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Modeling Of A Photo Chemical Vapor Deposition Reactor
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Book Synopsis Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies by : Y. Pauleau
Download or read book Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies written by Y. Pauleau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 372 pages. Available in PDF, EPUB and Kindle. Book excerpt: An up-to-date collection of tutorial papers on the latest advances in the deposition and growth of thin films for micro and nano technologies. The emphasis is on fundamental aspects, principles and applications of deposition techniques used for the fabrication of micro and nano devices. The deposition of thin films is described, emphasising the gas phase and surface chemistry and its effects on the growth rates and properties of films. Gas-phase phenomena, surface chemistry, growth mechanisms and the modelling of deposition processes are thoroughly described and discussed to provide a clear understanding of the growth of thin films and microstructures via thermally activated, laser induced, photon assisted, ion beam assisted, and plasma enhanced vapour deposition processes. A handbook for engineers and scientists and an introduction for students of microelectronics.
Download or read book Energy Research Abstracts written by and published by . This book was released on 1988 with total page 872 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Principles of Chemical Vapor Deposition by : Daniel Dobkin
Download or read book Principles of Chemical Vapor Deposition written by Daniel Dobkin and published by Springer Science & Business Media. This book was released on 2003-04-30 with total page 298 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Book Synopsis Three Dimensional Transport and Kinetic Modeling of Horizontal Chemical Vapor Deposition Reactors by : Erik Oddmund Einset
Download or read book Three Dimensional Transport and Kinetic Modeling of Horizontal Chemical Vapor Deposition Reactors written by Erik Oddmund Einset and published by . This book was released on 1991 with total page 556 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition by : M. L. Hitchman
Download or read book Chemical Vapor Deposition written by M. L. Hitchman and published by Academic Press. This book was released on 1993-04-13 with total page 692 pages. Available in PDF, EPUB and Kindle. Book excerpt: This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.
Book Synopsis Proceedings of the Ninth International Conference on Chemical Vapor Deposition, 1984 by : McD. Robinson
Download or read book Proceedings of the Ninth International Conference on Chemical Vapor Deposition, 1984 written by McD. Robinson and published by . This book was released on 1984 with total page 828 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Download or read book CVD-XI written by Karl E. Spear and published by . This book was released on 1990 with total page 762 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical and Catalytic Reactor Modeling by : American Chemical Society. Meeting
Download or read book Chemical and Catalytic Reactor Modeling written by American Chemical Society. Meeting and published by . This book was released on 1984 with total page 448 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis The Chemistry of Metal CVD by : Toivo T. Kodas
Download or read book The Chemistry of Metal CVD written by Toivo T. Kodas and published by John Wiley & Sons. This book was released on 2008-09-26 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Book Synopsis Carbon Nanomaterials: Modeling, Design, and Applications by : Kun Zhou
Download or read book Carbon Nanomaterials: Modeling, Design, and Applications written by Kun Zhou and published by CRC Press. This book was released on 2019-07-17 with total page 516 pages. Available in PDF, EPUB and Kindle. Book excerpt: Carbon Nanomaterials: Modeling, Design, and Applications provides an in-depth review and analysis of the most popular carbon nanomaterials, including fullerenes, carbon nanotubes, graphene and novel carbon nanomaterial-based membranes and thin films, with emphasis on their modeling, design and applications. This book provides basic knowledge of the structures, properties and applications of carbon-based nanomaterials. It illustrates the fundamental structure-property relationships of the materials in both experimental and modeling aspects, offers technical guidance in computational simulation of nanomaterials, and delivers an extensive view on current achievements in research and practice, while presenting new possibilities in the design and usage of carbon nanomaterials. This book is aimed at both undergraduate and graduate students, researchers, designers, professors, and professionals within the fields of materials science and engineering, mechanical engineering, applied physics, and chemical engineering.
Book Synopsis Handbook of Silicon Wafer Cleaning Technology by : Karen Reinhardt
Download or read book Handbook of Silicon Wafer Cleaning Technology written by Karen Reinhardt and published by William Andrew. This book was released on 2018-03-16 with total page 794 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processing are reviewed, including surface and colloidal aspects. This revised edition includes the developments of the last ten years to accommodate a continually involving industry, addressing new technologies and materials, such as germanium and III-V compound semiconductors, and reviewing the various techniques and methods for cleaning and surface conditioning. Chapters include numerous examples of cleaning technique and their results. The book helps the reader understand the process they are using for their cleaning application and why the selected process works. For example, discussion of the mechanism and physics of contamination, metal, particle and organic includes information on particle removal, metal passivation, hydrogen-terminated silicon and other processes that engineers experience in their working environment. In addition, the handbook assists the reader in understanding analytical methods for evaluating contamination. The book is arranged in an order that segments the various cleaning techniques, aqueous and dry processing. Sections include theory, chemistry and physics first, then go into detail for the various methods of cleaning, specifically particle removal and metal removal, amongst others. - Focuses on cleaning techniques including wet, plasma and other surface conditioning techniques used to manufacture integrated circuits - Reliable reference for anyone that manufactures integrated circuits or supplies the semiconductor and microelectronics industries - Covers processes and equipment, as well as new materials and changes required for the surface conditioning process
Book Synopsis Scientific and Technical Aerospace Reports by :
Download or read book Scientific and Technical Aerospace Reports written by and published by . This book was released on 1995 with total page 500 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Modeling of Chemical Vapor Deposition of Tungsten Films by : Chris R. Kleijn
Download or read book Modeling of Chemical Vapor Deposition of Tungsten Films written by Chris R. Kleijn and published by Birkhäuser. This book was released on 2013-11-11 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Book Synopsis Heterogeneous Photocatalysis by : Giuseppe Marcì
Download or read book Heterogeneous Photocatalysis written by Giuseppe Marcì and published by Elsevier. This book was released on 2019-02-21 with total page 291 pages. Available in PDF, EPUB and Kindle. Book excerpt: Heterogeneous Photocatalysis: Relationships with Heterogeneous Catalysis and Perspectives highlights the differences between thermal-catalysis and photo-catalysis and indicates borderlines, in particular, the possible synergism between them. The book outlines the basic aspect of thermal- and photo-catalysis, along with the most important characterization techniques. In addition, it presents case studies of thermal-catalytic and photo-catalytic or thermal-photo-catalytic reactions and includes a comparison between the results obtained using an inorganic solid as thermal catalyst and photocatalyst for the same reaction, and in the same setup. Final sections offer information on the preparation methods of (photo)catalysts, various techniques used for their characterization, engineering and economical aspects. This book will be a valuable reference source for students and researchers involved in heterogeneous photocatalysis and catalysis, chemistry, chemical engineering, materials science, materials engineering, environment engineering, nanotechnology and green chemistry. - Provides selective methods for the preparation of microcrystalline/nanocrystalline solids or films used in catalytic and photocatalytic processes - Describes (photo)reactions that can be carried out catalytically and/or photocatalytically - Outlines the different mechanisms, yields and experimental conditions under which photocatalytic reactions can take place - Describes various (photo)reactors and set ups under which the photacatalytic reactions can be carried out - Provides an economic assessment to understand the feasibility of some photocatalytic reactions
Download or read book Physics Briefs written by and published by . This book was released on 1992 with total page 1812 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Database Needs for Modeling and Simulation of Plasma Processing by : National Research Council
Download or read book Database Needs for Modeling and Simulation of Plasma Processing written by National Research Council and published by National Academies Press. This book was released on 1996-10-21 with total page 74 pages. Available in PDF, EPUB and Kindle. Book excerpt: In spite of its high cost and technical importance, plasma equipment is still largely designed empirically, with little help from computer simulation. Plasma process control is rudimentary. Optimization of plasma reactor operation, including adjustments to deal with increasingly stringent controls on plant emissions, is performed predominantly by trial and error. There is now a strong and growing economic incentive to improve on the traditional methods of plasma reactor and process design, optimization, and control. An obvious strategy for both chip manufacturers and plasma equipment suppliers is to employ large-scale modeling and simulation. The major roadblock to further development of this promising strategy is the lack of a database for the many physical and chemical processes that occur in the plasma. The data that are currently available are often scattered throughout the scientific literature, and assessments of their reliability are usually unavailable. Database Needs for Modeling and Simulation of Plasma Processing identifies strategies to add data to the existing database, to improve access to the database, and to assess the reliability of the available data. In addition to identifying the most important needs, this report assesses the experimental and theoretical/computational techniques that can be used, or must be developed, in order to begin to satisfy these needs.
Book Synopsis Surface Modeling Engineering by : Ram Kossowsky
Download or read book Surface Modeling Engineering written by Ram Kossowsky and published by CRC Press. This book was released on 1989-07-31 with total page 348 pages. Available in PDF, EPUB and Kindle. Book excerpt: These volumes present the general parctitioners in engineering with a comprehensive discussion of technological surfaces, their interactions with environments, and the various modification techniques available to improve their performance. In each subject, applications to metals, ceramics, and polymers are emphasized. The interactions with the environment are described: corrosion (chemical), friction and waer (mechanical), and bioreactivity (physiological). Reviews of major modification schemes such as chemical vapor deposition, physical vapor deposition, laser beam interactions, chemical infusion, and ion implantation are presented. In summary, reviews of applications of the modification techniques to optimize the performances of structural components, tools, electronic devices, and implantable medical devices, manufactured out of metals, ceramic, and polymers, are described.
