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Laser Assisted And Blanket Chemical Vapor Deposition Of Copper Using Copper Ii Hexafluoroacetylacetonate In A Cold Wall Atmospheric Pressure Laser Assited Chemical Vapor Deposition Reactor
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Book Synopsis The Chemistry of Metal CVD by : Toivo T. Kodas
Download or read book The Chemistry of Metal CVD written by Toivo T. Kodas and published by John Wiley & Sons. This book was released on 2008-09-26 with total page 562 pages. Available in PDF, EPUB and Kindle. Book excerpt: High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Book Synopsis Modeling of Chemical Vapor Deposition of Tungsten Films by : Chris R. Kleijn
Download or read book Modeling of Chemical Vapor Deposition of Tungsten Films written by Chris R. Kleijn and published by Birkhäuser. This book was released on 2013-11-11 with total page 138 pages. Available in PDF, EPUB and Kindle. Book excerpt: Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently under very different boundary conditions. On the one side, Chris Kleijn, working in an academic research environment, was able to go deep enough into the subject to laya solid foundation and prove the validity of all the assumptions made in his work. On the other side, Christoph Werner, working in the context of an industrial research lab, was able to closely interact with manufacturing and development engineers in a modern submicron semiconductor processing line. Because of these different approaches, the informal collaboration during the course of the projects proved to be extremely helpful to both sides, even though - or perhaps because - different computer codes, different CVD reactors and also slightly different models were used. In spite of the inconsistencies which might arise from this double approach, we feel that the presentation of both sets of results in one book will be very useful for people working in similar projects.
Book Synopsis Theory and Application of Laser Chemical Vapor Deposition by : J. Mazumder
Download or read book Theory and Application of Laser Chemical Vapor Deposition written by J. Mazumder and published by . This book was released on 2014-01-15 with total page 408 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Chemical Vapor Deposition by : Srinivasan Sivaram
Download or read book Chemical Vapor Deposition written by Srinivasan Sivaram and published by Springer Science & Business Media. This book was released on 2013-11-11 with total page 302 pages. Available in PDF, EPUB and Kindle. Book excerpt: In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.
Book Synopsis Handbook of Chemical Vapor Deposition by : Hugh O. Pierson
Download or read book Handbook of Chemical Vapor Deposition written by Hugh O. Pierson and published by William Andrew. This book was released on 2012-12-02 with total page 459 pages. Available in PDF, EPUB and Kindle. Book excerpt: Handbook of Chemical Vapor Deposition: Principles, Technology and Applications provides information pertinent to the fundamental aspects of chemical vapor deposition. This book discusses the applications of chemical vapor deposition, which is a relatively flexible technology that can accommodate many variations. Organized into 12 chapters, this book begins with an overview of the theoretical examination of the chemical vapor deposition process. This text then describes the major chemical reactions and reviews the chemical vapor deposition systems and equipment used in research and production. Other chapters consider the materials deposited by chemical vapor deposition. This book discusses as well the potential applications of chemical vapor deposition in semiconductors and electronics. The final chapter deals with ion implantation as a major process in the fabrication of semiconductors. This book is a valuable resource for scientists, engineers, and students. Production and marketing managers and suppliers of equipment, materials, and services will also find this book useful.
Book Synopsis Chemical Vapor Deposition by : S Neralla
Download or read book Chemical Vapor Deposition written by S Neralla and published by BoD – Books on Demand. This book was released on 2016-08-31 with total page 292 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Book Synopsis Chemical Vapor Deposition for Nanotechnology by : Pietro Mandracci
Download or read book Chemical Vapor Deposition for Nanotechnology written by Pietro Mandracci and published by BoD – Books on Demand. This book was released on 2019-01-10 with total page 166 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposition (CVD) techniques have played a major role in the development of modern technology, and the rise of nanotechnology has further increased their importance, thanks to techniques such as atomic layer deposition (ALD) and vapor liquid solid growth, which are able to control the growth process at the nanoscale. This book aims to contribute to the knowledge of recent developments in CVD technology and its applications. To this aim, important process innovations, such as spatial ALD, direct liquid injection CVD, and electron cyclotron resonance CVD, are presented. Moreover, some of the most recent applications of CVD techniques for the growth of nanomaterials, including graphene, nanofibers, and diamond-like carbon, are described in the book.
Book Synopsis Principles of Chemical Vapor Deposition by : D.M. Dobkin
Download or read book Principles of Chemical Vapor Deposition written by D.M. Dobkin and published by Springer Science & Business Media. This book was released on 2013-03-09 with total page 277 pages. Available in PDF, EPUB and Kindle. Book excerpt: Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Book Synopsis Chemical Vapor Deposition by : M. L. Hitchman
Download or read book Chemical Vapor Deposition written by M. L. Hitchman and published by Academic Press. This book was released on 1993-04-13 with total page 692 pages. Available in PDF, EPUB and Kindle. Book excerpt: This wide-ranging volume covers recent developments in the theoretical understanding of the chemistry and physics of chemical vapour deposition (CVD). Contributors are drawn from both academia and industry to achieve a balaced coverage of the subject. The volume emphasizes principles and understanding rather than details of specific materials or processes. Specific examples are given to illustrate the principles.
Book Synopsis Chemical Vapor Deposition (CVD). by : Levi Karlsson
Download or read book Chemical Vapor Deposition (CVD). written by Levi Karlsson and published by . This book was released on 2021 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Chemical vapor deposition (CVD) refers to a vacuum deposition method used to produce high quality, high-performance, solid materials in a variety of manufacturing industries. Chapter One provides a critical review of published experimental data for thin films of silicon nitride deposited by thermal and plasma CVD, plasma CVD, high density plasma CVD, atomic layer-by-layer deposition, and hot-wire CVD. Chapter Two describes several aspects of the use of CVD for single-crystal diamond synthesis for electronics. Chapter Three describes the properties of graphene and its preparation by a number of methods with a focus on the classical CVD method on copper foil together with graphene transfer onto a dielectric substrate.
Book Synopsis Catalytic Chemical Vapor Deposition by : Hideki Matsumura
Download or read book Catalytic Chemical Vapor Deposition written by Hideki Matsumura and published by John Wiley & Sons. This book was released on 2019-02-08 with total page 604 pages. Available in PDF, EPUB and Kindle. Book excerpt: The authoritative reference on catalytic chemical vapor deposition, written by the inventor of the technology. This comprehensive book covers a wide scope of Cat-CVD and related technologies from the fundamentals to the many applications, including the design of a Cat-CVD apparatus. Featuring contributions from four senior leaders in the field, including the father of catalytic chemical vapor deposition, it also introduces some of the techniques used in the observation of Cat-CVD related phenomena so that readers can understand the concepts of such techniques. Catalytic Chemical Vapor Deposition: Technology and Applications of Cat-CVD begins by reviewing the analytical tools for elucidating the chemical reactions in Cat-CVD, such as laser-induced fluorescence and deep ultra-violet absorption, and explains in detail the underlying physics and chemistry of the Cat-CVD technology. Subsequently it provides an overview of the synthesis and properties of Cat-CVD-prepared inorganic and organic thin films. The last parts of this unique book are devoted to the design and operation of Cat-CVD apparatuses and the applications. Provides coherent coverage of the fundamentals and applications of catalytic chemical vapor deposition (Cat-CVD) Assembles in one place the state of the art of this rapidly growing field, allowing new researchers to get an overview that is difficult to obtain solely from journal articles Presents comparisons of different Cat-CVD methods which are usually not found in research papers Bridges academic and industrial research, showing how CVD can be scaled up from the lab to large-scale industrial utilization in the high-tech industry. Catalytic Chemical Vapor Deposition: Technology and Applications is an excellent one-stop resource for researchers and engineers working on or entering the field of Cat-CVD, Hot-Wire CVD, iCVD, and related technologies.
Book Synopsis Ionized Physical Vapor Deposition by :
Download or read book Ionized Physical Vapor Deposition written by and published by Academic Press. This book was released on 1999-10-14 with total page 268 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume provides the first comprehensive look at a pivotal new technology in integrated circuit fabrication. For some time researchers have sought alternate processes for interconnecting the millions of transistors on each chip because conventional physical vapor deposition can no longer meet the specifications of today's complex integrated circuits. Out of this research, ionized physical vapor deposition has emerged as a premier technology for the deposition of thin metal films that form the dense interconnect wiring on state-of-the-art microprocessors and memory chips.For the first time, the most recent developments in thin film deposition using ionized physical vapor deposition (I-PVD) are presented in a single coherent source. Readers will find detailed descriptions of relevant plasma source technology, specific deposition systems, and process recipes. The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools.Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.Key Features:The first comprehensive volume on ionized physical vapor depositionCombines tool design, process development, and fundamental physical understanding to form a complete picture of I-PVDEmphasizes practical applications in the area of IC fabrication and interconnect technologyServes as a guide to select the most appropriate technology for any deposition application*This single source saves time and effort by including comprehensive information at one's finger tips*The integration of tool design, process development, and fundamental physics allows the reader to quickly understand all of the issues important to I-PVD*The numerous practical applications assist the working engineer to select and refine thin film processes
Author :Electrochemical Society. High Temperature Materials Division Publisher :The Electrochemical Society ISBN 13 :9781566771788 Total Pages :1686 pages Book Rating :4.7/5 (717 download)
Book Synopsis Chemical Vapor Deposition by : Electrochemical Society. High Temperature Materials Division
Download or read book Chemical Vapor Deposition written by Electrochemical Society. High Temperature Materials Division and published by The Electrochemical Society. This book was released on 1997 with total page 1686 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Proceedings of the Sixth International Conference on Chemical Vapor Deposition, 1977 by : Lee F. Donaghey
Download or read book Proceedings of the Sixth International Conference on Chemical Vapor Deposition, 1977 written by Lee F. Donaghey and published by . This book was released on 1977 with total page 564 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis New Methods, Mechanisms and Models of Vapor Deposition: Volume 616 by : Haydn N. G. Wadley
Download or read book New Methods, Mechanisms and Models of Vapor Deposition: Volume 616 written by Haydn N. G. Wadley and published by Mrs Proceedings. This book was released on 2000-09-25 with total page 274 pages. Available in PDF, EPUB and Kindle. Book excerpt: The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Book Synopsis Luminous Chemical Vapor Deposition and Interface Engineering by : Hirotsugu Yasuda
Download or read book Luminous Chemical Vapor Deposition and Interface Engineering written by Hirotsugu Yasuda and published by CRC Press. This book was released on 2004-11-30 with total page 840 pages. Available in PDF, EPUB and Kindle. Book excerpt: Providing in-depth coverage of the technologies and various approaches, Luminous Chemical Vapor Deposition and Interface Engineering showcases the development and utilization of LCVD procedures in industrial scale applications. It offers a wide range of examples, case studies, and recommendations for clear understanding of this innovative science.
Book Synopsis Luminous Chemical Vapor Deposition and Interface Engineering by : Hirotsugu Yasuda
Download or read book Luminous Chemical Vapor Deposition and Interface Engineering written by Hirotsugu Yasuda and published by CRC Press. This book was released on 2004-11-30 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt: Providing in-depth coverage of the technologies and various approaches, Luminous Chemical Vapor Deposition and Interface Engineering showcases the development and utilization of LCVD procedures in industrial scale applications. It offers a wide range of examples, case studies, and recommendations for clear understanding of this innovative science. The book comprises four parts. Part 1 describes the fundamental difference between glow discharge of an inert gas and that of an organic vapor, from which the concepts of Luminous Gas Phase derive. Part 2 explores the various ways of practicing Luminous Vapor Disposition and Treatment depending on the type and nature of substrates. Part 3 covers some very important aspects of surface and interface that could not have been seen clearly without results obtained by application of LCVD. Part 4 offers some examples of interface engineering that show very unique aspects of LCVD interface engineering in composite materials, biomaterial surface and corrosion protection by the environmentally benign process. Timely and up-to-date, the book provides broad coverage of the complex relationships involved in the interface between a gas/solid, liquid/solid, and a solid/solid. The author presents a new perspective on low-pressure plasma and describes key aspects of the surface and interface that could not be shown without the results obtained by LCVD technologies. Features Provides broad coverage of complex relationships involved in interface between a gas/solid, a liquid/solid, and a solid/solid Addresses the importance of the initial step of creating electrical glow discharge Describes the principles of creating chemically reactive species and their growth in the luminous gas phase Focuses on the nature of surface-state of solid and on the creation of imperturbable surface-state by the contacting phase or environment, which is vitally important in creating biocompatible surface, providing super corrosion protection of metals by environmentally benign processes, etc. Offers examples on how to use LCVD in the interface engineering process Presents a new view on low-pressure (low-temperature) plasma and emphasizes the importance of luminous gas phase and chemical reactions that occur in the phase About the author: Dr. Yasuda is one of the pioneers who explored low-pressure plasma for surface modification of materials and deposition of nano films as barrier and perm-selective membranes in the late 1960s. He obtained his PhD in physical and polymer chemistry working on transport properties of gases and vapors in polymers at State University of New York, College of Environmental Science and Forestry at Syracuse, NY. He has over 300 publications in refereed journals and books, and is currently a Professor Emeritus of Chemical Engineering, and Director, Center for Surface Science & Plasma Technology, University of Missouri-Columbia, and is actively engaged in research on the subjects covered by this book.
