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Ion Bombardment Energy Control For Fluorocarbon Plasma Etching Of Organosilicate Glass
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Book Synopsis Ion Bombardment Energy Control for Fluorocarbon Plasma Etching of Organosilicate Glass by : Rardchawadee Silapunt
Download or read book Ion Bombardment Energy Control for Fluorocarbon Plasma Etching of Organosilicate Glass written by Rardchawadee Silapunt and published by . This book was released on 2004 with total page 164 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Control and Measurement of Ion Bombardment Energies at Substrates Biased with Tailored Voltage Waveforms by : Marlann Marinho Patterson
Download or read book Control and Measurement of Ion Bombardment Energies at Substrates Biased with Tailored Voltage Waveforms written by Marlann Marinho Patterson and published by . This book was released on 2005 with total page 130 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Silicon Oxide and Silicon Nitride Etch Mechanisms in Nitrogen Trifloride /ethylene Plasma by : Puthajat Machima
Download or read book Silicon Oxide and Silicon Nitride Etch Mechanisms in Nitrogen Trifloride /ethylene Plasma written by Puthajat Machima and published by . This book was released on 2005 with total page 288 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Anisotropic Fluorocarbon Plasma Etching of Si/SiGe Heterostructures and Plasma Etching-induced Sidewall Damage by : Ruhang Ding
Download or read book Anisotropic Fluorocarbon Plasma Etching of Si/SiGe Heterostructures and Plasma Etching-induced Sidewall Damage written by Ruhang Ding and published by . This book was released on 2008 with total page 146 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Dissertation Abstracts International by :
Download or read book Dissertation Abstracts International written by and published by . This book was released on 2006 with total page 790 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Advanced Interconnects for ULSI Technology by : Mikhail Baklanov
Download or read book Advanced Interconnects for ULSI Technology written by Mikhail Baklanov and published by John Wiley & Sons. This book was released on 2012-02-17 with total page 616 pages. Available in PDF, EPUB and Kindle. Book excerpt: Finding new materials for copper/low-k interconnects is critical to the continuing development of computer chips. While copper/low-k interconnects have served well, allowing for the creation of Ultra Large Scale Integration (ULSI) devices which combine over a billion transistors onto a single chip, the increased resistance and RC-delay at the smaller scale has become a significant factor affecting chip performance. Advanced Interconnects for ULSI Technology is dedicated to the materials and methods which might be suitable replacements. It covers a broad range of topics, from physical principles to design, fabrication, characterization, and application of new materials for nano-interconnects, and discusses: Interconnect functions, characterisations, electrical properties and wiring requirements Low-k materials: fundamentals, advances and mechanical properties Conductive layers and barriers Integration and reliability including mechanical reliability, electromigration and electrical breakdown New approaches including 3D, optical, wireless interchip, and carbon-based interconnects Intended for postgraduate students and researchers, in academia and industry, this book provides a critical overview of the enabling technology at the heart of the future development of computer chips.
Download or read book Chemical Abstracts written by and published by . This book was released on 2002 with total page 2626 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Logic Synthesis for Asynchronous Controllers and Interfaces by : J. Cortadella
Download or read book Logic Synthesis for Asynchronous Controllers and Interfaces written by J. Cortadella and published by Springer Science & Business Media. This book was released on 2012-12-06 with total page 279 pages. Available in PDF, EPUB and Kindle. Book excerpt: This book is the result of a long friendship, of a broad international co operation, and of a bold dream. It is the summary of work carried out by the authors, and several other wonderful people, during more than 15 years, across 3 continents, in the course of countless meetings, workshops and discus sions. It shows that neither language nor distance can be an obstacle to close scientific cooperation, when there is unity of goals and true collaboration. When we started, we had very different approaches to handling the mys terious, almost magical world of asynchronous circuits. Some were more theo retical, some were closer to physical reality, some were driven mostly by design needs. In the end, we all shared the same belief that true Electronic Design Automation research must be solidly grounded in formal models, practically minded to avoid excessive complexity, and tested "in the field" in the form of experimental tools. The results are this book, and the CAD tool petrify. The latter can be downloaded and tried by anybody bold (or desperate) enough to tread into the clockless (but not lawless) domain of small-scale asynchronicity. The URL is http://www.lsi. upc. esr j ordic/petrify. We believe that asynchronous circuits are a wonderful object, that aban dons some of the almost militaristic law and order that governs synchronous circuits, to improve in terms of simplicity, energy efficiency and performance.
Book Synopsis Copper Interconnect Technology by : Tapan Gupta
Download or read book Copper Interconnect Technology written by Tapan Gupta and published by Springer Science & Business Media. This book was released on 2010-01-22 with total page 433 pages. Available in PDF, EPUB and Kindle. Book excerpt: Since overall circuit performance has depended primarily on transistor properties, previous efforts to enhance circuit and system speed were focused on transistors as well. During the last decade, however, the parasitic resistance, capacitance, and inductance associated with interconnections began to influence circuit performance and will be the primary factors in the evolution of nanoscale ULSI technology. Because metallic conductivity and resistance to electromigration of bulk copper (Cu) are better than aluminum, use of copper and low-k materials is now prevalent in the international microelectronics industry. As the feature size of the Cu-lines forming interconnects is scaled, resistivity of the lines increases. At the same time electromigration and stress-induced voids due to increased current density become significant reliability issues. Although copper/low-k technology has become fairly mature, there is no single book available on the promise and challenges of these next-generation technologies. In this book, a leader in the field describes advanced laser systems with lower radiation wavelengths, photolithography materials, and mathematical modeling approaches to address the challenges of Cu-interconnect technology.
Book Synopsis Self-healing Materials by : Martin D. Hager
Download or read book Self-healing Materials written by Martin D. Hager and published by Springer. This book was released on 2016-07-06 with total page 418 pages. Available in PDF, EPUB and Kindle. Book excerpt: The series Advances in Polymer Science presents critical reviews of the present and future trends in polymer and biopolymer science. It covers all areas of research in polymer and biopolymer science including chemistry, physical chemistry, physics, material science. The thematic volumes are addressed to scientists, whether at universities or in industry, who wish to keep abreast of the important advances in the covered topics. Advances in Polymer Science enjoys a longstanding tradition and good reputation in its community. Each volume is dedicated to a current topic, and each review critically surveys one aspect of that topic, to place it within the context of the volume. The volumes typically summarize the significant developments of the last 5 to 10 years and discuss them critically, presenting selected examples, explaining and illustrating the important principles, and bringing together many important references of primary literature. On that basis, future research directions in the area can be discussed. Advances in Polymer Science volumes thus are important references for every polymer scientist, as well as for other scientists interested in polymer science - as an introduction to a neighboring field, or as a compilation of detailed information for the specialist. Review articles for the individual volumes are invited by the volume editors. Single contributions can be specially commissioned. Readership: Polymer scientists, or scientists in related fields interested in polymer and biopolymer science, at universities or in industry, graduate students
Book Synopsis Handbook of Advanced Plasma Processing Techniques by : R.J. Shul
Download or read book Handbook of Advanced Plasma Processing Techniques written by R.J. Shul and published by Springer Science & Business Media. This book was released on 2000-08-28 with total page 664 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume covers the topic of advanced plasma processing techniques, from the fundamental physics of plasmas to diagnostics, modeling and applications such as etching and deposition for microelectronics. The use of plasmas for patterning on a submicron scale has enabled successive generations of continually smaller transistors, lasers, micromachines, sensors and magnetic read/write heads that have formed the basis of our information age. This volume is the first to give coverage to this broad area of topics in a detailed fashion, especially in the rapidly expanding fields of micro-mechanical machines, photomask fabrication, magnetic data storage and reactor modeling. It provides the reader with a broad array of topics, authored by the leading experts in the field.
Book Synopsis Glow Discharge Processes by : Brian Chapman
Download or read book Glow Discharge Processes written by Brian Chapman and published by Wiley-Interscience. This book was released on 1980 with total page 434 pages. Available in PDF, EPUB and Kindle. Book excerpt: Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.
Book Synopsis Principles of Plasma Discharges and Materials Processing by : Michael A. Lieberman
Download or read book Principles of Plasma Discharges and Materials Processing written by Michael A. Lieberman and published by John Wiley & Sons. This book was released on 2024-10-15 with total page 837 pages. Available in PDF, EPUB and Kindle. Book excerpt: A new edition of this industry classic on the principles of plasma processing Plasma-based technology and materials processes have been central to the revolution of the last half-century in micro- and nano-electronics. From anisotropic plasma etching on microprocessors, memory, and analog chips, to plasma deposition for creating solar panels and flat-panel displays, plasma-based materials processes have reached huge areas of technology. As key technologies scale down in size from the nano- to the atomic level, further developments in plasma materials processing will only become more essential. Principles of Plasma Discharges and Materials Processing is the foundational introduction to the subject. It offers detailed information and procedures for designing plasma-based equipment and analyzing plasma-based processes, with an emphasis on the abiding fundamentals. Now fully updated to reflect the latest research and data, it promises to continue as an indispensable resource for graduate students and industry professionals in a myriad of technological fields. Readers of the third edition of Principles of Plasma Discharges and Materials Processing will also find: Extensive figures and tables to facilitate understanding A new chapter covering the recent development of processes involving high-pressure capacitive discharges New subsections on discharge and processing chemistry, physics, and diagnostics Principles of Plasma Discharges and Materials Processing is ideal for professionals and process engineers in the field of plasma-assisted materials processing with experience in the field of science or engineering. It is the premiere world-wide basic text for graduate courses in the field.
Book Synopsis Plasma Etching by : Dennis M.. Manos
Download or read book Plasma Etching written by Dennis M.. Manos and published by . This book was released on 1989 with total page 0 pages. Available in PDF, EPUB and Kindle. Book excerpt:
Book Synopsis Optical Diagnostics for Thin Film Processing by : Irving P. Herman
Download or read book Optical Diagnostics for Thin Film Processing written by Irving P. Herman and published by Elsevier. This book was released on 1996-10-23 with total page 815 pages. Available in PDF, EPUB and Kindle. Book excerpt: This volume describes the increasing role of in situ optical diagnostics in thin film processing for applications ranging from fundamental science studies to process development to control during manufacturing. The key advantage of optical diagnostics in these applications is that they are usually noninvasive and nonintrusive. Optical probes of the surface, film, wafer, and gas above the wafer are described for many processes, including plasma etching, MBE, MOCVD, and rapid thermal processing. For each optical technique, the underlying principles are presented, modes of experimental implementation are described, and applications of the diagnostic in thin film processing are analyzed, with examples drawn from microelectronics and optoelectronics. Special attention is paid to real-time probing of the surface, to the noninvasive measurement of temperature, and to the use of optical probes for process control. Optical Diagnostics for Thin Film Processing is unique. No other volume explores the real-time application of optical techniques in all modes of thin film processing. The text can be used by students and those new to the topic as an introduction and review of the subject. It also serves as a comprehensive resource for engineers, technicians, researchers, and scientists already working in the field. - The only volume that comprehensively explores in situ, real-time, optical probes for all types of thin film processing - Useful as an introduction to the subject or as a resource handbook - Covers a wide range of thin film processes including plasma etching, MBE, MOCVD, and rapid thermal processing - Examples emphasize applications in microelectronics and optoelectronics - Introductory chapter serves as a guide to all optical diagnostics and their applications - Each chapter presents the underlying principles, experimental implementation, and applications for a specific optical diagnostic
Book Synopsis Electrodynamics of Metamaterials by : Andrey K. Sarychev
Download or read book Electrodynamics of Metamaterials written by Andrey K. Sarychev and published by World Scientific. This book was released on 2007 with total page 260 pages. Available in PDF, EPUB and Kindle. Book excerpt: Local electromagnetic field fluctuations and related enhancement of nonlinear phenomena in metal-dielectric composites near the percolation threshold (percolation composites) have recently become an area of active study, because of the many fundamental problems involved and the high potential for various applications. It has been recognized recently that local field fluctuations can be especially large in the optical and infrared spectral ranges due to the surface plasmon resonance in metallic granules and their clusters. The strong fluctuations of the local electric and magnetic fields result in the enhancement of various optical effects: anomalous absorption, Rayleigh and Raman scattering, generation of the higher harmonic, Kerr nonlinearity, etc. Nonlinear percolation composites are potentially of great practical importance as media with intensity-dependent dielectric functions and, in particular, as nonlinear filters and optical bistable elements. The optical response of nonlinear composites can be tuned, for example, by controlling the volume fraction and morphology of constituents. This book presents a new theory of electromagnetic field distribution and nonlinear optical processes in metal-dielectric composites. The new approach is based on a percolation theory and the fact that the problem of optical excitations in percolation composites mathematically maps the Anderson transition problem in quantum mechanics. The theory predicts localization of the excitations (surface plasmons) in percolation composites and describes in detail the localization pattern that allows one to obtain relatively simple expressions for the enhancement of linear and nonlinear optical responses. Thistheory is supported by recent near-field experiments where the surface plasmon localization has been directly observed in the percolating composites in optical and microwave bands.
Book Synopsis Plasma Diagnostics by : Orlando Auciello
Download or read book Plasma Diagnostics written by Orlando Auciello and published by Academic Press. This book was released on 2013-10-22 with total page 470 pages. Available in PDF, EPUB and Kindle. Book excerpt: Plasma Diagnostics, Volume 1: Discharge Parameters and Chemistry covers seven chapters on the important diagnostic techniques for plasmas and details their use in particular applications. The book discusses optical diagnostic techniques for low pressure plasmas and plasma processing; plasma diagnostics for electrical discharge light sources; as well as Langmuir probes. The text also describes the mass spectroscopy of plasmas, microwave diagnostics, paramagnetic resonance diagnostics, and diagnostics in thermal plasma processing. Electrical engineers, nuclear engineers, microwave engineers, chemists, and technical personnel in universities, industry, and national laboratories will find the book invaluable.
