Fundamental Principles of Optical Lithography

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Author :
Publisher : John Wiley & Sons
ISBN 13 : 1119965071
Total Pages : 503 pages
Book Rating : 4.1/5 (199 download)

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Book Synopsis Fundamental Principles of Optical Lithography by : Chris Mack

Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.

Principles of Lithography

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Author :
Publisher : SPIE Press
ISBN 13 : 9780819456601
Total Pages : 446 pages
Book Rating : 4.4/5 (566 download)

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Book Synopsis Principles of Lithography by : Harry J. Levinson

Download or read book Principles of Lithography written by Harry J. Levinson and published by SPIE Press. This book was released on 2005 with total page 446 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

EUV Lithography

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Publisher : SPIE Press
ISBN 13 : 0819469645
Total Pages : 704 pages
Book Rating : 4.8/5 (194 download)

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Book Synopsis EUV Lithography by : Vivek Bakshi

Download or read book EUV Lithography written by Vivek Bakshi and published by SPIE Press. This book was released on 2009 with total page 704 pages. Available in PDF, EPUB and Kindle. Book excerpt: Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.

The Tamarind Book of Lithography: Art & Techniques

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Author :
Publisher : Los Angeles : Tamarind Lithography Workshop
ISBN 13 :
Total Pages : 474 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis The Tamarind Book of Lithography: Art & Techniques by : Garo Z. Antreasian

Download or read book The Tamarind Book of Lithography: Art & Techniques written by Garo Z. Antreasian and published by Los Angeles : Tamarind Lithography Workshop. This book was released on 1971 with total page 474 pages. Available in PDF, EPUB and Kindle. Book excerpt:

Tamarind Techniques for Fine Art Lithography

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Author :
Publisher : ABRAMS
ISBN 13 :
Total Pages : 328 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Tamarind Techniques for Fine Art Lithography by : Marjorie Devon

Download or read book Tamarind Techniques for Fine Art Lithography written by Marjorie Devon and published by ABRAMS. This book was released on 2008 with total page 328 pages. Available in PDF, EPUB and Kindle. Book excerpt: This comprehensive text covers all facets of fine art lithography, from setting up a workshop of any size to pulling a successful edition. It ofers complete, illustrated step-by-step instructions for all techniques in use.

Field Guide to Optical Lithography

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Publisher : Society of Photo Optical
ISBN 13 : 9780819462077
Total Pages : 122 pages
Book Rating : 4.4/5 (62 download)

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Book Synopsis Field Guide to Optical Lithography by : Chris A. Mack

Download or read book Field Guide to Optical Lithography written by Chris A. Mack and published by Society of Photo Optical. This book was released on 2006 with total page 122 pages. Available in PDF, EPUB and Kindle. Book excerpt: This Field Guide distills the material written by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. It details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.

Lithography Process Control

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Publisher : SPIE Press
ISBN 13 : 9780819430526
Total Pages : 210 pages
Book Rating : 4.4/5 (35 download)

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Book Synopsis Lithography Process Control by : Harry J. Levinson

Download or read book Lithography Process Control written by Harry J. Levinson and published by SPIE Press. This book was released on 1999 with total page 210 pages. Available in PDF, EPUB and Kindle. Book excerpt: This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.

Chemistry and Lithography

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Publisher : SPIE Press
ISBN 13 : 9781118030028
Total Pages : 0 pages
Book Rating : 4.0/5 (3 download)

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Book Synopsis Chemistry and Lithography by : Uzodinma Okoroanyanwu

Download or read book Chemistry and Lithography written by Uzodinma Okoroanyanwu and published by SPIE Press. This book was released on 2011-03-08 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemistry and Lithography provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a wide readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology. Part I presents several important chemical and physical principles involved in the invention and evolution of lithography. Part II covers the processes for the synthesis, manufacture, usage, and handling of lithographic chemicals and materials. Part III investigates several important chemical and physical principles involved in the practice of lithography. Chemistry and Lithography is a useful reference for anyone working in the semiconductor industry.

Nanoimprint Lithography: An Enabling Process for Nanofabrication

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Author :
Publisher : Springer Science & Business Media
ISBN 13 : 3642344283
Total Pages : 270 pages
Book Rating : 4.6/5 (423 download)

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Book Synopsis Nanoimprint Lithography: An Enabling Process for Nanofabrication by : Weimin Zhou

Download or read book Nanoimprint Lithography: An Enabling Process for Nanofabrication written by Weimin Zhou and published by Springer Science & Business Media. This book was released on 2013-01-04 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.

Multiphoton Lithography

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Publisher : John Wiley & Sons
ISBN 13 : 3527682694
Total Pages : 408 pages
Book Rating : 4.5/5 (276 download)

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Book Synopsis Multiphoton Lithography by : Jürgen Stampfl

Download or read book Multiphoton Lithography written by Jürgen Stampfl and published by John Wiley & Sons. This book was released on 2016-09-12 with total page 408 pages. Available in PDF, EPUB and Kindle. Book excerpt: This first book on this fascinating, interdisciplinary topic meets the much-felt need for an up-to-date overview of the field. Written with both beginners and professionals in mind, this ready reference begins with an introductory section explaining the basics of the various multi-photon and photochemical processes together with a description of the equipment needed. A team of leading international experts provides the latest research results on such materials as new photoinitiators, hybrid photopolymers, and metallic carbon nanotube composites. They also cover promising applications and prospective trends, including photonic crystals, microfluidic devices, biological scaffolds, metamaterials, waveguides, and functionalized hydrogels. By bringing together the essentials for both industrial and academic researchers, this is an invaluable companion for materials scientists, polymer chemists, surface chemists, surface physicists, biophysicists, and medical scientists working with 3D micro- and nanostructures.

Semiconductor Lithography

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Publisher : Springer Science & Business Media
ISBN 13 : 1461308852
Total Pages : 937 pages
Book Rating : 4.4/5 (613 download)

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Book Synopsis Semiconductor Lithography by : Wayne M. Moreau

Download or read book Semiconductor Lithography written by Wayne M. Moreau and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 937 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor lithography is one of the key steps in the manufacturing of integrated silicon-based circuits. In fabricating a semiconductor device such as a transistor, a series of hot processes consisting of vacuum film deposition, oxidations, and dopant implantation are all patterned into microscopic circuits by the wet processes of lithography. Lithography, as adopted by the semiconductor industry, is the process of drawing or printing the pattern of an integrated circuit in a resist material. The pattern is formed and overlayed to a previous circuit layer as many as 30 times in the manufacture of logic and memory devices. With the resist pattern acting as a mask, a permanent device structure is formed by subtractive (removal) etching or by additive deposition of metals or insulators. Each process step in lithography uses inorganic or organic materials to physically transform semiconductors of silicon, insulators of oxides, nitrides, and organic polymers, and metals, into useful electronic devices. All forms of electromagnetic radiation are used in the processing. Lithography is a mUltidisciplinary science of materials, processes, and equipment, interacting to produce three-dimensional structures. Many aspects of chemistry, electrical engineering, materials science, and physics are involved. The purpose of this book is to bring together the work of many scientists and engineers over the last 10 years and focus upon the basic resist materials, the lithographic processes, and the fundamental principles behind each lithographic process.

Stone Lithography

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Author :
Publisher : A & C Black
ISBN 13 :
Total Pages : 168 pages
Book Rating : 4.3/5 (91 download)

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Book Synopsis Stone Lithography by : Paul Croft

Download or read book Stone Lithography written by Paul Croft and published by A & C Black. This book was released on 2003 with total page 168 pages. Available in PDF, EPUB and Kindle. Book excerpt: "In this practical handbook, Paul Croft offers a comprehensive approach to the many aspects of lithography. Through simplified steps the information is presented in a logical and meaningful manner. This lavishly illustrated guide is also teeming with examples of prints from an international group of artists, showing the beautiful work that is being produced around the world today."--BOOK JACKET.Title Summary field provided by Blackwell North America, Inc. All Rights Reserved

Philadelphia on Stone

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Publisher : Penn State Press
ISBN 13 : 027105252X
Total Pages : 321 pages
Book Rating : 4.2/5 (71 download)

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Book Synopsis Philadelphia on Stone by : Erika Piola

Download or read book Philadelphia on Stone written by Erika Piola and published by Penn State Press. This book was released on 2012 with total page 321 pages. Available in PDF, EPUB and Kindle. Book excerpt: "A collection of essays examining the history of nineteenth-century commercial lithography in Philadelphia. Analyzes the social, economic, and technological changes in the local trade from 1828 to 1878"--Provided by publisher.

Optical and EUV Lithography

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Publisher :
ISBN 13 : 9781510639010
Total Pages : pages
Book Rating : 4.6/5 (39 download)

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Book Synopsis Optical and EUV Lithography by : Andreas Erdmann

Download or read book Optical and EUV Lithography written by Andreas Erdmann and published by . This book was released on 2021-02 with total page pages. Available in PDF, EPUB and Kindle. Book excerpt:

Materials and Processes for Next Generation Lithography

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Publisher : Elsevier
ISBN 13 : 0081003587
Total Pages : 636 pages
Book Rating : 4.0/5 (81 download)

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Book Synopsis Materials and Processes for Next Generation Lithography by :

Download or read book Materials and Processes for Next Generation Lithography written by and published by Elsevier. This book was released on 2016-11-08 with total page 636 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place

Optical Lithography

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Publisher : SPIE-International Society for Optical Engineering
ISBN 13 : 9781510639959
Total Pages : 0 pages
Book Rating : 4.6/5 (399 download)

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Book Synopsis Optical Lithography by : Burn Jeng Lin

Download or read book Optical Lithography written by Burn Jeng Lin and published by SPIE-International Society for Optical Engineering. This book was released on 2021 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies.

Extreme Ultraviolet Lithography

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Publisher :
ISBN 13 : 9781510639393
Total Pages : 245 pages
Book Rating : 4.6/5 (393 download)

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Book Synopsis Extreme Ultraviolet Lithography by : Harry J. Levinson

Download or read book Extreme Ultraviolet Lithography written by Harry J. Levinson and published by . This book was released on 2020 with total page 245 pages. Available in PDF, EPUB and Kindle. Book excerpt: