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Author : Gregory N. Parsons
Publisher :
ISBN 13 :
Total Pages : 384 pages
Book Rating : 4.:/5 (213 download)
Download or read book Preparation and Physical Properties of Hydrogenated Amorphous Silicon Thin Films written by Gregory N. Parsons and published by . This book was released on 1989 with total page 384 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : J.D. Joannopoulos
Publisher : Springer
ISBN 13 : 9783540128076
Total Pages : 312 pages
Book Rating : 4.1/5 (28 download)
Download or read book The Physics of Hydrogenated Amorphous Silicon I written by J.D. Joannopoulos and published by Springer. This book was released on 1984 with total page 312 pages. Available in PDF, EPUB and Kindle. Book excerpt: With contributions by numerous experts
Author : Hasbullah Anthony Hasbi
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (96 download)
Download or read book Structural Properties of Hydrogenated Amorphous Silicon (a-Si:H) Thin Film Grown Via Radio Frequency Plasma Enhanced Chemical Vapor Deposition (RF PECVD) written by Hasbullah Anthony Hasbi and published by . This book was released on 2005 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Deren Yang
Publisher : Springer
ISBN 13 : 9783662564714
Total Pages : 0 pages
Book Rating : 4.5/5 (647 download)
Download or read book Handbook of Photovoltaic Silicon written by Deren Yang and published by Springer. This book was released on 2019-11-28 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: The utilization of sun light is one of the hottest topics in sustainable energy research. To efficiently convert sun power into a reliable energy – electricity – for consumption and storage, silicon and its derivatives have been widely studied and applied in solar cell systems. This handbook covers the photovoltaics of silicon materials and devices, providing a comprehensive summary of the state of the art of photovoltaic silicon sciences and technologies. This work is divided into various areas including but not limited to fundamental principles, design methodologies, wafering techniques/fabrications, characterizations, applications, current research trends and challenges. It offers the most updated and self-explanatory reference to all levels of students and acts as a quick reference to the experts from the fields of chemistry, material science, physics, chemical engineering, electrical engineering, solar energy, etc..
Author : Tim Searle
Publisher : Institution of Electrical Engineers
ISBN 13 :
Total Pages : 440 pages
Book Rating : 4.3/5 (91 download)
Download or read book Properties of Amorphous Silicon and Its Alloys written by Tim Searle and published by Institution of Electrical Engineers. This book was released on 1998 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt: Coverage: preparation and material quality; structural and vibrational properties; electronic structure; electronic transport recombination of excess carriers; Schottky junctions; multilayers; optical constants; mechanical and thermal properties; TFTs; solar cells; photodetectors; large area displays; LEDs; xerographic applications.
Author : Arno Hendrikus Marie Smets
Publisher :
ISBN 13 : 9789038619699
Total Pages : 175 pages
Book Rating : 4.6/5 (196 download)
Download or read book Growth Related Material Properties of Hydrogenated Amorphous Silicon written by Arno Hendrikus Marie Smets and published by . This book was released on 2002 with total page 175 pages. Available in PDF, EPUB and Kindle. Book excerpt: The realization of ultra high hydrogenated amorphous silicon (a-Si:H) growth rates (>10 A/s) is one of the main issues affecting cost reduction in the production process of thin film a-Si:H solar cells. Until now, the expanding thermal plasma (ETP) deposition technique and the hot-wire chemical deposition (HWCVD) technique are the only two techniques which have obtained good materials properties at ultra high growth rates of 100 A/s. To optimize the a-Si:H growth rate and the material properties, more insight into the a-Si:H growth is required. In this thesis the a-Si:H film properties deposited by means of the ETP technique are studied. Furthermore, the relation of the material properties with a-Si:H growth from the remote ETP deposition is studied.
Author : Robert W. Collins
Publisher :
ISBN 13 :
Total Pages : 1118 pages
Book Rating : 4.3/5 (91 download)
Download or read book Amorphous and Heterogeneous Silicon Thin Films - 2000: Volume 609 written by Robert W. Collins and published by . This book was released on 2001-04-10 with total page 1118 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author : Arvind Victor Shah
Publisher : CRC Press
ISBN 13 : 1439808104
Total Pages : 438 pages
Book Rating : 4.4/5 (398 download)
Download or read book Thin-Film Silicon Solar Cells written by Arvind Victor Shah and published by CRC Press. This book was released on 2010-08-19 with total page 438 pages. Available in PDF, EPUB and Kindle. Book excerpt: Photovoltaic technology has now developed to the extent that it is close to fulfilling the vision of a "solar-energy world," as devices based on this technology are becoming efficient, low-cost and durable. This book provides a comprehensive treatment of thin-film silicon, a prevalent PV material, in terms of its semiconductor nature, startin
Author : Ramlee Adnan
Publisher :
ISBN 13 :
Total Pages : 126 pages
Book Rating : 4.:/5 (969 download)
Download or read book Physical Properties of Hydrogenated Silicon (Si:H) Thin Films written by Ramlee Adnan and published by . This book was released on 2008 with total page 126 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : King-Ning Tu
Publisher :
ISBN 13 :
Total Pages : 360 pages
Book Rating : 4.3/5 (91 download)
Download or read book Preparation and Properties of Thin Films written by King-Ning Tu and published by . This book was released on 1982 with total page 360 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Preparation and Characterization of Hydrogenated Amorphous Silicon Thin Films and Thin Film Solar Cells Produced by Ion Plating Techniques. Final Report, 1 January 1979-31 May 1980 written by and published by . This book was released on 1980 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion plating techniques for the preparation of hydrogenated amorphous silicon thin films have been successfully developed. The technique involves essentially the evaporation of elemental silicon through a d.c. produced hydrogen plasma. In this way hydrogen has been successfully incorporated into amorphous silicon films in concentrations as high as 30 atomic percent. Infrared spectroscopy indicates the usual SiHx stretching mode at approximately 2000 cm−1. Further evidence for the bonding of hydrogen was obtained from ESR measurement of hydrogenated and unhydrogenated samples. The measured unpaired spin density was a factor of 25 less in the hydrogenated sample. The optical absorption edges of the hydrogenated films fell in the usual range between 1.7 and 1.9 eV. Electrical conductivity measurements indicated a substantial reduction in the density of defect states in the gap as expected. It was also shown that hydrogenated amorphous silicon prepared by ion-plating could be doped by co-evaporation of the dopant element during film deposition. Both co-evaporated phosphorous and co-evaporated bismuth have been found to substantially increase the dark conductivity of a-Si:H while shifting the Fermi level towards the conduction band edge. An x-ray method for estimating the density and hydrogen content of a-Si:H has been developed. The measurement of strain in a-Si:H thin films is discussed. (WHK).
Author : J. D. Joannopoulos
Publisher :
ISBN 13 : 9783662308578
Total Pages : 308 pages
Book Rating : 4.3/5 (85 download)
Download or read book The Physics of Hydrogenated Amorphous Silicon I written by J. D. Joannopoulos and published by . This book was released on 2014-01-15 with total page 308 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : R. A. Street
Publisher : Cambridge University Press
ISBN 13 : 9780521019347
Total Pages : 432 pages
Book Rating : 4.0/5 (193 download)
Download or read book Hydrogenated Amorphous Silicon written by R. A. Street and published by Cambridge University Press. This book was released on 2005-09-08 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt: Divided roughly into two parts, the book describes the physical properties and device applications of hydrogenated amorphous silicon. The first section is concerned with the atomic and electronic structure, and covers growth defects and doping and defect reactions. The emphasis is on the optical and electronic properties that result from the disordered structure. The second part of the book describes electronic conduction, recombination, interfaces, and multilayers. The special attribute of a-Si:H which makes it useful is the ability to deposit the material inexpensively over large areas, while retaining good semiconducting properties, and the final chapter discusses various applications and devices.
Author : Matthew Alan Ring
Publisher :
ISBN 13 :
Total Pages : 94 pages
Book Rating : 4.:/5 (527 download)
Download or read book Growth and Characterization of Hydrogenated Amorphous Silicon Prepared Using a Combined Hot Wire and Electron Cyclotron Resonance Plasma Deposition Technique written by Matthew Alan Ring and published by . This book was released on 2003 with total page 94 pages. Available in PDF, EPUB and Kindle. Book excerpt: Hot Wire Chemical Vapor Deposition (HWCVD) is an emerging technology in semiconductor materials thin film deposition due to the high growth rates and reasonable electronic properties attainable using this method. To improve the electronic characteristics of material grown by the HWCVD method, neutral ion bombardment during growth was introduced as it is shown to be beneficial in Plasma Enhanced Chemical Vapor Deposition (PECVD). Neutral ion bombardment was accomplished by using remote Electron Cyclotron Resonance (ECR) plasma and the entire deposition technique is termed ECR-HWCVD. The ECR-HWCVD films were compared to HWCVD materials deposited without ion bombardment grown at similar conditions in the same reactor using a 10.5 cm filament to substrate distance to minimize substrate heating by radiation during deposition. The growth rate is halved when ion bombardment is added to HWCVD, however it remains four times greater than the highest quality ECR-PECVD films. Also, ECR-HWCVD material exhibited better electronic properties as shown by Urbach energy, photosensitivity, hydrogen content, microstructure parameters, and space charge limited current defect measurements. In addition, the effect of substrate temperature on hydrogen content and material microstructure was investigated. Both hydrogen content and the microstructure parameter R decreased as substrate temperature increased; and when ion bombardment was added to the deposition conditions, the microstructure parameter decreased regardless of substrate temperature.
Author : Fuchao Wang
Publisher :
ISBN 13 :
Total Pages : 190 pages
Book Rating : 4.:/5 (214 download)
Download or read book Transport Properties of Hydrogenated Amorphous Silicon Based Thin Films written by Fuchao Wang and published by . This book was released on 1994 with total page 190 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Werner Luft
Publisher : CRC Press
ISBN 13 : 9780824791469
Total Pages : 344 pages
Book Rating : 4.7/5 (914 download)
Download or read book Hydrogenated Amorphous Silicon Alloy Deposition Processes written by Werner Luft and published by CRC Press. This book was released on 1993-05-24 with total page 344 pages. Available in PDF, EPUB and Kindle. Book excerpt: This reference reviews common film and plasma diagnostic techniques and the deposition and film properties of various hydrogenated amorphous silicon alloys (a-Si:H).;Drawing heavily from studies on a-Si:H solar cells and offering valuable insights into other semiconductor applications of a-Si:H and related alloys, Hydrogenated Amorphous Silicon Alloy Deposition Processes: describes conventional as well as alternative, deposition processes and compares the resulting material properties; systematically categorizes various a-Si:H deposition techniques; details the characteristics of a-Si:H and related alloys with both high and low optical bandgap, including a-SiC:H, a-SiGe:H, and a-SiSn:H; discusses basic designs of glow discharge deposition reactors; evaluates the etching properties of amorphous silicon-based alloys; and examines microcrystalline silicon and silicon carbide.;Providing over 825 literature citations for further study, Hydrogenated Amorphous Silicon Alloy Deposition Processes is an incomparable resource for physicists; materials scientists; chemical, process and production engineers; electrical engineers and technicians in the semiconductor industry; and upper-level undergraduate and graduate students in these disciplines.
Author :
Publisher :
ISBN 13 :
Total Pages : 310 pages
Book Rating : 4.:/5 (927 download)
Download or read book Thin Films and Porous Materials written by and published by . This book was released on 2009 with total page 310 pages. Available in PDF, EPUB and Kindle. Book excerpt: This special edition compromises a selection of papers presented at the International Conference on Thin Films and Porous Materials (ICTFPM 2008). The main goal of the volume is to report the most recent scientific findings, and to highlight current challenges and opportunities in the promising field of porous materials and thin films. The volume covers: Advances in Deposition Techniques; Characterization of Thin Films; Functionalization and Surface Modification; Magnetic Thin Films and Multilayers; Nanotechnology and Nanostructured Materials; New approaches in Thin Films; Organic Thin Films (polymers, biomolecules, alkyl ...); Porous Materials and Applications; Physics and Chemistry of Thin Films and Interfaces; Single and Multilayer-based devices (Sensors, Photovoltaic, Optoelectronic); Growth Techniques and Application to Thin Films; Thin Films and photonics applications; Thin-Film Related Environmental Devices; New Materials: Modelling and Simulation. The in-depth coverage will make this volume almost a handbook guide to the subject. This volume collects 48 of the papers presented at the May 2008 conference on the deposition, characterization, and uses of thin films. The primarily French and Algerian contributors investigate the physico-chemical properties of hydrogenated amorphous carbon thin films, fluorine-doped silicon oxide films prepared by plasma enhanced chemical vapor deposition, zinc oxide thin films grown on silicon substrates, and tin dioxide thin films. Other topics include nanocrystal non-volatile memory devices, a comparison of arylene-vinylene polymers, the effect of chromium and vanadium on nanolayered ternary carbides, and an FET gas sensor based on porous silicon.
