Silicon, Germanium, and Their Alloys

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Author :
Publisher : CRC Press
ISBN 13 : 1466586656
Total Pages : 424 pages
Book Rating : 4.4/5 (665 download)

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Book Synopsis Silicon, Germanium, and Their Alloys by : Gudrun Kissinger

Download or read book Silicon, Germanium, and Their Alloys written by Gudrun Kissinger and published by CRC Press. This book was released on 2014-12-09 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt: Despite the vast knowledge accumulated on silicon, germanium, and their alloys, these materials still demand research, eminently in view of the improvement of knowledge on silicon-germanium alloys and the potentialities of silicon as a substrate for high-efficiency solar cells and for compound semiconductors and the ongoing development of nanodevic

Defects and Impurities in Silicon Materials

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Author :
Publisher : Springer
ISBN 13 : 4431558004
Total Pages : 498 pages
Book Rating : 4.4/5 (315 download)

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Book Synopsis Defects and Impurities in Silicon Materials by : Yutaka Yoshida

Download or read book Defects and Impurities in Silicon Materials written by Yutaka Yoshida and published by Springer. This book was released on 2016-03-30 with total page 498 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book emphasizes the importance of the fascinating atomistic insights into the defects and the impurities as well as the dynamic behaviors in silicon materials, which have become more directly accessible over the past 20 years. Such progress has been made possible by newly developed experimental methods, first principle theories, and computer simulation techniques. The book is aimed at young researchers, scientists, and technicians in related industries. The main purposes are to provide readers with 1) the basic physics behind defects in silicon materials, 2) the atomistic modeling as well as the characterization techniques related to defects and impurities in silicon materials, and 3) an overview of the wide range of the research fields involved.

Single Crystal Growth of Semiconductors from Metallic Solutions

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Author :
Publisher : Elsevier
ISBN 13 : 0080467946
Total Pages : 505 pages
Book Rating : 4.0/5 (84 download)

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Book Synopsis Single Crystal Growth of Semiconductors from Metallic Solutions by : Sadik Dost

Download or read book Single Crystal Growth of Semiconductors from Metallic Solutions written by Sadik Dost and published by Elsevier. This book was released on 2006-11-17 with total page 505 pages. Available in PDF, EPUB and Kindle. Book excerpt: Single Crystal Growth of Semiconductors from Metallic Solutions covers the four principal growth techniques currently in use for the growth of semiconductor single crystals from metallic solutions. Providing an in-depth review of the state-of-the-art of each, both experimentally and by numerical simulations. The importance of a close interaction between the numerical and experimental aspects of the processes is also emphasized. Advances in the fields of electronics and opto-electronics are hampered by the limited number of substrate materials which can be readily produced by melt-growth techniques such as the Czochralski and Bridgman methods. This can be alleviated by the use of alternative growth techniques, and in particular, growth from metallic solutions. The principal techniques currently in use are: Liquid Phase Epitaxy; Liquid Phase Electroepitaxy; the Travelling Heater Method, and; Liquid Phase Diffusion. Single Crystal Growth of Semiconductors from Metallic Solutions will serve as a valuable reference tool for researchers, and graduate and senior undergraduate students in the field of crystal growth. It covers most of the models developed in recent years. The detailed development of basic and constitutive equations and the associated interface and boundary conditions given for each technique will be very valuable to researchers for the development of their new models.* Describes the fundamentals of crystal growth modelling* Providing a state-of-the art description of the mathematical and experimental growth processes * Allows reader to gain clear insight into the practical and mathematical aspects of the topic

Scientific and Technical Aerospace Reports

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Author :
Publisher :
ISBN 13 :
Total Pages : 704 pages
Book Rating : 4.:/5 (31 download)

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Book Synopsis Scientific and Technical Aerospace Reports by :

Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Bulk Crystal Growth of Electronic, Optical and Optoelectronic Materials

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Author :
Publisher : John Wiley & Sons
ISBN 13 : 0470012072
Total Pages : 574 pages
Book Rating : 4.4/5 (7 download)

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Book Synopsis Bulk Crystal Growth of Electronic, Optical and Optoelectronic Materials by : Peter Capper

Download or read book Bulk Crystal Growth of Electronic, Optical and Optoelectronic Materials written by Peter Capper and published by John Wiley & Sons. This book was released on 2005-10-31 with total page 574 pages. Available in PDF, EPUB and Kindle. Book excerpt: A valuable, timely book for the crystal growth community, edited by one of the most respected members in the field. Contents cover all the important materials from silicon through the III-V and II-IV compounds to oxides, nitrides, fluorides, carbides and diamonds International group of contributors from academia and industry provide a balanced treatment Includes global interest with particular relevance to: USA, Canada, UK, France, Germany, Netherlands, Belgium, Italy, Spain, Switzerland, Japan, Korea, Taiwan, China, Australia and South Africa

High Performance Scientific And Engineering Computing

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Publisher : Springer Science & Business Media
ISBN 13 : 3642559190
Total Pages : 420 pages
Book Rating : 4.6/5 (425 download)

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Book Synopsis High Performance Scientific And Engineering Computing by : Michael Breuer

Download or read book High Performance Scientific And Engineering Computing written by Michael Breuer and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 420 pages. Available in PDF, EPUB and Kindle. Book excerpt: In Douglas Adams' book 'Hitchhiker's Guide to the Galaxy', hyper-intelligent beings reached a point in their existence where they wanted to understand the purpose of their own existence and the universe. They built a supercomputer, called Deep Thought, and upon completion, they asked it for the answer to the ultimate question of life, the universe and everything else. The computer worked for several millennia on the answers to all these questions. When the day arrived for hyper-intelligent beings the to receive the answer, they were stunned, shocked and disappointed to hear that the answer was simply 42. The still open questions to scientists and engineers are typically much sim pler and consequently the answers are more reasonable. Furthermore, because human beings are too impatient and not ready to wait for such a long pe riod, high-performance computing techniques have been developed, leading to much faster answers. Based on these developments in the last two decades, scientific and engineering computing has evolved to a key technology which plays an important role in determining, or at least shaping, future research and development activities in many branches of industry. Development work has been going on all over the world resulting in numerical methods that are now available for simulations that were not foreseeable some years ago. However, these days the availability of supercomputers with Teraflop perfor mance supports extensive computations with technical relevance. A new age of engineering has started.

Heat Transfer 1994

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Publisher : CRC Press
ISBN 13 : 9781560323341
Total Pages : 660 pages
Book Rating : 4.3/5 (233 download)

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Book Synopsis Heat Transfer 1994 by : G. F. Hewitt

Download or read book Heat Transfer 1994 written by G. F. Hewitt and published by CRC Press. This book was released on 1994 with total page 660 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Crystal Growth and Evaluation of Silicon for VLSI and ULSI

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Publisher : CRC Press
ISBN 13 : 1482232820
Total Pages : 414 pages
Book Rating : 4.4/5 (822 download)

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Book Synopsis Crystal Growth and Evaluation of Silicon for VLSI and ULSI by : Golla Eranna

Download or read book Crystal Growth and Evaluation of Silicon for VLSI and ULSI written by Golla Eranna and published by CRC Press. This book was released on 2014-12-08 with total page 414 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon, as a single-crystal semiconductor, has sparked a revolution in the field of electronics and touched nearly every field of science and technology. Though available abundantly as silica and in various other forms in nature, silicon is difficult to separate from its chemical compounds because of its reactivity. As a solid, silicon is chemical

Crystal Growth and Evaluation of Silicon for VLSI and ULSI

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Author :
Publisher : CRC Press
ISBN 13 : 1482232812
Total Pages : 432 pages
Book Rating : 4.4/5 (822 download)

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Book Synopsis Crystal Growth and Evaluation of Silicon for VLSI and ULSI by : Golla Eranna

Download or read book Crystal Growth and Evaluation of Silicon for VLSI and ULSI written by Golla Eranna and published by CRC Press. This book was released on 2014-12-08 with total page 432 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon, as a single-crystal semiconductor, has sparked a revolution in the field of electronics and touched nearly every field of science and technology. Though available abundantly as silica and in various other forms in nature, silicon is difficult to separate from its chemical compounds because of its reactivity. As a solid, silicon is chemically inert and stable, but growing it as a single crystal creates many technological challenges. Crystal Growth and Evaluation of Silicon for VLSI and ULSI is one of the first books to cover the systematic growth of silicon single crystals and the complete evaluation of silicon, from sand to useful wafers for device fabrication. Written for engineers and researchers working in semiconductor fabrication industries, this practical text: Describes different techniques used to grow silicon single crystals Explains how grown single-crystal ingots become a complete silicon wafer for integrated-circuit fabrication Reviews different methods to evaluate silicon wafers to determine suitability for device applications Analyzes silicon wafers in terms of resistivity and impurity concentration mapping Examines the effect of intentional and unintentional impurities Explores the defects found in regular silicon-crystal lattice Discusses silicon wafer preparation for VLSI and ULSI processing Crystal Growth and Evaluation of Silicon for VLSI and ULSI is an essential reference for different approaches to the selection of the basic silicon-containing compound, separation of silicon as metallurgical-grade pure silicon, subsequent purification, single-crystal growth, and defects and evaluation of the deviations within the grown crystals.

Semiconductor Silicon Crystal Technology

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Author :
Publisher : Elsevier
ISBN 13 : 0323150489
Total Pages : 435 pages
Book Rating : 4.3/5 (231 download)

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Book Synopsis Semiconductor Silicon Crystal Technology by : Fumio Shimura

Download or read book Semiconductor Silicon Crystal Technology written by Fumio Shimura and published by Elsevier. This book was released on 2012-12-02 with total page 435 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor Silicon Crystal Technology provides information pertinent to silicon, which is the dominant material in the semiconductor industry. This book discusses the technology of integrated circuits (ICs) in electronic materials manufacturer. Comprised of eight chapters, this book provides an overview of the basic science, silicon materials, IC device fabrication processes, and their interaction for enhancing both the processes and materials. This text then proceeds with a discussion of the atomic structure and bonding mechanisms in order to understand the nature and formation of crystal structures, which are the fundamentals of material science. Other chapters consider the technological crystallography and classify natural crystal morphologies based on observation. The final chapter deals with the interrelationships among silicon material characteristics, circuit design, and IC fabrication in order to ensure the fabrication of very-large-scale-integration/ultra-large-scale-integration circuits. This book is a valuable resource for graduate students, physicists, engineers, materials scientists, and professionals involved in semiconductor industry.

Electrical & Electronics Abstracts

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Author :
Publisher :
ISBN 13 :
Total Pages : 2240 pages
Book Rating : 4.3/5 (243 download)

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Book Synopsis Electrical & Electronics Abstracts by :

Download or read book Electrical & Electronics Abstracts written by and published by . This book was released on 1997 with total page 2240 pages. Available in PDF, EPUB and Kindle. Book excerpt:

U.S. Government Research Reports

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Publisher :
ISBN 13 :
Total Pages : 600 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis U.S. Government Research Reports by :

Download or read book U.S. Government Research Reports written by and published by . This book was released on 1962 with total page 600 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Metals Abstracts

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Publisher :
ISBN 13 :
Total Pages : 1042 pages
Book Rating : 4.E/5 ( download)

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Book Synopsis Metals Abstracts by :

Download or read book Metals Abstracts written by and published by . This book was released on 1998 with total page 1042 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Encyclopedia of Chemical Processing

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Publisher : Taylor & Francis US
ISBN 13 : 9780824755577
Total Pages : 768 pages
Book Rating : 4.7/5 (555 download)

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Book Synopsis Encyclopedia of Chemical Processing by : Sunggyu Lee

Download or read book Encyclopedia of Chemical Processing written by Sunggyu Lee and published by Taylor & Francis US. This book was released on 2006 with total page 768 pages. Available in PDF, EPUB and Kindle. Book excerpt: Supplying nearly 350 expertly-written articles on technologies that can maximize and enhance the research and production phases of current and emerging chemical manufacturing practices and techniques, this second edition provides gold standard articles on the methods, practices, products, and standards recently influencing the chemical industries. New material includes: design of key unit operations involved with chemical processes; design, unit operation, and integration of reactors and separation systems; process system peripherals such as pumps, valves, and controllers; analytical techniques and equipment; current industry practices; and pilot plant design and scale-up criteria.

Encyclopedia of Chemical Processing (Online)

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Publisher : CRC Press
ISBN 13 : 1351237683
Total Pages : 3338 pages
Book Rating : 4.3/5 (512 download)

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Book Synopsis Encyclopedia of Chemical Processing (Online) by : Sunggyu Lee

Download or read book Encyclopedia of Chemical Processing (Online) written by Sunggyu Lee and published by CRC Press. This book was released on 2005-11-01 with total page 3338 pages. Available in PDF, EPUB and Kindle. Book excerpt: This second edition Encyclopedia supplies nearly 350 gold standard articles on the methods, practices, products, and standards influencing the chemical industries. It offers expertly written articles on technologies at the forefront of the field to maximize and enhance the research and production phases of current and emerging chemical manufacturing practices and techniques. This collecting of information is of vital interest to chemical, polymer, electrical, mechanical, and civil engineers, as well as chemists and chemical researchers. A complete reconceptualization of the classic reference series the Encyclopedia of Chemical Processing and Design, whose first volume published in 1976, this resource offers extensive A-Z treatment of the subject in five simultaneously published volumes, with comprehensive indexing of all five volumes in the back matter of each tome. It includes material on the design of key unit operations involved with chemical processes; the design, unit operation, and integration of reactors and separation systems; process system peripherals such as pumps, valves, and controllers; analytical techniques and equipment; and pilot plant design and scale-up criteria. This reference contains well-researched sections on automation, equipment, design and simulation, reliability and maintenance, separations technologies, and energy and environmental issues. Authoritative contributions cover chemical processing equipment, engineered systems, and laboratory apparatus currently utilized in the field. It also presents expert overviews on key engineering science topics in property predictions, measurements and analysis, novel materials and devices, and emerging chemical fields. ALSO AVAILABLE ONLINE This Taylor & Francis encyclopedia is also available through online subscription, offering a variety of extra benefits for both researchers, students, and librarians, including: Citation tracking and alerts Active reference linking Saved searches and marked lists HTML and PDF format options Contact Taylor and Francis for more information or to inquire about subscription options and print/online combination packages. US: (Tel) 1.888.318.2367; (E-mail) [email protected] International: (Tel) +44 (0) 20 7017 6062; (E-mail) [email protected]

Computational Thermo-Fluid Dynamics

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Publisher : John Wiley & Sons
ISBN 13 : 3527636080
Total Pages : 353 pages
Book Rating : 4.5/5 (276 download)

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Book Synopsis Computational Thermo-Fluid Dynamics by : Petr A. Nikrityuk

Download or read book Computational Thermo-Fluid Dynamics written by Petr A. Nikrityuk and published by John Wiley & Sons. This book was released on 2011-09-19 with total page 353 pages. Available in PDF, EPUB and Kindle. Book excerpt: Combining previously unconnected computational methods, this monograph discusses the latest basic schemes and algorithms for the solution of fluid, heat and mass transfer problems coupled with electrodynamics. It presents the necessary mathematical background of computational thermo-fluid dynamics, the numerical implementation and the application to real-world problems. Particular emphasis is placed throughout on the use of electromagnetic fields to control the heat, mass and fluid flows in melts and on phase change phenomena during the solidification of pure materials and binary alloys. However, the book provides much more than formalisms and algorithms; it also stresses the importance of good, feasible and workable models to understand complex systems, and develops these in detail. Bringing computational fluid dynamics, thermodynamics and electrodynamics together, this is a useful source for materials scientists, PhD students, solid state physicists, process engineers and mechanical engineers, as well as lecturers in mechanical engineering.

C,H,N and O in Si and Characterization and Simulation of Materials and Processes

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Author :
Publisher : North Holland
ISBN 13 :
Total Pages : 624 pages
Book Rating : 4.0/5 ( download)

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Book Synopsis C,H,N and O in Si and Characterization and Simulation of Materials and Processes by : A. Borghesi

Download or read book C,H,N and O in Si and Characterization and Simulation of Materials and Processes written by A. Borghesi and published by North Holland. This book was released on 1996 with total page 624 pages. Available in PDF, EPUB and Kindle. Book excerpt: Containing over 200 papers, this volume contains the proceedings of two symposia in the E-MRS series. Part I presents a state of the art review of the topic - Carbon, Hydrogen, Nitrogen and Oxygen in Silicon and in Other Elemental Semiconductors. There was strong representation from the industrial laboratories, illustrating that the topic is highly relevant for the semiconductor industry.The second part of the volume deals with a topic which is undergoing a process of convergence with two concerns that are more particularly application oriented. Firstly, the advanced instrumentation which, through the use of atomic force and tunnel microscopies, high resolution electron microscopy and other high precision analysis instruments, now allows for direct access to atomic mechanisms. Secondly, the technological development which in all areas of applications, particularly in the field of microelectronics and microsystems, requires as a result of the miniaturisation race, a precise mastery of the microscopic mechanisms.