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Molecular Beam Epitaxy Growth And Characterization Of Gan Aln And Algan Gan Heterostructures
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Book Synopsis Molecular Beam Epitaxy Growth and Characterization of GaN, AlN, and AlGaN/GaN Heterostructures by : Stefan Davidsson
Download or read book Molecular Beam Epitaxy Growth and Characterization of GaN, AlN, and AlGaN/GaN Heterostructures written by Stefan Davidsson and published by . This book was released on 2005 with total page 97 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis MBE Growth and Characterization of Zincblende GaN and GaN/AlN Structures by :
Download or read book MBE Growth and Characterization of Zincblende GaN and GaN/AlN Structures written by and published by . This book was released on 1997 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Program includes fundamental studies of Molecular beam epitaxial (MBE) growth of GaN and its related alloys and heterostructures. In additions, the optical and electrical properties of resultant materials were measured using a variety of spectroscopic techniques. The optical properties concentrated on optically-pumped stimulated emission and laser action in GaN/AlGaN heterostructures. The objective was to better understand the underlying physics of MBE growth, and the optical and electrical properties for GaN-based device application. 1.
Book Synopsis Electrical Characterization of GaN and AlGaN/GaN Heterostructures by Molecular Beam Epitaxy by :
Download or read book Electrical Characterization of GaN and AlGaN/GaN Heterostructures by Molecular Beam Epitaxy written by and published by . This book was released on 2002 with total page 52 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis MBE Growth and Characterization of GaN/AlN Structure Under Hydrostatic Pressure by :
Download or read book MBE Growth and Characterization of GaN/AlN Structure Under Hydrostatic Pressure written by and published by . This book was released on 1997 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: We present the results of a series of studies on the optical properties of GaN and AlGaN/GaN heterostructure using a variety of spectroscopic techniques. Strain effects were found to have a strong influence in determining the energies of excitonic transitions. The observations of spectral features associated with the transitions involving the ground and excited exciton states make it possible to directly estimate binding energy for the excitons in GaN. Optical pumping experiments were performed on AlGaN/GaN separate confinement heterostructures (SCH) grown on sapphire by MBE and SiC by MOCVD. The threshold pumping powers were found to be an order of magnitude lower than that for regular GaN epilayers. Nonlinear four wave mixing experiments were carried out in both femtosecond and picosecond regimes to study the intensity and time response of scattering efficiency, as well as the pump induced nonlinear refractive index change.
Book Synopsis MBE Growth and Characterization of GaN/AlN Structures Under Hydrostatic Pressure by :
Download or read book MBE Growth and Characterization of GaN/AlN Structures Under Hydrostatic Pressure written by and published by . This book was released on 1997 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: We present the results of a series of studies on the optical properties of GaN and AlGaN/GaN heterostructures using a variety of spectroscopic techniques. Strain effects were found to have a strong influence in determining the energies of excitonic transitions. The observations of spectral features associated with the transitions involving the ground and excited exciton states make it possible to directly estimate binding energy for the excitons in GaN. Optical pumping experiments were performed on AlGaN/GaN separate confinement heterostructures (SCH) grown on sapphire by MBE and SiC by MOCVD. The threshold pumping powers were found to be an order of magnitude lowere than that for regular GaN epilayers. Nonlinear four-wave-mixing experiments were carried out in both femtosecond and picosecond regimes to study the intensity and time response of scattering efficiency, as well as the pump-induced nonlinear refractive index change.
Book Synopsis Molecular Beam Epitaxy Growth and Characterization of ZnO-based Layers and Heterostructures by : Abdelhamid Abdelrehim Mahmoud Elshaer
Download or read book Molecular Beam Epitaxy Growth and Characterization of ZnO-based Layers and Heterostructures written by Abdelhamid Abdelrehim Mahmoud Elshaer and published by Cuvillier Verlag. This book was released on 2008 with total page 143 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Optical Characterization and Growth Investigation of Ga-adsorbate Mediated GaN/AlN Quantum Dot Heterostructures by Plasma-assisted Molecular Beam Epitaxy by : Jay Steven Brown
Download or read book Optical Characterization and Growth Investigation of Ga-adsorbate Mediated GaN/AlN Quantum Dot Heterostructures by Plasma-assisted Molecular Beam Epitaxy written by Jay Steven Brown and published by . This book was released on 2006 with total page 318 pages. Available in PDF, EPUB and Kindle. Book excerpt: The III-nitride semiconductors are attractive for a variety of electronic and optoelectronic applications, due to the large band-gap range (0.7 to 6.2 eV), high carrier mobility, and chemical stability. Spontaneous and piezoelectric polarization give rise to large internal electric fields in GaN/AlN heterostructures and are interesting for fundamental investigations and device applications. Quantum dots (QDs) are intensely studied for use as optical emitters in diverse applications ranging from quantum communications to enhancing the performance of conventional diodes and lasers because of their atomic-like density of states, enhanced free carrier capture, and tunable electronic bound states.
Book Synopsis Molecular Beam Epitaxy Growth and Characterization of Ultra-wide Bandgap Materials and Devices by : Ryan Lowry Page
Download or read book Molecular Beam Epitaxy Growth and Characterization of Ultra-wide Bandgap Materials and Devices written by Ryan Lowry Page and published by . This book was released on 2022 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Ultrawide bandgap (UWBG) semiconductors, especially those in the III-nitride family of materials with their exceptional electronic, optical, and thermal properties, will play a highly important role in the next generation of ultraviolet photonic and high power electronic devices. Currently, the performance and utilization of many UWBG materials in device applications is hampered by fundamental materials challenges with growth and doping. This thesis covers the growth and materials properties of two III-nitride UWBG materials, primarily grown by molecular beam epitaxy (MBE). First, hexagonal boron nitride, a two dimensional, layered material with unique optical properties and potential applications in van der Waals-based devices and heterostructures will be discussed. Second, recent work on aluminum nitride (AlN) and aluminum gallium nitride (AlGaN) alloys will be presented.This work begins with an investigation into the high temperature MBE growth of hBN on several substrates. The layers show improved quality over previous reports and are thoroughly characterized. Next, the optical properties of these hBN films, as well as those of bulk doped hBN crystals, are investigated by cryogenic deep UV photoluminescence. Several new emission characteristics are identified and studied in these hBN materials, including carbon-induced luminescence, the direct bandgap transition of monolayer hBN, and single photon emission from hBN defects. Transitioning to the AlGaN platform, the growth of AlN and AlGaN by MBE on high quality single crystalline bulk AlN substrates is outlined and expanded upon, including an analysis of AlGaN doping with Si and Mg. The MBE growth, doping, and electron transport of heavily Si-doped, high Al mole fraction Al- GaN on bulk AlN is investigated, revealing upper practical limits to both Al mole fraction and Si doping density for high conductivity n-type films. In addition to this work on material growth and characterization, several AlGaN-based devices, an optically pumped UV laser and a Schottky barrier diode, will be introduced and discussed. These devices directly benefit from the preceding advances in AlGaN growth and doping. Finally, initial exploratory investigations and results on cubic phase BN as well as boron aluminum nitride alloys will be presented.
Book Synopsis Molecular Beam Epitaxy by : Mohamed Henini
Download or read book Molecular Beam Epitaxy written by Mohamed Henini and published by Elsevier. This book was released on 2018-06-27 with total page 790 pages. Available in PDF, EPUB and Kindle. Book excerpt: Molecular Beam Epitaxy (MBE): From Research to Mass Production, Second Edition, provides a comprehensive overview of the latest MBE research and applications in epitaxial growth, along with a detailed discussion and ‘how to’ on processing molecular or atomic beams that occur on the surface of a heated crystalline substrate in a vacuum. The techniques addressed in the book can be deployed wherever precise thin-film devices with enhanced and unique properties for computing, optics or photonics are required. It includes new semiconductor materials, new device structures that are commercially available, and many that are at the advanced research stage. This second edition covers the advances made by MBE, both in research and in the mass production of electronic and optoelectronic devices. Enhancements include new chapters on MBE growth of 2D materials, Si-Ge materials, AIN and GaN materials, and hybrid ferromagnet and semiconductor structures. Condenses the fundamental science of MBE into a modern reference, speeding up literature review Discusses new materials, novel applications and new device structures, grounding current commercial applications with modern understanding in industry and research Includes coverage of MBE as mass production epitaxial technology and how it enhances processing efficiency and throughput for the semiconductor industry and nanostructured semiconductor materials research community
Book Synopsis Molecular Beam Epitaxy and Characterization of AIN/GaN Heterostructures by : Rashid Farivar
Download or read book Molecular Beam Epitaxy and Characterization of AIN/GaN Heterostructures written by Rashid Farivar and published by . This book was released on 2011 with total page 51 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Handbook of GaN Semiconductor Materials and Devices by : Wengang (Wayne) Bi
Download or read book Handbook of GaN Semiconductor Materials and Devices written by Wengang (Wayne) Bi and published by CRC Press. This book was released on 2017-10-20 with total page 775 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book addresses material growth, device fabrication, device application, and commercialization of energy-efficient white light-emitting diodes (LEDs), laser diodes, and power electronics devices. It begins with an overview on basics of semiconductor materials, physics, growth and characterization techniques, followed by detailed discussion of advantages, drawbacks, design issues, processing, applications, and key challenges for state of the art GaN-based devices. It includes state of the art material synthesis techniques with an overview on growth technologies for emerging bulk or free standing GaN and AlN substrates and their applications in electronics, detection, sensing, optoelectronics and photonics. Wengang (Wayne) Bi is Distinguished Chair Professor and Associate Dean in the College of Information and Electrical Engineering at Hebei University of Technology in Tianjin, China. Hao-chung (Henry) Kuo is Distinguished Professor and Associate Director of the Photonics Center at National Chiao-Tung University, Hsin-Tsu, Taiwan, China. Pei-Cheng Ku is an associate professor in the Department of Electrical Engineering & Computer Science at the University of Michigan, Ann Arbor, USA. Bo Shen is the Cheung Kong Professor at Peking University in China.
Book Synopsis Hot-wall Low Pressure Chemical Vapor Deposition Growth and Characterization of GaN and Epitaxial AlN on Si (111) by : Karen Heinselman
Download or read book Hot-wall Low Pressure Chemical Vapor Deposition Growth and Characterization of GaN and Epitaxial AlN on Si (111) written by Karen Heinselman and published by . This book was released on 2016 with total page 248 pages. Available in PDF, EPUB and Kindle. Book excerpt: The physical and electronic properties of aluminum nitride (AlN) have made it attractive for a wide variety of applications, including bulk and surface acoustic wave (B/SAW) resonators and thin film dielectric coatings. Due to its wide band gap of 6.2 eV, AlN is a good insulator. The chemical durability of AlN makes it appealing for extreme environmental conditions. Its thermal expansion coefficient is similar to those of other semiconductor materials such as Si and SiC, making it appropriate for use in high temperature applications as well. In this work, we demonstrate the growth of AlN and GaN thin films using hotwall low pressure chemical vapor deposition (LPCVD) in order to obtain epitaxial AlN growth with a parallelizable, inexpensive method (relative to the current epitaxial growth method, molecular beam epitaxy). This dissertation demonstrates the growth of aluminum nitride thin films (between 70 nm and 1 [MICRO SIGN]m in thickness) on Si (111) substrates using hot-wall low pressure chemical vapor deposition (LPCVD) at 1000 ? C and 2 torr. Prior to growth, the substrates were pretreated in situ with dichlorosilane cleaning step, the parameters of which were varied to optimize the c-axis alignment of the grown thin film AlN. In addition, nucleation time for the aluminum precursor, trimethylaluminum (TMAl) was varied and optimized. X-ray diffraction (XRD) was performed on the samples for characterization. With the optimal nucleation time and dichlorosilane pretreatment, the 2[theta]-[omega] FWHM of the resulting AlN film was 1160 arcsec, and the FWHM of the [omega] rocking curve was 1.6? . These optimal parameters exhibited epitaxial AlN peaks aligned with the Si (111) substrate when characterized using a tilted phi scan XRD technique. Transmission electron microscopy (TEM) provides a second epitaxial alignment confirmation. Backside etching of the Si (111) substrate to create freestanding AlN thin film drums is demonstrated. This access to the back side of the AlN thin films allows the fabrication of future bulk acoustic wave (BAW) resonator devices and testing the piezoelectric response of these materials. For alternate applications, GaN was grown on AlN buffer layers on Si (111) substrates using hot-wall LPCVD. The resulting film was c-axis aligned, with an XRD FWHM of 1420 arcsec for the GaN (001) 2[theta]-[omega] peak, and the FWHM of the rocking curve was 3.8? . Capacitance-voltage data on the grown GaN on AlN indicate n-type films with residual electron concentrations of roughly 1017 cm[-]3 .
Book Synopsis Characterization and Doping of Epitaxially Grown GaN and A1N on Si Using Molecular Beam Epitaxy by : Chi Hang Ko
Download or read book Characterization and Doping of Epitaxially Grown GaN and A1N on Si Using Molecular Beam Epitaxy written by Chi Hang Ko and published by . This book was released on 2007 with total page 170 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nitride based semiconductors have a unique combination of properties that make them especially suitable for many of the new challenges and applications of the twenty-first century, The group III nitride semiconductors, aluminum nitride (AlN), gallium nitride (GaN), and indium nitride (InN) form a complete series of ternary alloys (InGaN, InAlN, and AlGaN) whose direct band gaps range from 1.9 to 6.2 eV. These compound semiconductors far exceed the physical properties of silicon, and GaN is the most dynamic of them. GaN is often referred to as the "final frontier of semiconductors", Its high thermal conductivity, high melting temperature, low dielectric constant and high breakdown voltage make it an attractive semiconductor for many electronic and optoelectronic devices such as light emitting diodes, laser diodes, radiation detectors, high power and high frequency devices capable of operating at high temperatures, and in hostile chemical environments and so on, GaN thin films, either intrinsic or doped with silicon or magnesium, were grown on silicon(lll) substrates with AIN buffer layers by Molecular Beam Epitaxy (MBE) under a broad range of growth parameters in this study. The samples were characterized using Filmetrics thin film analyzer, Atomic Force Microscopy (AFM), Photoluminescence Spectroscopy, hot probe, and four-point probe. Material growth began with deposition of a 0.3 monolayer (ML) of Al on the SiC 111) 7x7 surface leading to fully passivated Si(111) [square root]3x[square root]3-Al surface, on which AlN buffer layers and then the GaN layers were deposited. X-ray diffraction measurements indicated growth of single-crystalline hexagonal GaN(00l) while PL measurement demonstrated a peak position corresponding to bulk hexagonal GaN, Sample surface morphology, roughness, and resistivity showed a strong dependence on growth conditions and dopant types. The percent roughness/thickness on the GaN fIlms decreased linearly with increasing Si dopant temperature and increased exponentially to the first order with increasing Mg dopant temperature. P-type doping was achieved using Mg and the resistivity of both Si- and Mg-doped GaN samples showed an inverse linear relationship with the dopant temperatures.
Book Synopsis 21st Century Nanoscience by : Klaus D. Sattler
Download or read book 21st Century Nanoscience written by Klaus D. Sattler and published by CRC Press. This book was released on 2022-01-18 with total page 4153 pages. Available in PDF, EPUB and Kindle. Book excerpt: This 21st Century Nanoscience Handbook will be the most comprehensive, up-to-date large reference work for the field of nanoscience. Handbook of Nanophysics, by the same editor, published in the fall of 2010, was embraced as the first comprehensive reference to consider both fundamental and applied aspects of nanophysics. This follow-up project has been conceived as a necessary expansion and full update that considers the significant advances made in the field since 2010. It goes well beyond the physics as warranted by recent developments in the field. Key Features: Provides the most comprehensive, up-to-date large reference work for the field. Chapters written by international experts in the field. Emphasises presentation and real results and applications. This handbook distinguishes itself from other works by its breadth of coverage, readability and timely topics. The intended readership is very broad, from students and instructors to engineers, physicists, chemists, biologists, biomedical researchers, industry professionals, governmental scientists, and others whose work is impacted by nanotechnology. It will be an indispensable resource in academic, government, and industry libraries worldwide. The fields impacted by nanoscience extend from materials science and engineering to biotechnology, biomedical engineering, medicine, electrical engineering, pharmaceutical science, computer technology, aerospace engineering, mechanical engineering, food science, and beyond.
Book Synopsis Molecular Beam Epitaxy and Heterostructures by : L.L. Chang
Download or read book Molecular Beam Epitaxy and Heterostructures written by L.L. Chang and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 718 pages. Available in PDF, EPUB and Kindle. Book excerpt: The NATO Advanced Study Institute on "Molecular Beam Epitaxy (MBE) and Heterostructures" was held at the Ettore Majorana Center for Scientific Culture, Erice, Italy, on March 7-19, 1983, the second course of the International School of Solid-State Device Re search. This volume contains the lectures presented at the Institute. Throughout the history of semiconductor development, the coupling between processing techniques and device structures for both scientific investigations and technological applications has time and again been demonstrated. Newly conceived ideas usually demand the ultimate in existing techniques, which often leads to process innova tions. The emergence of a process, on the other hand, invariably creates opportunities for device improvement and invention. This intimate relationship between the two has most recently been witnessed in MBE and heterostructures, the subject of this Institute. This volume is divided into several sections. Chapter 1 serves as an introduction by providing a perspective of the subject. This is followed by two sections, each containing four chapters, Chapters 2-5 addressing the principles of the MBE process and Chapters 6-9 describ ing its use in the growth of a variety of semiconductors and heteros tructures. The next two sections, Chapters to-II and Chapters 12-15, treat the theory and the electronic properties of the heterostructures, respectively. The focus is on energy quantization of the two dimensional electron system. Chapters 16-17 are devoted to device structures, including both field-effect transistors and lasers and detec tors.
Book Synopsis 21st Century Nanoscience – A Handbook by : Klaus D. Sattler
Download or read book 21st Century Nanoscience – A Handbook written by Klaus D. Sattler and published by CRC Press. This book was released on 2020-11-26 with total page 864 pages. Available in PDF, EPUB and Kindle. Book excerpt: 21st Century Nanoscience - A Handbook: Nanophotonics, Nanoelectronics, and Nanoplasmonics (Volume 6) will be the most comprehensive, up-to-date large reference work for the field of nanoscience. Handbook of Nanophysics by the same editor published in the fall of 2010 and was embraced as the first comprehensive reference to consider both fundamental and applied aspects of nanophysics. This follow-up project has been conceived as a necessary expansion and full update that considers the significant advances made in the field since 2010. It goes well beyond the physics as warranted by recent developments in the field. This sixth volume in a ten-volume set covers nanophotonics, nanoelectronics, and nanoplasmonics. Key Features: Provides the most comprehensive, up-to-date large reference work for the field. Chapters written by international experts in the field. Emphasises presentation and real results and applications. This handbook distinguishes itself from other works by its breadth of coverage, readability and timely topics. The intended readership is very broad, from students and instructors to engineers, physicists, chemists, biologists, biomedical researchers, industry professionals, governmental scientists, and others whose work is impacted by nanotechnology. It will be an indispensable resource in academic, government, and industry libraries worldwide. The fields impacted by nanophysics extend from materials science and engineering to biotechnology, biomedical engineering, medicine, electrical engineering, pharmaceutical science, computer technology, aerospace engineering, mechanical engineering, food science, and beyond.
Book Synopsis Pure AlN Layers in Metal-polar AlGaN/AlN/GaN and AlN/GaN Heterostructures Grown by Low-temperature Ammonia-based Molecular Beam Epitaxy by :
Download or read book Pure AlN Layers in Metal-polar AlGaN/AlN/GaN and AlN/GaN Heterostructures Grown by Low-temperature Ammonia-based Molecular Beam Epitaxy written by and published by . This book was released on 2015 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:
