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Download or read book Nonlithographic Manufacturing of 1-D Silicon Nanostructures with Tunable Surface Morphology Via Thermal Dewetting and Metal-assisted Chemical Etching written by and published by . This book was released on 2014 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Lucia Romano
Publisher : MDPI
ISBN 13 : 303943845X
Total Pages : 106 pages
Book Rating : 4.0/5 (394 download)
Download or read book Micro- and Nano-Fabrication by Metal Assisted Chemical Etching written by Lucia Romano and published by MDPI. This book was released on 2021-01-13 with total page 106 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates—Si, Ge, poly-Si, GaAs, and SiC—and using different catalysts—Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale—nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications.
Author : Hashim Ziad Alhmoud
Publisher :
ISBN 13 :
Total Pages : 225 pages
Book Rating : 4.:/5 (958 download)
Download or read book The Fabrication of Silicon Nanostructures Using Metal-assisted Chemical Etching and Their Applications in Biomedicine written by Hashim Ziad Alhmoud and published by . This book was released on 2015 with total page 225 pages. Available in PDF, EPUB and Kindle. Book excerpt: The main aim of this thesis was to develop novel nano-scale silicon structures with useful functions for biomedicine. Metal-assisted chemical etching (MACE) of silicon offered low fabrication cost, ease of implementation, and an inherent compatibility with various patterning technologies. For these reasons, MACE was used as the primary platform of fabrication for this work. Furthermore, nanostructure patterning was mainly carried out via self-assembled nanosphere lithography, which is a low-cost and reliable method for patterning surfaces on the sub-micrometer scale.
Author : Mariana Castaneda
Publisher :
ISBN 13 :
Total Pages : 92 pages
Book Rating : 4.:/5 (126 download)
Download or read book Effect of Thermal Oxide Film on Scalable Fabrication of Silicon Nanowire Arrays Using Metal Assisted Chemical Etching written by Mariana Castaneda and published by . This book was released on 2020 with total page 92 pages. Available in PDF, EPUB and Kindle. Book excerpt: Over the last several decades, the demand for real-time data processing and storage has exponentially increased and pushed the semiconductor field to its fabrication limits. Traditional methods of semiconductor nanomanufacturing, like lithography and reactive ion etching (RIE), suffer from feature resolution and etch taper limits for devices comprising sub-10 nm nanofabrication nodes. Methods like the ones mentioned above are both expensive and difficult to manufacture to keep up with continued scaling requirements of semiconductor fabrication. This thesis presents a fabrication method and metrology characterization of silicon nanowire arrays using a Metal Assisted Chemical Etching (MACE) approach. MACE is a simple, low-cost fabrication technique that allows for high aspect ratio silicon nanostructures to be successfully fabricated without sacrificing geometry fidelity, making it a promising etching method for large-scale semiconductor manufacturing. In this research, small-scale MACE was demonstrated on silicon coupons with an initial process window of 0 nm - 100 nm oxide thickness. Then, a down-selected process window of 10 nm - 50 nm oxide thickness was successfully reproduced on a full-wafer scale (100 mm diameter silicon wafers) at different etchant solution concentrations. The oxide layer serves as a sacrificial layer between the silicon and resist to allow a consistent etching starting point, thus improving the etch depth uniformity and aspect ratios of silicon nanowires. The silicon nanowires were characterized using local scanning electron microscopy (SEM) images by mapping the areas of the wafer as North, South, East, and West to measure critical dimensions such as height and diameter, as well as to observe phenomena such as nanowire collapse
Author : Raul Marcel Lema Galindo
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (14 download)
Download or read book Integrated Fabrication of Micro- and Nano-scale Structures for Silicon Devices Enabled by Metal-assisted Chemical Etch written by Raul Marcel Lema Galindo and published by . This book was released on 2021 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon device manufacturing, at both the micro and nanoscales, is largely performed using plasma etching techniques such as Reactive Ion Etching. Deep Reactive Ion Etching (DRIE) can be used to create high-aspect ratio nanostructures in silicon. The DRIE process suffers from low throughput, only one wafer can be processed at a time; high cost, the necessary tools and facilities for implementation are expensive; and surface defects such as sidewall taper and scalloping as a consequence of the cycling process required for high-aspect-ratio manufacturing. A potential solution to these issues consists of implementing wet-etching techniques, which do not require expensive equipment and can be implemented at a batch scale. Metal Assisted Chemical Etch is a wet-etch process that uses a metal catalyst to mediate silicon oxidation and removal in a diffusion-based process. This process has been demonstrated to work for both micro and nanoscale feature manufacturing on silicon substrates. To date, however, a single study aimed at identifying experimental conditions for successful multi-scale (integrated micro- and nanoscale) manufacturing is lacking in the literature. This mixed micro-nanoscale etching process (IMN-MACE) can enable a wide variety of applications including, for example, development of point-of-care medical diagnostic devices which rely on micro- and nano-fluidic sample processing, a growing field in the area of preventive medicine. This work developed multi-scale MACE by a systematic experimental exploration of the process space. A total of 54 experiments were performed to study the effects of the following process parameters: (i) surface silicon dioxide, (ii) metal catalyst stack, (iii) etchant solution concentration, and (iv) pre-etch sample preparation. Of these 54 experiments, 18 experiments were based on exploring nanopatterning of 100nm pillars, and the remaining 36 explored the fabrication of micropillars with a diameter between 10μm and 50μm in 5μm increments. It was determined that a single catalyst stack consisting of ~3nm Ag underneath a ~15nm Au metal layer can be used to etch high quality features at both the micro and nanoscales on a silicon substrate pre-treated with hydrogen fluoride to remove the native oxide layer from the surface. Future steps for micro-nano scale integration were also proposed
Author : Thi Phuong Nhung Nguyen
Publisher :
ISBN 13 :
Total Pages : 218 pages
Book Rating : 4.:/5 (8 download)
Download or read book Fabrication of Nanostructured Silicon Substrates for the Development of Superomniphobic Surfaces and Surface-Assisted Laser Desorption/Ionization Mass Spectrometry Analysis of Biomolecules written by Thi Phuong Nhung Nguyen and published by . This book was released on 2011 with total page 218 pages. Available in PDF, EPUB and Kindle. Book excerpt: This work concerns the fabrication of micro/nanostructured silicon substrates and their application as non-wetting surfaces, and analytical tools for biomolecules' analysis and in microfluidic devices. Two different techniques were investigated for the formation of nanostructured silicon substrates: chemical wet etching via metal-assisted electroless etching (Top-down approach) and nanowire growth by " Chemical Vapor Deposition " via Vapor-Liquid-Solid mechanism (Bottom-up approach). Different structured surface morphologies were then obtained. These were either simple structured such as: Micro or Nanoscale, or double structured such as: Micro-Nano or Nano-Nanoscale. The first part of the thesis deals with the preparation of superominiphobic surfaces capable of repelling almost any liquid. The surfaces consisting of double structured substrates gave the best non-wetting properties. Secondly, nanostructured silicon substrates were used as inorganic matrices for the detection of small molecules without using an organic matrix in laser desorption/ionization mass spectrometry. Herein, we investigated the influence of surface morphology, doping type and chemical termination on mass spectrometry analysis of a standard peptide mixture. Finally, functionalized silicon nanowires surfaces with a specific ligand were used to perform peptide enrichment and its subsequent analysis by mass spectrometry from a mixture solution.
Download or read book Metal-assisted Chemical Etching as a Disruptive Platform for Multi-dimensional Semiconductor Sculpting written by and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Shih-wei Chang (Ph.D.)
Publisher :
ISBN 13 :
Total Pages : 182 pages
Book Rating : 4.:/5 (666 download)
Download or read book Fabrication of High Aspect Ratio Silicon Nanostructure Arrays by Metal-assisted Etching written by Shih-wei Chang (Ph.D.) and published by . This book was released on 2010 with total page 182 pages. Available in PDF, EPUB and Kindle. Book excerpt: The goal of this research was to explore and understand the mechanisms involved in the fabrication of silicon nanostructures using metal-assisted etching. We developed a method utilizing metal-assisted etching in conjunction with block copolymer lithography to create ordered and densely-packed arrays of high-aspect-ratio single-crystal silicon nanowires with uniform crystallographic orientations. Nanowires with sub-20 nm diameters were created as either continuous carpets or as carpets within trenches. Wires with aspect ratios up to 220 with much reduced capillary-induced clustering were achieved through post-etching critical point drying. The size distribution of the diameters was narrow and closely followed the size distribution of the block copolymer. Fabrication of wires in topographic features demonstrated the ability to accurately control wire placement. The flexibility of this method will facilitate the use of such wire arrays in micro- and nano-systems in which high device densities and/or high surface areas are desired. In addition, we report a systematic study of metal-catalyzed etching of (100), (110), and (111) silicon substrates using gold catalysts with varying geometrical characteristics. It is shown that for isolated catalyst nanoparticles and metal meshes with small hole spacings, etching proceeded preferentially in the 100 direction. However, etching was confined in the direction vertical to the substrate surface when a catalyst mesh with large hole spacings was used. This result was used to demonstrate the use of metal-assisted etching to create arrays of vertically-aligned polycrystalline and amorphous silicon nanowires etched from deposited silicon thin films using catalyst meshes with relatively large hole spacings. The ability to pattern wires from polycrystalline and amorphous silicon thin films opens the possibility of making silicon nanowire-array-based devices on a much wider range of substrates. Finally, we demonstrated the fabrication of a silicon-nanopillar-based nanocapacitor array using metal-assisted etching and electrodeposition. The capacitance density was increased significantly as a result of an increased electrode area made possible by the catalytic etching approach. We also showed that the measured capacitance densities closely follow the expected trend as a function of pillar height and array period. The capacitance densities can be further enhanced by increasing the array density and wire length with the incorporation of known self-assembly-based patterning techniques such as block copolymer lithography.
Author : Thomas S. Wilhelm
Publisher :
ISBN 13 :
Total Pages : 240 pages
Book Rating : 4.:/5 (115 download)
Download or read book Semiconductor Nanofabrication Via Metal-assisted Chemical Etching written by Thomas S. Wilhelm and published by . This book was released on 2019 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: "The increasing demand for complex devices that utilize three-dimensional nanostructures has incentivized the development of adaptable and versatile semiconductor nanofabrication strategies. Without the introduction and refinement of methodologies to overcome traditional processing constraints, nanofabrication sequences risk becoming obstacles that impede device evolution. Crystallographic wet-chemical etching (e.g., Si in KOH) has historically been sufficient to produce textured Si surfaces with smooth sidewalls, though it lacks the ability to yield high aspect-ratio features. Physical and chemical plasma etching (e.g., reactive-ion etching) evolved to allow for the creation of vertical structures within integrated circuits; however, the high energy ion bombardment associated with dry etching can cause lattice and sidewall damage that is detrimental to device performance, particularly as structures progress within the micro- and nano-scale regimes. Metal-assisted chemical etching (MacEtch) provides an alternative processing scheme that is both solution-based and highly anisotropic. This fabrication method relies on a suitable catalyst (e.g., Au, Ag, Pt, or Pd) to induce semiconductor etching in a solution containing an oxidant and an etchant. The etching would otherwise be inert without the presence of the catalyst. The MacEtch process is modelled after a galvanic cell, with cathodic and anodic half reactions occurring at the solution/catalyst and catalyst/semiconductor interfaces, respectively. The metal catalyzes the reduction of oxidant species at the cathode, thereby generating charge carriers (i.e., holes) that are locally injected into the semiconductor at the anode. The solution interacts with the ionized substrate, which creates an oxide that is preferentially attacked by the etchant. Thus, MacEtch offers a nanofabrication alternative that combines the advantages of both wet- and dry-etching, while also overcoming many of their accompanying limitations. This provides a tunable semiconductor processing platform using controlled top-down catalytic etching, affording engineers greater processing control and versatility over conventional methodologies. Here, Au-enhanced MacEtch of the ternary alloys InGaP and AlGaAs is demonstrated for the first time, and processes are detailed for the formation of suspended III-V nanofoils and ordered nanopillar arrays. Next, a lithography-free and entirely solution-based method is outlined for the fabrication of black GaAs with solar-weighted reflectance of ~4%. Finally, a comparison between Au- and CNT-enhanced Si MacEtch is presented towards CMOS-compatibility using catalysts that do not introduce deep level traps. Sample preparation and etching conditions are shown to be adaptable to yield an a priori structural design, through a modification of injected hole distributions. Critical process parameters that guide the MacEtch mechanisms are considered at length, including heteroepitaxial effects, ternary material composition, etching temperature, and catalyst type, size, and deposition technique. This work extends the range of MacEtch materials and its fundamental mechanics for fabrication of micro- and nano-structures with applications in optoelectronics, photovoltaics, and nanoelectronics."--Abstract.
Author : Owen James Hildreth
Publisher :
ISBN 13 :
Total Pages : pages
Book Rating : 4.:/5 (865 download)
Download or read book Development of Metal-assisted Chemical Etching as a 3D Nanofabrication Platform written by Owen James Hildreth and published by . This book was released on 2012 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt: The considerable interest in nanomaterials and nanotechnology over the last decade is attributed to Industry's desire for lower cost, more sophisticated devices and the opportunity that nanotechnology presents for scientists to explore the fundamental properties of nature at near atomic levels. In pursuit of these goals, researchers around the world have worked to both perfect existing technologies and also develop new nano-fabrication methods; however, no technique exists that is capable of producing complex, 2D and 3D nano-sized features of arbitrary shape, with smooth walls, and at low cost. This in part is due to two important limitations of current nanofabrication methods. First, 3D geometry is difficult if not impossible to fabricate, often requiring multiple lithography steps that are both expensive and do not scale well to industrial level fabrication requirements. Second, as feature sizes shrink into the nano-domain, it becomes increasingly difficult to accurately maintain those features over large depths and heights. The ability to produce these structures affordably and with high precision is critically important to a number of existing and emerging technologies such as metamaterials, nano-fluidics, nano-imprint lithography, and more. Summary To overcome these limitations, this study developed a novel and efficient method to etch complex 2D and 3D geometry in silicon with controllable sub-micron to nano-sized features with aspect ratios in excess of 500:1. This study utilized Metal-assisted Chemical Etching (MaCE) of silicon in conjunction with shape-controlled catalysts to fabricate structures such as 3D cycloids, spirals, sloping channels, and out-of-plane rotational structures. This study focused on taking MaCE from a method to fabricate small pores and silicon nanowires using metal catalyst nanoparticles and discontinuous thin films, to a powerful etching technology that utilizes shaped catalysts to fabricate complex, 3D geometry using a single lithography/etch cycle. The effect of catalyst geometry, etchant composition, and external pinning structures was examined to establish how etching path can be controlled through catalyst shape. The ability to control the rotation angle for out-of-plane rotational structures was established to show a linear dependence on catalyst arm length and an inverse relationship with arm width. A plastic deformation model of these structures established a minimum pressure gradient across the catalyst of 0.4 - 0.6 MPa. To establish the cause of catalyst motion in MaCE, the pressure gradient data was combined with force-displacement curves and results from specialized EBL patterns to show that DVLO encompassed forces are the most likely cause of catalyst motion. Lastly, MaCE fabricated templates were combined with electroless deposition of Pd to demonstrate the bottom-up filling of MaCE with sub-20 nm feature resolution. These structures were also used to establish the relationship between rotation angle of spiraling star-shaped catalysts and their center core diameter. Summary In summary, a new method to fabricate 3D nanostructures by top-down etching and bottom-up filling was established along with control over etching path, rotation angle, and etch depth. Out-of-plane rotational catalysts were designed and a new model for catalyst motion proposed. This research is expected to further the advancement of MaCE as platform for 3D nanofabrication with potential applications in thru-silicon-vias, photonics, nano-imprint lithography, and more.
Author : Brendan Derek Smith
Publisher :
ISBN 13 :
Total Pages : 138 pages
Book Rating : 4.:/5 (15 download)
Download or read book A Novel Approach to the Scalable Production of Nanoporous Silicon Membranes for Applications in Water and Energy written by Brendan Derek Smith and published by . This book was released on 2018 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: This thesis introduces two chemical etching-based methods for the production of nanoporous silicon, improving on current state-of-the-art fabrication strategies in terms of scalability and simplicity. The developed processes also allow for new opportunities with respect to pore size, pore aspect ratio, and large-scale homogeneity. The first approach utilizes solution-casting of core-shell nanoparticle catalysts, where the shell is employed as a sacrificial spacer layer to maintain separation between etching-active catalyst cores. A second technique utilizing sputter-deposition of catalyst is developed with the goal of improving process scalability and homogeneity. With no intrinsic limitations on substrate size, this approach is used to produce nanoporous silicon over areas larger than 25 cm 2, pores less than 5 nm in diameter, and aspect ratios greater than 1000:1. Post-etch modification of the nanoporous silicon is performed by atomic layer deposition of alumina, titania, and tungsten nitride onto the surface and pore walls of the porous silicon, highlighting its morphological and chemical tunability. Utility of the material is demonstrated via its implementation in three industrially relevant use cases. As a nanofiltration membrane the material exhibits a size-cutoff as low as 2 nm, and tunable thickness-dependent permeability ranging over three orders of magnitude. Additionally, it demonstrates promise as an active material in a thermoelectric device, reducing thermal conductivity by approximately 70 fold with respect to bulk silicon, of which a factor of 20 can be attributed directly to the porosity in the film. Finally, applicability to the patterning of 2D materials is demonstrated using centimeter scale nanoporous silicon masks in the dry etching of molybdenum disulfide and tungsten disulfide, producing porous structures on the nanoscale. The broad impact of this work is the introduction of two new strategies for the manufacturing of nanoporous silicon at scale, and introduction of the relevant design metrics for control of pore size, pore aspect ratio, and homogeneity of the material. It is expected that this knowledge will be of use in applications which stand to benefit from the introduction of this unique form of nanoporous silicon.
Author : Lucia Romano
Publisher :
ISBN 13 : 9783039438464
Total Pages : 106 pages
Book Rating : 4.4/5 (384 download)
Download or read book Micro- and Nano-Fabrication by Metal Assisted Chemical Etching written by Lucia Romano and published by . This book was released on 2021 with total page 106 pages. Available in PDF, EPUB and Kindle. Book excerpt: Metal-assisted chemical etching (MacEtch) has recently emerged as a new etching technique capable of fabricating high aspect ratio nano- and microstructures in a few semiconductors substrates--Si, Ge, poly-Si, GaAs, and SiC--and using different catalysts--Ag, Au, Pt, Pd, Cu, Ni, and Rh. Several shapes have been demonstrated with a high anisotropy and feature size in the nanoscale--nanoporous films, nanowires, 3D objects, and trenches, which are useful components of photonic devices, microfluidic devices, bio-medical devices, batteries, Vias, MEMS, X-ray optics, etc. With no limitations of large-areas and low-cost processing, MacEtch can open up new opportunities for several applications where high precision nano- and microfabrication is required. This can make semiconductor manufacturing more accessible to researchers in various fields, and accelerate innovation in electronics, bio-medical engineering, energy, and photonics. Accordingly, this Special Issue seeks to showcase research papers, short communications, and review articles that focus on novel methodological developments in MacEtch, and its use for various applications.
Author : Bahareh Yaghootkar
Publisher :
ISBN 13 :
Total Pages : 115 pages
Book Rating : 4.:/5 (19 download)
Download or read book A Study of Novel Fabrication Techniques for Development of 3-D Silicon Nano-structure Array written by Bahareh Yaghootkar and published by . This book was released on 2014 with total page 115 pages. Available in PDF, EPUB and Kindle. Book excerpt: The large surface area and high aspect ratio of nano-structures make them promising candidates as a fundamental building block for manufacturing various devices. The potential applications of silicon nano-structure array include, but are not limited to, electron emitters, sensors, solar cells, rechargeable batteries, and hydrogen storage devices. With advances in nanotechnology, various techniques have been reported for synthesis and fabrication of nano-structures. However, these techniques like chemical vapor deposition and vapor liquid solid suffer from the need of very sophisticated and high cost equipment. Furthermore, the need of high operating temperature, high vacuum, and catalyst material such as gold are major challenges of these techniques. On the other hand some fabrication techniques such as top-down approaches involve complicated fabrication steps that ultimately increase the cost of the device. Therefore, a rising impetus has been devoted to development of less complicated and low-cost fabrication techniques of silicon nano-structure. The goal of this thesis was to introduce novel and cost-effective fabrication methods which also maintain the benefits of CMOS compatibility. Two non-lithography top-down approaches were introduced for fabrication of silicon nano-structures array with capability of controlling the structure characteristics. The first fabrication approach consists of three steps: 1) patterning of silicon surface in TMAH using anisotropic etching technique, 2) formation of porous layer on patterned silicon surface using electrochemical anodic etching, and 3) treatment of porous silicon layer using an alkaline etching to reveal the silicon nano-structure array. The second fabrication approach consisted of two steps, namely: Anisotropic etching followed by electrochemical etching. The main idea behind this approach was that unlike the first approach the electrochemical etching is performed in transition regime not porous silicon formation regime. These techniques allowed for the controlling the characteristics and morphology of silicon nano-structures. Completely different morphologies of nanostructures were achieved as a result of transforming the electrochemical process from porous silicon formation to transition regime. A study on effect of type of dopant, p- and n-type, on over-mentioned fabrication methods was also investigated.
Author : Bailey Anderson Yin
Publisher :
ISBN 13 :
Total Pages : 214 pages
Book Rating : 4.:/5 (986 download)
Download or read book Fabrication of Silicon Nanowires with Controlled Nano-scale Shapes Using Wet Anisotropic Etching written by Bailey Anderson Yin and published by . This book was released on 2015 with total page 214 pages. Available in PDF, EPUB and Kindle. Book excerpt: Silicon nanowires can enable important applications in energy and healthcare such as biochemical sensors, thermoelectric devices, and ultra-capacitors. In the energy sector, for example, as the need for more efficient energy storage continues to grow for enabling applications such as electric vehicles, high energy storage density capacitors are being explored as a potential replacement to traditional batteries that lack fast charge/discharge rates as well as have shorter life cycles. Silicon nanowire based ultra-capacitors offer increased energy storage density by increasing the surface area per unit projected area of the electrode, thereby allowing more surface “charge” to reside. The motivation behind this dissertation is the study of low-cost techniques for fabrication of high aspect ratio silicon nanowires with controlled geometry with an exemplar application in ultra-capacitors. Controlled transfer of high aspect ratio, nano-scale features into functional device layers requires anisotropic etch techniques. Dry reactive ion etch techniques are commonly used since most solution-based wet etch processes lack anisotropic pattern transfer capability. However, in silicon, anisotropic wet etch processes are available for the fabrication of nano-scale features, but have some constraints in the range of geometry of patterns that they can address. While this lack of geometric and material versatility precludes the use of these processes in applications like integrated circuits, they can be potentially realized for fabricating nanoscale pillars. This dissertation explores the geometric limitations of such inexpensive wet anisotropic etching processes and develops additional methods and geometries for fabrication of controlled nano-scale, high aspect ratio features. Jet and Flash Imprint Lithography (J-FILTM) has been used as the preferred pre-etch patterning process as it enables patterning of sub-50 nm high density features with versatile geometries over large areas. Exemplary anisotropic wet etch processes studied include Crystalline Orientation Dependent Etch (CODE) using potassium hydroxide (KOH) etching of silicon and Metal Assisted Chemical Etching (MACE) using gold as a catalyst to etch silicon. Experiments with CODE indicate that the geometric limitations of the etch process prevent the fabrication of high aspect ratio nanowires without adding a prohibitive number of steps to protect the pillar geometry. On the other hand, MACE offers a relatively simple process for fabricating high aspect ratio pillars with unique cross sections, and has thus been pursued to fabricate fully functional electrostatic capacitors featuring both circular and diamond-shaped nano-pillar electrodes. The capacitance of the diamond-shaped nano-pillar capacitor has been shown to be ~77.9% larger than that of the circular cross section due to the increase in surface area per unit projected area. This increase in capacitance approximately matches the increase calculated using analytical models. Thus, this dissertation provides a framework for the ability to create unique sharp cornered nanowires that can be explored further for a wider variety of cross sections.
Author : Sumio Hosaka
Publisher : BoD – Books on Demand
ISBN 13 : 9535111752
Total Pages : 264 pages
Book Rating : 4.5/5 (351 download)
Download or read book Updates in Advanced Lithography written by Sumio Hosaka and published by BoD – Books on Demand. This book was released on 2013-07-03 with total page 264 pages. Available in PDF, EPUB and Kindle. Book excerpt: Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.
Author : J. Grabmaier
Publisher : Springer Science & Business Media
ISBN 13 : 3642687652
Total Pages : 234 pages
Book Rating : 4.6/5 (426 download)
Download or read book Silicon Chemical Etching written by J. Grabmaier and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 234 pages. Available in PDF, EPUB and Kindle. Book excerpt: In the first contribution to this volume we read that the world-wide production of single crystal silicon amounts to some 2000 metric tons per year. Given the size of present-day silicon-crystals, this number is equivalent to 100000 silicon-crystals grown every year by either the Czochralski (80%) or the floating-zone (20%) technique. But, to the best of my knowledge, no coherent and comprehensive article has been written that deals with "the art and science", as well as the practical and technical aspects of growing silicon crystals by the Czochralski technique. The same could be said about the floating-zone technique were it not for the review article by W. Dietze, W. Keller and A. Miihlbauer which was published in the preceding Volume 5 ("Silicon") of this series (and for a monograph by two of the above authors published about the same time). As editor of this volume I am very glad to have succeeded in persuading two scien tists, W. Zulehner and D. Huber, of Wacker-Chemitronic GmbH - the world's largest producer of silicon-crystals - to write a comprehensive article about the practical and scientific aspects of growing silicon-crystals by the Czochralski method and about silicon wafer manufacture. I am sure that many scientists or engineers who work with silicon crystals -be it in the laboratory or in a production environment - will profit from the first article in this volume.
Author : Robert Kelsall
Publisher : John Wiley & Sons
ISBN 13 : 0470020865
Total Pages : 472 pages
Book Rating : 4.4/5 (7 download)
Download or read book Nanoscale Science and Technology written by Robert Kelsall and published by John Wiley & Sons. This book was released on 2005-11-01 with total page 472 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanotechnology is a vital new area of research and development addressing the control, modification and fabrication of materials, structures and devices with nanometre precision and the synthesis of such structures into systems of micro- and macroscopic dimensions. Future applications of nanoscale science and technology include motors smaller than the diameter of a human hair and single-celled organisms programmed to fabricate materials with nanometer precision. Miniaturisation has revolutionised the semiconductor industry by making possible inexpensive integrated electronic circuits comprised of devices and wires with sub-micrometer dimensions. These integrated circuits are now ubiquitous, controlling everything from cars to toasters. The next level of miniaturisation, beyond sub-micrometer dimensions into nanoscale dimensions (invisible to the unaided human eye) is a booming area of research and development. This is a very hot area of research with large amounts of venture capital and government funding being invested worldwide, as such Nanoscale Science and Technology has a broad appeal based upon an interdisciplinary approach, covering aspects of physics, chemistry, biology, materials science and electronic engineering. Kelsall et al present a coherent approach to nanoscale sciences, which will be invaluable to graduate level students and researchers and practising engineers and product designers.
