition of Diamond-like Carbon Films

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ISBN 13 :
Total Pages : 138 pages
Book Rating : 4.:/5 (221 download)

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Book Synopsis Radio Frequency Chemical Vapor Deposition of Diamond-like Carbon Films by : Christine L. Wodke

Download or read book Radio Frequency Chemical Vapor Deposition of Diamond-like Carbon Films written by Christine L. Wodke and published by . This book was released on 1989 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt:

RF Plasma-assisted Chemical Vapor Deposition of Diamond-like and Graphitic Carbon

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (115 download)

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Book Synopsis RF Plasma-assisted Chemical Vapor Deposition of Diamond-like and Graphitic Carbon by : Sang Ro Lee

Download or read book RF Plasma-assisted Chemical Vapor Deposition of Diamond-like and Graphitic Carbon written by Sang Ro Lee and published by . This book was released on 1989 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

High Rate Chemical Vapor Deposition of Carbon Films Using Fluorinated Gases

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (873 download)

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Book Synopsis High Rate Chemical Vapor Deposition of Carbon Films Using Fluorinated Gases by :

Download or read book High Rate Chemical Vapor Deposition of Carbon Films Using Fluorinated Gases written by and published by . This book was released on 1993 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: A high rate, low-temperature deposition of amorphous carbon films is produced by PE-CVD in the presence of a fluorinated or other halide gas. The deposition can be performed at less than 100.degree. C., including ambient room temperature, with a radio frequency plasma assisted chemical vapor deposition process. With less than 6.5 atomic percent fluorine incorporated into the amorphous carbon film, the characteristics of the carbon film, including index of refraction, mass density, optical clarity, and chemical resistance are within fifteen percent (15%) of those characteristics for pure amorphous carbon films, but the deposition rates are high.

Characterization of Amorphous Hydrogenated Carbon (a-C:H) from Plasma Assisted Chemical Vapor Deposition

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ISBN 13 :
Total Pages : 178 pages
Book Rating : 4.:/5 (34 download)

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Book Synopsis Characterization of Amorphous Hydrogenated Carbon (a-C:H) from Plasma Assisted Chemical Vapor Deposition by : Karen Margaret Carr

Download or read book Characterization of Amorphous Hydrogenated Carbon (a-C:H) from Plasma Assisted Chemical Vapor Deposition written by Karen Margaret Carr and published by . This book was released on 1989 with total page 178 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Characterization of Plasma-enhanced Chemical-vapor-deposited Diamond-like Carbon Films

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ISBN 13 :
Total Pages : 216 pages
Book Rating : 4.:/5 (288 download)

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Book Synopsis Characterization of Plasma-enhanced Chemical-vapor-deposited Diamond-like Carbon Films by : G. Sreenivas

Download or read book Characterization of Plasma-enhanced Chemical-vapor-deposited Diamond-like Carbon Films written by G. Sreenivas and published by . This book was released on 1992 with total page 216 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition

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Publisher : The Electrochemical Society
ISBN 13 : 9781566771559
Total Pages : 922 pages
Book Rating : 4.7/5 (715 download)

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Book Synopsis Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition by : Theodore M. Besmann

Download or read book Proceedings of the Thirteenth International Conference on Chemical Vapor Deposition written by Theodore M. Besmann and published by The Electrochemical Society. This book was released on 1996 with total page 922 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Carbon Nanofibers

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Publisher : John Wiley & Sons
ISBN 13 : 1119769124
Total Pages : 448 pages
Book Rating : 4.1/5 (197 download)

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Book Synopsis Carbon Nanofibers by : Madhuri Sharon

Download or read book Carbon Nanofibers written by Madhuri Sharon and published by John Wiley & Sons. This book was released on 2021-02-09 with total page 448 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book covers the fundamentals and applications of Carbon Nanofiber (CNF). In the first section, the initial chapter on the fundamentals of CNF is by Professor Maheshwar Sharon, the recognized “Father of Carbon Nanotechnology in India”, which powerfully provides a succinct overview of CNFs. This is followed by a chapter on biogenics that have produced unique morphologies of CNF that makes them suitable to various applications. This is followed by a chapter that mainly focuses on nanocomposites, especially those involving nanocomposites of CNF. The role of nanocatalysts and composites in promoting and enhancing the synthesis and application of CNF is then covered, followed by an important chapter on the characterization of CNF. The second section of the book encompasses the various applications of CNF, such as its use as a possible superconductor to adsorb and store hydrogen, and as a microwave absorber. The application of CNF for environmental concerns is also detailed by assessing its usefulness in dye and heavy metal removal from polluted water. The applications that are addressed include lithium-ion battery, solar cell, antenna, cosmetics, usefulness in regenerative medicine, as well as various aspects of agrotechnology.

Plasma-Enhanced Chemical Vapor Deposition of Silicon and Silicon-Containing Films

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ISBN 13 :
Total Pages : 8 pages
Book Rating : 4.:/5 (125 download)

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Book Synopsis Plasma-Enhanced Chemical Vapor Deposition of Silicon and Silicon-Containing Films by : DW. Hess

Download or read book Plasma-Enhanced Chemical Vapor Deposition of Silicon and Silicon-Containing Films written by DW. Hess and published by . This book was released on 1983 with total page 8 pages. Available in PDF, EPUB and Kindle. Book excerpt: The use of a radio frequency (rf) glow discharge or plasma has recently come into favor for the deposition of thin films. In plasma-enhanced chemical vapor deposition (PECVD), chemical reactions can be carried out at low (

Atomic Hydrogen Assisted Chemical Vapor Deposition and Etching of Silicon Thin Films

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ISBN 13 :
Total Pages : 246 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Atomic Hydrogen Assisted Chemical Vapor Deposition and Etching of Silicon Thin Films by : Shuangying Yu

Download or read book Atomic Hydrogen Assisted Chemical Vapor Deposition and Etching of Silicon Thin Films written by Shuangying Yu and published by . This book was released on 1996 with total page 246 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Proceedings of the Ninth European Conference on Chemical Vapour Deposition, Tampere, Finland, 22-27 August 1993

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ISBN 13 :
Total Pages : 646 pages
Book Rating : 4.:/5 (318 download)

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Book Synopsis Proceedings of the Ninth European Conference on Chemical Vapour Deposition, Tampere, Finland, 22-27 August 1993 by : Tapio Mäntylä

Download or read book Proceedings of the Ninth European Conference on Chemical Vapour Deposition, Tampere, Finland, 22-27 August 1993 written by Tapio Mäntylä and published by . This book was released on 1993 with total page 646 pages. Available in PDF, EPUB and Kindle. Book excerpt:

NASA Technical Paper

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ISBN 13 :
Total Pages : 20 pages
Book Rating : 4.F/5 ( download)

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Book Synopsis NASA Technical Paper by :

Download or read book NASA Technical Paper written by and published by . This book was released on 1984 with total page 20 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Remote Plasma Enhanced Chemical Vapor Deposition of Fluorinated Silicon Oxide Films Using 1,2bis(methyldifluorosilyl)ethane and Triethoxyfluorosilane

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ISBN 13 :
Total Pages : 274 pages
Book Rating : 4.:/5 (651 download)

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Book Synopsis Remote Plasma Enhanced Chemical Vapor Deposition of Fluorinated Silicon Oxide Films Using 1,2bis(methyldifluorosilyl)ethane and Triethoxyfluorosilane by : Zhongping Jin

Download or read book Remote Plasma Enhanced Chemical Vapor Deposition of Fluorinated Silicon Oxide Films Using 1,2bis(methyldifluorosilyl)ethane and Triethoxyfluorosilane written by Zhongping Jin and published by . This book was released on 2005 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Thermal Degradation and Tribiological Behavior of Diamond-like Carbon Films Prepared by Plasma-assisted Chemical Vapor Deposition

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ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (115 download)

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Book Synopsis Thermal Degradation and Tribiological Behavior of Diamond-like Carbon Films Prepared by Plasma-assisted Chemical Vapor Deposition by : Daesig Kim

Download or read book Thermal Degradation and Tribiological Behavior of Diamond-like Carbon Films Prepared by Plasma-assisted Chemical Vapor Deposition written by Daesig Kim and published by . This book was released on 1991 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Handbook of Manufacturing Engineering and Technology

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Publisher : Springer
ISBN 13 : 9781447146698
Total Pages : 0 pages
Book Rating : 4.1/5 (466 download)

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Book Synopsis Handbook of Manufacturing Engineering and Technology by : Andrew Y. C. Nee

Download or read book Handbook of Manufacturing Engineering and Technology written by Andrew Y. C. Nee and published by Springer. This book was released on 2014-10-31 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Springer Reference Work Handbook of Manufacturing Engineering and Technology provides overviews and in-depth and authoritative analyses on the basic and cutting-edge manufacturing technologies and sciences across a broad spectrum of areas. These topics are commonly encountered in industries as well as in academia. Manufacturing engineering curricula across universities are now essential topics covered in major universities worldwide.