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Plasma Enhanced Deposition Of Tungsten Molybdenum And Tungsten Silicide Films
Download Plasma Enhanced Deposition Of Tungsten Molybdenum And Tungsten Silicide Films full books in PDF, epub, and Kindle. Read online Plasma Enhanced Deposition Of Tungsten Molybdenum And Tungsten Silicide Films ebook anywhere anytime directly on your device. Fast Download speed and no annoying ads. We cannot guarantee that every ebooks is available!
Book Synopsis Semiconducting Silicides by : Victor E. Borisenko
Download or read book Semiconducting Silicides written by Victor E. Borisenko and published by Springer Science & Business Media. This book was released on 2013-03-07 with total page 362 pages. Available in PDF, EPUB and Kindle. Book excerpt: A comprehensive presentation and analysis of properties and methods of formation of semiconducting silicides. Fundamental electronic, optical and transport properties of the silicides collected from recent publications will help readers choose their application in new generations of solid-state devices. A comprehensive presentation of thermodynamic and kinetic data is given in combination with their technical application, as is information on corresponding thin-film or bulk crystal formation techniques.
Download or read book Solid State Technology written by and published by . This book was released on 1985 with total page 1412 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Handbook of Chemicals and Gases for the Semiconductor Industry by : Ashutosh Misra
Download or read book Handbook of Chemicals and Gases for the Semiconductor Industry written by Ashutosh Misra and published by John Wiley & Sons. This book was released on 2002-03-22 with total page 386 pages. Available in PDF, EPUB and Kindle. Book excerpt: The first comprehensive guide to the chemicals and gases used in semiconductor manufacturing The fabrication of semiconductor devices involves a series of complex chemical processes such as photolithography, etching, cleaning, thin film deposition, and polishing. Until now, there has been no convenient source of information on the properties, applications, and health and safety considerations of the chemicals used in these processes. The Handbook of Chemicals and Gases for the Semiconductor Industry meets this need. Each of the Handbook's eight chapters is related to a specific area of semiconductor processing. The authors provide a brief overview of each step in the process, followed by tables containing physical properties, handling, safety, and other pertinent information on chemicals and gases typically used in these processes. The 270 chemical and gas entries include data on physical properties, emergency treatment procedures, waste disposal, and incompatible materials, as well as descriptions of applications, chemical mechanisms involved, and references to the literature. Appendices cross-reference entries by process, chemical name, and CAS number. The Handbook's eight chapters are: Thin Film Deposition Materials Wafer Cleaning Materials Photolithography Materials Wet and Dry Etching Materials Chemical Mechanical Planarizing Methods Carrier Gases Uncategorized Materials Semiconductor Chemicals Analysis No other single source brings together these useful and important data on chemicals and gases used in the manufacture of semiconductor devices. The Handbook of Chemicals and Gases for the Semiconductor Industry will be a valuable reference for process engineers, scientists, suppliers to the semiconductor industry, microelectronics researchers, and students.
Book Synopsis Scientific and Technical Aerospace Reports by :
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Plasma Processing for VLSI by : Norman G. Einspruch
Download or read book Plasma Processing for VLSI written by Norman G. Einspruch and published by Academic Press. This book was released on 2014-12-01 with total page 544 pages. Available in PDF, EPUB and Kindle. Book excerpt: VLSI Electronics: Microstructure Science, Volume 8: Plasma Processing for VLSI (Very Large Scale Integration) discusses the utilization of plasmas for general semiconductor processing. It also includes expositions on advanced deposition of materials for metallization, lithographic methods that use plasmas as exposure sources and for multiple resist patterning, and device structures made possible by anisotropic etching. This volume is divided into four sections. It begins with the history of plasma processing, a discussion of some of the early developments and trends for VLSI. The second section, Deposition, discusses deposition techniques for VLSI such as sputtering metals for metallization and contacts, plasma-enhanced chemical vapor deposition of metals and suicides, and plasma enhanced chemical vapor deposition of dielectrics. The part on Lithography presents the high-resolution trilayer resist system, pulsed x-ray sources for submicrometer x-ray lithography, and high-intensity deep-UV sources. The last part, Etching, provides methods in etching, like ion-beam etching using reactive gases, low-pressure reactive ion etching, and the uses of inert-gas ion milling. The theory and mechanisms of plasma etching are described and a number of new device structures made possible by anisotropic etching are enumerated as well. Scientists, engineers, researchers, device designers, and systems architects will find the book useful.
Book Synopsis Fundamentals of Plasma by : Herman V. Boenig
Download or read book Fundamentals of Plasma written by Herman V. Boenig and published by CRC Press. This book was released on 1988 with total page 448 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Advances in Low-temperature Plasma Chemistry, Technology, Applications by :
Download or read book Advances in Low-temperature Plasma Chemistry, Technology, Applications written by and published by . This book was released on 1984 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Handbook of Thin-film Deposition Processes and Techniques by : Klaus K. Schuegraf
Download or read book Handbook of Thin-film Deposition Processes and Techniques written by Klaus K. Schuegraf and published by William Andrew. This book was released on 1988 with total page 440 pages. Available in PDF, EPUB and Kindle. Book excerpt: The most recent developments and techniques in thin film deposition for high technology applications are described by 23 authorities in the field.
Book Synopsis Advances in Low-temperature Plasma Chemistry, Technology, Applications by : Herman V. Boenig
Download or read book Advances in Low-temperature Plasma Chemistry, Technology, Applications written by Herman V. Boenig and published by . This book was released on 1984 with total page 400 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Thin Film Processes II by : John L. Vossen
Download or read book Thin Film Processes II written by John L. Vossen and published by Gulf Professional Publishing. This book was released on 1991 with total page 892 pages. Available in PDF, EPUB and Kindle. Book excerpt: This sequel to an earlier work offers an exposition of important thin film deposition and etching processes. It is intended to be of use to both the beginner in any particular process and to the experienced user wishing a wider perspective. Information is presented in a tutorial format. New topics which have arisen since the first book are included and some topics from the first book are updated. The practical applications of major thin film deposition and etching processes are given special emphasis.
Download or read book Proceedings written by and published by . This book was released on 1984 with total page 756 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Metals Abstracts written by and published by . This book was released on 1992 with total page 1516 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Tungsten and Other Refractory Metals for VLSI Applications by :
Download or read book Tungsten and Other Refractory Metals for VLSI Applications written by and published by . This book was released on 1984 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Bibliography on the High Temperature Chemistry and Physics of Materials by :
Download or read book Bibliography on the High Temperature Chemistry and Physics of Materials written by and published by . This book was released on 1989 with total page 320 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Tungsten and Other Refractory Metals for VLSI Applications by : R. S. Blewer
Download or read book Tungsten and Other Refractory Metals for VLSI Applications written by R. S. Blewer and published by . This book was released on 1986 with total page 594 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book Chemical Abstracts written by and published by . This book was released on 2002 with total page 2018 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis The Science and Engineering of Microelectronic Fabrication by : Stephen A. Campbell
Download or read book The Science and Engineering of Microelectronic Fabrication written by Stephen A. Campbell and published by Oxford University Press, USA. This book was released on 1996 with total page 572 pages. Available in PDF, EPUB and Kindle. Book excerpt: The Science and Engineering of Microelectronic Fabrication provides an introduction to microelectronic processing. Geared towards a wide audience, it may be used as a textbook for both first year graduate and upper level undergraduate courses and as a handy reference for professionals. The text covers all the basic unit processes used to fabricate integrated circuits including photolithography, plasma and reactive ion etching, ion implantation, diffusion, oxidation, evaporation, vapor phase epitaxial growth, sputtering and chemical vapor deposition. Advanced processing topics such as rapid thermal processing, nonoptical lithography, molecular beam epitaxy, and metal organic chemical vapor deposition are also presented. The physics and chemistry of each process is introduced along with descriptions of the equipment used for the manufacturing of integrated circuits. The text also discusses the integration of these processes into common technologies such as CMOS, double poly bipolar, and GaAs MESFETs. Complexity/performance tradeoffs are evaluated along with a description of the current state-of-the-art devices. Each chapter includes sample problems with solutions. The book also makes use of the process simulation package SUPREM to demonstrate impurity profiles of practical interest.
