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Low Pressure Chemical Vapor Deposition Of Semiconducting Boron Carbide Thin Films On Silicon
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Book Synopsis Low Pressure Chemical Vapor Deposition of Semiconducting Boron Carbide Thin Films on Silicon by : Thomas Gregory Wulz
Download or read book Low Pressure Chemical Vapor Deposition of Semiconducting Boron Carbide Thin Films on Silicon written by Thomas Gregory Wulz and published by . This book was released on 2014 with total page 61 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Silicon Carbide Thin Films Via Low Pressure Chemical Vapor Deposition for Micro- and Nano-electromechanical Systems by : Christopher Stephen Roper
Download or read book Silicon Carbide Thin Films Via Low Pressure Chemical Vapor Deposition for Micro- and Nano-electromechanical Systems written by Christopher Stephen Roper and published by . This book was released on 2007 with total page 390 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Photoassisted Chemical Vapor Deposition for Packaging and Fabrication of Wide-Band Gap Semiconducting Devices by :
Download or read book Photoassisted Chemical Vapor Deposition for Packaging and Fabrication of Wide-Band Gap Semiconducting Devices written by and published by . This book was released on 1997 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Major improvements have been made in the fabrication and in the performance characteristics of boron carbide-based, wide-band gap semiconductor devices. During this grant, working boron carbide transistors, tunnel junctions and homojunction diodes were fabricated. These transistors and diodes were the first carbide based devices of their type to be reported in either academic laboratories or in industry. Protocols for boron carbide substrate fabrication were optimized and the boron carbide thin films were deposited on a wide variety of substrates, including Si(111), aluminum, steel, gold, titanium and silver. PACVD (photoassisted chemical vapor deposition) methods using orthocarborane as a source molecule, were tailored to achieve band gaps of up to 4.0 eV with temperature stability to 250 C. The boron carbide material was successfully doped both n-type and p-type, and methods of tuning the band gap by inclusion of phosphorus-containg dimeric chloro-phospha-3-carborane allowed the band gap to be tuned reliably over the range of 0.7 to 2.4 eV by appropriate adjustment of feed gas. A novel class of CVD molecules, the metallocenes, were used for n-type doping. The sensitivity of these molecules to electron or photon beams have also allowed metal wires and other metal-metal containing features to be written with dimensions as small as 500 angstroms in resolution.
Book Synopsis Proceedings of the Eighth International Conference on Chemical Vapor Deposition by : J. M. Blocher
Download or read book Proceedings of the Eighth International Conference on Chemical Vapor Deposition written by J. M. Blocher and published by . This book was released on 1981 with total page 844 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Hot Filament Activated Chemical Vapor Deposition of Nitride and Carbide Thin Films by : Sadanand Vinayak Deshpande
Download or read book Hot Filament Activated Chemical Vapor Deposition of Nitride and Carbide Thin Films written by Sadanand Vinayak Deshpande and published by . This book was released on 1994 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Thin Films by Chemical Vapour Deposition by : C. E. Moroșanu
Download or read book Thin Films by Chemical Vapour Deposition written by C. E. Moroșanu and published by . This book was released on 1990 with total page 724 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Deposition of Boron Carbide Thin Films by Supersonic Plasma Jet Chemical Vapor Deposition by : Olivier Postel
Download or read book Deposition of Boron Carbide Thin Films by Supersonic Plasma Jet Chemical Vapor Deposition written by Olivier Postel and published by . This book was released on 1998 with total page 444 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis The Growth and Characterization of Beta Silicon Carbide ([beta]-Sic) Thin Films by Chemical Vapor Deposition in a Low Pressure Vertical Reactor by : Kenneth George Irvine
Download or read book The Growth and Characterization of Beta Silicon Carbide ([beta]-Sic) Thin Films by Chemical Vapor Deposition in a Low Pressure Vertical Reactor written by Kenneth George Irvine and published by . This book was released on 1992 with total page 170 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Setup of Low Pressure Chemical Vapor Deposition of Boron Nitride Thin Films by : Hsiao C. Liu
Download or read book Setup of Low Pressure Chemical Vapor Deposition of Boron Nitride Thin Films written by Hsiao C. Liu and published by . This book was released on 1991 with total page 36 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis The Growth and Characterization of Beta Silicon Carbide (β-Sic) Thin Films by Chemical Vapor Deposition in a Low Pressure Vertical Reactor by : Kenneth George Irvine
Download or read book The Growth and Characterization of Beta Silicon Carbide (β-Sic) Thin Films by Chemical Vapor Deposition in a Low Pressure Vertical Reactor written by Kenneth George Irvine and published by . This book was released on 1992 with total page 170 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Pressure Chemical Vapor Deposition of Silicon Dioxide and Phosphosilicate Glass Thin Films by : Vijayalakshmi Venkatesan
Download or read book Low Pressure Chemical Vapor Deposition of Silicon Dioxide and Phosphosilicate Glass Thin Films written by Vijayalakshmi Venkatesan and published by . This book was released on 1996 with total page 130 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Conformal Chemical Vapor Deposition of Boron Carbide Thin Films by : Arun Haridas Choolakkal
Download or read book Conformal Chemical Vapor Deposition of Boron Carbide Thin Films written by Arun Haridas Choolakkal and published by . This book was released on 2023 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Synthesis and Characterization of Silicon Dioxide Thin Films by Low Pressure Chemical Vapor Deposition by : Sutham Niyomwas
Download or read book Synthesis and Characterization of Silicon Dioxide Thin Films by Low Pressure Chemical Vapor Deposition written by Sutham Niyomwas and published by . This book was released on 1997 with total page 86 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition for Microelectronics by : Arthur Sherman
Download or read book Chemical Vapor Deposition for Microelectronics written by Arthur Sherman and published by William Andrew. This book was released on 1987 with total page 240 pages. Available in PDF, EPUB and Kindle. Book excerpt: Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.
Book Synopsis Low Pressure Chemical Vapor Deposition (LPCVD) of Silicon Dioxide at High Temperatures by : Ara Philipossian
Download or read book Low Pressure Chemical Vapor Deposition (LPCVD) of Silicon Dioxide at High Temperatures written by Ara Philipossian and published by . This book was released on 1985 with total page 236 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Low Pressure Chemical Vapor Deposition (LPCVD) of Silicon Carbide from Diethylsilane by : Yi-Tong Shi
Download or read book Low Pressure Chemical Vapor Deposition (LPCVD) of Silicon Carbide from Diethylsilane written by Yi-Tong Shi and published by . This book was released on 1991 with total page 152 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Synthesis and Characterization of Silicon Dioxide Thin Films by Low Pressure Chemical Vapor Deposition Using Ditertiarybutylsilane and Oxygen by : Sung-Jun Lee
Download or read book Synthesis and Characterization of Silicon Dioxide Thin Films by Low Pressure Chemical Vapor Deposition Using Ditertiarybutylsilane and Oxygen written by Sung-Jun Lee and published by . This book was released on 1996 with total page 104 pages. Available in PDF, EPUB and Kindle. Book excerpt:
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