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Author : David A. Murray
Publisher :
ISBN 13 :
Total Pages : 424 pages
Book Rating : 4.:/5 (2 download)
Download or read book Lithographer 1 & C. written by David A. Murray and published by . This book was released on 1981 with total page 424 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : United States. Bureau of Naval Personnel
Publisher :
ISBN 13 :
Total Pages : 360 pages
Book Rating : 4.:/5 (6 download)
Download or read book Lithographer 1 & C. written by United States. Bureau of Naval Personnel and published by . This book was released on 1958 with total page 360 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 337 pages
Book Rating : 4.:/5 (397 download)
Download or read book Lithographer 1 & C written by and published by . This book was released on 1970 with total page 337 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher :
ISBN 13 :
Total Pages : 337 pages
Book Rating : 4.:/5 (222 download)
Download or read book Lithographer 1 & C written by and published by . This book was released on 1970 with total page 337 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : David A. Murray
Publisher :
ISBN 13 :
Total Pages : 0 pages
Book Rating : 4.:/5 (16 download)
Download or read book Lithographer 1 & C. written by David A. Murray and published by . This book was released on 1981 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : United States. Bureau of Naval Personnel
Publisher :
ISBN 13 :
Total Pages : 367 pages
Book Rating : 4.:/5 (56 download)
Download or read book Lithographer 1 & C. written by United States. Bureau of Naval Personnel and published by . This book was released on 1951 with total page 367 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Chris Mack
Publisher : John Wiley & Sons
ISBN 13 : 1119965071
Total Pages : 503 pages
Book Rating : 4.1/5 (199 download)
Download or read book Fundamental Principles of Optical Lithography written by Chris Mack and published by John Wiley & Sons. This book was released on 2011-08-10 with total page 503 pages. Available in PDF, EPUB and Kindle. Book excerpt: The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Author : Harry J. Levinson
Publisher : SPIE Press
ISBN 13 : 9780819430526
Total Pages : 210 pages
Book Rating : 4.4/5 (35 download)
Download or read book Lithography Process Control written by Harry J. Levinson and published by SPIE Press. This book was released on 1999 with total page 210 pages. Available in PDF, EPUB and Kindle. Book excerpt: This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.
Author : Erika Piola
Publisher : Penn State Press
ISBN 13 : 027105252X
Total Pages : 321 pages
Book Rating : 4.2/5 (71 download)
Download or read book Philadelphia on Stone written by Erika Piola and published by Penn State Press. This book was released on 2012 with total page 321 pages. Available in PDF, EPUB and Kindle. Book excerpt: "A collection of essays examining the history of nineteenth-century commercial lithography in Philadelphia. Analyzes the social, economic, and technological changes in the local trade from 1828 to 1878"--Provided by publisher.
Author : United States. Bureau of Naval Personnel
Publisher :
ISBN 13 :
Total Pages : 520 pages
Book Rating : 4.:/5 (31 download)
Download or read book Lithographer 3 & 2 written by United States. Bureau of Naval Personnel and published by . This book was released on 1963 with total page 520 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author :
Publisher : Elsevier
ISBN 13 : 0081003587
Total Pages : 636 pages
Book Rating : 4.0/5 (81 download)
Download or read book Materials and Processes for Next Generation Lithography written by and published by Elsevier. This book was released on 2016-11-08 with total page 636 pages. Available in PDF, EPUB and Kindle. Book excerpt: As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation Includes information on processing and metrology techniques Brings together multiple approaches to litho pattern recording from academia and industry in one place
Author : Stefan Landis
Publisher : John Wiley & Sons
ISBN 13 : 1118621182
Total Pages : 311 pages
Book Rating : 4.1/5 (186 download)
Download or read book Lithography written by Stefan Landis and published by John Wiley & Sons. This book was released on 2013-03-04 with total page 311 pages. Available in PDF, EPUB and Kindle. Book excerpt: Lithography is now a complex tool at the heart of a technological process for manufacturing micro and nanocomponents. A multidisciplinary technology, lithography continues to push the limits of optics, chemistry, mechanics, micro and nano-fluids, etc. This book deals with essential technologies and processes, primarily used in industrial manufacturing of microprocessors and other electronic components.
Author : Kamil A. Valiev
Publisher : Springer Science & Business Media
ISBN 13 : 146153318X
Total Pages : 502 pages
Book Rating : 4.4/5 (615 download)
Download or read book The Physics of Submicron Lithography written by Kamil A. Valiev and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 502 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit.
Author : George Ripley
Publisher :
ISBN 13 :
Total Pages : 830 pages
Book Rating : 4.:/5 (321 download)
Download or read book The American Cyclopædia written by George Ripley and published by . This book was released on 1878 with total page 830 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Author : Yayi Wei
Publisher : SPIE Press
ISBN 13 : 0819475572
Total Pages : 338 pages
Book Rating : 4.8/5 (194 download)
Download or read book Advanced Processes for 193-nm Immersion Lithography written by Yayi Wei and published by SPIE Press. This book was released on 2009 with total page 338 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is a comprehensive guide to advanced processes and materials used in 193-nm immersion lithography (193i). It is an important text for those new to the field as well as for current practitioners who want to broaden their understanding of this latest technology. The book can be used as course material for graduate students of electrical engineering, material sciences, physics, chemistry, and microelectronics engineering and can also be used to train engineers involved in the manufacture of integrated circuits. It provides techniques for selecting critical materials (topcoats, photoresists, and antireflective coatings) and optimizing immersion processes to ensure higher performance and lower defectivity at lower cost. This book also includes sections on shrinking, trimming, and smoothing of the resist pattern to reduce feature sizes and line-edge roughness. Finally, it describes the recent development of 193i in combination with double exposure and double patterning.
Author : Weimin Zhou
Publisher : Springer Science & Business Media
ISBN 13 : 3642344283
Total Pages : 270 pages
Book Rating : 4.6/5 (423 download)
Download or read book Nanoimprint Lithography: An Enabling Process for Nanofabrication written by Weimin Zhou and published by Springer Science & Business Media. This book was released on 2013-01-04 with total page 270 pages. Available in PDF, EPUB and Kindle. Book excerpt: Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application. This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology. Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.
Author : R Newman
Publisher : Elsevier
ISBN 13 : 0444601287
Total Pages : 492 pages
Book Rating : 4.4/5 (446 download)
Download or read book Fine Line Lithography written by R Newman and published by Elsevier. This book was released on 2012-12-02 with total page 492 pages. Available in PDF, EPUB and Kindle. Book excerpt: Materials Processing - Theory and Practices, Volume 1: Fine Line Lithography reviews technical information as well as the theory and practices of materials processing. It looks at very large scale integration (VLSI) technology, with emphasis on the creation of fine line patterned structures that make up the devices and interconnects of complex functional circuits. It also describes a variety of other technologies that provide finer patterns, from modified versions of optical methods to electron-optic systems, non-plus-ultra of X-ray techniques, and dry processing that uses the chemical or kinetic energies of gas molecules or ions. Organized into five chapters, this volume begins with an overview of the fundamentals of electron and X-ray lithography, with a focus on resists and the way they function, and how they are used in microfabrication. It then discusses electron scattering and its effects on resist exposure and development, electron-beam lithography equipment, X-ray lithography, and optical methods for fine line lithography. It systematically introduces the reader to electron-beam projection techniques, dry processing methods, and application of electron-beam technology to large-scale integrated circuits. Other chapters focus on contact and proximity printing, projection printing, deep-UV lithography, and shadow printing with electrons and ions. The book describes reactive plasma etching and ion beam etching before concluding with a look at factors affecting the performance of the scanning-probe type of systems. This book is a valuable resource for materials engineers and processing engineers, as well as those in the academics and industry.
