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Preparation And Characterization Of Hydrogenated Amorphous Boron Thin Films And Thin Film Solar Cells Produced By Glow Discharge Decomposition Methods Third Quarterly Progress Report July 1 1979 September 30 1979
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Book Synopsis Preparation and Characterization of Hydrogenated Amorphous Boron Thin Films and Thin Film Solar Cells Produced by Glow Discharge Decomposition Methods. Third Quarterly Progress Report, July 1, 1979-September 30, 1979 by :
Download or read book Preparation and Characterization of Hydrogenated Amorphous Boron Thin Films and Thin Film Solar Cells Produced by Glow Discharge Decomposition Methods. Third Quarterly Progress Report, July 1, 1979-September 30, 1979 written by and published by . This book was released on 1979 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: This quarterly report is an account of recent progress in our program to produce hydrogenated amorphous boron thin films, to characterize these films, and to produce and evaluate solar cells from such amorphous boron films. In exact analogy with the situation previously existing for amorphous silicon, amorphous boron, without hydrogenation, has poor semiconducting properties due to defect states in the band gap. The decomposition of diborane, penataborane, and/or decarborane to produce thin films can reasonably be expected to result in amorphous boron thin films containing substantial quantities of hydrogen. The current program aims directly at the growth and doping of such hydrogenated amorphous boron thin films, the evaluation and optimization of their semiconductor properties, and the fabrication and testing of thin film solar cells from them. Both intrinsic and doped a-boron thin films have been produced. Film characterization efforts have been primarily focused on controlling the optical band gap by annealing the as-deposited films in vacuum at 400°C, and measuring the resulting optical gap as a function of bake-out time. Because the optical band gap of a-boron has been observed to vary from 0.8 eV to over 2.0 eV as a function of hydrogenation, it should be possible, by controlled annealing, to obtain a-boron films with an optimal band gap of 1.45 eV. In addition, work is nearing completion on the cryostat which will be used to measure the electrical gaps of our a-boron films.
Download or read book Energy Research Abstracts written by and published by . This book was released on 1982 with total page 1696 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Solar Energy Update written by and published by . This book was released on 1980 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Government Reports Announcements & Index by :
Download or read book Government Reports Announcements & Index written by and published by . This book was released on 1980-07 with total page 416 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Government Reports Annual Index by :
Download or read book Government Reports Annual Index written by and published by . This book was released on 1980 with total page 1422 pages. Available in PDF, EPUB and Kindle. Book excerpt: Sections 1-2. Keyword Index.--Section 3. Personal author index.--Section 4. Corporate author index.-- Section 5. Contract/grant number index, NTIS order/report number index 1-E.--Section 6. NTIS order/report number index F-Z.
Book Synopsis Preparation and Characterization of Hydrogenated Amorphous Silicon Thin Films and Thin Film Solar Cells Produced by Ion Plating Techniques. Final Report, 1 January 1979-31 May 1980 by :
Download or read book Preparation and Characterization of Hydrogenated Amorphous Silicon Thin Films and Thin Film Solar Cells Produced by Ion Plating Techniques. Final Report, 1 January 1979-31 May 1980 written by and published by . This book was released on 1980 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: Ion plating techniques for the preparation of hydrogenated amorphous silicon thin films have been successfully developed. The technique involves essentially the evaporation of elemental silicon through a d.c. produced hydrogen plasma. In this way hydrogen has been successfully incorporated into amorphous silicon films in concentrations as high as 30 atomic percent. Infrared spectroscopy indicates the usual SiHx stretching mode at approximately 2000 cm−1. Further evidence for the bonding of hydrogen was obtained from ESR measurement of hydrogenated and unhydrogenated samples. The measured unpaired spin density was a factor of 25 less in the hydrogenated sample. The optical absorption edges of the hydrogenated films fell in the usual range between 1.7 and 1.9 eV. Electrical conductivity measurements indicated a substantial reduction in the density of defect states in the gap as expected. It was also shown that hydrogenated amorphous silicon prepared by ion-plating could be doped by co-evaporation of the dopant element during film deposition. Both co-evaporated phosphorous and co-evaporated bismuth have been found to substantially increase the dark conductivity of a-Si:H while shifting the Fermi level towards the conduction band edge. An x-ray method for estimating the density and hydrogen content of a-Si:H has been developed. The measurement of strain in a-Si:H thin films is discussed. (WHK).
Download or read book Energy Research Abstracts written by and published by . This book was released on 1982 with total page 844 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Preparation and Characterization of Hydrogenated Amorphous Silicon Films Produced by Ion Plating and Hydrogenated Amorphous Boron Films Produced by Glow Discharge Decomposition by :
Download or read book Preparation and Characterization of Hydrogenated Amorphous Silicon Films Produced by Ion Plating and Hydrogenated Amorphous Boron Films Produced by Glow Discharge Decomposition written by and published by . This book was released on 1981 with total page 60 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Preparation and Characterization of Hydrogenated Amorphous-silicon Films Produced by Ion Plating and Hydrogenated Amorphous-boron Films Produced by Glow Discharge Decomposition by : Franklin H. Cocks
Download or read book Preparation and Characterization of Hydrogenated Amorphous-silicon Films Produced by Ion Plating and Hydrogenated Amorphous-boron Films Produced by Glow Discharge Decomposition written by Franklin H. Cocks and published by . This book was released on 1981 with total page 60 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Amorphous Boron-silicon-hydrogen Alloys for Thin-film Heterojunction Solar Cells Quarterly Technical Progress Report No. 1- by :
Download or read book Amorphous Boron-silicon-hydrogen Alloys for Thin-film Heterojunction Solar Cells Quarterly Technical Progress Report No. 1- written by and published by . This book was released on 1980 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Diagnostics of a Glow Discharge Used to Produce Hydrogenated Amorphous Silicon Films: A Final Subcontract Report by :
Download or read book Diagnostics of a Glow Discharge Used to Produce Hydrogenated Amorphous Silicon Films: A Final Subcontract Report written by and published by . This book was released on 1984 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Atomic-scale Characterization of Hydrogenated Amorphous-silicon Films and Devices by :
Download or read book Atomic-scale Characterization of Hydrogenated Amorphous-silicon Films and Devices written by and published by . This book was released on 1997 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Our research is concerned with improving the electronic properties of hydrogenated amorphous silicon (a-Si:H) films and of photovoltaic (PV) cells that use these films. Two approaches toward this goal are being taken. One is to establish the character of silicon particle growth in the rf glow discharges that are used to make the films and PV cells, and to understand the particle incorporation into the films. The ultimate goal of this effort is to find mitigating techniques that minimize the particle incorporation. During this contract period, we have developed a novel particle light-scattering technique that provides a very detailed and sensitive diagnostic of the particles suspended in the discharge, The second program is directed toward measuring the electronic properties of these thin-film PV cells, as a function of depth within the cell. The approach being taken is to use a scanning tunneling microscope to measure the depth-dependent electronic properties of cross-sectioned PV cells. During the present period, cell cleaving and cross-section locating methods, both in a ultrahigh vacuum environment, have been successfully developed.
Book Synopsis Photovoltaic and Photoactive Materials by : Joseph M. Marshall
Download or read book Photovoltaic and Photoactive Materials written by Joseph M. Marshall and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 361 pages. Available in PDF, EPUB and Kindle. Book excerpt: The primary objective of this NATO Advanced Study Institute (ASI) was to present an up-to-date overview of various current areas of interest in the field of photovoltaic and related photoactive materials. This is a wide-ranging subject area, of significant commercial and environmental interest, and involves major contributions from the disciplines of physics, chemistry, materials, electrical and instrumentation engineering, commercial realisation etc. Therefore, we sought to adopt an inter disciplinary approach, bringing together recognised experts in the various fields while retaining a level of treatment accessible to those active in specific individual areas of research and development. The lecture programme commenced with overviews of the present relevance and historical development of the subject area, plus an introduction to various underlying physical principles of importance to the materials and devices to be addressed in later lectures. Building upon this, the ASI then progressed to more detailed aspects of the subject area. We were also fortunately able to obtain a contribution from Thierry Langlois d'Estaintot of the European Commission Directorate, describing present and future EC support for activities in this field. In addition, poster sessions were held throughout the meeting, to allow participants to present and discuss their current activities. These were supported by what proved to be very effective feedback sessions (special thanks to Martin Stutzmann), prior to which groups of participants enthusiastically met (often in the bar) to identify and agree topics of common interest.
Book Synopsis Introduction to Thin Film Transistors by : S.D. Brotherton
Download or read book Introduction to Thin Film Transistors written by S.D. Brotherton and published by Springer Science & Business Media. This book was released on 2013-04-16 with total page 467 pages. Available in PDF, EPUB and Kindle. Book excerpt: Introduction to Thin Film Transistors reviews the operation, application and technology of the main classes of thin film transistor (TFT) of current interest for large area electronics. The TFT materials covered include hydrogenated amorphous silicon (a-Si:H), poly-crystalline silicon (poly-Si), transparent amorphous oxide semiconductors (AOS), and organic semiconductors. The large scale manufacturing of a-Si:H TFTs forms the basis of the active matrix flat panel display industry. Poly-Si TFTs facilitate the integration of electronic circuits into portable active matrix liquid crystal displays, and are increasingly used in active matrix organic light emitting diode (AMOLED) displays for smart phones. The recently developed AOS TFTs are seen as an alternative option to poly-Si and a-Si:H for AMOLED TV and large AMLCD TV applications, respectively. The organic TFTs are regarded as a cost effective route into flexible electronics. As well as treating the highly divergent preparation and properties of these materials, the physics of the devices fabricated from them is also covered, with emphasis on performance features such as carrier mobility limitations, leakage currents and instability mechanisms. The thin film transistors implemented with these materials are the conventional, insulated gate field effect transistors, and a further chapter describes a new thin film transistor structure: the source gated transistor, SGT. The driving force behind much of the development of TFTs has been their application to AMLCDs, and there is a chapter dealing with the operation of these displays, as well as of AMOLED and electrophoretic displays. A discussion of TFT and pixel layout issues is also included. For students and new-comers to the field, introductory chapters deal with basic semiconductor surface physics, and with classical MOSFET operation. These topics are handled analytically, so that the underlying device physics is clearly revealed. These treatments are then used as a reference point, from which the impact of additional band-gap states on TFT behaviour can be readily appreciated. This reference book, covering all the major TFT technologies, will be of interest to a wide range of scientists and engineers in the large area electronics industry. It will also be a broad introduction for research students and other scientists entering the field, as well as providing an accessible and comprehensive overview for undergraduate and postgraduate teaching programmes.
Book Synopsis Technology and Applications of Amorphous Silicon by : Robert A. Street
Download or read book Technology and Applications of Amorphous Silicon written by Robert A. Street and published by Springer Science & Business Media. This book was released on 2013-06-29 with total page 429 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book gives the first systematic and complete survey of technology and application of amorphous silicon, a material with a huge potential in electronic applications. The book features contributions by world-wide leading researchers in this field.
Book Synopsis Handbook of Photovoltaic Science and Engineering by : Antonio Luque
Download or read book Handbook of Photovoltaic Science and Engineering written by Antonio Luque and published by John Wiley & Sons. This book was released on 2011-01-31 with total page 1172 pages. Available in PDF, EPUB and Kindle. Book excerpt: The most comprehensive, authoritative and widely cited reference on photovoltaic solar energy Fully revised and updated, the Handbook of Photovoltaic Science and Engineering, Second Edition incorporates the substantial technological advances and research developments in photovoltaics since its previous release. All topics relating to the photovoltaic (PV) industry are discussed with contributions by distinguished international experts in the field. Significant new coverage includes: three completely new chapters and six chapters with new authors device structures, processing, and manufacturing options for the three major thin film PV technologies high performance approaches for multijunction, concentrator, and space applications new types of organic polymer and dye-sensitized solar cells economic analysis of various policy options to stimulate PV growth including effect of public and private investment Detailed treatment covers: scientific basis of the photovoltaic effect and solar cell operation the production of solar silicon and of silicon-based solar cells and modules how choice of semiconductor materials and their production influence costs and performance making measurements on solar cells and modules and how to relate results under standardised test conditions to real outdoor performance photovoltaic system installation and operation of components such as inverters and batteries. architectural applications of building-integrated PV Each chapter is structured to be partially accessible to beginners while providing detailed information of the physics and technology for experts. Encompassing a review of past work and the fundamentals in solar electric science, this is a leading reference and invaluable resource for all practitioners, consultants, researchers and students in the PV industry.
Book Synopsis Thin Film Device Applications by : Kasturi Chopra
Download or read book Thin Film Device Applications written by Kasturi Chopra and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 305 pages. Available in PDF, EPUB and Kindle. Book excerpt: Two-dimensional materials created ab initio by the process of condensation of atoms, molecules, or ions, called thin films, have unique properties significantly different from the corresponding bulk materials as a result of their physical dimensions, geometry, nonequilibrium microstructure, and metallurgy. Further, these characteristic features of thin films can be drasti cally modified and tailored to obtain the desired and required physical characteristics. These features form the basis of development of a host of extraordinary active and passive thin film device applications in the last two decades. On the one extreme, these applications are in the submicron dimensions in such areas as very large scale integration (VLSI), Josephson junction quantum interference devices, magnetic bubbles, and integrated optics. On the other extreme, large-area thin films are being used as selective coatings for solar thermal conversion, solar cells for photovoltaic conver sion, and protection and passivating layers. Indeed, one would be hard pressed to find many sophisticated modern optical and electronic devices which do not use thin films in one way or the other. With the impetus provided by industrial applications, the science and technology of thin films have undergone revolutionary development and even today continue to be recognized globally as frontier areas of RID work. Major technical developments in any field of science and technology are invariably accompanied by an explosion of published literature in the form of scientific publications, reviews, and books.
