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Preparation And Properties Of Aluminum Nitride Films By Plasma Enhanced Metal Organic Chemical Vapor Deposition
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Book Synopsis Preparation and Properties of Aluminum Nitride Films by Plasma-enhanced Metal-organic Chemical Vapor Deposition by : Chin Hsiung Ho
Download or read book Preparation and Properties of Aluminum Nitride Films by Plasma-enhanced Metal-organic Chemical Vapor Deposition written by Chin Hsiung Ho and published by . This book was released on 1990 with total page 110 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis The Electrical, Structural, and Optical Properties of Aluminum Nitride Thin Films Deposited by Atmospheric Pressure Metal-organic Chemical Vapor Deposition by : Akhter Uddin Ahmed
Download or read book The Electrical, Structural, and Optical Properties of Aluminum Nitride Thin Films Deposited by Atmospheric Pressure Metal-organic Chemical Vapor Deposition written by Akhter Uddin Ahmed and published by . This book was released on 1992 with total page 418 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Carbide, Nitride and Boride Materials Synthesis and Processing by : A.W. Weimer
Download or read book Carbide, Nitride and Boride Materials Synthesis and Processing written by A.W. Weimer and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 675 pages. Available in PDF, EPUB and Kindle. Book excerpt: Carbide, Nitride and Boride Materials Synthesis and Processing is a major reference text addressing methods for the synthesis of non-oxides. Each chapter has been written by an expert practising in the subject area, affiliated with industry, academia or government research, thus providing a broad perspective of information for the reader. The subject matter ranges from materials properties and applications to methods of synthesis including pre- and post-synthesis processing. Although most of the text is concerned with the synthesis of powders, chapters are included for other materials such as whiskers, platelets, fibres and coatings. Carbide, Nitride and Boride Materials Synthesis and Processing is a comprehensive overview of the subject and is suitable for practitioners in the industry as well as those looking for an introduction to the field. It will be of interest to chemical, mechanical and ceramic engineers, materials scientists and chemists in both university and industrial environments working on or with refractory carbides, nitrides and borides.
Book Synopsis Metal Organic Chemical Vapor Deposition (MOCVD) of Thin Films of Aluminum Oxide and Aluminum Nitride on an Alumina Substrate by : Cristian Antonio Soto Lenz
Download or read book Metal Organic Chemical Vapor Deposition (MOCVD) of Thin Films of Aluminum Oxide and Aluminum Nitride on an Alumina Substrate written by Cristian Antonio Soto Lenz and published by . This book was released on 1994 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Handbook of Chemical Vapor Deposition by : Hugh O. Pierson
Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 1999-09-01 with total page 507 pages. Available in PDF, EPUB and Kindle. Book excerpt: Turn to this new second edition for an understanding of the latest advances in the chemical vapor deposition (CVD) process. CVD technology has recently grown at a rapid rate, and the number and scope of its applications and their impact on the market have increased considerably. The market is now estimated to be at least double that of a mere seven years ago when the first edition of this book was published. The second edition is an update with a considerably expanded and revised scope. Plasma CVD and metallo-organic CVD are two major factors in this rapid growth. Readers will find the latest data on both processes in this volume. Likewise, the book explains the growing importance of CVD in production of semiconductor and related applications.
Book Synopsis Synthesis of Aluminum Nitride Thin Films at Lower Temperatures by Metalorganic Chemical Vapor Deposition by : John N. Kidder
Download or read book Synthesis of Aluminum Nitride Thin Films at Lower Temperatures by Metalorganic Chemical Vapor Deposition written by John N. Kidder and published by . This book was released on 1996 with total page 368 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Structure and Properties of Metal and Alloy Thin Films Prepared by Plasma-enchanced Metalorganic Chemical Vapor Deposition by : Tyau-Jeen Lin
Download or read book Structure and Properties of Metal and Alloy Thin Films Prepared by Plasma-enchanced Metalorganic Chemical Vapor Deposition written by Tyau-Jeen Lin and published by . This book was released on 1987 with total page 160 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Metalorganic Chemical Vapor Deposition of Aluminum Nitride by : Herng Liu
Download or read book Metalorganic Chemical Vapor Deposition of Aluminum Nitride written by Herng Liu and published by . This book was released on 1995 with total page 392 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis THE LOW-TEMPERATURE THERMAL CHEMICAL VAPOR DEPOSITION AND CATALYZED CHEMICAL VAPOR DEPOSITION OF ALUMINUM NITRIDE AND SILICON NITRIDE (CHEMICAL VAPOR DEPOSITION). by : JEFFREY L. DUPUIE
Download or read book THE LOW-TEMPERATURE THERMAL CHEMICAL VAPOR DEPOSITION AND CATALYZED CHEMICAL VAPOR DEPOSITION OF ALUMINUM NITRIDE AND SILICON NITRIDE (CHEMICAL VAPOR DEPOSITION). written by JEFFREY L. DUPUIE and published by . This book was released on 1991 with total page 396 pages. Available in PDF, EPUB and Kindle. Book excerpt: deposition scheme holds much promise for low temperature film growth.
Book Synopsis Comprehensive Materials Processing by :
Download or read book Comprehensive Materials Processing written by and published by Newnes. This book was released on 2014-04-07 with total page 5485 pages. Available in PDF, EPUB and Kindle. Book excerpt: Comprehensive Materials Processing, Thirteen Volume Set provides students and professionals with a one-stop resource consolidating and enhancing the literature of the materials processing and manufacturing universe. It provides authoritative analysis of all processes, technologies, and techniques for converting industrial materials from a raw state into finished parts or products. Assisting scientists and engineers in the selection, design, and use of materials, whether in the lab or in industry, it matches the adaptive complexity of emergent materials and processing technologies. Extensive traditional article-level academic discussion of core theories and applications is supplemented by applied case studies and advanced multimedia features. Coverage encompasses the general categories of solidification, powder, deposition, and deformation processing, and includes discussion on plant and tool design, analysis and characterization of processing techniques, high-temperatures studies, and the influence of process scale on component characteristics and behavior. Authored and reviewed by world-class academic and industrial specialists in each subject field Practical tools such as integrated case studies, user-defined process schemata, and multimedia modeling and functionality Maximizes research efficiency by collating the most important and established information in one place with integrated applets linking to relevant outside sources
Book Synopsis Numerical Investigation of Pulsed Chemical Vapor Deposition of Aluminum Nitride by : Derek Endres
Download or read book Numerical Investigation of Pulsed Chemical Vapor Deposition of Aluminum Nitride written by Derek Endres and published by . This book was released on 2010 with total page 64 pages. Available in PDF, EPUB and Kindle. Book excerpt: Abstract: The Metal Organic Vapor Phase Epitaxy (MOVPE) of Aluminum Nitride (AlN) results not only in the growth of an AlN thin film, but also in the growth of AlN particles suspended in the gas-phase. Particle formation of AlN is unique to the MOVPE of AlN because the bond strength of AlN (11.5eV) is much larger than that of other III-V materials. This study numerically examined the effect of pulsing the precursor gases on the MOVPE of AlN as a way to curb AlN particle formation, in both horizontal and vertical reactors. Pulsing parameters such as pulse width, pulse duration, and precursor gas flow rate were varied to see the effect on growth rate and particle formation. The numerical predictions show AlN particle formation decreases significantly as the length of carrier gas pulse width increases and the deposition rate of substrate AlN can stay at approximately the same value as the steady state value with increased precursor gas flow rates. Therefore, if pulsing is introduced with relatively large carrier gas pulse width and increased precursor gas flow rates the AlN particle formation would be minimized while keeping the growth rate more or less unaffected. Numerical results also showed that pulsing has the added benefit that it increased the average growth rate (compared to steady state growth rates) because the precursors are not wasted as particles.
Book Synopsis Metalorganic Chemical Vapor Deposition of Aluminum Nitride and Aluminum Nitride/silicon Carbide Solid Solutions by : I. Wang
Download or read book Metalorganic Chemical Vapor Deposition of Aluminum Nitride and Aluminum Nitride/silicon Carbide Solid Solutions written by I. Wang and published by . This book was released on 1995 with total page 69 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Structural, Optical, and Mechanical Properties of Silicon Nitride Films Deposited by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition by : Ezgi Abacıoğlu
Download or read book Structural, Optical, and Mechanical Properties of Silicon Nitride Films Deposited by Inductively Coupled Plasma Enhanced Chemical Vapor Deposition written by Ezgi Abacıoğlu and published by . This book was released on 2022 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Thermal and Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride Films by : Sui-Yuan Lynn
Download or read book Thermal and Plasma Enhanced Chemical Vapor Deposition of Silicon Nitride Films written by Sui-Yuan Lynn and published by . This book was released on 1987 with total page 212 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Physics Briefs written by and published by . This book was released on 1993 with total page 1058 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Plasma-enhanced Chemical Vapor Deposition of Silicon Nitride from 1,1,3,3,5,5,-hexamethylcyclotrisilazane by : Todd Alan Brooks
Download or read book Plasma-enhanced Chemical Vapor Deposition of Silicon Nitride from 1,1,3,3,5,5,-hexamethylcyclotrisilazane written by Todd Alan Brooks and published by . This book was released on 1988 with total page 286 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Plasma Deposition, Treatment, and Etching of Polymers by : Riccardo d'Agostino
Download or read book Plasma Deposition, Treatment, and Etching of Polymers written by Riccardo d'Agostino and published by Elsevier. This book was released on 2012-12-02 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Deposition, Treatment, and Etching of Polymers takes a broad look at the basic principles, the chemical processes, and the diagnostic procedures in the interaction of plasmas with polymer surfaces. This recent technology has yielded a large class of new materials offering many applications, including their use as coatings for chemical fibers and films. Additional applications include uses for the passivation of metals, the surface hardening of tools, increased biocompatibility of biomedical materials, chemical and physical sensors, and a variety of micro- and optoelectronic devices. Appeals to a broad range of industries from microelectronics to space technology Discusses a wide array of new uses for plasma polymers Provides a tutorial introduction to the field Surveys various classes of plasma polymers, their chemical and morphological properties, effects of plasma process parameters on the growth and structure of these synthetic materials, and techniques for characterization Interests scientists, engineers, and students alike
