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Author : Ashfaq A. Munshi
Publisher :
ISBN 13 :
Total Pages : 110 pages
Book Rating : 4.:/5 (232 download)
Download or read book Proximity Effect Correction in Electron Beam Lithography written by Ashfaq A. Munshi and published by . This book was released on 1982 with total page 110 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Raju Gurung
Publisher :
ISBN 13 :
Total Pages : 260 pages
Book Rating : 4.:/5 (643 download)
Download or read book Computer Visualisation and Proximity Effect Correction for Submicron Electron Beam Lithography written by Raju Gurung and published by . This book was released on 1995 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : David G. L. Chow
Publisher :
ISBN 13 :
Total Pages : 92 pages
Book Rating : 4.:/5 (115 download)
Download or read book An Image Processing Approach to Fast, Efficient Proximity Effect Correction for Electron Beam Lithography written by David G. L. Chow and published by . This book was released on 1984 with total page 92 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Joseph Charles Jacob
Publisher :
ISBN 13 :
Total Pages : 190 pages
Book Rating : 4.E/5 ( download)
Download or read book Pyramid-a Hierarchical, Rule-based Scheme for Proximity Effect Correction in Electron-beam Lithography written by Joseph Charles Jacob and published by . This book was released on 1992 with total page 190 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Brian David Cook
Publisher :
ISBN 13 :
Total Pages : 358 pages
Book Rating : 4.E/5 ( download)
Download or read book Pyramid-a Hierarchical, Rule-based Proximity Effect Correction Scheme for Electron Beam Lithography written by Brian David Cook and published by . This book was released on 1996 with total page 358 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : 粘群
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (15 download)
Download or read book Short-time and Low-temperature Development for Electron-beam Lithography and the Algorithms of Proximity Effect Correction written by 粘群 and published by . This book was released on 2017 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : H. L. Berkowitz
Publisher :
ISBN 13 :
Total Pages : 17 pages
Book Rating : 4.:/5 (227 download)
Download or read book A Proximity Effect Correction Program for Electron Beam Lithography written by H. L. Berkowitz and published by . This book was released on 1982 with total page 17 pages. Available in PDF, EPUB and Kindle. Book excerpt: A proximity effect correction program implementing the self-consistent correction algorithm has been developed. The program calculates recommended electron beam exposures given as input, the pattern to be written and the beam scattering parameters. Predicted dose patterns resulting from the recommended exposures are also calculated. Results of sample calculations are shown. (Author).
Author : J. M. Pavkovich
Publisher :
ISBN 13 :
Total Pages : 5 pages
Book Rating : 4.:/5 (227 download)
Download or read book Proximity Effect Correction in Variably Shaped Electron-Beam Lithography written by J. M. Pavkovich and published by . This book was released on 1985 with total page 5 pages. Available in PDF, EPUB and Kindle. Book excerpt: Proximity effect in electron-beam lithography is studied with an emphasis on physical understanding. Computer simulation is used to explore correction schemes which specifically include the resist behavior and yet are theoretically manageable in formulating the pattern correction for mathematical analysis. Both energy density part way through the resist and relative importance of background on critical edge are investigated. It is shown that one-third of the resist thickness from the substrate appears to be where the process parameters should be characterized, and that the total effective deposited energy at the nominal edge must be reduced as the background contribution increases. A mathematical model and design graphs are developed so that the impact of the background on the edge control is directly related to fundamental physics through the Monte Carlo calculation. The nominal edge is used as the critical aspect to be controlled and the constraint of constant bias can be applied. (Author).
Author : Fei Hu
Publisher :
ISBN 13 :
Total Pages : 212 pages
Book Rating : 4.:/5 (52 download)
Download or read book An Implementation of Proximity Effect Correction for Grayscale E-beam Lithography written by Fei Hu and published by . This book was released on 2002 with total page 212 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : 劉俊宏
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (9 download)
Download or read book Design of Proximity Effect Modeling and Correction Methods for Electron-beam Lithography with Applications in Full-chip Nanometer Integrated Circuit Manufacturing written by 劉俊宏 and published by . This book was released on 2013 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Noppachai Anupongpaibool
Publisher :
ISBN 13 :
Total Pages : 288 pages
Book Rating : 4.:/5 (561 download)
Download or read book Distributed Proximity Effect Correction for Grayscale E-beam Lithography on a Heterogeneous Cluster written by Noppachai Anupongpaibool and published by . This book was released on 2004 with total page 288 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Jayesh Laddha
Publisher :
ISBN 13 :
Total Pages : 230 pages
Book Rating : 4.:/5 (447 download)
Download or read book An Efficient Hierarchical Pattern Representation Format for Proximity Effect Correction in E-beam Lithography written by Jayesh Laddha and published by . This book was released on 2000 with total page 230 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : HL. Berkowitz
Publisher :
ISBN 13 :
Total Pages : 19 pages
Book Rating : 4.:/5 (125 download)
Download or read book Edge-Controlled, Self-Consistent Proximity Effect Corrections written by HL. Berkowitz and published by . This book was released on 1984 with total page 19 pages. Available in PDF, EPUB and Kindle. Book excerpt: A new method for correcting electron-beam lithography pattern data for proximity effects is presented. The method calculates the average dose received by each partition exterior edge to be equal to the critical dose necessary for proper exposure. This method minimizes the number of partitioned rectangles required for acceptable lithography, thus greatly reducing CPU time. Electron-beam dose averages are not only determined for critical edges where exposure conditions are stringent, but also for the rest of the partitioned edges where tolerances are more relaxed. Both simulated and experimental results will be presented.
Author : Jo Allyson McMillan
Publisher :
ISBN 13 :
Total Pages : 254 pages
Book Rating : 4.E/5 ( download)
Download or read book An Investigation of the Proximity Effect in Submicron Pattern Exposure written by Jo Allyson McMillan and published by . This book was released on 1989 with total page 254 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : 藍崇源
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (13 download)
Download or read book Proximity Effect Correction for Multiple Electron Beam Direct Write Systems written by 藍崇源 and published by . This book was released on 2017 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Melissa Ann Iovino
Publisher :
ISBN 13 :
Total Pages : 168 pages
Book Rating : 4.:/5 (319 download)
Download or read book Proximity Correction for Electron Beam Lithography Utilizing CAPROX written by Melissa Ann Iovino and published by . This book was released on 1994 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : 黃靖軒
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (18 download)
Download or read book High Throughput Proximity Effect Correction for Multiple Electron Beam Direct Write Systems written by 黃靖軒 and published by . This book was released on 2018 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
